Patents by Inventor Takashi Nagai
Takashi Nagai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10397422Abstract: A control apparatus includes a processor that causes a preview to be displayed for an image to be printed on a print medium by a printing apparatus and a display that displays the preview. The processor causes the display to display the preview including one or more page images on a first side and one or more page images on a second side such that a positional relationship between a position of a page image on the first side of a print medium and a position of a page image on the second side of the print medium is shown, and adjusts the positions of the page images on the first side and second side such that a position of a blank area between the page images on the first side corresponds to a position of a blank area between the page images on the second side.Type: GrantFiled: March 16, 2018Date of Patent: August 27, 2019Assignee: Seiko Epson CorporationInventor: Takashi Nagai
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Publication number: 20190210138Abstract: To provide a compact welding torch in which a motor can be easily replaced, in which, when a motor capable of high-speed welding is used for a long time in a high current region, heat generated by the motor can be sufficiently cooled, and in which the motor can be protected from spatters or the like. A first cooler that cools a first side surface of a motor parallel to a shaft of the motor and a second cooler that cools a second side surface of the motor different from the first side surface are included. The first cooler has a first inflow port and a first outflow port for a cooling fluid, and a first flow passage that connects the first inflow port and the first outflow port. The second cooler has a second inflow port and a second outflow port for the cooling fluid, and a second flow passage that connects the second inflow port and the second outflow port.Type: ApplicationFiled: June 22, 2017Publication date: July 11, 2019Inventors: YOICHI FUKUMITSU, TAKASHI NAGAI, ATSUHIRO KAWAMOTO, KAITO MATSUI
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Publication number: 20190080938Abstract: A substrate liquid processing apparatus A1 includes a processing liquid storage unit 38 configured to store a processing liquid therein; a processing liquid drain unit 41 configured to drain the processing liquid from the processing liquid storage unit 38; and a control unit 7. The control unit 7 performs a first control in a constant concentration mode in which a concentration of the processing liquid in the processing liquid storage unit 38 is regulated to a predetermined set concentration and a second control in a concentration changing mode in which the concentration of the processing liquid is changed. In the second control, a set concentration after concentration change is compared with a set concentration before the concentration change, and when the set concentration after the concentration change is lower, the control unit controls the processing liquid drain unit 41 to start draining of the processing liquid.Type: ApplicationFiled: September 10, 2018Publication date: March 14, 2019Inventors: Takahiro Kawazu, Takafumi Tsuchiya, Hideaki Sato, Hidemasa Aratake, Osamu Kuroda, Takashi Nagai, Jiro Harada
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Patent number: 10231339Abstract: An electronic apparatus is provided including a substrate, a conductive land formed on a surface of the substrate, an electronic component including an electrode, at least one insulating protrusion formed on the land in an overlapping region between the land and the electrode in plan view, and a solder that bonds the electronic component to the land, the solder being formed between the electrode and the land in the overlapping region in a normal direction to the surface of the substrate.Type: GrantFiled: May 13, 2015Date of Patent: March 12, 2019Assignee: Murata Manufacturing Co., Ltd.Inventors: Takashi Nagai, Hiroyuki Kumagai
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Publication number: 20190067048Abstract: A recovery route returns, to a retaining tank, mixed solution supplied to a substrate processing unit. A discarding route discards the supplied mixed solution to a place other than the retaining tank. A switching controller causes the supplied mixed solution to flow into the discarding route during a time interval until a first time interval has elapsed from a time point when the substrate processing unit starts to supply the mixed solution; causes the supplied mixed solution to flow into the recovery route during a time interval until a second time interval, which is decided based on a predetermined recovery rate, has elapsed after the first time interval elapses; and causes the supplied mixed solution to flow into the discarding route during a time interval until supply of the mixed solution has been ended from a time point when the second time interval elapses.Type: ApplicationFiled: January 20, 2017Publication date: February 28, 2019Applicant: TOKYO ELECTRON LIMITEDInventors: Yasuhiro Takaki, Shinichi Umeno, Takashi Nagai, Hisashi Morita, Nobuhiro Ogata, Yusuke Takamatsu, Jiro Higashijima
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Patent number: 10185315Abstract: Electronic control units (ECUs) provided with circuits for backing up other ECUs lack versatility and increase costs. In the present invention, motor control ECUs respectively control motors via signal wires that perform motor control. In addition, a dedicated substitute ECU is connected to each motor via signal wires that perform motor control. A substitute control circuit part of the dedicated substitute ECU runs to a network, is continuously receiving malfunction information and stability information via a signal wire, and detects the malfunction of the motor control ECU from said information. Then the dedicated substitute ECU substitutes for the motor control ECU and performs a backup operation to continue control of the motor via the signal wire.Type: GrantFiled: January 14, 2015Date of Patent: January 22, 2019Assignee: Hitachi Automotive Systems, Ltd.Inventors: Shigeru Naoi, Atsushi Uehara, Takashi Nagai
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Publication number: 20180301345Abstract: Disclosed is a substrate liquid processing apparatus that includes: a liquid processing unit that performs a liquid processing on a film formed on a surface of a substrate with an etching liquid; an etching liquid supply unit that supplies an etching liquid to the liquid processing unit; and a controller that controls the etching liquid supply unit. The controller is configured to perform a control such that an etching liquid in a state of having a relatively low etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit, and then, an etching liquid in a state of having a relatively high etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit.Type: ApplicationFiled: June 22, 2018Publication date: October 18, 2018Inventors: Hideaki Sato, Takashi Nagai, Hiromi Hara
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Publication number: 20180278776Abstract: A control apparatus includes a processor that causes a preview to be displayed for an image to be printed on a print medium by a printing apparatus and a display that displays the preview. The processor causes the display to display the preview including one or more page images on a first side and one or more page images on a second side such that a positional relationship between a position of a page image on the first side of a print medium and a position of a page image on the second side of the print medium is shown, and adjusts the positions of the page images on the first side and second side such that a position of a blank area between the page images on the first side corresponds to a position of a blank area between the page images on the second side.Type: ApplicationFiled: March 16, 2018Publication date: September 27, 2018Inventor: Takashi NAGAI
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Publication number: 20180247841Abstract: A substrate liquid processing apparatus includes a processing tub 34A which is configured to store therein a processing liquid in a boiling state and in which a processing of a substrate 8 is performed by immersing the substrate in the stored processing liquid; a concentration sensor 55B configured to detect a concentration of a chemical liquid component contained in the processing liquid; a concentration control unit 7 (40, 41) configured to control the concentration of the chemical liquid component to a set concentration by adding the chemical liquid component or a diluting solution to the processing liquid based on a detection concentration of the concentration sensor; a head pressure sensor 86B configured to detect a head pressure of the processing liquid within the processing tub; and a concentration set value correction unit 7 configured to correct, based on a detection value of the head pressure sensor, the set concentration.Type: ApplicationFiled: February 27, 2018Publication date: August 30, 2018Inventors: Takashi Nagai, Hideaki Sato, Hiromi Hara, Hiroshi Yoshida, Tsukasa Hirayama
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Publication number: 20180233384Abstract: A substrate liquid processing apparatus includes a processing tub 34 which is configured to store therein a processing liquid and in which a processing of a substrate is performed by immersing the substrate in the stored processing liquid; a circulation line 50 connected to the processing tub; a pump 51 provided at the circulation line and configured to generate a flow of the processing liquid flowing out from the processing tub and returning back to the processing tub after passing through the circulation line; and a heater 52 provided at the circulation line and configured to heat the processing liquid. At least two temperature sensors 81 to 83 are provided at different positions within a circulation system including the processing tub and the circulation line. Controllers 90 and 100 control a heat generation amount of the heater based on detection temperatures of the at least two temperature sensors.Type: ApplicationFiled: February 13, 2018Publication date: August 16, 2018Inventors: Takashi Nagai, Hideaki Sato, Junichi Kitano, Kenji Goto
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Patent number: 10032642Abstract: Disclosed is a substrate liquid processing apparatus that includes: a liquid processing unit that performs a liquid processing on a film formed on a surface of a substrate with an etching liquid; an etching liquid supply unit that supplies an etching liquid to the liquid processing unit; and a controller that controls the etching liquid supply unit. The controller is configured to perform a control such that an etching liquid in a state of having a relatively low etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit, and then, an etching liquid in a state of having a relatively high etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit.Type: GrantFiled: May 12, 2016Date of Patent: July 24, 2018Assignee: Tokyo Electron LimitedInventors: Hideaki Sato, Takashi Nagai, Hiromi Hara
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Publication number: 20170220035Abstract: Electronic control units (ECUs) provided with circuits for backing up other ECUs lack versatility and increase costs. In the present invention, motor control ECUs respectively control motors via signal wires that perform motor control. In addition, a dedicated substitute ECU is connected to each motor via signal wires that perform motor control. A substitute control circuit part of the dedicated substitute ECU runs to a network, is continuously receiving malfunction information and stability information via a signal wire, and detects the malfunction of the motor control ECU from said information. Then the dedicated substitute ECU substitutes for the motor control ECU and performs a backup operation to continue control of the motor via the signal wire.Type: ApplicationFiled: January 14, 2015Publication date: August 3, 2017Applicant: Hitachi Automotive Systems, Ltd.Inventors: Shigeru NAOI, Atsushi UEHARA, Takashi NAGAI
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Patent number: 9711380Abstract: Disclosed are a liquid processing apparatus and a liquid processing method. The liquid processing apparatus includes an ejection port ejecting a first liquid to a wafer, a first liquid supply mechanism supplying sulphuric acid to the ejection port, and a second liquid supply mechanism supplying hydrogen peroxide solution to the ejection port. The first liquid supply mechanism includes a first temperature adjustment mechanism maintaining the first liquid heated to a first temperature, a second temperature adjustment mechanism connected to the first temperature adjustment mechanism, and an ejection line connecting the second temperature adjustment mechanism with the ejection port. The second temperature adjustment mechanism includes a second circulation line and a second heater. The ejection line connects the second circulation line through a switching valve at a location further downstream than the second heater.Type: GrantFiled: August 24, 2012Date of Patent: July 18, 2017Assignee: Tokyo Electron LimitedInventors: Norihiro Ito, Takashi Nagai
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Patent number: 9691602Abstract: A top plate is provided with a top plate rotation mechanism configured to rotate the top plate in a horizontal plane. An outside cup peripheral case disposed around a cup is configured to move between an upper position, in which a top end of the cylinder is positioned above the cup, and a lower position located below the upper position. A nozzle support arm configured to support a nozzle is moved, in a horizontal direction, between an advanced position, in which the arm is advanced into the outside cup peripheral case via a side opening formed in a side surface of the outside cup peripheral case when the cylinder is located in the upper position, and a retracted position, in which the arm is retracted outward from the outside cup peripheral case.Type: GrantFiled: July 11, 2012Date of Patent: June 27, 2017Assignee: Tokyo Electron LimitedInventors: Norihiro Ito, Kazuhiro Aiura, Naoki Shindo, Yosuke Hachiya, Takashi Nagai
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Patent number: 9662786Abstract: An industrial robot of the present disclosure includes a manipulator, a control device for controlling the manipulator, and a connection cable that connects the manipulator to the control device. The manipulator includes a fixed base section, a first motor, a first detecting section, a power supply section, a first casing, and a first power supply cable. The first motor operates the manipulator. The first detecting section detects the state of the first motor. The power supply section supplies electric power to the first detecting section. The first casing stores the first motor and the first detecting section. The first power supply cable connects the first detecting section to the power supply section. The power supply section is disposed in the base section.Type: GrantFiled: December 15, 2014Date of Patent: May 30, 2017Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Takashi Nagai, Kazunori Matsumoto, Wataru Takahashi
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Publication number: 20170150605Abstract: An electronic apparatus is provided including a substrate, a conductive land formed on a surface of the substrate, an electronic component including an electrode, at least one insulating protrusion formed on the land in an overlapping region between the land and the electrode in plan view, and a solder that bonds the electronic component to the land, the solder being formed between the electrode and the land in the overlapping region in a normal direction to the surface of the substrate.Type: ApplicationFiled: May 13, 2015Publication date: May 25, 2017Inventors: Takashi NAGAI, Hiroyuki KUMAGAI
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Patent number: 9640383Abstract: A liquid treatment apparatus includes a substrate holding member that holds a substrate horizontally, a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.Type: GrantFiled: July 11, 2012Date of Patent: May 2, 2017Assignee: Tokyo Electron LimitedInventors: Kazuhiro Aiura, Norihiro Ito, Takashi Nagai
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Publication number: 20160336202Abstract: Disclosed is a substrate liquid processing apparatus that includes: a liquid processing unit that performs a liquid processing on a film formed on a surface of a substrate with an etching liquid; an etching liquid supply unit that supplies an etching liquid to the liquid processing unit; and a controller that controls the etching liquid supply unit. The controller is configured to perform a control such that an etching liquid in a state of having a relatively low etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit, and then, an etching liquid in a state of having a relatively high etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit.Type: ApplicationFiled: May 12, 2016Publication date: November 17, 2016Inventors: Hideaki Sato, Takashi Nagai, Hiromi Hara
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Patent number: 9484057Abstract: A disk conveyance unit 3 conveys the disk medium 2 to a position where recording and reproducing are performed by the pickup 1 with the spindle motor 4 held. The disk conveyance unit 3 includes first movement mechanisms 22 and 24 for moving a first conveyance frame 30 with respect to fixed frames 10 and 20 and second movement mechanisms 34 and 36 for moving a second conveyance frame 40 holding a spindle motor 4 with respect to the first conveyance frame 30. The first and second movement mechanisms move to substantially the same direction and operate independently from each other. This allows the disk of the hologram recording and reproducing apparatus to be moved at a high speed and positioned at a high accuracy.Type: GrantFiled: February 4, 2016Date of Patent: November 1, 2016Assignee: Hitachi-LG Data Storage, Inc.Inventors: Kouji Fukuda, Takashi Nagai, Akihiro Ashida, Yuuki Yamasaki, Shinsuke Takatsuka
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Publication number: 20160267936Abstract: A disk conveyance mechanism for a hologram recording and reproducing apparatus includes a first conveyance mechanism for conveying a disk medium 2 to a position where a spindle motor 4 is situated with the disk medium 2 loaded onto a tray 6, a second conveyance mechanism in which the spindle motor 4 is held and moved in the rotational axis direction of the spindle motor 4 to take out the disk medium 2 from the tray 6 and load the disk medium 2 onto spindle motor 4, a third conveyance mechanism for conveying the disk medium 2 to the position where recording and reproducing are performed by the pickup 1 with the disk medium 2 loaded onto the spindle motor 4. The first and third conveyance mechanisms convey the disk medium 2 in a direction substantially parallel to the surface of the medium.Type: ApplicationFiled: March 11, 2016Publication date: September 15, 2016Applicant: HITACHI-LG DATA STORAGE, INC.Inventors: Kouji FUKUDA, Takashi NAGAI, Shinsuke TAKATSUKA, Akihiro ASHIDA, Hisahiro MIKI