Patents by Inventor Takayuki Fujiwara

Takayuki Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9645491
    Abstract: A sulfonium salt having both anion and cation moieties in the molecule functions as a photoacid generator and is compatible with other components. A resist composition comprising the sulfonium salt has the advantages of reduced acid diffusion and forms a pattern with a good balance of sensitivity, MEF and DOF, less outgassing, and minimal defects.
    Type: Grant
    Filed: May 24, 2016
    Date of Patent: May 9, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masaki Ohashi
  • Publication number: 20170124338
    Abstract: As a technology for preventing the leaking of confidential information more properly, provided is a work recording apparatus including: a recording control unit configured to record a work situation; a position detection unit configured to detect a position; and a usable function restriction unit configured to specify an applicable predetermined state through use of the position detected by the position detection unit and restrict a part or all of functions of the recording control unit based on the specified applicable predetermined state.
    Type: Application
    Filed: June 13, 2014
    Publication date: May 4, 2017
    Inventors: Kentarou OONISHI, Daisuke KATSUMATA, Tooru SUGIMOTO, Naoto MURAYAMA, Nobuhiro IHORI, Naoto MIYAO, Shinya IGUCHI, Kenta TAKAHASHI, Takayuki FUJIWARA, Hiroaki TAKATSUKI
  • Publication number: 20170058066
    Abstract: A polymer compound for a conductive polymer including one or more repeating units “a” shown by the following general formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000, wherein R1 represents a hydrogen atom or a methyl group; R2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms and optionally containing either or both of an ether group and an ester group; R3 represents a linear or branched alkyl group having 1 to 4 carbon atoms with one or more hydrogen atoms in R3 being substituted by a fluorine atom(s); “Z” represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and “a” is a number satisfying 0<a?1.0.
    Type: Application
    Filed: August 4, 2016
    Publication date: March 2, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Takayuki FUJIWARA, Takayuki NAGASAWA, Koji HASEGAWA
  • Publication number: 20170038683
    Abstract: The present invention provides a compound shown by the formula (1), wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; A represents a single bond or a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms, in which the hydrocarbon group may contain a heteroatom, and a part or all of hydrogen atoms in the hydrocarbon group may be substituted with a group containing a heteroatom; “n” represents 0 or 1, provided that “n” is 0 when A is a single bond; and M+ represents a cation. This compound is suitable as a raw material of a polymer compound usable for a base resin of a resist composition that has high resolution and high sensitivity and is excellent in balance of lithography properties such as LWR and CDU.
    Type: Application
    Filed: June 28, 2016
    Publication date: February 9, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki OHASHI, Jun HATAKEYAMA, Masahiro FUKUSHIMA, Takayuki FUJIWARA
  • Patent number: 9523798
    Abstract: Provided is an element array in which an error in pitch among elements in the element array is absorbed surely in a step of laminating a plurality of element arrays so that each group of the elements arrayed in the laminating direction can be aligned with high accuracy. The element array has a plurality of elements arrayed one-dimensionally or two-dimensionally, and a flexible support formed out of a material richer in elasticity than a material forming the elements. The elements are coupled with one another through the support.
    Type: Grant
    Filed: July 6, 2010
    Date of Patent: December 20, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Takayuki Fujiwara, Seiichi Watanabe
  • Publication number: 20160349612
    Abstract: A sulfonium salt having both anion and cation moieties in the molecule functions as a photoacid generator and is compatible with other components. A resist composition comprising the sulfonium salt has the advantages of reduced acid diffusion and forms a pattern with a good balance of sensitivity, MEF and DOF, less outgassing, and minimal defects.
    Type: Application
    Filed: May 24, 2016
    Publication date: December 1, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masaki Ohashi
  • Publication number: 20160320698
    Abstract: An onium salt having an anion moiety of a specific structure is an effective photoacid generator. A resist composition comprising the onium salt has the advantages of compatibility and reduced acid diffusion and forms a pattern with a good balance of sensitivity and MEF, rectangularity, and minimal defects.
    Type: Application
    Filed: April 27, 2016
    Publication date: November 3, 2016
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Masaki Ohashi, Ryosuke Taniguchi
  • Publication number: 20160299428
    Abstract: A chemically amplified negative resist composition is defined as comprising (A) an onium salt having an anion moiety which is a nitrogen-containing carboxylate of fused ring structure, (B) a base resin, and (C) a crosslinker. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.
    Type: Application
    Filed: April 8, 2016
    Publication date: October 13, 2016
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Masaaki Kotake, Daisuke Domon, Takayuki Fujiwara
  • Patent number: 9458144
    Abstract: A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: October 4, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masayoshi Sagehashi, Koji Hasegawa, Ryosuke Taniguchi
  • Publication number: 20160246175
    Abstract: A resist composition comprising a resin adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium or iodonium salt of nitrogen-containing carboxylic acid has a high resolution. By lithography, a pattern with minimal LER can be formed.
    Type: Application
    Filed: February 16, 2016
    Publication date: August 25, 2016
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaaki Kotake, Takayuki Fujiwara, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe
  • Patent number: 9393747
    Abstract: Disclosed is a method of manufacturing an optical element capable of increasing surface accuracy of an optical surface of an optical element with a plastic lens portion. A cavity which is formed when a pair of molds are closed has a compression molding space and an annular injection molding space, and the method includes a compression molding step of casting a compression molding material into the compression molding space of the molds and an injection molding step of injecting an injection molding material into the injection molding space in a state where the molds are closed and forming an injection molded portion at the outer circumferential edge of the compression molded compression molding material. In the injection molding step, before the compression molding material reaches a temperature lower than the glass transition temperature, the injection of the injection molding material starts.
    Type: Grant
    Filed: August 13, 2014
    Date of Patent: July 19, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Seiichi Watanabe, Kazumi Koike, Takayuki Fujiwara
  • Patent number: 9377689
    Abstract: A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.
    Type: Grant
    Filed: July 23, 2015
    Date of Patent: June 28, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Takayuki Fujiwara, Koji Hasegawa
  • Publication number: 20160152755
    Abstract: A resist composition comprising a polymer comprising recurring units of lactone and a PAG is provided. The resist composition has a high dissolution contrast during organic solvent development, and improved resist properties including MEF and CDU and forms a fine hole pattern with improved roundness and size control.
    Type: Application
    Filed: August 26, 2015
    Publication date: June 2, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masayoshi Sagehashi, Koji Hasegawa, Kenichi Oikawa
  • Publication number: 20160097973
    Abstract: The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.
    Type: Application
    Filed: September 15, 2015
    Publication date: April 7, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki URANO, Masashi IIO, Katsuya TAKEMURA, Koji HASEGAWA, Masahiro FUKUSHIMA, Takayuki FUJIWARA
  • Publication number: 20160078911
    Abstract: A device includes a data storing cell array including a plurality of groups of data storing cells each configured to be accessed responsive to the input of the corresponding one of the row addresses and a count value control circuit coupled to each of the groups of the data storing cells. The count value control circuit is configured to update a count value stored in each of the groups of data storing cells by a first value responsive to the input of the corresponding one of the row addresses in a first operation mode and to set the count value stored in each of the groups of the data storing cells to a second value responsive to the input of the corresponding one of the row addresses in a second operation mode.
    Type: Application
    Filed: November 7, 2014
    Publication date: March 17, 2016
    Inventors: Takayuki Fujiwara, Kanji Oishi, Shin Ishikawa
  • Patent number: 9259866
    Abstract: The invention provides a lens forming apparatus that can suppress generation of burrs even if gaps between outer walls of an upper die and a lower die and an inner wall of a trunk die is made wide. A lens forming apparatus 11 according to the present invention includes a trunk die 12 having a through-hole 17 therein; first and second dies 13 and 14 that are fitted into the through-hole 17 from both ends thereof, respectively, and have pressing surfaces 20 and 30 for sandwiching and pressing a forming material 24; and induction-heating coils 15 and 16 that heat the first and second dies 13 and 14 to a temperature equal to or higher than a glass transition point, in a state where the trunk die 12 is not heated and the temperature thereof is set to a temperature equal to or lower than the glass transition point.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: February 16, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Takayuki Fujiwara, Seiichi Watanabe
  • Patent number: 9256127
    Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 each are H or a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, k1=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: February 9, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Takayuki Fujiwara, Koji Hasegawa, Ryosuke Taniguchi
  • Publication number: 20160033865
    Abstract: A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.
    Type: Application
    Filed: July 23, 2015
    Publication date: February 4, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Takayuki Fujiwara, Koji Hasegawa
  • Publication number: 20150343096
    Abstract: There are provided a liquid preparation for oral administration which contains barium that is likely to be mixed with residues and is less likely to be precipitated in the intestinal tract, and a liquid preparation for oral administration and a composition for imaging a digestive tract which contain barium and enable the reduction of the dose of an intestinal tract cleaning solution in a the intestinal tract pretreatment. That is, there are provided an orally administered liquid preparation which contains barium and one or more types of thickening agents selected from the group consisting of a natural polysaccharide and a cellulose-based polymer, in which the viscosity at a shear rate of 21.54 s?1 is 100 mPa·s or greater and the viscosity at a shear rate of 464.1 s?1 is 5 mPa·s to 90 mPa·s, and the particle diameter D10 which is the particle diameter when the accumulation value in a volume cumulative distribution of the barium becomes 10% is 0.30 ?m to 0.80 ?m and the particle diameter D90 is 1.
    Type: Application
    Filed: May 7, 2015
    Publication date: December 3, 2015
    Applicants: Ajinomoto Co., Inc., Fushimi Pharmaceutical Co., Ltd.
    Inventors: Dennai TAKEDA, Takayuki Fujiwara, Nobuo Ando, Tomoko Watanabe, Akira Yoshino
  • Publication number: 20150323865
    Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 each are H or a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, k1=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.
    Type: Application
    Filed: April 28, 2015
    Publication date: November 12, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Takayuki Fujiwara, Koji Hasegawa, Ryosuke Taniguchi