Patents by Inventor Takayuki Fujiwara

Takayuki Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210232048
    Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having the formula (1) or an iodonium salt having the formula (2).
    Type: Application
    Filed: December 23, 2020
    Publication date: July 29, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20210200083
    Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
    Type: Application
    Filed: March 11, 2021
    Publication date: July 1, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei ADACHI, Shinya YAMASHITA, Masaki OHASHI, Tomohiro KOBAYASHI, Kenichi OIKAWA, Takayuki FUJIWARA
  • Publication number: 20210188770
    Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.
    Type: Application
    Filed: December 1, 2020
    Publication date: June 24, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Kenichi Oikawa, Tomohiro Kobayashi, Masahiro Fukushima
  • Publication number: 20210179554
    Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.
    Type: Application
    Filed: December 4, 2020
    Publication date: June 17, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Tomomi Watanabe, Kazuhiro Katayama
  • Patent number: 11022881
    Abstract: A photoacid generator having formula (1a) is provided. A chemically amplified resist composition comprising the PAG forms a pattern of rectangular profile with a good balance of sensitivity and LWR when processed by photolithography using ArF excimer laser, EB or EUV.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: June 1, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Kazuya Honda, Takayuki Fujiwara, Masaki Ohashi, Kazuhiro Katayama
  • Patent number: 11016559
    Abstract: A terminal display device which a user wears on a user's head displays on a display unit an information object to be overlapped with a field of view of the user, detects a motion of the terminal display device, and stores a pattern of a motion of the terminal display device and an operation content of the information object that is displayed in association with each other. An information type management memory unit stores information related to a display mode of each of the information objects. A display control unit determines an operation content of the terminal display device based on the motion that is detected and an association between the motion pattern and the operation content, specifies the information object disposed at a predetermined position of the display unit, and performs an operation specified with the determined operation content on the specified information object.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: May 25, 2021
    Assignee: HITACHI-LG DATA STORAGE, INC.
    Inventors: Takayuki Fujiwara, Yoshihiro Machida, Yoshiho Seo, Tatsuya Ishitobi
  • Publication number: 20210149301
    Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.
    Type: Application
    Filed: November 3, 2020
    Publication date: May 20, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Kenichi Oikawa, Tomohiro Kobayashi, Masahiro Fukushima
  • Publication number: 20210149300
    Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium or iodonium salt of iodized benzamide group-containing fluorinated sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: October 27, 2020
    Publication date: May 20, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara, Tomomi Watanabe
  • Publication number: 20210141306
    Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and not containing a repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
    Type: Application
    Filed: October 28, 2020
    Publication date: May 13, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei ADACHI, Shinya YAMASHITA, Masaki OHASHI, Takayuki FUJIWARA
  • Publication number: 20210061967
    Abstract: The present invention addresses the problem of providing a prepreg that has excellent short-time and low-pressure handling properties, during pasting and layering work. In order to solve the problem, this invention has the following configuration. The prepreg includes reinforcing fibers and an epoxy resin composition, has a fiber content of 90 mass % or less, and satisfies conditions (a) and (b) below. (a) When the average thickness of the prepreg is set as D (D being 3 ?m or greater), the viscosity at 25° C. of the epoxy resin composition at a site (I) located at a depth of D/4 to 3D/4 from the surface on one side of the prepreg is 50,000 to 300,000 Pa·s inclusive. (b) From among sites (II) located at a depth of up to 0.5 ?m from each surface on both sides of the prepreg, the viscosity at 25° C. of the epoxy resin composition at least at a site (II) on the one side is 10,000 to 40,000 Pa·s inclusive.
    Type: Application
    Filed: March 13, 2019
    Publication date: March 4, 2021
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Tomoki MIZUSAWA, Takayuki FUJIWARA
  • Publication number: 20210055652
    Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt which is structured such that an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) is bonded to a benzene ring via an ester bond-containing group offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: May 19, 2020
    Publication date: February 25, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20210048748
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group and an anion derived from an iodized or brominated phenol offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: July 21, 2020
    Publication date: February 18, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20210048746
    Abstract: A resist composition comprising a base polymer and a sulfonium salt of a carboxylic acid having an iodine or bromine-substituted hydrocarbyl group offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: May 11, 2020
    Publication date: February 18, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Publication number: 20210033970
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group which may contain an ester bond or ether bond and a carboxylate anion having an iodized or brominated hydrocarbyl group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: July 2, 2020
    Publication date: February 4, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Publication number: 20210003916
    Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of fluorosulfonic acid having an iodized or brominated aromatic ring, and recurring unite (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an add labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
    Type: Application
    Filed: June 30, 2020
    Publication date: January 7, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Patent number: 10871711
    Abstract: A resist composition is provided comprising a base polymer containing an iodized polymer, and an acid generator containing a sulfonium salt and/or iodonium salt of iodized benzene ring-containing fluorosulfonic acid. When processed by lithography, the resist composition exhibits a high sensitivity, low LWR and improved CDU independent of whether it is of positive tone or negative tone.
    Type: Grant
    Filed: September 13, 2018
    Date of Patent: December 22, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Masahiro Fukushima, Takayuki Fujiwara
  • Publication number: 20200393760
    Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of N-carbonylsulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
    Type: Application
    Filed: May 4, 2020
    Publication date: December 17, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Publication number: 20200382439
    Abstract: A communication system (1) includes a flow collector (30) that collects traffic of an NW edge (12) accommodating CPE (11), an NFVO (50) that provides an instruction to add or remove a resource of a VNF (22), a resource management device (40) that notifies the NFVO (50) of an increased or decreased resource amount and an addition or removal instruction of the VNF (22) based on an increase or decrease of the traffic of the NW edge (12) collected by the flow collector (30), and that decides on the VNF (22) which becomes a redirection destination of the traffic of the NW edge (12) in response to execution of addition or removal of the VNF (22) by the NFVO (50), a VIM (60) that adds or removes the VNF (22) in accordance with an instruction from the NFVO (50), and a flow controller (70) that instructs the NW edge (12) to set the VNF (22) decided by the resource management device (40) as the redirection destination of the traffic.
    Type: Application
    Filed: February 13, 2019
    Publication date: December 3, 2020
    Inventors: Satomi Inoue, Masayuki Nishiki, Takayuki Fujiwara, Satoshi Nishiyama
  • Patent number: 10851188
    Abstract: A polymer compound for a conductive polymer contains one or more kinds of repeating units “a” represented by the following general formula (1) and has a weight average molecular weight in the range of 1,000 to 500,000, R1 represents a hydrogen atom or a methyl group; Rf1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf1; Z1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(?O)—O—R2—; R2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R2; and “a” is 0<a?1.0.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: December 1, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara, Koji Hasegawa, Takayuki Nagasawa
  • Publication number: 20200369605
    Abstract: An onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by lithography, the resist composition exhibits a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: April 24, 2020
    Publication date: November 26, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Takayuki Fujiwara, Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama