Abstract: Provided is an electronic device capable of reducing the possibility of malfunction. An electronic device is provided with: a first substrate including a drive circuit; a second substrate including a light-emitting unit driven by the drive circuit and mounted on one surface side of the first substrate; and a light-shielding unit provided on the first substrate and configured to shield at least a part of the drive circuit from light emitted by the light-emitting unit.

Abstract: The present invention is directed to a semiconductor integrated circuit device that basically has a non-memory array area, a memory array area, and memory capacitors formed across lower embedded metal interconnection layers including a low-dielectric constant interlayer insulating film in the memory array area. In addition, a memory-periphery metal seal ring is provided in the lower embedded metal interconnection layers having at least the low-dielectric constant interlayer insulating film so as to surround the memory array area.

Abstract: The present invention is directed to a semiconductor integrated circuit device that basically has a non-memory array area, a memory array area, and memory capacitors formed across lower embedded metal interconnection layers including a low-dielectric constant interlayer insulating film in the memory array area. In addition, a memory-periphery metal seal ring is provided in the lower embedded metal interconnection layers having at least the low-dielectric constant interlayer insulating film so as to surround the memory array area.

Abstract: A semiconductor device, includes a substrate, an element isolating film formed in the substrate, a first element formation region isolated by the element isolating film, a second element formation region positioned adjacent to the first element formation region and isolated by the element isolating film, a first well of a second conductive type formed in a whole area of the first element formation region, a first transistor of a first conductive type formed on the first element formation region, a second transistor of the first conductive type which is formed on the first element formation region and whose threshold voltage is the same as a threshold voltage of the first transistor, a second well of the second conductive type formed in a whole area of the second element formation region, and a third transistor of the first conductive type formed on the second element formation region.

Abstract: A semiconductor device, includes a substrate, an element isolating film formed in the substrate, a first element formation region isolated by the element isolating film, a second element formation region positioned adjacent to the first element formation region and isolated by the element isolating film, a first well of a second conductive type formed in a whole area of the first element formation region, a first transistor of a first conductive type formed on the first element formation region, a second transistor of the first conductive type which is formed on the first element formation region and whose threshold voltage is the same as a threshold voltage of the first transistor, a second well of the second conductive type formed in a whole area of the second element formation region, and a third transistor of the first conductive type formed on the second element formation region.

Abstract: A first transistor and a second transistor are formed in a first element formation region, and a third transistor is formed in a second element formation region. The three transistors are of the same conductive type, and the first transistor and the second transistor have the same threshold voltage. A first well is formed in the first element formation region by use of a first mask pattern, and a second well is formed in the second element formation region by use of a second mask pattern. A channel region of the first transistor and a channel region of the second transistor have a shape which is line-symmetrical with respect to a reference line. The first mask pattern has a shape which is line-symmetrical with respect to the reference line.

Abstract: A semiconductor device 100 includes a first gate 210, which is formed using a gate last process. The first gate 210 includes a gate insulating film formed in a bottom surface in a first concave portion formed in the insulating film; a gate electrode formed over the gate insulating film in the first concave portion; and a protective insulating film 140 formed on the gate electrode in the first concave portion. In addition, the semiconductor device 100 includes a contact 134, which is coupled to the N-type impurity-diffused region 116a in the both sides of the first gate 210 and is buried in the second concave portion having a diameter that is large than the first concave portion.

Abstract: A semiconductor memory device comprises a comparing unit that comprises a potential of a memory cell with a reference potential supplied by a reference cell to read data of the memory cell; first and second bit lines connected to inputs of the comparing unit; a first memory cell connected to the first bit line; a second memory cell connected to the second bit line; a first reference cell acting as the reference cell; a second reference cell acting as another reference cell; a potential line that supplies the reference potential to the first and second reference cells; and a dummy cell comprising a coupling capacitor that stabilizes potential of the potential line.

Abstract: A semiconductor device 100 includes a first gate 210, which is formed using a gate last process. The first gate 210 includes a gate insulating film formed in a bottom surface in a first concave portion formed in the insulating film; a gate electrode formed over the gate insulating film in the first concave portion; and a protective insulating film 140 formed on the gate electrode in the first concave portion. In addition, the semiconductor device 100 includes a contact 134, which is coupled to the N-type impurity-diffused region 116a in the both sides of the first gate 210 and is buried in the second concave portion having a diameter that is large than the first concave portion.

Abstract: A semiconductor memory device comprises a comparing unit that comprises a potential of a memory cell with a reference potential supplied by a reference cell to read data of the memory cell; first and second bit lines connected to inputs of the comparing unit; a first memory cell connected to the first bit line; a second memory cell connected to the second bit line; a first reference cell acting as the reference cell; a second reference cell acting as another reference cell; a potential line that supplies the reference potential to the first and second reference cells; and a dummy cell comprising a coupling capacitor that stabilizes potential of the potential line.

Abstract: A semiconductor memory device includes a sense amplifier, first and second bit lines connected to the sense amplifier, a first reference cell connected to the first bit line, and a second reference cell connected to the second bit line. A reference potential is simultaneously written to the first and second reference cells. Further, a dummy cell may be provided to be simultaneously, with the reference cell, with the reference potential.

Abstract: In a conventional semiconductor device, an excessive etching occurs in a section where an opening for contact plug is formed, causing a damage to a diffusion layer located under the opening. A semiconductor device 1 includes a region D1 for forming an electric circuit, and a seal ring 30 (guard ring) that surrounds the region D1 for forming the electric circuit. A DRAM 40 is formed in the region D1 for forming the electric circuit. Interlayer insulating films 22, 24, 26 and 28 are formed on a semiconductor substrate 10. The seal ring 30 is formed in the interlayer insulating films 22, 24, 26 and 28, and at least a portion there of is located spaced apart from the semiconductor substrate 10.

Abstract: The present invention solves a problem of the degradation of the long-term reliability of a conventional semiconductor memory device due to early deterioration of a FET included in a reference cell therein. DRAM 1 has word lines 101 to 10n, word lines 22 and 24, memory cells 301 to 30n and a reference cell 40. Gates of FETs 32 in the memory cells 301 to 30n are connected to the word lines 101 to 10n respectively. Gates of a FET 42 and a FET 44 in the reference cell 40 are connected to the word line 22 for readout and the word line 24 for writing respectively. Here, potentials applied to the word lines 22 and 24 are lower than those applied to the word lines 101 to 10n.

Abstract: A semiconductor memory device has bit lines, capacitors, bit contacts and capacitor contacts, wherein the bit lines are provided over a semiconductor substrate, the bit lines are connected to the semiconductor substrate through the bit contacts, the capacitors are connected to the semiconductor substrate through the capacitor contacts, and wherein in two adjacent bit lines, pitch d2 (first pitch) representing a pitch of portions provided with the capacitor contacts is larger than pitch d3 (second pitch) representing a pitch of portions provided with the bit contacts, and distance d4 between two such bit lines in the portions provided with the bit contacts is larger than width d5 of the bit lines in the portions provided with the bit contacts.

Abstract: A first transistor and a second transistor are formed in a first element formation region, and a third transistor is formed in a second element formation region. The three transistors are of the same conductive type, and the first transistor and the second transistor have the same threshold voltage. A first well is formed in the first element formation region by use of a first mask pattern, and a second well is formed in the second element formation region by use of a second mask pattern. A channel region of the first transistor and a channel region of the second transistor have a shape which is line-symmetrical with respect to a reference line. The first mask pattern has a shape which is line-symmetrical with respect to the reference line.

Abstract: There is provided a semiconductor chip having fuses. The semiconductor chip includes fuses each having a first terminal electrically connected to a first logic circuit, a second terminal electrically connected to a second logic circuit, and a blowable region formed between the first terminal and the second terminal; and fuse residues each having the same patterns with those of the first terminal and the second terminal of the fuses, and configured so that patterns corresponded to the first terminals and the second terminals are electrically disconnected from each other.

Abstract: A semiconductor memory device comprises a comparing unit that comprises a potential of a memory cell with a reference potential supplied by a reference cell to read data of the memory cell; first and second bit lines connected to inputs of the comparing unit; a first memory cell connected to the first bit line; a second memory cell connected to the second bit line; a first reference cell acting as the reference cell; a second reference cell acting as another reference cell; a potential line that supplies the reference potential to the first and second reference cells; and a dummy cell comprising a coupling capacitor that stabilizes potential of the potential line.

Abstract: When the film thickness of an insulating film on a fuse connected to a circuit is not uniform within a wafer surface, there was a problem that disconnection of the fuse might become insufficient due to the insufficient intensity of a laser or disconnection of even an adjacent fuse due to excessive laser irradiation might occur. Further, a problem also occurred that after disconnection of the fuse, moisture entered from exterior through the region in which the fuse has been disconnected, so that the quality of a film underlying the fuse was adversely affected. After a SiON film, a SiN film, and a SiO2 film have been formed to cover the fuse in this stated order, etching is performed to the SiN film, which is an etching stopper film. The SiON film having a uniform and desired film thickness is thereby formed on the fuse.

Abstract: A semiconductor device 100 includes a first gate 210, which is formed using a gate last process. The first gate 210 includes a gate insulating film formed in a bottom surface in a first concave portion formed in the insulating film; a gate electrode formed over the gate insulating film in the first concave portion; and a protective insulating film 140 formed on the gate electrode in the first concave portion. In addition, the semiconductor device 100 includes a contact 134, which is coupled to the N-type impurity-diffused region 116a in the both sides of the first gate 210 and is buried in the second concave portion having a diameter that is large than the first concave portion.

Abstract: A semiconductor memory device includes a sense amplifier, first and second bit lines connected to the sense amplifier, a first reference cell connected to the first bit line, and a second reference cell connected to the second bit line. A reference potential is simultaneously written to the first and second reference cells. Further, a dummy cell may be provided to be simultaneously, with the reference cell, with the reference potential.