Abstract: The present invention provides a zirconium element-containing resin composition capable of achieving both high transparency and a high refractive index. The present invention is a zirconium element-containing resin composition containing a zirconium element-containing metal oxide (A); a dispersant (B); and a polymerizable resin (C), in which the zirconium element-containing metal oxide (A) has an average particle diameter of 20 nm or less as measured by a dynamic light scattering method, and the dispersant (B) contains a compound represented by the following formula (1), the zirconium element-containing resin composition may contain a silane coupling agent, and a content ratio of the silane coupling agent is less than 30 parts by mass with respect to 100 parts by mass of a total of the compound represented by the formula (1) and the silane coupling agent.

Abstract: This composite comprises: a material having electrical conductivity; and a transition metal oxide which is supported by said material. The transition metal oxide has an amorphous structure.

Abstract: The present invention is provided with a threat analysis processing unit that, on the basis of an analysis result from the vulnerability analysis unit, analyzes a threat to the system and outputs a threat analysis result; a countermeasure planning unit that, on the basis of the threat analysis result and vulnerability information, plans the countermeasure plan which reduces the impact of the vulnerability; a security test planning unit that plans the security test on the basis of the countermeasure plan; an evaluation calculation unit that performs an evaluation on the basis of the security test, and outputs an evaluation result; and a result processing unit that processes the evaluation result and generates a security countermeasure.

Abstract: A liquid treatment apparatus includes: a substrate holder for holding a substrate; a discharge nozzle for discharging a treatment liquid onto the substrate; a liquid supply pipe for supplying the treatment liquid from a treatment liquid storage source to the discharge nozzle; a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe; a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and an atmosphere gas supply part for supplying an atmosphere gas into the processing container. The gas pipe is provided so that an extension portion between an upstream end inside the processing container and an encompassing portion is folded back inside the processing container in a plan view.

Abstract: An aspect of this disclosure is a substrate treatment method of performing a treatment for forming a pattern of a metal-containing resist on a substrate includes changing an acid concentration in a substrate existence space where the substrate exists in a substrate treatment apparatus before a developing treatment of a film of the metal-containing resist.

Abstract: A voice recognition part performs voice recognition on a voice data and generates a first text which is a text indicating an utterance content. A text acquisition part acquires a second text which is a text indicating an utterance content according to an operation. A display processing part moves a position of a display text displayed on a display part, displays a text of at least one of the first text and the second text as a display text in a free region generated by the movement, and when fixing of a display position of the second text is instructed according to an operation, fixes the second text as a fixed text at a predetermined display position and displays the second text on the display part.

Abstract: A terminal includes: an input mode selection unit that accepts selection of an input mode from a plurality of types of input modes; a notification unit that notifies a terminal of a communication partner of the input mode; an input acceptance unit that accepts input of information in the input mode; a mode acquisition unit that acquires an input mode notified from the terminal of the communication partner; and a display control unit that generates display information for displaying the information on a display region of a display, in which, when the input mode notified from the terminal of the communication partner is acquired by the mode acquisition unit, the display control unit generates display information for displaying the acquired input mode on the display region, and causes the display to display the input mode notified from the terminal of the communication partner in accordance with the generated display information.

Abstract: A display control unit sets a first virtual region around a display region of a display, sets, as a second virtual region, a region which is a part of the display region and which does not display information shared with a terminal of a communication partner in order to match an aspect ratio with that of the terminal of the communication partner, in a case where it is determined that a part of a character string protrudes from the display region, extends a curve to any one of the first virtual region, the second virtual region, and the first virtual region straddling the second virtual region, and generates display information in which the part of the character string is disposed along the extended curve in any one of the first virtual region, the second virtual region, and the first virtual region straddling the second virtual region.

Abstract: A liquid treatment apparatus includes: a substrate holder for holding a substrate; a discharge nozzle for discharging a treatment liquid onto the substrate; a liquid supply pipe for supplying the treatment liquid from a treatment liquid storage source to the discharge nozzle; a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe; a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and an atmosphere gas supply part for supplying an atmosphere gas into the processing container. The gas pipe is provided so that an extension portion between an upstream end inside the processing container and an encompassing portion is folded back inside the processing container in a plan view.

Abstract: A substrate processing method includes: forming a coating film on a substrate by supplying a resist liquid which is photosensitive to extreme ultraviolet (EUV) light to a surface of the substrate; forming a semi-solidified film by volatilizing a solvent contained in the coating film without heating the solvent; irradiating the semi-solidified film with EUV light thereby exposing the semi-solidified film with EUV light; and supplying a developer to the substrate after the exposure of the semi-solidified film.

