Patents by Inventor Takahiro Kitano

Takahiro Kitano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8808798
    Abstract: A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.
    Type: Grant
    Filed: August 8, 2012
    Date of Patent: August 19, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Publication number: 20140197360
    Abstract: A method for being capable of sufficiently exerting property improvement effect by the addition of additive particles other than water-absorbing resin to water-absorbing resin particles. The problems can be solved by using additive particles having over cohesive particles in an amount equal to or less than a predetermined amount, or by using the additive particles by crushing or classifying in advance, before mixing with water-absorbing resin particles. Alternatively, the problem can be solved by subjecting a mixture of the water-absorbing resin particles and the additive particles to pneumatic transportation processing, in particular, in a heated state, after mixing or at the same time as mixing. Further, provided is a water-absorbing resin composition, which is capable of stably exerting high-level property. The problems can be solved by a water-absorbing resin composition, where the addition amount of additive particles and amount of free additive particles satisfies a predetermined relation.
    Type: Application
    Filed: March 18, 2014
    Publication date: July 17, 2014
    Applicant: NIPPON SHOKUBAI CO., LTD.
    Inventors: Takahiro KITANO, Yorimichi DAIROKU, Sumio OKUDA, Kozo NOGI, Motohiro IMURA
  • Patent number: 8772413
    Abstract: Disclosed is a method for producing a water absorbent resin, by which a surface-crosslinked water absorbent resin having excellent physical properties can be efficiently obtained at low cost, while assuring high productivity. When the production scale is increased to a continuous production at 1 t/hr or more, the physical properties are improved and stabilized (for example, standard deviation of the physical properties is reduced) by a surface-crosslinking treatment, and the absorption against pressure (AAP) and liquid permeability (SFC) are further improved.
    Type: Grant
    Filed: August 27, 2010
    Date of Patent: July 8, 2014
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Takahiro Kitano, Kozo Nogi, Kunihiko Ishizaki
  • Patent number: 8734684
    Abstract: A method for producing a metallic carbon nanotube, by which a dispersion with a high concentration can be obtained. Specifically disclosed is a method for producing a metallic carbon nanotube, which comprises a fullerene addition step wherein fullerenes are added into a carbon nanotube-containing solution in which metallic carbon nanotubes and semiconductive carbon nanotubes are mixed, and a taking-out step wherein carbon nanotubes dispersed by the added fullerenes are taken out.
    Type: Grant
    Filed: October 22, 2009
    Date of Patent: May 27, 2014
    Assignee: Kuraray Co., Ltd.
    Inventor: Takahiro Kitano
  • Patent number: 8729190
    Abstract: A particulate water-absorbent agent containing a polyacrylate salt-type water-absorbent resin. The agent has an absorption capacity without load of 28 g/g or higher and has a diffusion absorption index of 1.40 to 10.0 g/g min. The amount of water-soluble components in the agent, with stirring, is 15-60% by mass. The difference between this amount and the amount of water-soluble components, without stirring, is 15-50% by mass. Also disclosed is a method of making the above-identified agent.
    Type: Grant
    Filed: February 28, 2008
    Date of Patent: May 20, 2014
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Takahiro Kitano, Takaaki Kawano, Katsuyuki Wada
  • Patent number: 8703859
    Abstract: The present invention provides a method for being capable of sufficiently exerting property improvement effect by the addition of additive particles other than water-absorbing resin to water-absorbing resin particles. The problems can be solved by using additive particles having over cohesive particles in an amount equal to or less than a predetermined amount, or by using the additive particles by crushing or classifying in advance, before mixing with water-absorbing resin particles. Alternatively, the problem can be solved by subjecting a mixture of the water-absorbing resin particles and the additive particles to pneumatic transportation processing, in particular, in a heated state, after mixing or at the same time as mixing. Further, the present invention provides a water-absorbing resin composition, which is capable of stably exerting high-level property.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: April 22, 2014
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Takahiro Kitano, Yorimichi Dairoku, Sumio Okuda, Kozo Nogi, Motohiro Imura
  • Publication number: 20140102474
    Abstract: A substrate cleaning apparatus for cleaning a substrate back surface includes a first substrate supporting portion supporting the substrate at a first area of the substrate back surface, the back surface facing down; a second substrate supporting portion supporting the substrate at a second area of the substrate back surface, the second area being separated from the first area; a cleaning liquid supplying portion supplying cleaning liquid to the substrate back surface; a drying portion drying the second area of the substrate back surface; and a cleaning portion cleaning a third area of the substrate back surface when the substrate is supported by the first substrate supporting portion, the third area including the second area, and cleaning a fourth area of the substrate back surface when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area.
