Patents by Inventor Takayuki Hirao

Takayuki Hirao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10804432
    Abstract: A free-standing substrate of a polycrystalline nitride of a group 13 element contains a plurality of monocrystalline particles having a particular crystal orientation in approximately a normal direction. The polycrystalline nitride of the group 13 element is composed of gallium nitride, aluminum nitride, indium nitride or a mixed crystal thereof. The free-standing substrate has a top surface and bottom surface. The free-standing substrate contains at least one of zinc and calcium. A root mean square roughness Rms at the top surface is 3.0 nm or less.
    Type: Grant
    Filed: August 9, 2018
    Date of Patent: October 13, 2020
    Assignee: NGK INSULATORS, LTD.
    Inventors: Katsuhiro Imai, Yoshitaka Kuraoka, Mikiya Ichimura, Takayuki Hirao
  • Patent number: 10756354
    Abstract: A membrane catalyst layer assembly production method is provided for producing a membrane catalyst layer assembly by discharging catalyst ink having a solvent and a solid component onto an electrolyte membrane. The membrane catalyst layer assembly production method includes forming a first catalyst ink layer having a first porosity on the electrolyte membrane by controlling a porosity of a catalyst ink layer that is formed by the catalyst ink making impact with the electrolyte membrane by adjusting an amount of solvent in the catalyst ink in drop form prior to impact with the electrolyte membrane, and forming a second catalyst ink layer having a second porosity, which is different from the first porosity, on the first catalyst ink layer, by adjusting the amount of solvent in the catalyst ink in drop form prior to impact with the first catalyst ink layer.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: August 25, 2020
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Michito Kishi, Tooru Kosemura, Takayuki Hirao, Hiroshi Miyaoka, Yasuhiro Numao, Jun Inomata, Kimio Nishimura
  • Patent number: 10734548
    Abstract: A free-standing substrate of a polycrystalline nitride of a group 13 element is composed of a plurality of monocrystalline particles having a particular crystal orientation in approximately a normal direction. The free-standing substrate has a top surface and a bottom surface. The polycrystalline nitride of the group 13 element is gallium nitride, aluminum nitride, indium nitride or a mixed crystal thereof and contains zinc at a concentration of 1×1017 atoms/cm3 or more and 1×1020 atoms/cm3 or less.
    Type: Grant
    Filed: August 9, 2018
    Date of Patent: August 4, 2020
    Assignee: NGK INSULATORS, LTD.
    Inventors: Katsuhiro Imai, Yoshitaka Kuraoka, Mikiya Ichimura, Takayuki Hirao
  • Publication number: 20200232120
    Abstract: A layer of a crystal of a group 13 nitride selected from gallium nitride, aluminum nitride, indium nitride and the mixed crystals thereof has an upper surface and a bottom surface. The upper surface of a crystal layer of the group 13 nitride includes a linear high-luminance light-emitting part and a low-luminance light-emitting region adjacent to the high-luminance light-emitting part, observed by cathode luminescence. The high-luminance light-emitting part includes a portion extending along an m-plane of the crystal of the group 13 nitride. A normal line to the upper surface has an off-angle of 2.0° or less with respect to <0001> direction of the crystal of the nitride of the group 13 element.
    Type: Application
    Filed: February 21, 2020
    Publication date: July 23, 2020
    Inventors: Takayuki HIRAO, Hirokazu NAKANISHI, Mikiya ICHIMURA, Takanao SHIMODAIRA, Masahiro SAKAI, Takashi YOSHINO
  • Publication number: 20200223875
    Abstract: The objectives of the present invention are: to provide a novel tetrazole silane compound, a method for synthesizing the same, and a silane coupling agent containing the tetrazole silane compound as a component; and to provide a surface treatment solution using the tetrazole silane compound, a method for surface treatment, and a method for adhering two different materials. The tetrazole silane compound according to the present invention is a compound represented by chemical formula (I). (In formula (I), X, R, and n are respectively the same as defined in the specification.
    Type: Application
    Filed: July 31, 2018
    Publication date: July 16, 2020
    Applicant: SHIKOKU CHEMICALS CORPORATION
    Inventors: Noriaki YAMAJI, Takayuki MURAl, Miya TANIOKA, Shusaku IIDA, Masato KATSUMURA, Takahito IMAMINE, Masahiko TSUJINO, Tomoya MAE, Hirohiko HIRAO
  • Publication number: 20200203573
    Abstract: It is provided a layer of a crystal of a nitride of a group 13 element selected from gallium nitride, aluminum nitride, indium nitride and the mixed crystals thereof, and the layer includes an upper surface and a bottom surface. The upper surface includes a linear high-luminance light-emitting part and a low-luminance light-emitting region adjacent to the high-luminance light-emitting part, and the high-luminance light-emitting part has a portion extending along an m-plane of the crystal of the nitride of the group 13 element, in the case that the upper surface is observed by cathode luminescence. The upper surface has an arithmetic average roughness Ra of 0.05 nm or more and 1.0 nm or less.
    Type: Application
    Filed: February 21, 2020
    Publication date: June 25, 2020
    Inventors: Takayuki HIRAO, Hirokazu NAKANISHI, Mikiya ICHIMURA, Takanao SHIMODAIRA, Masahiro SAKAI, Takashi YOSHINO
  • Publication number: 20200194621
    Abstract: A layer of a crystal of a group 13 nitride selected from gallium nitride, aluminum nitride, indium nitride and the mixed crystals thereof has an upper surface and a bottom surface. The upper surface of a crystal layer of the group 13 nitride includes a linear high-luminance light-emitting part and a low-luminance light-emitting region adjacent to the high-luminance light-emitting part, observed by cathode luminescence. The high-luminance light-emitting part includes a portion extending along an m-plane of the crystal of the group 13 nitride. The crystal of the nitride of the group 13 element contains oxygen atoms in a content of 1×1018 atom/cm3 or less, silicon atoms, manganese atoms, carbon atoms, magnesium atoms and calcium atoms in contents of 1×1017 atom/cm3 or less, chromium atoms in a content of 1×1016 atom/cm3 or less and chlorine atoms in a content of 1×1015 atom/cm3 or less.
    Type: Application
    Filed: February 21, 2020
    Publication date: June 18, 2020
    Inventors: Takayuki HIRAO, Hirokazu NAKANISHI, Mikiya ICHIMURA, Takanao SHIMODAIRA, Masahiro SAKAI, Takashi YOSHINO
  • Publication number: 20200190695
    Abstract: It is provided a layer of a crystal of a group 13 nitride having an upper surface and lower surface and composed of a crystal of the group 13 nitride selected from gallium nitride, aluminum nitride, indium nitride or the mixed crystals thereof. In the case that the upper surface of the layer of the crystal of the group 13 nitride is observed by cathode luminescence, the upper surface includes a linear high-luminance light-emitting part and a low-luminance light-emitting region adjacent to the high-luminance light-emitting part. A half value width of reflection at (0002) plane of an X-ray rocking curve on the upper surface is 3000 seconds or less and 20 seconds or more.
    Type: Application
    Filed: February 21, 2020
    Publication date: June 18, 2020
    Inventors: Takayuki HIRAO, Hirokazu NAKANISHI, Mikiya ICHIMURA, Takanao SHIMODAIRA, Masahiro SAKAI, Takashi YOSHINO
  • Publication number: 20200194626
    Abstract: A layer of a crystal of a group 13 nitride selected from gallium nitride, aluminum nitride, indium nitride and the mixed crystals thereof has an upper surface and a bottom surface. The upper surface of a crystal layer of the group 13 nitride includes a linear high-luminance light-emitting part and a low-luminance light-emitting region adjacent to the high-luminance light-emitting part, observed by cathode luminescence. The high-luminance light-emitting part includes a portion extending along an m-plane of the crystal of the group 13 nitride.
