Abstract: A plasma processing apparatus includes: a vacuum chamber in which plasma is formed; an inner chamber detachable from the vacuum chamber; a sample stage disposed in the inner chamber; a sample stage ring base disposed in the inner chamber; and a suspension beam coupled to the sample stage ring base in a space between the vacuum chamber and the inner chamber. With the inside of the vacuum chamber hermetically sealed, the inner chamber is placed on the sample stage ring base, and the inside is hermetically sealed. The upper part of the suspension beam is vertically movably held to a sample stage base plate configuring the upper part of the vacuum chamber to cover the inside. The plasma processing apparatus includes a conductive connector sandwiched between the suspension beam made of SUS and the upper part of the member and the sample stage base plate.

Abstract: In a plasma processing apparatus including an upper electrode arranged above a sample stage on which a sample to be processed in a processing chamber is mounted to supply an electric field, and a high frequency power supply to output first high frequency power to form the electric field to the upper electrode, an insulating layer has an impedance smaller than the impedance of the feeding path for bias or the feeding path for electrostatic chuck and a current of the first high frequency power flows through a circuit that passes through the conductive plate and a member constituting an inner sidewall surface of the processing chamber from the upper electrode via the top surface of the sample stage to return to the high frequency power supply.

Abstract: Information providing device has: travelling route searching section searching for a travelling route; and power consumption amount calculating section calculating a total power consumption amount. The power consumption amount calculating section has: first calculating section that refers to travel information correlated with a first unit area that belongs to the searched travelling route and calculates each first power consumption amount consumed to travel in the first unit area; second calculating section that refers to weather information forecasted for each second unit area that belongs to the searched travelling route, predicts setting temperature of an air conditioner and calculates each second power consumption amount consumed when the air conditioner into which the predicted setting temperature is inputted is operated during the travel in the second unit area; and totalizing section that calculates the total power consumption amount on the basis of the first and second power consumption amounts.

Abstract: Information providing device has: travelling route searching section searching for a travelling route; and power consumption amount calculating section calculating a total power consumption amount. The power consumption amount calculating section has: first calculating section that refers to travel information correlated with a first unit area that belongs to the searched travelling route and calculates each first power consumption amount consumed to travel in the first unit area; second calculating section that refers to weather information forecasted for each second unit area that belongs to the searched travelling route, predicts setting temperature of an air conditioner and calculates each second power consumption amount consumed when the air conditioner into which the predicted setting temperature is inputted is operated during the travel in the second unit area; and totalizing section that calculates the total power consumption amount on the basis of the first and second power consumption amounts.

Abstract: The invention provides a plasma processing apparatus and a method for purging the apparatus, capable of preventing damage of components caused by pressure difference during purging operation of a vacuum reactor, and capable of preventing residual processing gas from remaining in the vacuum reactor. Inert gas is introduced through an inert gas feed port 233 on a side wall of a depressurized processing chamber (V1) 226 of a plasma processing apparatus, and the interior of the processing chamber (V1) 226 is brought to predetermined pressure by the inert gas, and thereafter, the inert gas is supplied to processing gas supply paths 213 and 216 (V2) communicated to a plurality of through holes 224 for introducing processing gas, so as to introduce the inert gas through the plurality of through holes 224 into the processing chamber (V1) 226.

Abstract: The invention provides a plasma processing apparatus and a method for purging the apparatus, capable of preventing damage of components caused by pressure difference during purging operation of a vacuum reactor, and capable of preventing residual processing gas from remaining in the vacuum reactor. Inert gas is introduced through an inert gas feed port 233 on a side wall of a depressurized processing chamber (V1) 226 of a plasma processing apparatus, and the interior of the processing chamber (V1) 226 is brought to predetermined pressure by the inert gas, and thereafter, the inert gas is supplied to processing gas supply paths 213 and 216 (V2) communicated to a plurality of through holes 224 for introducing processing gas, so as to introduce the inert gas through the plurality of through holes 224 into the processing chamber (V1) 226.