Patents by Inventor Takahiro Yamada

Takahiro Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180243831
    Abstract: An object of the present invention is to provide a phosphorus-containing copper powder with good volume resistivity and a small carbon content by suppressing an oxygen content to a relatively low value even if a particle size is made small, and a method for producing the same. In the phosphorus-containing copper powder containing phosphorus, a ratio of an oxygen content (wt. %) to a BET specific surface area (m2/g) (oxygen content/BET specific surface area) is 0.90 wt. %·g/m2 or less, a divalent copper compound is present on a surface of particles constituting the phosphorus-containing copper powder, a carbon content is 0.10 wt. % or less, and D50 is 7.11 ?m or less.
    Type: Application
    Filed: August 18, 2016
    Publication date: August 30, 2018
    Applicant: DOWA ELECTRONICS MATERIALS CO., LTD.
    Inventors: Kenichi INOUE, Atsushi EBARA, Masahiro YOSHIDA, Kyoso MASUDA, Takahiro YAMADA, Shinichi UCHIYAMA
  • Patent number: 10059073
    Abstract: Disclosed is a single facer which comprises: a cartridge pivotally supporting a pair of corrugating rolls by a side plate; two cartridges pivotally supporting a pair of corrugating rolls by a side plate, respectively; a single facer body housing the two cartridges in a movable manner so as to exchange respective setup positions of the two cartridges between the in-use position and the rest position; and a hydraulic jack disposed just below the stacked cartridges in a vertical direction and configured to push the stacked cartridges upwardly, wherein, by pushing the stacked cartridges upwardly by the hydraulic jack, the single facer is operable to press an upper end of the side plate of the upper cartridge against a lower end of a ceiling member of the single facer body, so as to clamp the stacked cartridges by the hydraulic jack and the ceiling member of the single facer body.
    Type: Grant
    Filed: November 30, 2016
    Date of Patent: August 28, 2018
    Assignee: KABUSHIKI KAISHA ISOWA
    Inventors: Takahiro Yamada, Hisashi Hayashi, Naoki Mori
  • Patent number: 10062473
    Abstract: A silver-coated copper alloy powder, which has a low volume resistivity and excellent storage stability (reliability), is produced by coating a copper alloy powder, which has a chemical composition comprising 1 to 50 wt % of at least one of nickel and zinc and the balance being copper and unavoidable impurities (preferably a copper alloy powder wherein a particle diameter (D50 diameter) corresponding to 50% of accumulation in cumulative distribution of the copper alloy powder, which is measured by a laser diffraction particle size analyzer, is 0.1 to 15 ?m), with 7 to 50 wt % of a silver containing layer, preferably a layer of silver or an silver compound.
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: August 28, 2018
    Assignee: Dowa Electronics Materials Co., Ltd.
    Inventors: Kenichi Inoue, Kozo Ogi, Atsushi Ebara, Yuto Hiyama, Takahiro Yamada, Toshihiko Ueyama
  • Publication number: 20180237256
    Abstract: A method for controlling an elevator system comprises obtaining images of the inside of an elevator car, detecting passengers in the images, creating graphic passenger models of the detected passengers from the images and determining the number of passengers who may additionally board the elevator car using the passenger models. The passenger models may reflect the actual size of the passengers.
    Type: Application
    Filed: February 22, 2017
    Publication date: August 23, 2018
    Inventors: Takahiro Yamada, Naoki Taniguchi, Keiji Hashimoto, Kenichi Ohmura
  • Publication number: 20180200534
    Abstract: There is provided a treatment planning system and a particle therapy system. In the related art, it is unable to determine optimum beam intensity in irradiation for which discrete spot irradiation and continuous beam irradiation coexist. There is provided a treatment planning system that includes a spot determination unit that divides an irradiation region to be irradiated with a charged particle beam into a plurality of layers in an advancing direction of the charged particle beam and disposes a plurality of irradiation spots, which becomes irradiation points of the charged particle beam, in the layers and a beam intensity determination unit that determines beam intensity for each of the layers by evaluating the irradiation time by changing the beam intensity in a range of a condition of change in dose distribution which is set in advance.