    Type: Application
    Filed: October 9, 2013
    Publication date: April 17, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yasushi TAKIGUCHI, Taro YAMAMOTO, Akihiro FUJIMOTO, Shuuichi NISHIKIDO, Dai KUMAGAI, Naoto YOSHITAKA, Takahiro KITANO, Yoichi TOKUNAGA
  • Publication number: 20140091033
    Abstract: The object of the present invention is to provide carbon fiber material having high electrical conductivity at a low cost. A manufacturing method of carbon fiber material comprises a dispersion liquid preparation step, a centrifugal spinning step and a denaturation step. The dispersion liquid preparation step is a step in which dispersion liquid containing resin and carbon particles is prepared. The centrifugal spinning step is a step in which nonwoven fabric made of a carbon fiber precursor is formed from the dispersion liquid. The denaturation step is a step in which the carbon fiber precursor denatures into carbon fiber.
    Type: Application
    Filed: October 18, 2012
    Publication date: April 3, 2014
    Applicant: Tec One Co., Ltd.
    Inventor: Takahiro Kitano
  • Publication number: 20140017417
    Abstract: Problem to be Solved The present invention is a transparent conductive film characterized in that: a major component of the transparent conductive film is a single-walled carbon nanotube; the single-walled carbon nanotubes are present in a bundle state; and a rope-like shape, which is a state where the bundles are gathered together, can be confirmed by scanning electron microscope observation. The present invention is also a method for producing a liquid crystal alignment film using a transparent electrode substrate, with an electrode layer being the aforementioned transparent conductive film. According to the invention, a transparent electrode substrate with high wettability can be obtained, and further a method for producing an alignment film by which a uniform alignment film can be obtained without deteriorating an electrical characteristic is provided.
    Type: Application
    Filed: July 10, 2013
    Publication date: January 16, 2014
    Applicant: Kuraray Co., Ltd.
    Inventors: Takahiro KITANO, Masayasu OGUSHI
  • Publication number: 20140000517
    Abstract: Disclosed is a coating apparatus capable of enhancing the film thickness uniformity. The coating apparatus includes a nozzle and a moving mechanism. The nozzle includes a storage chamber that stores a coating liquid and a slit-like flow path that is in communication with the storage chamber, and discharges the coating liquid through a discharge port formed at a front end of the flow path. The moving mechanism moves the nozzle and the substrate relatively to each other along a surface of the substrate. Also, in the flow path provided in the nozzle, flow resistance at the central portion in the longitudinal direction is larger than that at both end portions in the longitudinal direction.
    Type: Application
    Filed: June 18, 2013
    Publication date: January 2, 2014
    Inventors: Takayuki Ishii, Takahiro Sakamoto, Takahiro Kitano, Shoichi Terada
  • Patent number: 8578953
    Abstract: A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back
    Type: Grant
    Filed: December 14, 2007
    Date of Patent: November 12, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Akihiro Fujimoto, Shuuichi Nishikido, Dai Kumagai, Naoto Yoshitaka, Takahiro Kitano, Yoichi Tokunaga
  • Patent number: 8551563
    Abstract: A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.
    Type: Grant
    Filed: May 3, 2012
    Date of Patent: October 8, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Patent number: 8522712
    Abstract: In a template treatment of forming a film of a release agent on a treatment surface of a template, the treatment surface of the template is first cleaned. Thereafter, in a coating unit, the release agent is applied to the treatment surface of the template. The release agent on the template is then dried. Then, alcohol is applied to the release agent on the template to make the release agent adhere to the treatment surface of the template and to remove an unreacted portion of the release agent. Thereafter, the alcohol on the template is dried and removed. In this manner, a film of the release agent is formed in a predetermined film thickness on the treatment surface of the template.