    Type: Application
    Filed: February 21, 2020
    Publication date: June 18, 2020
    Inventors: Takayuki HIRAO, Hirokazu NAKANISHI, Mikiya ICHIMURA, Takanao SHIMODAIRA, Masahiro SAKAI, Takashi YOSHINO
  • Patent number: 10553876
    Abstract: A method is provided that modifies a catalyst layer of a membrane catalyst layer assembly, which is manufactured by transferring the catalyst layer formed on a transfer sheet onto an electrolyte membrane. In the catalyst layer correction method, presence or absence of a defect in the catalyst layer is detected. The defect is removed based on the size and position of the detected defect. The portion from which the defect has been removed is repaired by application thereto of a correcting ink corresponding to the catalyst layer.
    Type: Grant
    Filed: February 2, 2015
    Date of Patent: February 4, 2020
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Hiroshi Okonogi, Aurel Funar, Yasuhiro Numao, Tooru Kosemura, Takayuki Hirao, Kimio Nishimura
  • Publication number: 20200031852
    Abstract: The abstract of the international application is being replace by the following abstract: The purpose of the present invention is to provide: a novel triazole silane compound and a method for synthesizing the same, and a silane coupling agent containing the triazole silane compound as a component; and a surface treatment solution, a surface treatment method, and a method for bonding two different materials, which use said triazole silane compound.
    Type: Application
    Filed: April 5, 2018
    Publication date: January 30, 2020
    Applicant: SHIKOKU CHEMICALS CORPORATION
    Inventors: Takayuki MURAI, Miya TANIOKA, Shusaku IIDA, Masato KATSUMURA, Noriaki YAMAJI, Takahito IMAMINE, Masahiko TSUJINO, Hirohiko HIRAO
  • Patent number: 10405422
    Abstract: The present invention is a copper film-forming agent containing a copper complex composed of a copper formate and a 5-membered or 6-membered nitrogen-containing heterocyclic compound having from 1 to 3 nitrogen atoms, in which the nitrogen-containing heterocyclic compound has one or two ring structures, the total number of carbon atoms contained in a substituent is from 1 to 5, and an element other than a carbon atom in the compound is not bonded to a hydrogen atom.
    Type: Grant
    Filed: May 30, 2013
    Date of Patent: September 3, 2019
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Shusaku Iida, Takayuki Murai, Hirohiko Hirao
  • Patent number: 10398028
    Abstract: A surface treating composition for copper or a copper alloy comprising an imidazole compound and means for using the composition in the soldering of electronic parts to printed wiring boards are disclosed.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: August 27, 2019
    Assignee: SHIKOKU CHEMICALS CORPORATION
    Inventors: Hirohiko Hirao, Noriaki Yamaji, Masato Nakanishi, Takayuki Murai
  • Publication number: 20190242029
    Abstract: It is provided a layer of a nitride of a group 13 element having a first main face and second main face. The layer of the nitride of the group 13 element includes a first void-depleted layer provided on the side of the first main face, a second void-depleted layer provided on the side of the second main face, and the void-distributed layer provided between the first void-depleted layer and second void-depleted layer.
    Type: Application
    Filed: April 16, 2019
    Publication date: August 8, 2019
    Applicant: NGK INSULATORS, LTD.
    Inventors: Yoshinori ISODA, Suguru NOGUCHI, Tetsuya UCHIKAWA, Takayuki HIRAO, Takanao SHIMODAIRA, Katsuhiro IMAI
  • Patent number: 10190233
    Abstract: A group 13 element source, a flux comprising at least one of an alkali metal and an alkaline earth metal, and an additive being liquid at an ambient temperature are placed in a crystal growing vessel. The crystal growing vessel is heated and pressurized under a nitrogen atom-containing gas atmosphere to form a melt containing the group 13 element source, the flux and the additive. Evaporation of the additive is prevented until the flux is melted. The crystal of the nitride of the group 13 element is then grown in the melt.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: January 29, 2019
    Assignee: NGK INSULATORS, LTD.
    Inventors: Suguru Noguchi, Shuhei Higashihara, Takayuki Hirao, Tetsuya Uchikawa
  • Publication number: 20190027760
    Abstract: A membrane catalyst layer assembly production method is provided for producing a membrane catalyst layer assembly by discharging catalyst ink having a solvent and a solid component onto an electrolyte membrane. The membrane catalyst layer assembly production method includes forming a first catalyst ink layer having a first porosity on the electrolyte membrane by controlling a porosity of a catalyst ink layer that is formed by the catalyst ink making impact with the electrolyte membrane by adjusting an amount of solvent in the catalyst ink in drop form prior to impact with the electrolyte membrane, and forming a second catalyst ink layer having a second porosity, which is different from the first porosity, on the first catalyst ink layer, by adjusting the amount of solvent in the catalyst ink in drop form prior to impact with the first catalyst ink layer.
    Type: Application
    Filed: September 3, 2015
    Publication date: January 24, 2019
    Inventors: Michito KISHI, Tooru KOSEMURA, Takayuki HIRAO, Hiroshi MIYAOKA, Yasuhiro NUMAO, Jun INOMATA, Kimio NISHIMURA
  • Patent number: 10156022
    Abstract: It is produced a crystal of a nitride of a group 13 element in a melt including the group 13 element and a flux including at least an alkali metal under atmosphere comprising a nitrogen-containing gas. An amount of carbon is made 0.005 to 0.018 atomic percent, provided that 100 atomic percent is assigned to a total amount of said flux, said group 13 element and carbon in said melt.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: December 18, 2018
    Assignee: NGK INSULATORS, LTD.
    Inventors: Takayuki Hirao, Shuhei Higashihara, Katsuhiro Imai
  • Publication number: 20180350918
    Abstract: A free-standing substrate of a polycrystalline nitride of a group 13 element contains a plurality of monocrystalline particles having a particular crystal orientation in approximately a normal direction. The polycrystalline nitride of the group 13 element is composed of gallium nitride, aluminum nitride, indium nitride or a mixed crystal thereof. The free-standing substrate has a top surface and bottom surface. The free-standing substrate contains at least one of zinc and calcium. A root mean square roughness Rms at the top surface is 3.0 nm or less.
    Type: Application
    Filed: August 9, 2018
    Publication date: December 6, 2018
    Inventors: Katsuhiro IMAI, Yoshitaka KURAOKA, Mikiya ICHIMURA, Takayuki HIRAO
  • Publication number: 20180351041
    Abstract: A free-standing substrate of a polycrystalline nitride of a group 13 element is composed of a plurality of monocrystalline particles having a particular crystal orientations in approximately a normal direction. The free-standing substrate has a top surface and a bottom surface. The polycrystalline nitride of the group 13 element is gallium nitride, aluminum nitride, indium nitride or a mixed crystal thereof and contains zinc at a concentration of 1×1017 atoms/cm3 or more and 1×1020 atoms/cm3 or less.
    Type: Application
    Filed: August 9, 2018
    Publication date: December 6, 2018
    Inventors: Katsuhiro IMAI, Yoshitaka KURAOKA, Mikiya ICHIMURA, Takayuki HIRAO
  • Publication number: 20180309135
    Abstract: [Problems] To easily and efficiently manufacture a catalyst layer having high catalytic activity and to easily manufacture a fuel cell having high power generation efficiency. [Solution] An apparatus for forming a catalyst layer 3 for a fuel cell on an electrolyte film (application object) 2, the apparatus including: a holding portion 6 that holds a sheet-shaped electrolyte film 2, an application portion 7 that applies a catalyst ink 5 for forming the catalyst layer 3 on at least one side of the electrolyte film 2 held by the holding portion 6, a chamber portion 8 that is capable of forming a space 55 including the holding portion 6, and a suction portion 9 that depressurizes the inside of the space 55 formed by the chamber portion 8 so as to dry the catalyst ink 5.
    Type: Application
    Filed: October 13, 2016
    Publication date: October 25, 2018
    Inventors: Futoshi SHIMAI, Hiroshi OKONOGI, Yasuhiro NUMAO, Takayuki HIRAO, Kimio NISHIMURA