Patents by Inventor Takahiro Kitano

Takahiro Kitano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100297449
    Abstract: The present invention is a transparent conductive film characterized in that: a major component of the transparent conductive film is a single-walled carbon nanotube; the single-walled carbon nanotubes are present in a bundle state; and a rope-like shape, which is a state where the bundles are gathered together, can be confirmed by scanning electron microscope observation. The present invention is also a method for producing a liquid crystal alignment film using a transparent electrode substrate, with an electrode layer being the aforementioned transparent conductive film. According to the invention, a transparent electrode substrate with high wettability can be obtained, and further a method for producing an alignment film by which a uniform alignment film can be obtained without deteriorating an electrical characteristic is provided.
    Type: Application
    Filed: October 24, 2007
    Publication date: November 25, 2010
    Applicant: KURARAY CO., LTD.
    Inventors: Takahiro Kitano, Masayasu Ogushi
  • Publication number: 20100288336
    Abstract: Provided is a solar cell array having excellent power generation efficiency by being capable of efficiently cooling solar cell panels with a simple structure.
    Type: Application
    Filed: October 3, 2008
    Publication date: November 18, 2010
    Applicant: KYOCERA CORPORATION
    Inventors: Takahiro Kitano, Toshiaki Ohno, Akihito Ito
  • Patent number: 7797855
    Abstract: A heating apparatus 2 comprises a housing 20; a flat heating chamber 4 which is provided in the housing 2 and adapted to heat a wafer W used as a substrate, with one side of the heating chamber 4 opening for carrying in and carrying out the wafer; and a heating plates 44, 45 provided in the heating chamber 4 such that the wafer W can be heated from both above and below. A cooling plate 3 is provided in the housing 20 located in the vicinity of the opening of the heating chamber 4, for cooling the wafer W after being heated by the heating plates 44, 45. Additionally, a carrying means is provided in the housing 20 for carrying the wafer W between an upper position of the cooling plate 3 and the interior of the heating chamber 4 such that a heat treatment for the wafer W can be performed with the wafer W being held in the heating chamber 4.
    Type: Grant
    Filed: August 18, 2006
    Date of Patent: September 21, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Tetsuo Fukuoka, Masami Akimoto, Takahiro Kitano, Yoshio Kimura, Shinichi Hayashi, Hikaru Ito
  • Publication number: 20100215985
    Abstract: Disclosed is a transparent conductive film containing a single-walled carbon nanotube and a fullerene.
    Type: Application
    Filed: April 24, 2008
    Publication date: August 26, 2010
    Applicant: Kuraray Co., Ltd.
    Inventor: Takahiro Kitano
  • Publication number: 20100216077
    Abstract: A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to supply a developing solution to a substrate on a substrate holder, and a controller to control a heater, a cooler and a developing nozzle.
    Type: Application
    Filed: May 5, 2010
    Publication date: August 26, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takanori NISHI, Takahiro Kitano, Katsuya Okumura
  • Patent number: 7766566
    Abstract: In the present invention, a substrate transfer unit into/from which a substrate is transferred from/to the outside of a treatment container and a developing treatment unit in which development of the substrate is performed are arranged side by side in the treatment container, and a carrier mechanism is provided which carries the substrate while grasping an outside surface of the substrate from both sides, between the substrate transfer unit and the developing treatment unit. A developing solution supply nozzle for supplying a developing solution onto the substrate and a gas blow nozzle for blowing a gas to the substrate, are provided between the substrate transfer unit and the developing treatment unit and above a carriage path along which the substrate is carried, and a cleaning solution supply nozzle is provided in the developing treatment unit for supplying a cleaning solution onto the substrate.
    Type: Grant
    Filed: July 31, 2006
    Date of Patent: August 3, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Masami Akimoto, Shuuichi Nishikido, Dai Kumagai
  • Publication number: 20100187485
    Abstract: Disclosed is a single-walled carbon nanotube dispersion liquid containing a single-walled carbon nanotube, a fullerene and a solvent.
