Abstract: A hot-stretch-reduced electric resistance welded pipe has a base metal portion and a weld portion, the base metal portion has a predetermined chemical composition, a Ti/N value obtained by dividing Ti content by N content is 3.0 or more, in a microstructure of the weld portion, the average grain diameter is 10.0 ?m or less, the area ratio of ferrite is 20% or more, and the remaining structure includes at least one or more of pearlite and bainite/martensite, and in a texture of the weld portion, the accumulation intensity of a {001} plane is 6.0 or less, and a critical cooling rate Vc90 of the base metal portion is 5° C./s to 90° C./s.

Abstract: The present disclosure promotes distribution of sensor data among a plurality of business operators. A controller that an information processing system according to the present disclosure includes collects first data including a plurality of items and personal information from mobile bodies belonging to a first business operator. The controller converts the first data to second data not being usable to identify individuals. The controller provides data in a range decided based on content of a predetermined data use contract, among the second data, to a second business operator. The controller calculates a consideration for the data that is to be paid by the second business operator, based on a data use record of the second business operator.

Abstract: A light distribution control device, if a first upper limit number N1?the number of near-distance targets T1, controls a lamp to irradiate the near-distance targets with light having illuminance according to attributes of the near-distance targets; if a remaining number M?the number of long-distance targets T2, controls the lamp to irradiate the long-distance targets with light having illuminance according to attributes of the long-distance targets; if N1<T1, controls the lamp to form a light distribution pattern that does not depend on the near-distance targets and the long-distance targets; and, if M<T2, controls the lamp to form a light distribution pattern that does not depend on the long-distance targets.

Abstract: A drive device includes a power supply circuit that includes a switch element, and a drive circuit that is configured to use a voltage supplied from the power supply circuit as a power supply voltage and that is configured to perform pulse driving of a drive-target element. The power supply circuit is configured to operate such that a switching frequency of the switch element differs from a frequency of the pulse driving.

Abstract: A multilayer coil component includes an element body, a plurality of coil conductors, a first resistive layer, and a second resistive layer. The plurality of coil conductors are disposed in the element body and electrically connected to each other. The plurality of coil conductors include a first coil conductor and a second coil conductor adjacent to each other. The first resistive layer and the second resistive layer oppose each other between the first coil conductor and the second coil conductor. The first resistive layer is in contact with the first coil conductor.

Abstract: A grindstone includes abrasive grains and a binder for fixing the abrasive grains, and the binder contains a spherical filler for reinforcing the bonding material.

Abstract: A substrate liquid processing apparatus includes a processing liquid storage unit configured to store a processing liquid therein; a processing liquid drain unit configured to drain the processing liquid from the processing liquid storage unit; and a control unit. The control unit performs a first control in a constant concentration mode in which a concentration of the processing liquid in the processing liquid storage unit is regulated to a predetermined set concentration and a second control in a concentration changing mode in which the concentration of the processing liquid is changed. In the second control, a set concentration after concentration change is compared with a set concentration before the concentration change, and when the set concentration after the concentration change is lower, the control unit controls the processing liquid drain unit to start draining of the processing liquid.

Abstract: A colorimetric method includes a server generating a colorimetric job including information about an instruction to perform colorimetry and a colorimetry measurement condition, the server storing the colorimetric job, the server transmitting the colorimetric job, a colorimeter receiving the colorimetric job, and the colorimeter performing colorimetry based on the colorimetric job when the colorimetric job is selected by the colorimeter.

Abstract: A welding torch includes an inner tube of a helically wound wire to define a passage for a welding wire, a conduit in which the inner tube is inserted, the conduit having a curved portion, a torch body including a tip portion and a nozzle, a torch holder having a gas supplying member that supplies a shield gas into a space between the inner tube and the conduit, a feed unit provided upstream of the torch holder to feed the welding wire forward to or backward from the inner tube, and a sealing mechanism for preventing a reverse flow of the shield gas to the feed unit. A gap is defined between the adjacent wires of the inner tube allowing the shield gas to flow therethrough, and permitting wear debris generated by abrasion of the welding wire sliding in the inner tube to be ejected out from the nozzle.

Abstract: A colorimetric method includes a server generating a colorimetric job including information about an instruction to perform colorimetry and a colorimetry measurement condition, the server storing the colorimetric job, the server transmitting the colorimetric job, a colorimeter receiving the colorimetric job, and the colorimeter performing colorimetry based on the colorimetric job when the colorimetric job is selected by the colorimeter.

Abstract: A substrate liquid processing apparatus includes a processing tub 34 which is configured to store therein a processing liquid and in which a processing of a substrate is performed by immersing the substrate in the stored processing liquid; a circulation line 50 connected to the processing tub; a pump 51 provided at the circulation line and configured to generate a flow of the processing liquid flowing out from the processing tub and returning back to the processing tub after passing through the circulation line; and a heater 52 provided at the circulation line and configured to heat the processing liquid. At least two temperature sensors 81 to 83 are provided at different positions within a circulation system including the processing tub and the circulation line. Controllers 90 and 100 control a heat generation amount of the heater based on detection temperatures of the at least two temperature sensors.