    Type: Application
    Filed: November 24, 2017
    Publication date: July 19, 2018
    Inventors: Takahiro YAMADA, Taisuke TAKAYANAGI, Rintarou FUJIMOTO, Shinichiro FUJITAKA, Takuya NOMURA
  • Patent number: 9994429
    Abstract: A system for detecting a defect in a steel wire embedded in a handrail of a passenger conveyor includes a non-contact inspection device embedded in the handrail for inspecting a condition of the steel wire and transmitting a signal regarding the condition of the steel wire, a non-contact power supply device arranged in proximity to the handrail for supplying power wirelessly to the non-contact inspection device from the outside of the handrail, and a controller arranged outside of the handrail for receiving the signal regarding the condition wirelessly and determining whether there is a defect in the steel wire.
    Type: Grant
    Filed: May 15, 2017
    Date of Patent: June 12, 2018
    Assignee: OTIS ELEVATOR COMPANY
    Inventors: Naoki Taniguchi, Kenichi Ohmura, Takahiro Yamada, Keiji Hashimoto
  • Publication number: 20180156714
    Abstract: A handrail friction checking device comprises a handrail gripper for gripping the handrail and movable together with the handrail, a spring with one end of the spring being fixed and the other end being connected to the handrail gripper so that the spring can apply a spring force which is opposed to the direction of handrail movement to the handrail gripper when the handrail gripper moves along with the handrail and a sensor which is disposed in a way that it is distanced from the handrail gripper and can be triggered by the handrail gripper when the handrail gripper moves along with the handrail.
    Type: Application
    Filed: December 7, 2016
    Publication date: June 7, 2018
    Inventors: Takahiro Yamada, Atsushi Yamada, Hiromitsu Miyajima, Kenji Komiya
  • Publication number: 20180144939
    Abstract: A PSG film, which is a silicon dioxide thin film containing phosphorus as a dopant, is formed on the surface of a semiconductor wafer. The semiconductor wafer having the PSG film formed thereon is kept at a predetermined heating temperature by light radiation from halogen lamps in the atmosphere containing hydrogen for 1 second or longer, so that the dopant is diffused from the PSG film into the surface of the semiconductor wafer. In addition, the flashing light is radiated to the semiconductor wafer for the radiation time shorter than 1 second to heat the surface of the semiconductor wafer to the target temperature so as to activate the dopant. When the PSG film is heated in the atmosphere containing hydrogen, a diffusion coefficient of the dopant contained in the PSG film becomes high; therefore, the dopant can be efficiently diffused from the PSG film into the semiconductor wafer.
    Type: Application
    Filed: November 16, 2017
    Publication date: May 24, 2018
    Inventors: Hideaki TANIMURA, Takayuki Aoyama, Kazuhiko Fuse, Takahiro Yamada
  • Publication number: 20180076062
    Abstract: A ring support is attached to an inner wall surface of a chamber that houses a semiconductor wafer to support a susceptor. When the semiconductor wafer is placed on the susceptor, an inner space of the chamber is separated into an upper space and a lower space. Particles are likely to accumulate on a lower chamber window as a floor part of the chamber. However, since the upper space and the lower space are separated, the semiconductor wafer can be prevented from being contaminated by the particles flowing into the upper space and adhering to a surface of the semiconductor wafer even when the particles on the lower chamber window are blown up by irradiation with flash light.
    Type: Application
    Filed: July 13, 2017
    Publication date: March 15, 2018
    Inventors: Takahiro YAMADA, Makoto ABE, Kazuhiko FUSE, Jun WATANABE, Shinji MIYAWAKI
  • Publication number: 20180061954
    Abstract: A semiconductor device (100) includes a base layer (10), an interface layer (20), and a deposition layer (30). The base layer (10) includes a nitride semiconductor that contains gallium. The interface layer (20) is adjacent to the base layer (10). The interface layer (20) contains gallium oxide. The deposition layer (30) is adjacent to the interface layer (20). The deposition layer (30) has a wider band gap than the interface layer (20). The interface layer (20) preferably has crystallinity. The interface layer (20) preferably contains ?-phase Ga2O3.
