Patents by Inventor Takayuki Hirao

Takayuki Hirao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10553876
    Abstract: A method is provided that modifies a catalyst layer of a membrane catalyst layer assembly, which is manufactured by transferring the catalyst layer formed on a transfer sheet onto an electrolyte membrane. In the catalyst layer correction method, presence or absence of a defect in the catalyst layer is detected. The defect is removed based on the size and position of the detected defect. The portion from which the defect has been removed is repaired by application thereto of a correcting ink corresponding to the catalyst layer.
    Type: Grant
    Filed: February 2, 2015
    Date of Patent: February 4, 2020
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Hiroshi Okonogi, Aurel Funar, Yasuhiro Numao, Tooru Kosemura, Takayuki Hirao, Kimio Nishimura
  • Publication number: 20190242029
    Abstract: It is provided a layer of a nitride of a group 13 element having a first main face and second main face. The layer of the nitride of the group 13 element includes a first void-depleted layer provided on the side of the first main face, a second void-depleted layer provided on the side of the second main face, and the void-distributed layer provided between the first void-depleted layer and second void-depleted layer.
    Type: Application
    Filed: April 16, 2019
    Publication date: August 8, 2019
    Applicant: NGK INSULATORS, LTD.
    Inventors: Yoshinori ISODA, Suguru NOGUCHI, Tetsuya UCHIKAWA, Takayuki HIRAO, Takanao SHIMODAIRA, Katsuhiro IMAI
  • Patent number: 10190233
    Abstract: A group 13 element source, a flux comprising at least one of an alkali metal and an alkaline earth metal, and an additive being liquid at an ambient temperature are placed in a crystal growing vessel. The crystal growing vessel is heated and pressurized under a nitrogen atom-containing gas atmosphere to form a melt containing the group 13 element source, the flux and the additive. Evaporation of the additive is prevented until the flux is melted. The crystal of the nitride of the group 13 element is then grown in the melt.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: January 29, 2019
    Assignee: NGK INSULATORS, LTD.
    Inventors: Suguru Noguchi, Shuhei Higashihara, Takayuki Hirao, Tetsuya Uchikawa
  • Publication number: 20190027760
    Abstract: A membrane catalyst layer assembly production method is provided for producing a membrane catalyst layer assembly by discharging catalyst ink having a solvent and a solid component onto an electrolyte membrane. The membrane catalyst layer assembly production method includes forming a first catalyst ink layer having a first porosity on the electrolyte membrane by controlling a porosity of a catalyst ink layer that is formed by the catalyst ink making impact with the electrolyte membrane by adjusting an amount of solvent in the catalyst ink in drop form prior to impact with the electrolyte membrane, and forming a second catalyst ink layer having a second porosity, which is different from the first porosity, on the first catalyst ink layer, by adjusting the amount of solvent in the catalyst ink in drop form prior to impact with the first catalyst ink layer.
    Type: Application
    Filed: September 3, 2015
    Publication date: January 24, 2019
    Inventors: Michito KISHI, Tooru KOSEMURA, Takayuki HIRAO, Hiroshi MIYAOKA, Yasuhiro NUMAO, Jun INOMATA, Kimio NISHIMURA
  • Patent number: 10156022
    Abstract: It is produced a crystal of a nitride of a group 13 element in a melt including the group 13 element and a flux including at least an alkali metal under atmosphere comprising a nitrogen-containing gas. An amount of carbon is made 0.005 to 0.018 atomic percent, provided that 100 atomic percent is assigned to a total amount of said flux, said group 13 element and carbon in said melt.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: December 18, 2018
    Assignee: NGK INSULATORS, LTD.
    Inventors: Takayuki Hirao, Shuhei Higashihara, Katsuhiro Imai
  • Publication number: 20180350918
    Abstract: A free-standing substrate of a polycrystalline nitride of a group 13 element contains a plurality of monocrystalline particles having a particular crystal orientation in approximately a normal direction. The polycrystalline nitride of the group 13 element is composed of gallium nitride, aluminum nitride, indium nitride or a mixed crystal thereof. The free-standing substrate has a top surface and bottom surface. The free-standing substrate contains at least one of zinc and calcium. A root mean square roughness Rms at the top surface is 3.0 nm or less.
    Type: Application
    Filed: August 9, 2018
    Publication date: December 6, 2018
    Inventors: Katsuhiro IMAI, Yoshitaka KURAOKA, Mikiya ICHIMURA, Takayuki HIRAO
  • Publication number: 20180351041
    Abstract: A free-standing substrate of a polycrystalline nitride of a group 13 element is composed of a plurality of monocrystalline particles having a particular crystal orientations in approximately a normal direction. The free-standing substrate has a top surface and a bottom surface. The polycrystalline nitride of the group 13 element is gallium nitride, aluminum nitride, indium nitride or a mixed crystal thereof and contains zinc at a concentration of 1×1017 atoms/cm3 or more and 1×1020 atoms/cm3 or less.
