Abstract: To provide an aluminum alloy in which natural aging is suppressed and a method for producing the same. This disclosure relates to an Al—Si-based aluminum alloy containing Si, Mg, Mn, Fe, and unavoidable impurities and Al—Si—Mg—Fe—Mn-based compounds, and further to a method for producing said Al—Si—based aluminum alloy by controlling the cooling process of a molten alloy during casting.

Abstract: A coil device includes: a drum core having first and second flange portions and a winding core portion therebetween; a coil wound around the core portion; a plate core connected to first and second flange portions first and second flange surfaces at a first direction side; a first electrode terminal on the first flange portion, one coil end portion electrically connected on the first electrode terminal; and a second electrode terminal on the second flange portion, the other coil end portion electrically connected on the second electrode terminal. The plate core has a first and second projecting portions respectively protruding toward the first and second flange surfaces and having first and second flat surfaces facing the first and second flange surfaces. The drum core and the plate core are connected by abutting and bonding the first and second flange surfaces against the first and second flat surfaces.

Abstract: A method for manufacturing a molded product of the present disclosure includes a deposition step of depositing a mixture including a fiber and starch in air, a humidification step of applying water to the mixture, and a molding step of heating and pressurizing the mixture applied with water to obtain a molded product. The starch has a gelatinized and then pulverized particle diameter d50 of 0.30 mm or more and 1.0 mm or less, which is the average particle diameter of the finely pulverized product determined by a prescribed measuring method.

Abstract: A method for manufacturing a molded body, includes a deposition step of depositing a mixture containing fibers and a starch in air; a moisturizing step of applying water to the mixture; and a molding step of forming a molded body by heating and pressurizing the mixture to which the water is applied. In the method described above, the starch has a setback viscosity (?50-?93) of 40 to 200 mPa·s, the setback viscosity (?50-?93) being obtained by measurement performed in accordance with the following measurement methods (1) to (4) using a rapid visco analyzer (RVA). The measurement is performed such that (1) after a water suspension containing the starch at 25 percent by mass is charged in the RVA as a measurement sample, the temperature thereof is increased to 50° C. and then maintained for one minute; (2) the temperature of the measurement sample is increased from 50° C. to 93° C. over 4 minutes and then maintained at 93° C. for 7 minutes; (3) the temperature of the measurement sample is decreased from 93° C.

Abstract: A method for manufacturing a molded body, includes a deposition step of depositing a mixture containing fibers and a starch in air; a moisturizing step of applying water to the mixture; and a molding step of forming a molded body by heating and pressurizing the mixture to which the water is applied, and the starch has a value of 2,000 to 10,000, the value being represented by the following expression (I) and being obtained by measurement performed in accordance with the following measurement methods (1) to (4) using a rapid visco analyzer (RVA). 5,000?30×T1?90×(T2?T1)+2×?1?15×?2??(I) In the expression (I), T1 represents a gelatinization start temperature (° C.), T2 represents a gelatinization peak temperature (° C.

Abstract: A method for manufacturing a molded body, includes a deposition step of depositing a mixture containing fibers and a starch in air; a moisturizing step of applying water to the mixture; and a molding step of forming a molded body by heating and pressurizing the mixture to which the water is applied. In the method described above, the starch has a value of 100 or less, the value being represented by the following expression (I) and being obtained by measurement performed in accordance with the following measurement methods (1) to (4) using a rapid visco analyzer (RVA). 1,000?7×T?9×???(I) In the expression (I), T represents a gelatinization peak temperature (° C.) of the starch, and h represents a setback viscosity (mPa·s) thereof, and the measurement is performed such that (1) after a water suspension containing the starch at 25 percent by mass is charged in the RVA as a measurement sample, the temperature thereof is increased to 50° C.

Abstract: A method for producing a shaped article includes a deposition step, in which a mixture containing fibers and starch is deposited in the air; a moistening step, in which the mixture is supplied with water; and a shaping step, in which heat and pressure are applied to the mixture supplied with water to give a shaped article. The starch has a viscosity of 20 mPa·s or more and 200 mPa·s or less as a final viscosity at 50° C. of a 25% by mass aqueous suspension of the starch measured using a Rapid Visco Analyzer.

Abstract: An upper holding device holds a substrate in a horizontal attitude without rotating the substrate. A lower holding device rotates a substrate while holding the substrate by suction. A substrate held by the upper holding device is cleaned with use of a cleaning liquid, and a substrate held by the lower holding device is cleaned with use of a cleaning liquid. Gas in a processing space is exhausted by exhaust equipment of a factory through an exhaust system. When a substrate is held by the upper holding device, gas in the processing space is not exhausted or gas in the processing space is exhausted at a first flow rate. Gas in the processing space is exhausted at a second or third flow rate that is higher than the first flow rate when the substrate is held by the lower holding device.

Abstract: A substrate alignment device includes first and second support members that are arranged to be opposite to each other and be spaced apart from each other in a plan view, and respectively support an outer peripheral end of a substrate from a position below the substrate. Further, the substrate alignment device includes a first pressing member that is arranged to be opposite to the first support member in a plan view, and moves the substrate by pressing one portion of the outer peripheral end of the substrate in a first direction directed from the second support member toward the first support member with the substrate supported by the first and second support members. The first support member includes a movement limiter that limits movement of the substrate in the first direction past a predetermined prescribed position.