    Type: Application
    Filed: August 25, 2017
    Publication date: March 1, 2018
    Applicant: OSAKA UNIVERSITY
    Inventors: Heiji WATANABE, Takahiro YAMADA, Mikito NOZAKI, Takuji HOSOI, Takayoshi SHIMURA
  • Publication number: 20170342566
    Abstract: The invention relates to a washing solution for a tin plating film after electroless tin plating and before water washing. The invention also relates to a method for forming a tin plating film, the method includes a step of washing step using the washing solution. The washing solution according to the present invention is an acidic aqueous solution containing an acid, a complexing agent, a stabilizer and a chloride ion. The washing solution has a chloride ion concentration of 2 wt % or more, and a tin concentration of 0.5 wt % or less. The washing solution according to the present invention has good washing property for a tin plating film surface, and allows a tin plating film to easily maintain its properties. In addition the washing solution causes little influence on a tin plating film surface even when continuously used and is excellent in temporal stability.
    Type: Application
    Filed: September 17, 2015
    Publication date: November 30, 2017
    Applicant: MEC COMPANY LTD.
    Inventors: Yuko SHIBANUMA, Tatsuya GODA, Jojiro NIGORO, Tomoko ICHIHASHI, Keisuke JOKO, Takahiro YAMADA, Tsuyoshi AMATANI
  • Publication number: 20170345107
    Abstract: A power supply management system according to an embodiment of the present invention includes a fee setting unit configured to set power fee unit prices (first power fee unit price and second power fee unit price for each time slot, and a notification unit configured to notify a consumer of information on the set power fee unit prices. The first power fee unit price is a power unit price for a household electrical load, and the second power fee unit price is a power unit price in a case of using a charge/discharge device to charge a vehicle-mounted storage battery. The fee setting unit is configured to set, by predicting a load factor of a transformer, a discount rate of the second power fee unit price to become higher (second power fee unit price to become lower) as the predicted load factor becomes lower. The second power fee unit price is determined on the basis of the first power fee unit price and the discount rate.
    Type: Application
    Filed: October 7, 2015
    Publication date: November 30, 2017
    Inventors: Tetsuya HIRATA, Masayuki KAWAMOTO, Jun KOREISHI, Tatsuya MORII, Koshi ITO, Kengo MATSUNAGA, Takahiro YAMADA
  • Publication number: 20170336711
    Abstract: A substrate having a surface on which a resist film is formed and that has undergone pattern exposure processing and development processing is conveyed into a chamber and held by a holding plate. The surface of the substrate W held by the holding plate is irradiated with flash light emitted from flash lamps. The spectral distribution of the flash light has a peak in a wavelength range of 200 nm to 300 nm. The spectral distribution of the flash light also shows that the relative intensity at a wavelength of 300 nm is 20% or more higher than that at a wavelength of 500 nm. Since the resist film absorbs ultraviolet rays, the resist film can be selectively heated by irradiating the resist film with flash light that includes a large number of wavelength components in the ultraviolet region.
    Type: Application
    Filed: October 8, 2015
    Publication date: November 23, 2017
    Inventor: Takahiro YAMADA
  • Publication number: 20170308973
    Abstract: An energy saving support system according to an embodiment is configured to provide a consumer, who has an electric load to which electric energy is supplied from an electric power supply system within a house, with energy consumption-related information through a photo frame or the like. The information providing apparatus is configured to acquire an acceptability level, which stepwise indicates a degree of interest of the consumer in the energy consumption-related information, and to determine the energy consumption-related information to be newly provided to the consumer based on the acceptability level.
    Type: Application
    Filed: October 7, 2015
    Publication date: October 26, 2017
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Tetsuya HIRATA, Masayuki KAWAMOTO, Jun KOREISHI, Tatsuya MORII, Hiroaki SUGIYAMA, Daisuke TAKANOHASHI, Koshi ITO, Kengo MATSUNAGA, Takahiro YAMADA
  • Patent number: 9778148
    Abstract: In order to remove dust attached to a filter member 40 to surely clean the filter member 40, an analysis apparatus 100 includes: a sample containing part 10 that contains a sample; the filter member 40 through which gas produced from the sample heated in the sample containing part 10 passes; and a gas flow path L1 adapted to lead the gas having passed through the filter member 40 to an analyzer. In addition, the filter member 40 is formed in a tubular shape, and in one end part of the filter member 40, a gas lead-out port 40a connecting to the gas flow path L1 is formed. Further, it is configured that the gas passes through a side wall part 42 of the filter member 40 from outside to inside, and flows from the gas lead-out port 40a to the gas flow path L1.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: October 3, 2017
    Assignee: HORIBA, LTD.