    Type: Grant
    Filed: November 10, 2010
    Date of Patent: September 3, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Koukichi Hiroshiro, Takanori Nishi, Takahiro Kitano, Shoichi Terada
  • Patent number: 8468943
    Abstract: The present invention provides a method for applying an application liquid between a template and a substrate, and transferring the transfer pattern onto the application liquid. The template is inclinedly arranged with respect to the substrate in a manner that a first distance between a first end portion of the template and the substrate is a distance that causes a capillary action of the application liquid to occur, and a second distance between a second end portion of the template that opposes the first end portion and the substrate is a distance that does not cause the capillary action of the application liquid to occur. Thereafter, the application liquid is supplied from an outer side of the first end portion to the first end portion. Thereafter, the second end portion and the substrate are relatively moved so that the second distance becomes equal to the first distance.
    Type: Grant
    Filed: August 25, 2010
    Date of Patent: June 25, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Koukichi Hiroshiro, Takanori Nishi, Shoichi Terada, Takahiro Kitano
  • Patent number: 8430967
    Abstract: The hydrophobicizing apparatus includes a vaporizing surface forming member of which surface is located in a vaporizing room; a vaporizing surface heating unit that heats the vaporizing surface forming member; a liquid chemical supply port that supplies a liquid chemical for a hydrophobicizing process on the surface of the vaporizing surface forming member; a gas inlet port that introduces a carrier gas into the vaporizing room; an outlet port that supplies a hydrophobicizing gas vaporized in the vaporizing room; and a processing chamber that performs the hydrophobicizing process on a substrate accommodated therein by the hydrophobicizing gas supplied through the outlet port. With this configuration, the hydrophobicizing gas of a high concentration can be supplied onto the substrate. Further, since the stored liquid chemical is not in contact with the carrier gas when a process is not being performed, degradation of the liquid chemical is suppressed.
    Type: Grant
    Filed: August 20, 2010
    Date of Patent: April 30, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Satoshi Shimmura, Tetsuo Fukuoka, Takahiro Kitano
  • Publication number: 20130045024
    Abstract: In the state where a handle (2) and a lid (12) are attached to a main body (11), left and right bases (22) of the handle (2) are fitted into recesses (1112, 1113) at coupling portions (111, 112). Left and right shaft supports (91) of the lid (12) are fitted into recesses (1111, 1114). Shaft portions (81) of the left and right bases (22) are fitted from above into a through hole (72) and a through hole (73), respectively, and are supported rotatably about a center axis (200) in the through holes (72, 73). Shafts (93 to 95) of the shaft supports (91, 92) are laterally fitted into through holes (71, 74, 75), respectively, and are supported rotatably about the center axis (200) in the through holes (71, 74, 75). The shaft (94) of the shaft support (92) is laterally fitted into a blind hole (82) of the right base (22).
    Type: Application
    Filed: April 5, 2011
    Publication date: February 21, 2013
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Masanobu Deguchi, Shinji Kawamura, Takahiro Kitano, Wataru Yoshida, Hideki Sekino
  • Publication number: 20120301612
    Abstract: A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.
    Type: Application
    Filed: August 8, 2012
    Publication date: November 29, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Takahiro KITANO, Koichi OBATA, Hiroichi INADA, Nobuhiro OGATA
  • Patent number: 8309654
    Abstract: A method of producing a particle-shape water-absorbing resin material is realized. With this method, it is possible to prevent deterioration of properties of the particle-shape water-absorbing resin material, and reduces damages onto surfaces thereof. This method is arranged such that (a) water-absorbing resin particles are surface-treated by using a crossing agent so that surfaces of the particles are cross-linked, (b) an additive for giving a function to the particles is added to the particles, (c) and a step of mixing the particles and the additive is carried out in a step of performing particle-size regulating treatment for the particles which includes agglomerated particles.
    Type: Grant
    Filed: September 3, 2004
    Date of Patent: November 13, 2012
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Koji Miyake, Takahiro Kitano, Kunihiko Ishizaki
  • Patent number: 8304020
    Abstract: There are provided an adhesion promoting process using a comparatively small amount of an adhesion promoting gas for processing a workpiece, an adhesion promoting device for carrying out the adhesion promoting process, a coating and developing system including the adhesion promoting device, and a storage medium storing a program specifying a set of instructions for carrying out the adhesion promoting process.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: November 6, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Tetsuo Fukuoka, Takahiro Kitano
  • Patent number: 8256370
    Abstract: A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: September 4, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata