Abstract: Provided is a composition capable of forming a polyurethane elastomer that is soft and excellent in elongation and restorability by curing. The composition for a polyurethane elastomer of the present disclosure contains: a polyol compound (A) containing a compound having three or more groups represented by Formula (1) below per molecule and having an average molecular weight per hydroxyl group of 1000 or greater and 2000 or less; and a polyisocyanate compound (B). In Formula (1) below, n represents an integer of 2 to 6, and m represents an integer of 6 to 20.

Abstract: The present invention relates to a 1-halo-7-methyltricosane compound of the following general formula (1), wherein X1 represents a halogen atom. The present invention relates also to a process for preparing a 17-methylalkane compound of the following general formula (4), wherein n represents an integer of 11 to 13, the process comprising the steps of converting the aforesaid 1-halo-7-methyltricosane compound (1) into a nucleophilic reagent, 7-methyltricosyl compound, of the following general formula (2), wherein M1 represents Li, MgZ1, CuZ1, or CuLiZ1, and Z1 represents a halogen atom or a 7-methyltricosyl group, subsequently subjecting the aforesaid nucleophilic reagent, 7-methyltricosyl compound (2), to a coupling reaction with an electrophilic alkyl reagent of the following general formula (3), wherein X2 represents a halogen atom or a p-toluenesulfonyloxy group, and n is as defined above, to form the aforesaid 17-methylalkane compound (4).

Abstract: The present invention relates to a 1-halo-2,6,14-trimethyloctadecane compound of the following general formula (1), wherein X1 represents a halogen atom. The present invention further relates to a process for preparing a 5,13,17-trimethylalkane compound of the following general formula (4), wherein n represents an integer of 14 to 18, the process comprising converting the aforesaid 1-halo-2,6,14-trimethyloctadecane compound (1) into a nucleophilic reagent, 2,6,14-trimethyloctadecyl, of the following general formula (2), wherein M1 represents Li or MgZ1, and Z1 represents a halogen atom or a 2,6,14-trimethyloctadecyl group, and subsequently subjecting the nucleophilic reagent, 2,6,14-trimethyloctadecyl compound (2), to a coupling reaction with an electrophilic alkyl reagent (3) of the following general formula (3), wherein X2 represents a halogen atom or a p-toluenesulfonyloxy group, and n is as defined above, to obtain the aforesaid 5,13,17-trimethylalkane compound (4).

Abstract: A degassing device removes air dissolved in a liquid under a pressure decreased atmosphere, and includes a liquid tank, a pressure decreasing device, a circulation flow pass, a circulation device, and a variable mechanism. The liquid tank stores the liquid. The pressure decreasing device decreases pressure in the liquid tank. The circulation flow pass communicates different positions of the liquid tank. The circulation device circulates the liquid through the circulation flow pass. The variable mechanism changes a height of an inlet port from the circulation flow pass to the liquid tank in accordance with a height of a liquid surface in the liquid tank.

Abstract: A degassing device removes air dissolved in a liquid under a pressure decreased atmosphere, includes a liquid tank, a pressure decreasing device, a circulation flow pass, a circulation device, a dissolved gas amount measuring device, and a control device. The liquid tank stores the liquid. The pressure decreasing device decreases pressure in the liquid tank. The circulation flow pass communicates different positions of the liquid tank. The circulation device circulates the liquid through the circulation flow pass. The dissolved gas amount measuring device measures an amount of dissolved gas of the liquid in the liquid tank. The control device controls the circulation device in accordance with the amount of dissolved gas measured by the dissolved gas amount measuring device.

Abstract: A deposition mask package according to the present embodiment includes a receiving portion, a lid portion that faces the receiving portion, a deposition mask that is arranged between the receiving portion and the lid portion and has an effective region in which a plurality of through-holes is formed. The receiving portion has a first opposing surface facing the lid portion and a concave portion provided on the first opposing surface. The concave portion is covered by a first flexible film. The effective region of the deposition mask is arranged on the concave portion with the first flexible film interposed therebetween.

Abstract: A curable resin composition for obtaining a cured product having improved heat resistance contains a component (A), which is a polyphenylene ether resin, in an amount of 100 parts by weight, and a component (B), which is a diallyl ether compound represented by general formula (1), in an amount of 0.1 to 4.9 parts by weight: wherein R1 to R8 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms.