    Type: Application
    Filed: April 24, 2008
    Publication date: July 29, 2010
    Applicant: Kuraray Co., Ltd.
    Inventor: Takahiro Kitano
  • Patent number: 7740410
    Abstract: A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to supply a developing solution to a substrate on a substrate holder, and a controller to control a heater, a cooler and a developing nozzle.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: June 22, 2010
    Assignees: Tokyo Electron Limited, Octec Inc.
    Inventors: Takanori Nishi, Takahiro Kitano, Katsuya Okumura
  • Patent number: 7742277
    Abstract: A dielectric film capacitor includes a lower electrode having an opening and formed of a material including platinum, a dielectric film provided over the lower electrode and including an oxide having an ABOx crystal structure, and an upper electrode provided over the dielectric film. The planar area of the lower electrode is 50% or more of the area of a formation region of the dielectric film. A dielectric film capacitor includes a lower electrode formed of a material including platinum and having a thickness of 10 to 100 nm, a dielectric film provided over the lower electrode and including an oxide having an ABOx crystal structure, and an upper electrode provided over the dielectric film.
    Type: Grant
    Filed: August 23, 2006
    Date of Patent: June 22, 2010
    Assignee: Ibiden Company Limited
    Inventors: Tomotaka Shinoda, Kinji Yamada, Takahiro Kitano, Yoshiki Yamanishi, Muneo Harada, Tatsuzo Kawaguchi, Yoshihiro Hirota, Katsuya Okumura, Shuichi Kawano
  • Publication number: 20100072421
    Abstract: A particulate water-absorbent agent containing a polyacrylate salt-type water-absorbent resin. The agent has an absorption capacity without load of 28 g/g or higher and has a diffusion absorption index of 1.40 to 10.0 g/g min. The amount of water-soluble components in the agent, with stirring, is 15-60% by mass. The difference between this amount and the amount of water-soluble components, without stirring, is 15-50% by mass. Also disclosed is a method of making the above-identified agent.
    Type: Application
    Filed: February 28, 2008
    Publication date: March 25, 2010
    Applicant: Nippon Shokubai Co., Ltd.
    Inventors: Takahiro Kitano, Takaaki Kawano, Katsuyuki Wada
  • Publication number: 20090285984
    Abstract: A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.
    Type: Application
    Filed: February 27, 2009
    Publication date: November 19, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takahiro KITANO, Koichi OBATA, Hiroichi INADA, Nobuhiro OGATA
  • Publication number: 20090285991
    Abstract: A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.
    Type: Application
    Filed: February 23, 2009
    Publication date: November 19, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Publication number: 20090252932
    Abstract: An active energy ray-curable resin composition is handleable when it is formed into an uncured film. The resin composition cures quickly, is formable, and can be used to make a hard coat layer with a high hardness. Specifically, the active energy ray-curable resin composition of the present invention contains a vinyl polymer having alkoxysilyl groups in its side chain, along with a photoacid generator. In its uncured state, the active energy ray-curable resin composition has a glass transition temperature of 15° C. to 100° C.
    Type: Application
    Filed: December 15, 2005
    Publication date: October 8, 2009
    Applicant: Kuraray Co., Ltd.
    Inventors: Takahiro Kitano, Hiroshi Matsugi, Takashi Imazu, Keiji Kubo, Masayasu Ogushi, Hirokazu Suzuki
  • Publication number: 20090207390
    Abstract: There are provided an adhesion promoting process using a comparatively small amount of an adhesion promoting gas for processing a workpiece, an adhesion promoting device for carrying out the adhesion promoting process, a coating and developing system including the adhesion promoting device, and a storage medium storing a program specifying a set of instructions for carrying out the adhesion promoting process.
    Type: Application
    Filed: February 3, 2009
    Publication date: August 20, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tetsuo FUKUOKA, Takahiro Kitano
  • Patent number: 7534467
    Abstract: The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.
