Patents by Inventor Takashi Hayakawa

Takashi Hayakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140211625
    Abstract: Predictive management of a network buffer is contemplated. The network buffer may be predictively managed to control packet drop based at least in part on predicted sojourn time. The predicted sojourn time may be determined to predict time needed from an arriving packet to travel through a queue of the network buffer.
    Type: Application
    Filed: January 25, 2014
    Publication date: July 31, 2014
    Applicant: Cable Television Laboratories, Inc.
    Inventors: Gregory C. White, Joey Padden, Takashi Hayakawa
  • Publication number: 20140206187
    Abstract: A method for manufacturing semiconductor device includes preparing a structure including a substrate, an insulating layer on the substrate and having a recess, a barrier film on the insulating layer, and a copper film on the barrier such that the copper film is filling the recess with the barrier between the insulating layer and copper film, removing the copper film down to interface with the barrier such that copper wiring is formed in the recess, etching the wiring such that surface of the wiring is recessed from surface of the insulating layer, and removing the barrier from the surface of the insulating layer such that the surface of the insulating layer is exposed. The etching includes positioning the structure removed down to the barrier in organic compound atmosphere having vacuum state, and irradiating oxygen gas cluster ion beam on the surface of the wiring to anisotropically etch the wiring.
    Type: Application
    Filed: March 21, 2014
    Publication date: July 24, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kenichi HARA, Takashi Hayakawa, Mariko Ozawa
  • Publication number: 20130217225
    Abstract: A method comprising the steps of: forming a copper film (101) on a Cu barrier film (100); forming a mask material (102) on the copper film (101); anisotropically etching the copper film (101) until the Cu barrier film (100) is exposed, using the mask material (102) as a mask; and removing the mask material (102) and subsequently forming a plating film (104) that contains a substance for suppressing copper diffusion on the anisotropically etched copper film (101), using an electroless plating method that utilizes a selective deposition in which catalytic action occurs with respect to the copper film (101) but not the Cu barrier film (100).
    Type: Application
    Filed: July 29, 2011
    Publication date: August 22, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takashi Hayakawa, Kenichi Hara, Takashi Tanaka
  • Publication number: 20130203260
    Abstract: This etching method comprises a step for forming an organic compound gas (22) atmosphere around a copper film (101) that has a mask material (102) formed on the surface thereof and a step for using the mask material (102) as a mask on the copper film (101), irradiating with oxygen ions (6), and performing anisotropic etching of the copper film (101) in the organic compound gas (22) atmosphere.
    Type: Application
    Filed: July 29, 2011
    Publication date: August 8, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kenichi Hara, Takashi Hayakawa
  • Publication number: 20120305183
    Abstract: A semiconductor device manufacturing apparatus includes: a first pattern forming unit for forming a first pattern by patterning a first mask material layer; a trimming unit for reducing a width of the first pattern to a predetermined width; a boundary layer forming unit for forming a boundary layer, on a surface of the first pattern; a second mask material layer forming unit for forming a second mask material layer on a surface of the boundary layer; a second mask material removing unit for removing a part of the second mask material layer to expose top portions of the boundary layer; and a boundary layer etching unit for exposing the first pattern and forming a second pattern having the second mask material layer at a top portion thereof by etching the boundary layer.
    Type: Application
    Filed: August 21, 2012
    Publication date: December 6, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidetami Yaegashi, Satoru Shimura, Takashi Hayakawa
  • Patent number: 8283253
    Abstract: A pattern forming method for forming a pattern serving as a mask, includes a process for forming a first pattern 105, a process for trimming a width of the first pattern 105, a process for forming a boundary layer 106 on a surface of the first pattern 105, a process for forming a second mask material layer 107 on a surface of the boundary layer 106, a process for removing a part of the second mask material layer 107 to expose top portions of the boundary layer 106, and a process for exposing the first pattern 105 and forming a second pattern having the second mask material layer 107 at a top portion thereof by etching the boundary layer 106.
    Type: Grant
    Filed: February 13, 2009
    Date of Patent: October 9, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Hidetami Yaegashi, Satoru Shimura, Takashi Hayakawa
  • Patent number: 8187788
    Abstract: Disclosed is a photosensitive resin composition comprising an alkali-soluble resin, wherein the dissolution rate of the alkali-soluble resin in an aqueous sodium carbonate solution is not less than 0.04 ?m/sec. When a photosensitive layer having a thickness of 30 ?m is formed by applying the photosensitive resin composition onto a base and removing the solvent by heating, and thus-obtained photosensitive layer is irradiated with an active ray of 1000 mJ/cm2 or less, the dissolution rate of the portion irradiated with the active ray in the photosensitive layer made of the photosensitive resin composition is not less than 0.22 ?m/sec and the film residual rate of the portion not irradiated with the active ray is not less than 90%.
    Type: Grant
    Filed: April 24, 2007
    Date of Patent: May 29, 2012
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Kuon Miyazaki, Takashi Hayakawa
  • Publication number: 20090209105
    Abstract: A pattern forming method for forming a pattern serving as a mask, includes a process for forming a first pattern 105, a process for trimming a width of the first pattern 105, a process for forming a boundary layer 106 on a surface of the first pattern 105, a process for forming a second mask material layer 107 on a surface of the boundary layer 106, a process for removing a part of the second mask material layer 107 to expose top portions of the boundary layer 106, and a process for exposing the first pattern 105 and forming a second pattern having the second mask material layer 107 at a top portion thereof by etching the boundary layer 106.
    Type: Application
    Filed: February 13, 2009
    Publication date: August 20, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidetami Yaegashi, Satoru Shimura, Takashi Hayakawa
  • Patent number: 7574743
    Abstract: A method for ensuring security and a data storage apparatus that enable an efficient security check on a notebook PC or like that are taken outside are provided. By executing a program that is read from the data storage apparatus, the processing for determining whether or not a piece of security ensuring data is applied; reading the piece of security ensuring data that is determined to be applied; and applying the same to a predetermined program in a terminal is executed.
    Type: Grant
    Filed: April 20, 2005
    Date of Patent: August 11, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Yoshio Masuzawa, Takashi Hayakawa, Kazunori Kumakura, Toshio Morikawa
  • Publication number: 20090191385
    Abstract: Disclosed is a photosensitive resin composition comprising an alkali-soluble resin, wherein the dissolution rate of the alkali-soluble resin in an aqueous sodium carbonate solution is not less than 0.04 ?m/sec. When a photosensitive layer having a thickness of 30 ?m is formed by applying the photosensitive resin composition onto a base and removing the solvent by heating, and thus-obtained photosensitive layer is irradiated with an active ray of 1000 mJ/cm2 or less, the dissolution rate of the portion irradiated with the active ray in the photosensitive layer made of the photosensitive resin composition is not less than 0.22 ?m/sec and the film residual rate of the portion not irradiated with the active ray is not less than 90%.
    Type: Application
    Filed: April 24, 2007
    Publication date: July 30, 2009
    Applicant: ASAHI KASEI KABUSHIKI KAISHA
    Inventors: Kuon Miyazaki, Takashi Hayakawa
  • Patent number: 7542107
    Abstract: A liquid crystal display (LCD) panel has apertures for entry of backlight. A micro-lens array comprises micro-lenses of a resin on a transparent base. The base and each of the micro-lenses have a surface energy difference falling in or constrained to a predetermined range. The shape of each of the micro-lenses is such that collimated light substantially orthogonally incident to each of the micro-lens is compressed into a tight beam to enter one of the apertures.
    Type: Grant
    Filed: October 20, 2005
    Date of Patent: June 2, 2009
    Assignee: Miyakawa Corporation
    Inventor: Takashi Hayakawa
  • Publication number: 20070151596
    Abstract: A substrate 1 for a photoelectric conversion device includes a first transparent conductive layer 5 formed on at least a part of the surface region of a transparent substrate 3, the first transparent conductive layer 5 having at least an opening portion 7 exposing the substrate 3.