Abstract: A technique for suppressing a metal component from remaining at a bottom of a mask pattern when the mask pattern is formed using a metal-containing resist film. A developable anti reflection film 103 is previously formed below a resist film 104. Further, after exposing and developing the wafer W, TMAH is supplied to the wafer W to remove a surface of the antireflection film 103 facing a bottom of the recess pattern 110 of the resist film 104. Therefore, the metal component 105 can be suppressed from remaining at the bottom of the recess pattern 110. Therefore, when the SiO2 film 102 is subsequently etched using the pattern of the resist film 104, the etching is not hindered, so that defects such as bridges can be suppressed.

Abstract: A liquid treatment apparatus includes: a substrate holder for holding a substrate; a discharge nozzle for discharging a treatment liquid onto the substrate; a liquid supply pipe for supplying the treatment liquid from a treatment liquid storage source to the discharge nozzle; a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe; a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and an atmosphere gas supply part for supplying an atmosphere gas into the processing container. The gas pipe is provided so that an extension portion between an upstream end inside the processing container and an encompassing portion is folded back inside the processing container in a plan view.

Abstract: Provided is a method of, in ladle refining treatment of a molten steel, accurately estimating the molten steel temperature after the ladle refining treatment. An operation method of ladle refining treatment by which ladle refining treatment of a molten steel is performed while continuously measuring a molten steel temperature during operation of the ladle refining treatment of the molten steel comprises setting a time earlier than a scheduled ending time of the ladle refining treatment in a continuous measurement period of the molten steel temperature as a determination timing, and estimating the molten steel temperature at the scheduled ending time on the basis of a change with time of the molten steel temperature in continuous measured data of the molten steel temperature from a start of continuous measurement of the molten steel temperature to the determination timing.

Abstract: A technique for suppressing a metal component from remaining at a bottom of a mask pattern when the mask pattern is formed using a metal-containing resist film. A developable anti reflection film 103 is previously formed below a resist film 104. Further, after exposing and developing the wafer W, TMAH is supplied to the wafer W to remove a surface of the anti-reflection film 103 facing a bottom of the recess pattern 110 of the resist film 104. Therefore, the metal component 105 can be suppressed from remaining at the bottom of the recess pattern 110. Therefore, when the SiO2 film 102 is subsequently etched using the pattern of the resist film 104, the etching is not hindered, so that defects such as bridges can be suppressed.

Abstract: An ignition coil includes a primary coil and a secondary coil magnetically coupled from each other; a core cover disposed around the primary coil and the secondary coil; and an outer peripheral core supported by the core cover. The core cover includes a pair of support portions that support the outer peripheral core; and at least one of the pair of support portions includes a flexible portion that elastically presses the outer peripheral core, the flexible portion having flexibility in an arrangement direction separating the pair of support portions.

Abstract: A wiring substrate includes a core layer, first conductor layers including a first inner conductor layer, a first outer conductor layer and a first intermediate conductor layer, second conductor layers including a second inner conductor layer, a second outer conductor layer and a second intermediate conductor layer, and interlayer insulating layers interposed between the first conductor layers and between the second conductor layers. The first and/or second inner conductor layers has a first laminated structure including a metal foil layer and a plating film layer, the first and/or second outer conductor layers has the first laminated structure, and the first and/or second intermediate conductor layers has a second laminated structure including a metal foil layer and a plating film layer and includes a conductor pattern formed such that an upper surface of the conductor pattern has an edge portion forming an inclined portion inclined toward the core layer.

Abstract: An electronic apparatus includes a chassis and a substrate arranged to face each other, a cable disposed between the chassis and the substrate and having an extra length, and a plurality of clampers formed on the chassis and clamping the cable. The plurality of dampers includes a second damper fixedly clamping the cable and a third clamper movably clamping the cable. The cable is fixed to the chassis by the second damper, and the third damper limits a movable direction and a movable range of the cable in extra length processing of the cable.

Abstract: A topic analysis portion extracts a word or a phrase of a prescribed topic from utterance text representing utterance content. A search portion searches for reference text related to the topic in a storage portion in which an utterance history including previous utterance text is saved. A display processing portion outputs the utterance text and related information about the reference text in association with each other to a display portion.