Abstract: In a case where the target (30) is not supplied, binding through a nucleic acid sequence from the base end on a side of the solid phase surface of the complementary sequence complementary to a part of the nucleic acid sequence of the detection sequence to the other base end is maintained, which causes fluorescence of the fluorescent molecule (11) to be quenched by the quenching molecule (21) close to the fluorescent molecule (11). In a case where the target (30) is supplied, the target is bound to the detection sequence and the binding through the complementary sequence is released, which causes the fluorescent molecule (11) to separate from the quenching molecule (21) and emit fluorescence.

Abstract: A developing cartridge includes a developing electrode and a supply electrode. The developing electrode includes a first electrical contact in contact with a developing roller shaft, and a second electrical contact positioned closer to the developing roller shaft than a second agitator gear is to the developing roller shaft. The second electrical contact is positioned farther from the developing roller shaft than the first electrical contact is from the developing roller shaft. The supply electrode includes a first electrical contact in contact with the supply roller shaft, and a second electrical contact positioned closer to the developing roller shaft than the second agitator gear is to the developing roller shaft. The second electrical contact of the supply electrode is positioned farther from the developing roller shaft than the second electrical contact of the developing electrode is from the developing roller shaft.

Abstract: The invention relates to a method of producing a tendon neotissue from a population of adipose-derived stem cells (ASCs) subjected to mechanical and biological stimulations in a bioreactor system. The tendon neotissues are effective as implants to treat tendon or ligament injury in a subject. The invention also relates to a customized bioreactor useful for producing a tri-dimensional engineered tissue.

Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.

Abstract: A substrate processing apparatus includes a processing section and an exposure transport section. The exposure transport section includes a horizontal transport region and a plurality of vertical transport regions in a casing. The horizontal transport region is provided at the upper portion of the casing to extend in the X direction. A plurality of exposure devices are arranged below the horizontal transport region to be lined up in the X direction. A transport mechanism is provided in the horizontal transport region. The transport mechanism is configured to be capable of transporting a substrate between the processing section and the plurality of exposure devices.

Abstract: A substrate is transported based on coordinates information indicating a receiving position of the substrate and a placement position of the substrate by a hand. If the substrate is shifted from a first position, the substrate is received by the hand while a center of the substrate is shifted from a normal position of the hand. The hand that holds the substrate is moved toward a second position. A plurality of portions at an outer periphery of the substrate are detected before the substrate is placed. A shift of the substrate with respect to the normal position of the hand is detected based on the detection result, and the coordinates information is corrected such that a shift between a position of the center of the substrate to be placed at the second position by the hand and the center of the second position is canceled.

Abstract: A liquid crystal display device includes: a pair of substrates disposed to face each other with a predetermined distance therebetween; a seal pattern, provided between the pair of substrates and has a closed-loop shape to surround and seal a liquid crystal, wherein the liquid crystal is provided in a form of a plurality of droplets on one of the pair of substrates and then is sandwiched between the pair of substrates, so that the plurality of droplets are respectively spread and sealed in a region surrounded by the seal pattern; and a dummy pattern, which is formed on the one substrate in the region surrounded by the seal pattern and has a height less than half of the predetermined distance, the dummy pattern being arranged adjacent to and in parallel to the seal pattern and in a range to which one droplet is spread out.

Abstract: A method includes the steps of: (a) measuring a height of a pillar spacer after the pillar spacer is formed on a main surface of a CF substrate; (b) measuring a gap between a TFT substrate and the CF substrate after the TFT substrate and the CF substrate are bonded to each other; and (c) determining a quality of a liquid crystal panel based on the difference between the measured height of the pillar spacer and the measured gap.

Abstract: A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

Abstract: A method includes the steps of: (a) measuring a height of a pillar spacer after the pillar spacer is formed on a main surface of a CF substrate; (b) measuring a gap between a TFT substrate and the CF substrate after the TFT substrate and the CF substrate are bonded to each other; and (c) determining a quality of a liquid crystal panel based on the difference between the measured height of the pillar spacer and the measured gap.

Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.

Abstract: A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

Abstract: A substrate processing apparatus includes a processing section and an exposure transport section. The exposure transport section includes a horizontal transport region and a plurality of vertical transport regions in a casing. The horizontal transport region is provided at the upper portion of the casing to extend in the X direction. A plurality of exposure devices are arranged below the horizontal transport region to be lined up in the X direction. A transport mechanism is provided in the horizontal transport region. The transport mechanism is configured to be capable of transporting a substrate between the processing section and the plurality of exposure devices.

Abstract: A substrate is transported based on coordinates information indicating a receiving position of the substrate and a placement position of the substrate by a hand. If the substrate is shifted from a first position, the substrate is received by the hand while a center of the substrate is shifted from a normal position of the hand. The hand that holds the substrate is moved toward a second position. A plurality of portions at an outer periphery of the substrate are detected before the substrate is placed. A shift of the substrate with respect to the normal position of the hand is detected based on the detection result, and the coordinates information is corrected such that a shift between a position of the center of the substrate to be placed at the second position by the hand and the center of the second position is canceled.

Abstract: An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.

Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

Abstract: A liquid crystal display device includes: a pair of substrates disposed to face each other with a predetermined distance therebetween; a seal pattern, which provided between the pair of substrates and has a closed-loop shape to surround and seal a liquid crystal, wherein the liquid crystal is provided in a form of a plurality of droplets on one of the pair of substrates and then is sandwiched between the pair of substrates, so that the plurality of droplets are respectively spread and sealed in a region surrounded by the seal pattern; and a dummy pattern, which is formed on the one substrate in the region surrounded by the seal pattern and has a height less than half of the predetermined distance, the dummy pattern being arranged adjacent to and in parallel to the seal pattern and in a range to which one droplet is spread out.

Abstract: An output circuit which outputs an output signal based on an input signal from an output terminal and brings the output terminal into a high impedance state in response to an impedance control signal. The output circuit includes an output pMOS transistor connected at a source thereof to a first power supply. The output circuit includes an output nMOS transistor connected between a drain of the output pMOS transistor and ground. The output circuit includes an output terminal connected between the drain of the output pMOS transistor and a drain of the output nMOS transistor. The output circuit includes a first level shifter circuit which outputs a first gate control signal from a first gate control terminal to control on/off of the output pMOS transistor. The output circuit includes a second level shifter circuit which outputs a second gate control signal from a second gate control terminal to control on/off of the output nMOS transistor.

Abstract: An output circuit which outputs an output signal based on an input signal from an output terminal and brings the output terminal into a high impedance state in response to an impedance control signal. The output circuit includes an output pMOS transistor connected at a source thereof to a first power supply. The output circuit includes an output nMOS transistor connected between a drain of the output pMOS transistor and ground. The output circuit includes an output terminal connected between the drain of the output pMOS transistor and a drain of the output nMOS transistor. The output circuit includes a first level shifter circuit which outputs a first gate control signal from a first gate control terminal to control on/off of the output pMOS transistor. The output circuit includes a second level shifter circuit which outputs a second gate control signal from a second gate control terminal to control on/off of the output nMOS transistor.

Abstract: A semiconductor device has a transparent dielectric substrate such as a sapphire substrate. To enable fabrication equipment to detect the presence of the substrate optically, the back surface of the substrate is coated with a triple-layer light-reflecting film, preferably a film in which a silicon oxide or silicon nitride layer is sandwiched between polycrystalline silicon layers. This structure provides high reflectance with a combined film thickness of less than half a micrometer.