    Type: Application
    Filed: January 7, 2005
    Publication date: July 5, 2007
    Applicant: SHARP KABUSHIKI KAISHA
    Inventors: Yoshiyuki Nasuno, Noriyoshi Kohama, Kazuhiko Nishimura, Takashi Hayakawa
  • Publication number: 20070013830
    Abstract: A liquid crystal display (LCD) panel has apertures for entry of backlight. A micro-lens array comprises micro-lenses of a resin on a transparent base. The base and each of the micro-lenses have a surface energy difference falling in or constrained to a predetermined range. The shape of each of the micro-lenses is such that collimated light substantially orthogonally incident to each of the micro-lens is compressed into a tight beam to enter one of the apertures.
    Type: Application
    Filed: October 20, 2005
    Publication date: January 18, 2007
    Applicant: MIYAKAWA CORPORATION
    Inventor: Takashi Hayakawa
  • Patent number: 7108415
    Abstract: An optical element and a display device incorporating the optical element are provided. The optical element comprises a panel member having a first surface and a second surface opposite to the first surface, and a jetted pattern of light extracting dots applied to the first surface. Each light extracting dot has a part-spherical surface intersecting the first surface and a transition between the part-spherical surface and the first surface. The transition includes substantially continuous angular configuration from the part-spherical surface angular orientation to the first surface angular orientation.
    Type: Grant
    Filed: May 4, 2004
    Date of Patent: September 19, 2006
    Assignee: Miyakawa Corporation
    Inventor: Takashi Hayakawa
  • Publication number: 20060015744
    Abstract: A method for ensuring security and a data storage apparatus that enable an efficient security check on a notebook PC or like that are taken outside are provided. By executing a program that is read from the data storage apparatus, the processing for determining whether or not a piece of security ensuring data is applied; reading the piece of security ensuring data that is determined to be applied; and applying the same to a predetermined program in a terminal is executed.
    Type: Application
    Filed: April 20, 2005
    Publication date: January 19, 2006
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Yoshio Masuzawa, Takashi Hayakawa, Kazunori Kumakura, Toshio Morikawa
  • Publication number: 20050190575
    Abstract: An optical element and a display device incorporating the optical element are provided. The optical element comprises a panel member having a first surface and a second surface opposite to the first surface, and a jetted pattern of light extracting dots applied to the first surface. Each light extracting dot has a part-spherical surface intersecting the first surface and a transition between the part-spherical surface and the first surface. The transition includes substantially continuous angular configuration from the part-spherical surface angular orientation to the first surface angular orientation.
    Type: Application
    Filed: May 4, 2004
    Publication date: September 1, 2005
    Applicant: MIYAKAWA CORPORATION
    Inventor: Takashi Hayakawa
  • Publication number: 20050185421
    Abstract: A light emitting panel assembly comprises a light emitting panel member having at least one light input area for receiving light from at least one light source.
    Type: Application
    Filed: April 26, 2004
    Publication date: August 25, 2005
    Applicant: MIYAKAWA CORPORATION
    Inventor: Takashi Hayakawa
  • Patent number: 6459034
    Abstract: A multi-junction solar cell comprising: a support substrate having a first electrode layer, a plurality of photoelectric conversion devices and a second electrode layer stacked thereon, and an intermediate layer having an uneven surface being sandwiched between any two of the photoelectric conversion devices stacked adjacent each other.
    Type: Grant
    Filed: May 24, 2001
    Date of Patent: October 1, 2002
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Masahiko Muramoto, Takashi Hayakawa
  • Publication number: 20020038691
    Abstract: There is provided a plasma processing system capable of making a processing rate uniform without the occurrence of charge-up damage and arcing damage when a substrate to be processed is plasma-processed.
    Type: Application
    Filed: September 28, 2001
    Publication date: April 4, 2002
    Applicant: Tokyo Electron Limited
    Inventor: Takashi Hayakawa
  • Publication number: 20020011263
    Abstract: A multi-junction solar cell comprising: a support substrate having a first electrode layer, a plurality of photoelectric conversion devices and a second electrode layer stacked thereon, and an intermediate layer having an uneven surface being sandwiched between any two of the photoelectric conversion devices stacked adjacent each other.
    Type: Application
    Filed: May 24, 2001
    Publication date: January 31, 2002
    Inventors: Masahiko Muramoto, Takashi Hayakawa