    Type: Grant
    Filed: September 2, 2004
    Date of Patent: May 19, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Manabu Hama, Shinichi Sugimoto, Naoya Hirakawa
  • Patent number: 7510611
    Abstract: A coating solution is sprayed on a rotating wafer held horizontally from a nozzle provided above the wafer while the nozzle is travelling over the wafer from a wafer center to a wafer outer area, thus spirally spraying the coating solution on the wafer. The nozzle stops when the coating solution has reached the wafer outer area and the coating solution is sprayed in circle on the wafer outer area while the wafer is rotating. A coating solution including a component of a coating film and a solvent may be sprayed on a first area to be coated of the wafer and the coating solution and a solvent for the coating film may be sprayed on a second edge area located outside the first area of the wafer.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: March 31, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Jun Ookura, Hiroaki Kurishima
  • Publication number: 20090052025
    Abstract: To provide a lenticular lens sheet having a fine light shielding pattern that has high color reproducibility. [MEANS FOR SOLVING PROBLEMS] The above problem can be solved by a lenticular lens sheet, in which the average primary particle diameter of carbon black contained in a light shielding layer is not less than 10 nm and not more than 50 nm and, preferably, in an image of the cross-section of the light shielding layer under scanning electron microscopic observation, the area ratio of carbon black to the whole image is not less than 60% and not more than 95%, and a process for producing the lenticular lens sheet.
    Type: Application
    Filed: March 14, 2006
    Publication date: February 26, 2009
    Applicant: Kuraray Co., Ltd.
    Inventors: Takahiro Kitano, Masayasu Ogushi
  • Patent number: 7488505
    Abstract: When a coating film is formed on a substrate, the inplane uniformity of the thickness of the coating film is enhanced to improve through put. Above the substrate, there are provided main and auxiliary nozzles separately movable, and monitoring means for monitoring the state of the surface of the substrate to detect the occurrence of an uncoated region on the surface of the substrate. On the basis of previously prepared coating data, a coating liquid is spirally applied on the substrate by the main nozzle. Then, if the monitoring means detects the occurrence of the uncoated region in a coated region in which the coating liquid has been applied by the main nozzle, a control part detects whether it is required to supply the coating liquid to the uncoated region. If it is required, the coating liquid is supplied to the uncoated region by the auxiliary nozzle. On the other hand, the portion of occurrence of the uncoated region has been grasped by the control part.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: February 10, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Jun Ookura, Hiroaki Kurishima
  • Publication number: 20090032777
    Abstract: Disclosed is a carbon nanotube dispersion liquid which enables to easily form a transparent conductive film. Also disclosed is a transparent conductive film obtained by using such a carbon nanotube dispersion liquid. Specifically disclosed is a carbon nanotube dispersion liquid containing a carbon nanotube (A), a dispersing agent (B) composed of an organic compound containing one of a carboxyl group, epoxy group, amino group and sulfonyl group and having a boiling point of not less than 30˚C and not more than 150˚C, and a solvent (C). Also disclosed are a transparent conductive film containing a layer composed of a solid component of such a dispersion liquid, and a method for producing such a transparent conductive film.
    Type: Application
    Filed: June 6, 2006
    Publication date: February 5, 2009
    Applicant: KURARAY CO., LTD.
    Inventors: Takahiro Kitano, Masayasu Ogushi
  • Patent number: 7473470
    Abstract: The present invention provides a particulate water absorbing agent for a thin type absorbing substrate suitable for actual use. A particulate water absorbing agent having irregularly pulverized shape, characterized by comprising, a surface crosslinked water-absorbing resin obtained by crosslinking polymerization of an unsaturated monomer with an acid group and/or salts thereof, which absorbing agent contains agglomerated particles therein and further satisfies (i) centrifuge retention capacity (CRC) in a physiological saline solution of not lower than 32 g/g, (ii) mass median particle size (D50) of 200 to 400 ?m, and (iii) particles smaller than 600 ?m and not smaller than 150 ?m of 95 to 100% by weight. By using the particulate water absorbing agent, such absorbing articles can be obtained as have few rugged surface after water absorption, excellent liquid permeation property.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: January 6, 2009
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kunihiko Ishizaki, Takahiro Kitano, Yoshifumi Adachi, Hiroko Ueda, Katsuyuki Wada