    Inventors: Heihachiro Taniguchi, Takuji Kurozumi, Takahiro Yamada, Yasushi Hirata
  • Publication number: 20170262069
    Abstract: A character input device using a D-pad for inputting a desired character string includes an operation receiving unit, a keyboard management unit, an input character string management unit, a predicted candidate management unit, and a character candidate detection unit. The input character string management unit manages an input character string. The predicted candidate management unit estimates predicted character string candidates based on the input character string, and manages the predicted character string candidates. The character candidate detection unit compares the input character string with the predicted character string candidates, and detects one or more character candidates that are to be selected next. The operation receiving unit receives an input direction that is input with the D-pad. The keyboard management unit executes refined input, in which a cursor is moved only to a character candidate present in the input direction with respect to the character on which the cursor is placed.
    Type: Application
    Filed: December 12, 2016
    Publication date: September 14, 2017
    Applicant: OMRON Corporation
    Inventor: Takahiro YAMADA
  • Publication number: 20170243770
    Abstract: A semiconductor wafer held by a holder within a chamber is irradiated and heated with halogen light emitted from multiple halogen lamps. Cylindrical outer and inner louvers made of opaque quartz are provided between the halogen lamps and the semiconductor wafer. A reflector is provided in an area of tube walls of the halogen lamps that faces the spacing between the inner wall surface of the outer louver and the outer wall surface of the inner louver. The spacing between the two louvers is located immediately below and faces the peripheral portion of the semiconductor wafer. Thus, the illuminance of light that reaches the peripheral portion of the semiconductor wafer where a temperature drop is likely to occur will be higher than the illuminance of light that travels toward the central portion from the halogen lamps. This configuration will help make uniform the in-plane temperature distribution of the semiconductor wafer.
    Type: Application
    Filed: January 20, 2017
    Publication date: August 24, 2017
    Inventors: Makoto ABE, Hikaru KAWARAZAKI, Takahiro YAMADA
  • Publication number: 20170173914
    Abstract: Disclosed is a single facer which comprises: a cartridge pivotally supporting a pair of corrugating rolls by a side plate; two cartridges pivotally supporting a pair of corrugating rolls by a side plate, respectively; a single facer body housing the two cartridges in a movable manner so as to exchange respective setup positions of the two cartridges between the in-use position and the rest position; and a hydraulic jack disposed just below the stacked cartridges in a vertical direction and configured to push the stacked cartridges upwardly, wherein, by pushing the stacked cartridges upwardly by the hydraulic jack, the single facer is operable to press an upper end of the side plate of the upper cartridge against a lower end of a ceiling member of the single facer body, so as to clamp the stacked cartridges by the hydraulic jack and the ceiling member of the single facer body.
    Type: Application
    Filed: November 30, 2016
    Publication date: June 22, 2017
    Inventors: Takahiro YAMADA, Hisashi HAYASHI, Naoki MORI
  • Publication number: 20170155512
    Abstract: A management apparatus according to an embodiment is connected to a measurement apparatus deployed for each user via a first network. The management apparatus is connected to a service providing apparatus via a second network. The management apparatus includes a first communication device, a second communication device and one or more first processors. The first processors generate seed information using a service providing apparatus identifier. The first processors generate a user key using a measurement apparatus individual key, and the seed information. The first communication device transmits the generated seed information to the measurement apparatus via the first network. The second communication device transmits the generated user key to the service providing apparatus via the second network.
    Type: Application
    Filed: February 9, 2017
    Publication date: June 1, 2017
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Naoki OGURA, Toru KAMBAYASHI, Yoshikazu HANATANI, Takahiro YAMADA, Takeshi SAITO
  • Publication number: 20170140976
    Abstract: A susceptor of a holding part for holding a semiconductor wafer includes a disc-shaped holding plate, an annular shaped guide ring, and a plurality of support pins. The guide ring has an inside diameter greater than the diameter of the semiconductor wafer and is installed on the peripheral portion of the top face of the holding plate. The guide ring has a tapered surface along the inner circumference. The semiconductor wafer before irradiated with flash light is supported by the support pins. The annular shape of the guide ring increases the contact area when the semiconductor wafer that has jumped off the susceptor and fallen when irradiated with flash light collides with the guide ring, thus reducing the impact of the collision and preventing cracks in the substrate.
    Type: Application
    Filed: January 27, 2017
    Publication date: May 18, 2017
    Inventors: Makoto ABE, Takahiro YAMADA, Kazuhiko FUSE