    Type: Application
    Filed: August 9, 2018
    Publication date: December 6, 2018
    Inventors: Katsuhiro IMAI, Yoshitaka KURAOKA, Mikiya ICHIMURA, Takayuki HIRAO
  • Publication number: 20180309135
    Abstract: [Problems] To easily and efficiently manufacture a catalyst layer having high catalytic activity and to easily manufacture a fuel cell having high power generation efficiency. [Solution] An apparatus for forming a catalyst layer 3 for a fuel cell on an electrolyte film (application object) 2, the apparatus including: a holding portion 6 that holds a sheet-shaped electrolyte film 2, an application portion 7 that applies a catalyst ink 5 for forming the catalyst layer 3 on at least one side of the electrolyte film 2 held by the holding portion 6, a chamber portion 8 that is capable of forming a space 55 including the holding portion 6, and a suction portion 9 that depressurizes the inside of the space 55 formed by the chamber portion 8 so as to dry the catalyst ink 5.
    Type: Application
    Filed: October 13, 2016
    Publication date: October 25, 2018
    Inventors: Futoshi SHIMAI, Hiroshi OKONOGI, Yasuhiro NUMAO, Takayuki HIRAO, Kimio NISHIMURA
  • Patent number: 10041186
    Abstract: It is used a crucible containing a flux and a source material, a reaction vessel containing the crucible, an intermediate vessel containing the reaction vessel, and a pressure vessel containing the intermediate vessel and used to fill a gas comprising at least a nitrogen atom. When the flux and the source material are melted by heating to grow the nitride crystal, a vapor of an organic compound is provided in a space outside of the reaction vessel and inside of the intermediate vessel.
    Type: Grant
    Filed: August 17, 2016
    Date of Patent: August 7, 2018
    Assignee: NGK INSULATORS, LTD.
    Inventors: Katsuhiro Imai, Makoto Iwai, Masahiro Sakai, Takanao Shimodaira, Shuhei Higashihara, Takayuki Hirao
  • Publication number: 20180202067
    Abstract: An underlying substrate including a seed crystal layer of a group 13 nitride, wherein projections and recesses repeatedly appear in stripe shapes at a principal surface of the seed crystal layer, and the projections have a level difference of 0.3 to 40 ?m and a width of 5 to 100 ?m, and the recesses have a bottom thickness of 2 ?m or more and a width of 50 to 500 ?m.
    Type: Application
    Filed: March 14, 2018
    Publication date: July 19, 2018
    Inventors: Takayuki HIRAO, Makoto IWAI, Katsuhiro IMAI, Takashi YOSHINO
  • Publication number: 20180026273
    Abstract: A method is provided that modifies a catalyst layer of a membrane catalyst layer assembly, which is manufactured by transferring the catalyst layer formed on a transfer sheet onto an electrolyte membrane. In the catalyst layer correction method, presence or absence of a defect in the catalyst layer is detected. The defect is removed based on the size and position of the detected defect. The portion from which the defect has been removed is repaired by application thereto of a correcting ink corresponding to the catalyst layer.
    Type: Application
    Filed: February 2, 2015
    Publication date: January 25, 2018
    Inventors: Hiroshi OKONOGI, Aurel FUNAR, Yasuhiro NUMAO, Tooru KOSEMURA, Takayuki HIRAO, Kimio NISHIMURA
  • Patent number: 9868877
    Abstract: The present invention provides a composition including a fluorine-containing polymer, and excellent in heat resistance even if only a small amount of additives is added to the composition. The present invention relates to a composition, comprising: a fluorine-containing polymer (a) and a cobalt compound (b).
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: January 16, 2018
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yasukazu Nakatani, Toshio Miyatani, Hiroshi Torii, Natsumi Okamoto, Takayuki Hirao, Manabu Fujisawa, Shigehito Sagisaka
  • Patent number: 9793553
    Abstract: A method for manufacturing a separator assembly includes a preparation step for preparing a first separator, a second separator, and an elastic member; a first placement step for positioning the elastic member and placing the same on a placement surface; a second placement step for positioning the first separator in relation to the elastic member, and placing the first separator so as to overlap the elastic member; and a joining step for joining the elastic member and first separator which have been positioned and made to overlap. In the second placement step, the first separator is made to overlap the elastic member while first positioning members for positioning the elastic member are made to retract into the placement surface.
    Type: Grant
    Filed: April 9, 2014
    Date of Patent: October 17, 2017
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Yasuhiro Numao, Hiroshi Miyaoka, Takayuki Hirao
  • Publication number: 20170283983
    Abstract: A group 13 element source, a flux comprising at least one of an alkali metal and an alkaline earth metal, and an additive being liquid at an ambient temperature are placed in a crystal growing vessel. The crystal growing vessel is heated and pressurized under a nitrogen atom-containing gas atmosphere to form a melt containing the group 13 element source, the flux and the additive. Evaporation of the additive is prevented until the flux is melted. The crystal of the nitride of the group 13 element is then grown in the melt.
