Patents by Inventor Takayuki Fujiwara

Takayuki Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200285149
    Abstract: A resist composition is provided comprising a base polymer and a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene salt of an iodized aromatic group-containing N-carbonysulfonamide. The salt is effective for sensitizing and suppressing acid diffusion and prevents any film thickness loss after development. The resist composition is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.
    Type: Application
    Filed: February 20, 2020
    Publication date: September 10, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • BIO-ELECTRODE AND METHODS FOR MANUFACTURING THE BIO-ELECTRODE
    Publication number: 20200276437
    Abstract: The present invention provides a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by providing a conductive substrate and a living body contact layer formed on the conductive substrate, where the living body contact layer is a cured product of a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit “a” of a lithium salt, a sodium salt, a potassium salt, or an ammonium salt of sulfonamide including a partial structure represented by the following general formula (1) and a repeating unit “b” having a silicon atom, —R1—C(?O)—N?—SO2—Rf1M+(1).
    Type: Application
    Filed: May 15, 2020
    Publication date: September 3, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Motoaki IWABUCHI, Osamu WATANABE, Takayuki FUJIWARA, Yasuyoshi KURODA
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200272048
    Abstract: A resist composition comprising a base polymer and a quencher in the form of a salt of a cyclic ammonium cation with a carboxylate, sulfonamide, halogenated phenoxide or halide anion offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: February 11, 2020
    Publication date: August 27, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200272049
    Abstract: A resist composition comprising a base polymer and a quencher in the form of a heterocyclic amine compound having a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: February 26, 2020
    Publication date: August 27, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Sulfonium salt, resist composition, and patterning process
    Patent number: 10754248
    Abstract: The present invention provides a sulfonium salt capable of providing a resist composition having few defects in photolithography where a high energy beam is used as a light source, and excellent in lithography performance by controlling acid diffusion.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: August 25, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Ryo Mitsui, Kazuhiro Katayama
  • Work management apparatus, work defect prevention program, and work defect prevention method
    Patent number: 10755222
    Abstract: Provided is a technology for supporting work carried out under a unique work environment. A work management apparatus includes: an image reception unit configured to receive an image from another apparatus; an instruction target specification unit configured to specify a device instructed by a predetermined instruction method in the received image; and a display instruction unit configured to instruct the another apparatus to display the device specified by the instruction target specification unit in a different display mode from a display mode of another device contained in the image.
    Type: Grant
    Filed: June 13, 2014
    Date of Patent: August 25, 2020
    Assignee: Hitachi Systems, Ltd.
    Inventors: Kentarou Oonishi, Daisuke Katsumata, Tooru Sugimoto, Naoto Murayama, Nobuhiro Ihori, Naoto Miyao, Takayuki Fujiwara, Shinya Iguchi, Hiroaki Takatsuki
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200249571
    Abstract: A resist composition comprising a sulfonium salt having formula (1) as PAG, a base polymer, and an organic solvent, when processed by lithography, has light transmittance, acid diffusion suppressing effect, and excellent lithography performance factors such as DOF, LWR and MEF. A lithography process for forming a resist pattern from the composition is also provided.
    Type: Application
    Filed: January 15, 2020
    Publication date: August 6, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Kenichi Oikawa, Masaki Ohashi, Tomohiro Kobayashi
  • Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer compound
    Patent number: 10734132
    Abstract: The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit “a” of a sodium salt, a potassium salt, or an ammonium salt including a partial structure represented by the following general formula (1) and a repeating unit “b” having a silicon atom.
    Type: Grant
    Filed: January 30, 2018
    Date of Patent: August 4, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Osamu Watanabe, Takayuki Fujiwara, Motoaki Iwabuchi, Yasuyoshi Kuroda
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200241414
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: December 30, 2019
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200241417
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: December 30, 2019
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara, Masaki Ohashi
  • Polymerizable monomer, polymer compound, biological electrode composition, biological electrode, and method for producing biological electrode
    Patent number: 10726967
    Abstract: The present invention provides: a biological electrode composition formable a living body contact layer for a biological electrode which is excellent in conductivity and biocompatibility, as well as light in the weight thereof and producible at a low cost, and in addition, which does not cause a significant decrease in the conductivity thereof regardless of under a water-wet condition and a dry condition; a polymer compound which can be suitably used for the biological electrode composition; a polymerizable monomer suitable as a raw material of the polymer compound; a biological electrode having a living body contact layer formed of the biological electrode composition; and a method for producing the same; and wherein, the polymerizable monomer is represented by the following general formula (1).
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: July 28, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Osamu Watanabe, Motoaki Iwabuchi, Takayuki Fujiwara
  • Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer
    Patent number: 10695554
    Abstract: The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit “a” of a lithium salt, a sodium salt, a potassium salt, or an ammonium salt of sulfonamide including a partial structure represented by the following general formula (1) and a repeating unit “b” having a silicon atom, —R1—C(?O)—N?—SO2—Rf1M+??(1).
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: June 30, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Motoaki Iwabuchi, Osamu Watanabe, Takayuki Fujiwara, Yasuyoshi Kuroda
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200192222
    Abstract: A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.
    Type: Application
    Filed: December 17, 2019
    Publication date: June 18, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Masahiro Fukushima, Takayuki Fujiwara, Kazuhiro Katayama
  • Resist composition and patterning process
    Patent number: 10613437
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: April 7, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200089112
    Abstract: A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: September 10, 2019
    Publication date: March 19, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200089111
    Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: September 10, 2019
    Publication date: March 19, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
    Publication number: 20200081341
    Abstract: A novel carboxylic acid iodonium salt and a resist composition comprising the same as a quencher are provided. When resist composition is processed by photolithography using KrF or ArF excimer laser, EB or EUV, there is formed a resist pattern which is improved in rectangularity, MEF, LWR, and CDU.
    Type: Application
    Filed: September 5, 2019
    Publication date: March 12, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Masaki Ohashi, Kazuhiro Katayama, Kenji Yamada
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20200050105
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring bonded to the nitrogen atom via a divalent hydrocarbon group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: August 2, 2019
    Publication date: February 13, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara
  • Polymer compound for conductive polymer and method for producing same
    Patent number: 10508162
    Abstract: A polymer compound for a conductive polymer contains one or more kinds of repeating units “a” represented by the following general formula (1) and has a weight average molecular weight in the range of 1,000 to 500,000, R1 represents a hydrogen atom or a methyl group; Rf1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf1; Z1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(?O)—O—R2—; R2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R2; and “a” is 0<a?1.0.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: December 17, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara, Koji Hasegawa, Takayuki Nagasawa
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20190369491
    Abstract: A resist composition comprising a base polymer and an onium salt of N-carbonylsulfonamide having iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: May 30, 2019
    Publication date: December 5, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara