Abstract: A communication system includes a flow collector that collects traffic of an NW edge accommodating CPE, an NFVO that provides an instruction to add or remove a resource of a VNF, a resource management device that notifies the NFVO of an increased or decreased resource amount and an addition or removal instruction of the VNF based on an increase or decrease of the traffic of the NW edge collected by the flow collector, and that decides on the VNF which becomes a redirection destination of the traffic of the NW edge in response to execution of addition or removal of the VNF by the NFVO, a VIM that adds or removes the VNF in accordance with an instruction from the NFVO, and a flow controller that instructs the NW edge to set the VNF decided by the resource management device as the redirection destination of the traffic.

Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.

Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition is provided comprising a base polymer and a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene salt of an iodized aromatic group-containing N-carbonysulfonamide. The salt is effective for sensitizing and suppressing acid diffusion and prevents any film thickness loss after development. The resist composition is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.

Abstract: The content creation system comprises: an operation measurement device 1 that acquires, as measurement information, a three-dimensional work operation of a model worker R1 that performs the work of the work procedure; an evaluation criterion creation device 2 that creates evaluation criterion information on the work of the work procedure, based on the measurement information of the three-dimensional work operation; and a content creation device 3 that creates and updates the training content, based on the measurement information of the three-dimensional work operation, the evaluation criterion information and the three-dimensional shape information of the work target device. The work management server 2 creates the evaluation criterion information, based on distance information of the three-dimensional work operation with respect to the three-dimensional shape in specific stage of the work procedure, on the condition that a predetermined body motion of the model worker R1 is detected.

Abstract: A resist composition comprising a sulfonium compound of specific structure as PAG has excellent lithography performance factors such as minimal defects, high sensitivity, improved LWR and CDU, and is a quite effective resist material for precise micropatterning.

Abstract: A polymer compound having a weight average molecular weight in the range of 1,000 to 500,000, and contains one or more repeating units represented by formula (1) and one or more repeating units represented by formula (2): R1 represents a hydrogen atom or a methyl group; Rf1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf1; Z1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(?O)—O—R2—; R2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R2; and “a” is 0<a?1.0, and “b” is 0<b<1.0.

Abstract: A control system 10 may include a packet size analysis unit (14) that analyzes a distribution of packet sizes of traffic input to VNFs, a capacity calculation unit (123) that calculates a traffic volume per unit time processible by one VNF based on VNF capacity information indicating a traffic volume (bps, pps) per unit time processible by one VNF for a packet size and the distribution of the packet sizes input to the VNFs, and an installation number calculation unit (124) that calculates the number of VNFs to be increased or decreased based on the traffic volume per unit time processible by one VNF and the resource amount necessary for forwarding of the traffic.

Abstract: A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: A content presentation system includes: a training content distribution function 431 that presents the training content to the trainee; a work content delivery function 331 that presents a work procedure based on augmented reality; a user operation detection unit 120 that detects a three-dimensional operation of the site worker; a work record analysis function 338 that determines success or failure of the work based on the evaluation reference information; and a content creation/updating function 342 that updates the training content based on the determination result. When a predetermined body motion of the worker is detected, the work record analysis function determines whether the work has failed based on the measurement information of the model worker up to the body motion. When the work is determined to have failed, the content creation/updating function updates the training content so as to suppress the factor of the failure.

Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: The training management server 3 and the site management server 6 of the content presentation system 1 that presents a training content, when predetermined information that can be an accident occurrence factor in the on-site work of the work target device from a predetermined three-dimensional body motion of the trainee R1 or the model worker R2, adjust the evaluation criterion information on the work operation in the specific stage or other stage of the work procedure of the on-site work related to the information. At that time, the training content is updated so as to increase a probability of occurrence of a simulated accident with respect to the work operation in the specific stage or other stage during the simulated work, and impress the trainee R1 with the occurrence of the accident at occurrence of the simulated accident.

Abstract: A control system 10 may include a packet size analysis unit (14) that analyzes a distribution of packet sizes of traffic input to VNFs, a capacity calculation unit (123) that calculates a traffic volume per unit time processible by one VNF based on VNF capacity information indicating a traffic volume (bps, pps) per unit time processible by one VNF for a packet size and the distribution of the packet sizes input to the VNFs, and an installation number calculation unit (124) that calculates the number of VNFs to be increased or decreased based on the traffic volume per unit time processible by one VNF and the resource amount necessary for forwarding of the traffic.

Abstract: A communication system (1) includes a programmable switch (10) configured to perform packet transfer and queuing, a plurality of VNFs (20) configured to execute network functions on packets, and a controller (40) configured to control the programmable switch (10), the programmable switch (10) includes a queue distribution unit (12) configured to distribute input packets to any of the plurality of VNFs (20) according to an instruction of the controller (40) with respect to a queue group (11), the plurality of VNFs (20) each include a load measurement unit (22) configured to measure an amount of consumption of server resources and notify the controller (40) of a load status, and the controller (40) includes a load analysis unit (41) configured to analyze a load of each of the plurality of VNFs (20) based on a certain rule, and a queue control unit (42) configured to change a queue distribution rule according to whether a value based on the number of VNFs having a higher load than a predetermined value exceeds a

Abstract: The present invention provides a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by providing a conductive substrate and a living body contact layer formed on the conductive substrate, where the living body contact layer is a cured product of a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit “a” of a lithium salt, a sodium salt, a potassium salt, or an ammonium salt of sulfonamide including a partial structure represented by the following general formula (1) and a repeating unit “b” having a silicon atom, —R1—C(?O)—N?—SO2—Rf1M+(1).

Abstract: A control system (10) includes, for each type of VNF, a VNF compatibility condition indicating a condition of allocation of resources by which the VNF corresponding to the type is allowed to coexist with other VNFs in an identical computer, and resource usage information indicating resources in use by the VNF in the computer and unused resources. The control system (10) includes a VNF deploy control unit (14) referencing, in a case of receiving an instruction to additionally install a VNF, the type of the VNF to be additionally installed, the VNF compatibility condition, and the resource usage information to determine, from among the unused resources, resources allocated to the VNF to be additionally installed, and a resource allocation processing unit allocating the determined resources to the VNF to be additionally installed.

Abstract: As a technology for preventing the leaking of confidential information more properly, provided is a work recording apparatus including: a recording control unit configured to record a work situation; a position detection unit configured to detect a position; and a usable function restriction unit configured to specify an applicable predetermined state through use of the position detected by the position detection unit and restrict a part or all of functions of the recording control unit based on the specified applicable predetermined state.

Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having the formula (1) or an iodonium salt having the formula (2).

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.

Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.