Abstract: The present invention provides a measurement apparatus which measures a shape of a test object, including a detection unit configured to detect interference light between reference light from a reference surface and test light from the test object, thereby obtaining an interference image, and a processing unit configured to perform processing of obtaining the shape of the test object based on the interference image obtained by the detection unit, wherein in a measurement mode in which the interference image is obtained under a measurement condition that the optical path length difference measurable range is a second range smaller than a first range, the processing unit obtains a second shape of the test object by using data of an obtained first shape, and the interference image obtained by the detection unit in the measurement mode.

Abstract: The present invention provides an imprint apparatus for performing an imprint process of transferring a pattern onto a substrate by curing a resin on the substrate while the resin is in contact with a mold, and removing the mold from the cured resin, including a detection unit configured to detect a foreign particle existing on the substrate, wherein the detection unit includes an obtaining unit configured to irradiate a surface of the substrate with light, and obtain light from the surface of the substrate, and a specification unit configured to specify a shot region where a foreign particle existing on the substrate is positioned, based on the light obtained by the obtaining unit.

Abstract: In an illumination optical system arranged to illuminate an illumination target plane by using light from a light source, the illumination optical system includes a prism unit arranged to refract the light, an optical integrator arranged to form a plurality of light sources with light emerging from the prism unit, and an optical system arranged to introduce light emerging from the optical integrator to the illumination target plane. The prism unit includes a pair of conical refractive surface having a conical concave refractive surface and a conical convex refractive surface, and a pair of pyramidal refractive surface having a pyramidal concave refractive surface and a pyramidal convex refractive surface. At least one of the concave refractive surface and the convex refractive surface of the one pair is disposed between the concave refractive surface of the other pair and the convex refractive surface of the other pair.

Abstract: The present invention provides an exposure apparatus including an illumination optical system, the illumination optical system includes a mirror array optical element including a plurality of mirror elements having reflecting surfaces which reflect light from a light source, the plurality of mirror elements having angles that can be independently controlled with respect to the light from the light source, a first optical system configured to guide the light from the light source to the mirror array optical element, and receive light reflected by a predetermined mirror element, an angle of which is controlled to guide the light reflected by the reflecting surface to the reticle, a second optical system which is present on a side of the light source with respect to the first optical system, and a third optical system which is present on a side of the reticle with respect to the first optical system.

Abstract: A measurement apparatus for measuring the polarization state of a light beam Fourier-transforms changes in intensity of a plurality of light beams with different polarization states, which are detected while changing a relative rotation angle ? between the waveplate and the polarizer about the optical axis, to calculate the values of first Fourier coefficients of respective components oscillating with waveforms described by cos 4?, sin 4?, sin 2?, and cos 2?, approximately calculates, using the values of the first Fourier coefficients, third coefficients that define the relationship between the first Fourier coefficients and second Fourier coefficients of the respective components oscillating with waveforms described by cos 4?, sin 4?, and sin 2? assuming that the detection result contains no measurement error attributed to the optical system, and calculates a measurement error attributed to the optical system using the third coefficients.

Abstract: An illumination optical apparatus is configured to irradiate a light beam from a light source onto a surface to be irradiated. The illumination optical apparatus includes a first group of prisms which has a plurality of prisms, a second group of prisms which has a plurality of prisms, and a switch of a group of prisms which is capable of switching the first and the second groups of prisms so as to position one of the first and the second groups of prisms in an optical path.

Abstract: An illumination optical apparatus is configured to irradiate a light beam from a light source onto a surface to be irradiated. The illumination optical apparatus includes a first group of prisms which has a plurality of prisms, a second group of prisms which has a plurality of prisms, and a switch of a group of prisms which is capable of switching the first and the second groups of prisms so as to position one of the first and the second groups of prisms in an optical path.

Abstract: An exposure apparatus comprises an illumination optical system configured to illuminate a reticle arranged on a surface to be illuminated with a light beam from a light source, a projection optical system configured to project a pattern of the reticle onto a substrate, and a stage configured to drive the substrate, wherein the illumination optical system includes a light distribution forming unit configured to form a trapezoidal light intensity distribution along a scanning direction of the reticle on the surface to be illuminated to uniform a light angle distribution for illuminating each point on the surface to be illuminated, and the substrate is exposed with the light intensity distribution and light angle distribution formed by the light distribution forming unit, while the stage drives the substrate by tilting a normal to the substrate with respect to an optical axis of the projection optical system.

Abstract: In an illumination optical system arranged to illuminate an illumination target plane by using light from a light source, the illumination optical system includes a prism unit arranged to refract the light, an optical integrator arranged to form a plurality of light sources with light emerging from the prism unit, and an optical system arranged to introduce light emerging from the optical integrator to the illumination target plane. The prism unit includes a pair of conical refractive surface having a conical concave refractive surface and a conical convex refractive surface, and a pair of pyramidal refractive surface having a pyramidal concave refractive surface and a pyramidal convex refractive surface. At least one of the concave refractive surface and the convex refractive surface of the one pair is disposed between the concave refractive surface of the other pair and the convex refractive surface of the other pair.

Abstract: A diffractive optical element is disclosed. The diffractive optical element is used in an illumination optical system of an exposure apparatus which exposes a substrate, and used for forming the intensity distribution of light at a pupil plane of the illumination optical system. The diffractive optical element comprises a first diffractive element and a second diffractive element which have different diffraction actions from each other, wherein each of the first diffractive element and the second diffractive element has point symmetry in a irradiated region where light is irradiated and common center of the point symmetry.