Abstract: A deposition mask package according to the present embodiment includes a receiving portion, a lid portion that faces the receiving portion, a deposition mask that is arranged between the receiving portion and the lid portion and has an effective region in which a plurality of through-holes is formed. The receiving portion has a first opposing surface facing the lid portion and a concave portion provided on the first opposing surface. The concave portion is covered by a first flexible film. The effective region of the deposition mask is arranged on the concave portion with the first flexible film interposed therebetween.

Abstract: A lighting device that is capable of illuminating in all directions includes: a case that includes a plurality of wall portions each including a face in a polygonal shape; a plurality of light-emitting elements that are provided in the plurality of wall portions and emit light toward outside of the lighting device; and a controller that controls the plurality of light-emitting elements separately. The case is of an outer shape that is spherical or polyhedral. The case includes bent portions that are bent in the outer shape of the case. The bent portions constitute at least three sides of the outer shape of the case.

Abstract: A delivery plan support system includes a reception unit, a check unit, and an instruction unit. The reception unit receives data indicating a plurality of constraints on a delivery plan in a case where a plurality of vehicles are divided to deliver packages from a delivery base to a plurality of nodes. The check unit determines whether or not the plurality of constraints are consistent with respect to at least one of time and resource assignment. The instruction unit inputs a delivery plan instruction based on the plurality of constraints to a delivery plan generator in a case where it is determined that the plurality of constraints are consistent.

Abstract: A point management system using a vehicle as a contact point includes: an evaluation device that evaluates a specific activity of an user of the vehicle based on vehicle information according to a travel state of the vehicle or activity information recorded in a smart device of the user; a point giving device that gives the point to the user according to an evaluation by the evaluation device; and a propose device that proposes, to the user, an activity for which the point is given. The specific activity includes at least one of three categories of an eco-driving activity, a health care activity, and a social contribution activity.

Abstract: A rotary electric machine rotor includes a rotor core and a core support member that supports the rotor core. The core support member includes a tubular portion formed in a tubular shape and a support portion supported so as to be rotatable with respect to a non-rotary member to support the tubular portion from the inner side in a radial direction. The core support member is formed such that a diameter of a fitting surface portion in a specific region, which includes an overlapping region which overlaps a connection region as viewed in the radial direction, is smaller than a diameter of the fitting surface portion in a general region which is a region other than the specific region.

Abstract: The present invention relates to A process for preparing a conjugated diene compound, the process comprising: subjecting, to an intramolecular sigmatropic rearrangement reaction, a conjugated diene compound (1) of the following general formula (1), wherein Z represents a halogen atom, a methyl group, a hydroxy group, an acetoxy group, a formyl group, or an acetal, and n and m are, independently of each other, integers of 0 to 14, or a conjugated diene compound (2) of the following general formula (2), wherein Z, n, and m are as defined above, to obtain, respectively, a conjugated diene compound (3) of the following general formula (3), wherein Z is as defined above, and n and m are, independently of each other, integers of 0 to 14, with the proviso that m?1 is an integer of zero or more, or a conjugated diene compound (4) of the following general formula (4), wherein Z is as defined above, and n and m are, independently of each other, integers of 0 to 14, with the proviso that n?1 is an integer of zero or mor

Abstract: A resist underlayer film material used in multilayer resist method contains (A) compound shown by following general formula (1), and (B) organic solvent, where X independently represents monovalent organic group shown by following general formula (2); W contains an “m” number of partial structures each independently shown by following formula (3); “m” and “n” each represent an integer of 1 to 10; broken lines represent bonding arms; Z represents aromatic group; A represents single bond or —O—(CH2)p—; “k” represents integer of 1 to 5; “p” represents integer of 1 to 10; R01 represents hydrogen atom or monovalent organic group having 1 to 10 carbon atoms. Material is capable of forming resist underlayer film excellent in planarizing property in fine patterning process by multilayer resist method in semiconductor-device manufacturing process; and patterning processes and methods for forming resist underlayer film use material.

Abstract: The present invention relates to a process for preparing (Z)-7-tetradecen-2-one of the following formula (5), the process comprising the steps of converting a (Z)-1-halo-4-undecene compound (1) of the following general formula (1), wherein X1 represents a halogen atom, into a nucleophilic reagent, (Z)-4-undecenyl compound, of the following general formula (2), wherein M1 represents Li or MgZ1, and Z1 represents a halogen atom or a (4Z)-4-undecenyl group, subjecting the nucleophilic reagent, (Z)-4-undecenyl compound (2), to an addition reaction with propylene oxide of the following formula (3) to obtain (Z)-7-tetradecen-2-ol of the following formula (4) and oxidizing (Z)-7-tetradecen-2-ol (4) thus obtained to form (Z)-7-tetradecen-2-one (5).

Abstract: A composition for forming a silicon-containing resist underlayer film contains at least one or more kinds of a quaternary ammonium salt shown by the following general formula (A-1), and a thermally crosslinkable polysiloxane (Sx), where Ar1 represents an aromatic group having 6 to 20 carbon atoms, or a heteroaromatic group having 4 to 20 carbon atoms. R11 represents an alkyl group, alkenyl group, oxoalkyl group, or oxoalkenyl group having 1 to 12 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an aralkyl group or aryloxoalkyl group having 7 to 12 carbon atoms. Some or all of hydrogen atoms of these groups are optionally substituted. Z? represents an organic or inorganic anion as a counterion of the quaternary ammonium cation. An object is to provide a silicon-containing resist underlayer film having high effect of suppressing ultrafine pattern collapse and appropriate etching rate in multilayer resist methods.

Abstract: The present invention relates to a process for preparing an organohalogen compound of the following general formula (5), wherein R2 represents a linear, branched, or aromatic monovalent hydrocarbon group having 1 to 10 carbon atoms, n is the number of methylene groups of 1 to 10, and X2 represents a halogen atom, the process comprising: obtaining a reaction product mixture by subjecting a (?-halo-2-alkenyl)triphenylphosphonium halide compound of the following general formula (1), wherein n is as defined for the general formula (5) above, X1 and X2 represent, independently of each other, a halogen atom, and Ph represents a phenyl group, to a phosphorus ylide preparation reaction with an alkali metal alkoxide of the following general formula (3), wherein R1 represents a linear or branched alkyl group having 1 to 6 carbon atoms, and M represents an alkali metal atom, in the presence of a lithium halide of the following general formula (2), wherein X3 represents a halogen atom, and then subjecting the aforesaid r

Abstract: The present invention provides a process for preparing 2-methyl-N-(2?-methylbutyl)butanamide of the following formula (1): the process comprising: subjecting an ?-arylethyl-2-methylbutylamine compound of the following general formula (2): wherein Ar represents a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, to N-2-methylbutyrylation to form an N-?-arylethyl-2-methyl-N-(2?-methylbutyl)butanamide compound of the following general formula (3): wherein Ar is as defined above, and removing the ?-arylethyl group of the resulting compound (3) to form 2-methyl-N-(2?-methylbutyl)butanamide (1).

Abstract: The present invention provides a pattern forming method using an adhesion film forming composition comprising (A) a polymer compound, (B) a thermal acid generator, and (C) an organic solvent includes steps of: (I-1) applying the adhesion film forming composition onto a substrate to be processed and thereafter performing thermal treatment to form an adhesion film; (I-2) forming a resist upper layer film on the adhesion film using a resist upper layer film forming composition; (I-3) performing pattern exposure on the resist upper layer film and thereafter developing the resist upper layer film with a developer to form a circuit pattern on the resist upper layer film; and (I-4) transferring a pattern to the adhesion film and the substrate to be processed by dry etching with the resist upper layer film on which the circuit pattern is formed as a mask.

Abstract: The present invention provides a composition for forming an adhesive film that provides an adhesive film that yields good pattern profiles and has high adhesion to a resist upper layer film to prevent collapse of fine patterns in a fine patterning process during semiconductor apparatus manufacturing processes, as well as a patterning process using the composition and a method for forming an adhesive film using the composition. As such, provided is a composition for forming an adhesive film directly under a resist upper layer film. The composition includes: (A) a polymer containing a repeating unit shown by the following general formula (1) and a repeating unit shown by the following general formula (2); and (B) an organic solvent.