    Type: Application
    Filed: June 22, 2017
    Publication date: October 5, 2017
    Applicant: NGK INSULATORS, LTD.
    Inventors: Suguru Noguchi, Shuhei Higashihara, Takayuki Hirao, Tetsuya Uchikawa
  • Patent number: 9677192
    Abstract: A group 13 nitride crystal substrate according to the present invention is produced by growing a group 13 nitride crystal on a seed-crystal substrate by a flux method, wherein a content of inclusions in the group 13 nitride crystal grown in a region of the seed-crystal substrate except for a circumferential portion of the seed-crystal substrate, the region having an area fraction of 70% relative to an entire area of the seed-crystal substrate, is 10% or less, preferably 2% or less.
    Type: Grant
    Filed: July 15, 2011
    Date of Patent: June 13, 2017
    Assignee: NGK Insulators, Ltd.
    Inventors: Takanao Shimodaira, Katsuhiro Imai, Makoto Iwai, Takayuki Hirao
  • Publication number: 20160355945
    Abstract: It is used a crucible containing a flux and a source material, a reaction vessel containing the crucible, an intermediate vessel containing the reaction vessel, and a pressure vessel containing the intermediate vessel and used to fill a gas comprising at least a nitrogen atom. When the flux and the source material are melted by heating to grow the nitride crystal, a vapor of an organic compound is provided in a space outside of the reaction vessel and inside of the intermediate vessel.
    Type: Application
    Filed: August 17, 2016
    Publication date: December 8, 2016
    Applicant: NGK INSULATORS, LTD.
    Inventors: Katsuhiro Imai, Makoto Iwai, Masahiro Sakai, Takanao Shimodaira, Shuhei Higashihara, Takayuki Hirao
  • Publication number: 20160168749
    Abstract: It is produced a crystal of a nitride of a group 13 element in a melt including the group 13 element and a flux including at least an alkali metal under atmosphere comprising a nitrogen-containing gas. An amount of carbon is made 0.005 to 0.018 atomic percent, provided that 100 atomic percent is assigned to a total amount of said flux, said group 13 element and carbon in said melt.
    Type: Application
    Filed: February 18, 2016
    Publication date: June 16, 2016
    Applicant: NGK INSULATORS, LTD.
    Inventors: Takayuki Hirao, Shuhei Higashihara, Katsuhiro Imai
  • Patent number: 9290861
    Abstract: Regarding a base substrate, a plurality of steps are formed stepwise on the principal surface (c-face). Each step has a height difference of 10 to 40 ?m, and an edge is formed parallel to an a-face of a hexagonal crystal of GaN. Meanwhile, the terrace width of each step is set at a predetermined width. The predetermined width is set in such a way that after a GaN crystal is grown on the principal surface of the base substrate, the principal surface is covered up with grain boundaries when the grown GaN crystal is observed from the surface side. The plurality of steps can be formed through, for example, dry etching, sand blasting, lasing, and dicing.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: March 22, 2016
    Assignee: NGK INSULATORS, LTD.
    Inventors: Takayuki Hirao, Takanao Shimodaira, Katsuhiro Imai
  • Publication number: 20160079611
    Abstract: A method for manufacturing a separator assembly includes a preparation step for preparing a first separator, a second separator, and an elastic member; a first placement step for positioning the elastic member and placing the same on a placement surface; a second placement step for positioning the first separator in relation to the elastic member, and placing the first separator so as to overlap the elastic member; and a joining step for joining the elastic member and first separator which have been positioned and made to overlap. In the second placement step, the first separator is made to overlap the elastic member while first positioning members for positioning the elastic member are made to retract into the placement surface.
    Type: Application
    Filed: April 9, 2014
    Publication date: March 17, 2016
    Inventors: Yasuhiro NUMAO, Hiroshi MIYAOKA, Takayuki HIRAO
  • Patent number: 9080035
    Abstract: The present invention provides an aqueous fluoropolymer dispersion that shows favorable dispersion stability and is less likely to have a pH decrease even after storage for a long period of time. The present invention provides an aqueous fluoropolymer dispersion including: a fluoropolymer; a fluorine free surfactant; at least one organic electrolyte selected from the group consisting of hydroxy monocarboxylic acids, hydroxy dicarboxylic acids, tricarboxylic acids, and amino acids; and a fluorine-containing anionic surfactant containing not more than 7 carbon atoms.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: July 14, 2015
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Kenjiro Tanimoto, Junya Iida, Takeshi Shimono, Takayuki Hirao, Nobuhiko Tsuda, Taketo Kato