Abstract: A cleaner comes into contact with a lower-surface center region of a substrate held by a first holder, so that the lower-surface center region is cleaned. The cleaner comes into contact with a lower-surface outer region of the substrate rotated by a second holder, so that the lower-surface outer region of the substrate is cleaned. During cleaning of the lower-surface center region, the second holder is rotated about a vertical axis while not holding the substrate. Alternatively, during cleaning of the lower-surface center region, the gas injector arranged between the cleaner and the second holder injects gas toward the substrate from a first height spaced apart from the substrate by a predetermined distance. Further, during drying of the lower-surface center region, the gas injector injects gas toward the substrate from a second height closer to the substrate than the first height.

Abstract: A lower-surface center region of a substrate held by a first holder is cleaned by a cleaner. A lower-surface outer region of the substrate rotated by a second holder is cleaned by the cleaner. A mobile base provided with the second holder and the cleaner is moved in a horizontal plane such that a reference position of the first holder coincides with a center axis of the second holder in a plan view when the substrate is received and transferred between the first holder and the second holder, and is moved in the horizontal plane such that the cleaner overlaps with the lower-surface center region of the substrate held by the first holder and a center axis of the cleaner coincides with a first portion different from a center of the substrate in the plan view when the lower-surface center region is cleaned.

Abstract: A first cleaner cleans an upper surface of a substrate by scanning above the substrate to pass through a first point in an outer edge of the substrate in a plan view. A second cleaner cleans an outer peripheral end of the substrate by coming into contact with a second point in the outer edge of the substrate in a plan view. A virtual first straight line passing through the first point and the second point and a virtual second straight line passing through a center of the substrate and is parallel to the first straight line are defined. A third cleaner is arranged below the substrate and opposite to the first cleaner and the second cleaner with the second straight line located between the third cleaner, and the first cleaner and the second cleaner, and cleans a lower surface of the substrate.

Abstract: A lower-surface brush includes a base portion, a first cleaning portion and a second cleaning portion. The first cleaning portion is provided on an upper surface of the base portion to project upwardly from the upper surface of the base portion and extend in one direction through a geometric center of the base portion in a plan view. The second cleaning portion is provided on the upper surface of the base portion to project upwardly from the upper surface of the base portion and extend along an outer edge of the base portion. Alternatively, one or a plurality of pairs of second cleaning portions may be provided on the upper surface of the base portion to project upwardly from the upper surface of the base portion and be opposite to each other with the first cleaning portion interposed therebetween.

Abstract: A first substrate holder holds an outer peripheral end of a substrate. A second substrate holder holds a lower-surface center region of the substrate by suction at a position farther downward than the first substrate holder. The second substrate holder and the lower-surface brush are provided on a mobile base that is movable in a horizontal direction. The mobile base is moved between a position at which the lower-surface brush is opposite to a lower-surface outer region of the substrate and a position at which the lower-surface brush is opposite to the lower-surface center region of the substrate. The lower-surface center region of the substrate held by the first substrate holder is cleaned. At this time, a height position of the substrate is higher than an upper end portion of a processing cup. The lower-surface outer region of the substrate held by the second substrate holder is cleaned. At this time, a height position of the substrate is lower than the upper end portion of the processing cup.

Abstract: Provided are a pair of substrates, a seal material disposed between the pair of substrates, an inter-substrate conductive member disposed spaced apart from the seal material, and a moisture-proof film covering a side face of the seal material and a side face of the inter-substrate conductive member.

Abstract: A substrate cleaning brush for cleaning a wafer includes a brush main body, a brush holding unit, and a main flow path forming body. The brush main body has a liquid permeable structure and includes a lower surface that comes into contact with a substrate. The brush holding unit holds the brush main body while exposing a distal end portion in a vertical direction of the brush main body to the outside. The main flow path forming body includes a main flow path and a plurality of sub flow paths. The main flow path is formed to allow a processing liquid supplied from the outside to pass therethrough. The plurality of sub flow paths branch off from the main flow path, extend outward in a width direction perpendicular to the vertical direction of the brush main body, and are connected to an upper surface of the brush main body.

Abstract: Provided are a pair of substrates, a seal material disposed between the pair of substrates, an inter-substrate conductive member disposed spaced apart from the seal material, and a moisture-proof film covering a side face of the seal material and a side face of the inter-substrate conductive member.

Abstract: While a substrate is being rotated, the lower surface of a brush is moved along the upper surface of the substrate. The brush and a spray nozzle are moved upward from a takeoff position to a lower non-contact position so as to separate the lower surface of the brush from the upper surface of the substrate. The spray nozzle generates the droplets in a state where the brush and the spray nozzle are located in the lower non-contact position so as to make the droplets collide with the upper surface of the substrate, and then the droplets colliding with the upper surface of the substrate are discharged from a gap between the lower surface of the brush and the upper surface of the substrate while the droplets are being supplied to the lower surface of the brush.

Abstract: The disclosure includes a method of introducing a polynucleotide into a male germ cell or a Sertoli cell, comprising injecting an adeno-associated virus vector comprising the polynucleotide into the testis of a vertebrate.

Abstract: In an electro-optic device, a chip provided with a mirror and a drive element adapted to drive the mirror, a cover having a light-transmitting property and adapted to cover the mirror in a planar view, and a spacer located between the cover and the chip are disposed on an interconnection board. Further, a boundary between the cover and the spacer, a boundary between the chip and the spacer, and a part of the interconnection board are covered with an inorganic film such as an aluminum oxide film. The inorganic film also covers a part of a chip-side terminal and an internal terminal, and a conductive member.