Abstract: An onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by lithography, the resist composition exhibits a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having an arylsulfonate anion structure linked to an aromatic group having an iodine atom or a bromine atom and a sulfonimide anion structure or a sulfonamide anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at ?- or ?-position and linked to an aromatic group having an iodine atom or a bromine atom and a sulfonimide anion structure or a sulfonamide anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at the position a or ? and linked to an aromatic group having an iodine atom or a bromine atom and a carboxylate anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at ?- or ?-position and linked to an aromatic group having an iodine atom or a bromine atom and a carboxylate anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: The present invention relates to a raw-material supply system and a raw-material supply method for pyrolyzing waste plastic including PVC and PET.

Abstract: A control function module of a mobile network receives, from a user terminal that has accessed the mobile network, a request to communicate with a data processing device connected to an external network outside the mobile network. The control function module determines whether or not a user of the user terminal is a registered user. In a case where a user of the user terminal is a registered user, the control function module transmits information used to establish communication between a communication device in the mobile network and the data processing device to an external network control device that controls the external network.

Abstract: The resist composition comprises an onium salt of sulfonic acid which has a linkage of two iodized or brominated aromatic groups as the acid generator. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.

Abstract: A resist composition comprises an onium salt of aromatic sulfonic acid having a linkage of two iodized or brominated aromatic groups as the acid generator is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.

Abstract: The pyrolysis apparatus includes a fluid bed furnace (1), a first partition wall (11) dividing inside of the fluid bed furnace (1) into a pyrolysis chamber (4) and a combustion chamber (5), a second partition wall (12) dividing the combustion chamber (5) into a main combustion chamber (6) and a settling combustion chamber (7), a first gas diffuser (15), a second gas diffuser (25), and a third gas diffuser (35) configured to supply a first fluidizing gas, a second fluidizing gas, and a third fluidizing gas to the pyrolysis chamber (4), the main combustion chamber (6), and the settling combustion chamber (7), respectively, a first raw-material supply device (71) configured to supply a first raw material to the pyrolysis chamber (4) with a first supply amount, a second raw-material supply device (72) configured to supply a second raw material to the pyrolysis chamber (4) with a second supply amount, and an operation controller (200) configured to independently control operations of the first raw-material supply

Abstract: An acquisition unit acquires network topology information indicating a connection form of a network device and traffic information data that is information about flows in traffic. A path calculation unit calculates a path of each flow so that the number of flows whose paths are to be changed is minimized.

Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.

Abstract: The resist composition exhibits higher sensitivity and improved LWR or CDU. The resist composition comprises a base polymer containing repeat units (a) containing a substituted or unsubstituted arylsulfonic acid anion bonded to a polymer backbone having a group containing an iodine atom or a bromine atom and an onium cation.

Abstract: An object of the present invention is to provide a compound exhibiting an excellent drug efficacy as an anti-adenoviral agent, and an anti-adenoviral agent. The present invention provides a compound represented by General Formula [1] (in the formula, R1 represents a halogen atom, an amino group which may be substituted, a C1-6 alkoxy group which may be substituted, a hydroxyl group which may be protected, or the like; R2 represents a hydrogen atom or an amino protecting group; R3 represents a C1-20 alkoxy group which may be substituted, an aryloxy group which may be substituted, an amino group which may be substituted, or the like; R4 represents a C1-20 alkoxy group which may be substituted, an aryloxy group which may be substituted, an amino group which may be substituted, or the like); or a salt thereof.

Abstract: Provided are a work support system and a work target specifying device and method capable of improving usability. A work support system 7 for supporting work of a worker includes: a work target specifying device 1 to be used by the worker U1; and a work support device 2 to be used by a work supporter U2 for supporting the work of the worker, the work support device being communicably connected to the work target specifying device. The work target specifying device is configured to acquire three-dimensional space data 52 of a work space including a target device, create predetermined image data by associating two-dimensional image data 51 obtained by imaging the target device with the target device in the three-dimensional space data, and output the created predetermined image data to the work support device.

Abstract: A resist composition comprising a base polymer containing repeat units (a) having a salt structure containing a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having formula (1).

Abstract: A sulfonium salt consisting of a carboxylate anion having a hydroxy group and fluorine or trifluoromethyl at ?- or ?-position and a phenyldibenzothiophenium cation having a hydrocarbylcarbonyl or hydrocarbyloxycarbonyl group has a high decomposition efficiency and a high acid diffusion controlling ability upon exposure. A resist composition comprising the sulfonium salt offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: A stream information setting unit sets, with respect to a plurality of information collection object apparatuses, either a first transmission setting of a first data transmission of which a transmission cycle is designated or a second transmission setting of a second data transmission which uses a predetermined transmission cycle. A telemetry data receiving unit receives data from the information collection object apparatuses by the first data transmission executed according to the first transmission setting and the second data transmission executed according to the second transmission setting. A measuring unit measures a transmission time of data by the first data transmission. A comparing unit determines whether or not the transmission time measured by the measuring unit exceeds the designated transmission cycle. A cycle changing unit extends a transmission cycle of the second data transmission when the comparing unit determines that the transmission time exceeds the transmission cycle.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and further containing at least one repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms with a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms without a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process of using it that show a particularly favorable mask dimension dependency and CDU in photolithography where a light source is a high-energy beam such as a KrF excimer laser beam, an electron beam, or an extreme ultraviolet ray.