Abstract: To provide a compact welding torch in which a motor can be easily replaced, in which, when a motor capable of high-speed welding is used for a long time in a high current region, heat generated by the motor can be sufficiently cooled, and in which the motor can be protected from spatters or the like. A first cooler that cools a first side surface of a motor parallel to a shaft of the motor and a second cooler that cools a second side surface of the motor different from the first side surface are included. The first cooler has a first inflow port and a first outflow port for a cooling fluid, and a first flow passage that connects the first inflow port and the first outflow port. The second cooler has a second inflow port and a second outflow port for the cooling fluid, and a second flow passage that connects the second inflow port and the second outflow port.

Abstract: A storage device according to an aspect of the present disclosure includes a storage tank, a heating mechanism, and a controller. The storage tank stores a processing liquid that contains an aqueous solution of phosphoric acid and an additive. The heating mechanism heats the processing liquid that is stored in the storage tank. The controller controls the heating mechanism to execute a concentration maintaining process where a temperature of the processing liquid is adjusted in such a manner that an amount of evaporation of water for the processing liquid in the storage tank approaches an amount of absorption of moisture for the processing liquid in the storage tank.

Abstract: A substrate processing apparatus includes: a processing container, a mixing device, a liquid feeding path, and a controller. The processing container processes a substrate by immersing the substrate in a processing liquid. The mixing device mixes a phosphoric acid aqueous solution and an additive, to produce a mixed liquid to be used as a raw material of the processing liquid. The liquid feeding path feeds the mixed liquid from the mixing device to the processing container. The controller controls the substrate processing apparatus. The controller performs a control to feed the mixed liquid from the mixing device to the processing container in which the substrate is immersed, after a phosphoric acid concentration of the mixed liquid is regulated from a first concentration to a second concentration higher than the first concentration. The first concentration is a concentration when the phosphoric acid aqueous solution is supplied to the mixing device.

Abstract: A recovery route returns, to a retaining tank, mixed solution supplied to a substrate processing unit. A discarding route discards the supplied mixed solution to a place other than the retaining tank. A switching controller causes the supplied mixed solution to flow into the discarding route during a time interval until a first time interval has elapsed from a time point when the substrate processing unit starts to supply the mixed solution; causes the supplied mixed solution to flow into the recovery route during a time interval until a second time interval, which is decided based on a predetermined recovery rate, has elapsed after the first time interval elapses; and causes the supplied mixed solution to flow into the discarding route during a time interval until supply of the mixed solution has been ended from a time point when the second time interval elapses.

Abstract: A flotation conveyance apparatus according to an embodiment conveys a substrate while floating the substrate by ejecting a gas to a lower surface of the substrate. The flotation conveyance apparatus includes an upper plate disposed on the substrate side including a plurality of ejecting ports for ejecting the gas and a lower plate disposed under the upper plate. Flow-paths for supplying the gas to the plurality of ejecting ports are provided on at least one of the upper plate and the lower plate.

Abstract: A substrate liquid processing apparatus includes a processing tub 34A which is configured to store therein a processing liquid in a boiling state and in which a processing of a substrate 8 is performed by immersing the substrate in the stored processing liquid; a concentration sensor 55B configured to detect a concentration of a chemical liquid component contained in the processing liquid; a concentration control unit 7 (40, 41) configured to control the concentration of the chemical liquid component to a set concentration by adding the chemical liquid component or a diluting solution to the processing liquid based on a detection concentration of the concentration sensor; a head pressure sensor 86B configured to detect a head pressure of the processing liquid within the processing tub; and a concentration set value correction unit 7 configured to correct, based on a detection value of the head pressure sensor, the set concentration.

Abstract: Disclosed is a method for performing a liquid processing on a substrate using an aqueous solution of a chemical agent at a predetermined concentration as a processing liquid. The method includes: storing the processing liquid in a processing liquid storage unit; and supplying an aqueous solution of the chemical agent at a different concentration from the concentration of the processing liquid to the processing liquid storage unit, discharging the processing liquid from the processing liquid storage unit so as to update the processing liquid stored in the processing liquid storage unit. The aqueous solution in a predetermined amount is supplied to the processing liquid storage unit, and the processing liquid is discharged from the processing liquid storage unit, the processing liquid containing the chemical agent in the same amount as the amount of the chemical agent contained in the aqueous solution supplied to the processing liquid storage unit.

Abstract: A welding torch is provided, which comprises an inner tube of a helically wound wire to define a passage for a welding wire, a conduit in which the inner tube is inserted, the conduit having a curved portion, a torch body including a tip portion and a nozzle, a torch holder having a gas supplying member that supplies a shield gas into a space between the inner tube and the conduit, a feed unit provided upstream the torch holder to feed the welding wire forward to or backward from the inner tube, and a sealing mechanism to prevent a reverse flow of the shield gas to the feed unit. A gap is defined between the adjacent wires of the inner tube allowing the shield gas to flow therethrough, and wear debris generated by abrasion of the welding wire sliding in the inner tube is ejected out from the nozzle.

Abstract: Disclosed is a substrate liquid processing apparatus that includes: a liquid processing unit that performs a liquid processing on a film formed on a surface of a substrate with an etching liquid; an etching liquid supply unit that supplies an etching liquid to the liquid processing unit; and a controller that controls the etching liquid supply unit. The controller is configured to perform a control such that an etching liquid in a state of having a relatively low etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit, and then, an etching liquid in a state of having a relatively high etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit.