Patents by Inventor Takeru Watanabe

Takeru Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230391710
    Abstract: The present invention provides a novel compound, (4Z,6E)-4,6-undecadienyl trimethylacetate (1). The present invention further provides a process for preparing (4Z,6E)-4,6-undecadienyl trimethylacetate (1), the process comprising subjecting a 4-halobutyl trimethylacetate compound (2) wherein X1 represents a halogen atom, to a phosphonium salt formation reaction with a phosphine compound of the following general formula (3) wherein Ar represents, independently of each other, an aryl group, to obtain a [4-(trimethylacetyloxy)butyl]triarylphosphonium halide compound (4) wherein Y represents a halogen atom, and Ar is as defined above, subjecting the [4-(trimethylacetyloxy)butyl]triarylphosphonium halide compound (4) to a deprotonation reaction in the presence of a base to obtain a reaction product mixture, and subjecting the reaction product mixture to a Wittig reaction with (2E)-2-heptenal (5) to obtain (4Z,6E)-4,6-undecadienyl trimethylacetate (1).
    Type: Application
    Filed: June 1, 2023
    Publication date: December 7, 2023
    Inventors: Yuki Miyake, Takeru Watanabe, Yusuke Nagae
  • Patent number: 11767282
    Abstract: There are provided a composition which has a larger attracted number than (9Z)-9,13-tetradecadien-11-ynal alone; and others. More specifically, there are provided a composition bioactive to Stenoma catenifer (STENCA), the composition including (9Z)-9,13-tetradecadien-11-ynal and (9E)-9,13-tetradecadien-11-ynal; a sustained release preparation for controlling STENCA, the preparation including the composition and a carrier or container for sustainedly releasing the (9Z)-9,13-tetradecadien-11-ynal and the (9E)-9,13-tetradecadien-11-ynal; and a method for controlling STENCA, the method including a step of installing the sustained release preparation in a field to release the (9Z)-9,13-tetradecadien-11-ynal and the (9E)-9,13-tetradecadien-11-ynal into the field.
    Type: Grant
    Filed: June 24, 2022
    Date of Patent: September 26, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuki Miyake, Tatsuya Fujii, Yasuhiko Kutsuwada, Takeru Watanabe, Takeshi Kinsho
  • Patent number: 11746078
    Abstract: The present invention relates to a process for preparing a (1S,2R)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound of the following general formula (S,R)-(2), wherein R1 represents a monovalent hydrocarbon group having 1 to 6 carbon atoms, and a bold wedged bond represents the absolute configuration, and a (1R,2S)-(2-acetoxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound of the following general formula (R,S)-(3), wherein R1 is as defined above, a hashed wedged bond represents the absolute configuration, and Ac represents an acetyl group, the process comprising: subjecting a (1RS,2SR)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound of the following general formula (RS,SR)-(2), wherein R1 is as defined above, and a hashed unwedged bond represents a relative configuration, to a kinetic resolution reaction with a lipase in the presence of vinyl acetate to obtain the (1S,2R)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound ((S,R)-(2)
    Type: Grant
    Filed: January 21, 2022
    Date of Patent: September 5, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tomohiro Watanabe, Takeshi Kinsho, Takeru Watanabe, Miyoshi Yamashita, Yusuke Nagae
  • Patent number: 11731930
    Abstract: The present invention provides a process for preparing a (1,2-dimethyl-3-methylenecyclopentyl)acetate compound of the following general formula (3), wherein R represents a linear or branched alkyl group having 1 to 4 carbon atoms, the process comprising subjecting a haloacetaldehyde alkyl 2,3-dimethyl-2-cyclopentenyl acetal compound of the following general formula (1), wherein R is as defined above, and Y represents a halogen atom, to a dehydrohalogenation reaction in the presence of a base, followed by a rearrangement reaction to obtain a (1,2-dimethyl-2-cyclopentenyl)acetate compound of the following general formula (2), wherein R is as defined above, and subjecting the (1,2-dimethyl-2-cyclopentenyl)acetate compound (2) to an epoxidation reaction, followed by an isomerization reaction and then a methylenation reaction to obtain the (1,2-dimethyl-3-methylenecyclopentyl)acetate compound of the following general formula (3).
    Type: Grant
    Filed: June 6, 2022
    Date of Patent: August 22, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Miyoshi Yamashita, Takeru Watanabe, Takeshi Kinsho
  • Patent number: 11692066
    Abstract: An object of the present invention is to provide: a compound containing an imide group which is not only cured under film formation conditions of inert gas as well as air, generates no by-product and has excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but can also form an organic underlayer film with favorable adhesion to a substrate.
    Type: Grant
    Filed: April 16, 2020
    Date of Patent: July 4, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Kori, Keisuke Niida, Takashi Sawamura, Takeru Watanabe, Seiichiro Tachibana, Tsutomu Ogihara
  • Publication number: 20230202968
    Abstract: The present invention provides a process for preparing 2-methyl-N-(2?-methylbutyl)butanamide of the following formula (1): the process comprising: subjecting an ?-arylethyl-2-methylbutylamine compound of the following general formula (2): wherein Ar represents a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, to N-2-methylbutyrylation to form an N-?-arylethyl-2-methyl-N-(2?-methylbutyl)butanamide compound of the following general formula (3): wherein Ar is as defined above, and removing the ?-arylethyl group of the resulting compound (3) to form 2-methyl-N-(2?-methylbutyl)butanamide (1).
    Type: Application
    Filed: February 28, 2023
    Publication date: June 29, 2023
    Inventors: Takeshi Kinsho, Yusuke Nagae, Shogo Tsukaguchi, Yasuhiko Kutsuwada, Tatsuya Hojo, Takeru Watanabe
  • Patent number: 11685703
    Abstract: The present invention relates to a process for preparing a 3,7-dimethylalkane compound (3): wherein n is 5 or 6, the process comprising: subjecting a nucleophilic reagent, 2,6-dimethyloctyl compound (1): wherein M1 represents Li, Mg Z1, CuZ1, or CuLiZ1, wherein Z1 represents a halogen atom or a 2,6-dimethyloctyl group, to a coupling reaction with an electrophilic alkyl reagent (2): wherein X1 represents a halogen atom or a p-toluenesulfonate group, and ā€œnā€ is as defined above, to form the 3,7-dimethylalkane compound (3).
    Type: Grant
    Filed: November 23, 2022
    Date of Patent: June 27, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuki Miyake, Takeru Watanabe, Takeshi Kinsho
  • Patent number: 11676814
    Abstract: A material for forming an organic film using a polymer including an imide group for forming an organic underlayer film that cures under film-forming conditions in the air and in an inert gas, generates no by-product in heat resistance and embedding and flattening characteristics of a pattern formed on a substrate, also adhesiveness to a substrate for manufacturing a semiconductor apparatus, a method for forming an organic film, and a patterning process. The material includes (A) a polymer having a repeating unit represented by the following general formula (1A) whose terminal group is a group represented by either of the following general formulae (1B) or (1C), and (B) an organic solvent: wherein, W1 represents a tetravalent organic group, and W2 represents a divalent organic group: wherein, R1 represents any of the groups represented by the following formula (1D), and two or more of R1s may be used in combination.
    Type: Grant
    Filed: May 27, 2020
    Date of Patent: June 13, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Kori, Takashi Sawamura, Keisuke Niida, Seiichiro Tachibana, Takeru Watanabe, Tsutomu Ogihara
  • Patent number: 11661390
    Abstract: The present invention relates to an acetal compound of the following general formula (1) and an acetal compound of the following general formula (2). The present invention relates to processes for preparing the acetal compound (2), comprising subjecting the acetal compound (1) to a hydrogenation reaction to form the acetal compound (2). The present invention provides a process for preparing 2,3,4,4-tetramethylcyclopentanecarbaldehyde of the following formula (3), comprising subjecting the acetal compound (2) to a hydrolysis reaction to form 2,3,4,4-tetramethylcyclopentanecarbaldehyde (3).
    Type: Grant
    Filed: July 11, 2022
    Date of Patent: May 30, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeru Watanabe, Takeshi Kinsho
  • Publication number: 20230159412
    Abstract: The present invention relates to a process for preparing a 3,7-dimethylalkane compound (3): wherein n is 5 or 6, the process comprising: subjecting a nucleophilic reagent, 2,6-dimethyloctyl compound (1): wherein M1 represents Li, Mg Z1, CuZ1, or CuLiZ1, wherein Z1 represents a halogen atom or a 2,6-dimethyloctyl group, to a coupling reaction with an electrophilic alkyl reagent (2): wherein X1 represents a halogen atom or a p-toluenesulfonate group, and ā€œnā€ is as defined above, to form the 3,7-dimethylalkane compound (3).
    Type: Application
    Filed: November 23, 2022
    Publication date: May 25, 2023
    Inventors: Yuki Miyake, Takeru Watanabe, Takeshi Kinsho
  • Patent number: 11635691
    Abstract: A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1) as a repeating unit, and an organic solvent. Each of AR1 and AR2 represents a benzene ring or naphthalene ring which optionally have a substituent; W1 represents a particular partial structure having a triple bond, and the polymer optionally contains two or more kinds of W1; and W2 represents a divalent organic group having 6 to 80 carbon atoms and at least one aromatic ring. This invention provides: a polymer curable even under film formation conditions in an inert gas and capable of forming an organic film which has not only excellent heat resistance and properties of filling and planarizing a pattern formed in a substrate, but also favorable film formability onto a substrate with less sublimation product; and a composition for forming an organic film, containing the polymer.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: April 25, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Kori, Takashi Sawamura, Keisuke Niida, Seiichiro Tachibana, Takeru Watanabe, Tsutomu Ogihara
  • Patent number: 11629119
    Abstract: The present invention provides a process for preparing 2-methyl-N-(2?-methylbutyl) butanamide of the following formula (1):the process comprising: subjecting an ?-arylethyl-2-methylbutylamine compound of the following general formula (2): wherein Ar represents a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, to N-2-methylbutyrylation to form an N-?-arylethyl-2-methyl-N-(2?-methylbutyl)butanamide compound of the following general formula (3): wherein Ar is as defined above, and removing the ?-arylethyl group of the resulting compound (3) to form 2-methyl-N-(2? -methylbutyl)butanamide (1).
    Type: Grant
    Filed: May 24, 2022
    Date of Patent: April 18, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeshi Kinsho, Yusuke Nagae, Shogo Tsukaguchi, Yasuhiko Kutsuwada, Tatsuya Hojo, Takeru Watanabe
  • Publication number: 20230062627
    Abstract: The present invention relates to an acetal compound of the following general formula (1) and an acetal compound of the following general formula (2). The present invention relates to processes for preparing the acetal compound (2), comprising subjecting the acetal compound (1) to a hydrogenation reaction to form the acetal compound (2). The present invention provides a process for preparing 2,3,4,4-tetramethylcyclopentanecarbaldehyde of the following formula (3), comprising subjecting the acetal compound (2) to a hydrolysis reaction to form 2,3,4,4-tetramethylcyclopentanecarbaldehyde (3).
    Type: Application
    Filed: July 11, 2022
    Publication date: March 2, 2023
    Inventors: Takeru Watanabe, Takeshi Kinsho
  • Publication number: 20230014797
    Abstract: The present invention provides a vinylether compound of the following general formula (1), wherein R1 represents a monovalent hydrocarbon group having 1 to 15 carbon atoms, and the wavy line represents the E-form, the Z-form, or a mixture thereof. The present invention further provides a process for preparing 2,3,4,4-tetramethyl-1-cyclopentenecarbaldehyde of the following formula of the following formula (2), the process comprising subjecting the vinylether compound (1) to a hydrolysis reaction to form 2,3,4,4-tetramethyl-1-cyclopentenecarbaldehyde (2).
    Type: Application
    Filed: July 11, 2022
    Publication date: January 19, 2023
    Inventors: Takeru Watanabe, Takeshi Kinsho
  • Publication number: 20230002305
    Abstract: The present invention provides a process for preparing a (1,2-dimethyl-3-methylenecyclopentyl)acetate compound of the following general formula (3), wherein R represents a linear or branched alkyl group having 1 to 4 carbon atoms, the process comprising subjecting a haloacetaldehyde alkyl 2,3-dimethyl-2-cyclopentenyl acetal compound of the following general formula (1), wherein R is as defined above, and Y represents a halogen atom, to a dehydrohalogenation reaction in the presence of a base, followed by a rearrangement reaction to obtain a (1,2-dimethyl-2-cyclopentenyl)acetate compound of the following general formula (2), wherein R is as defined above, and subjecting the (1,2-dimethyl-2-cyclopentenyl)acetate compound (2) to an epoxidation reaction, followed by an isomerization reaction and then a methylenation reaction to obtain the (1,2-dimethyl-3-methylenecyclopentyl)acetate compound of the following general formula (3).
    Type: Application
    Filed: June 6, 2022
    Publication date: January 5, 2023
    Inventors: Miyoshi Yamashita, Takeru Watanabe, Takeshi Kinsho
  • Publication number: 20220411358
    Abstract: There are provided a composition which has a larger attracted number than (9Z)-9,13-tetradecadien-11-ynal alone; and others. More specifically, there are provided a composition bioactive to Stenoma catenifer (STENCA), the composition including (9Z)-9,13-tetradecadien-11-ynal and (9E)-9,13-tetradecadien-11-ynal; a sustained release preparation for controlling STENCA, the preparation including the composition and a carrier or container for sustainedly releasing the (9Z)-9,13-tetradecadien-11-ynal and the (9E)-9,13-tetradecadien-11-ynal; and a method for controlling STENCA, the method including a step of installing the sustained release preparation in a field to release the (9Z)-9,13-tetradecadien-11-ynal and the (9E)-9,13-tetradecadien-11-ynal into the field.
    Type: Application
    Filed: June 24, 2022
    Publication date: December 29, 2022
    Inventors: Yuki Miyake, Tatsuya Fujii, Yasuhiko Kutsuwada, Takeru Watanabe, Takeshi Kinsho
  • Publication number: 20220411363
    Abstract: The present invention provides a process for preparing 2-methyl-N-(2?-methylbutyl)butanamide of the following formula (1):the process comprising: subjecting an ?-arylethyl-2-methylbutylamine compound of the following general formula (2): wherein Ar represents a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, to N-2-methylbutyrylation to form an N-?-arylethyl-2-methyl-N-(2?-methylbutyl)butanamide compound of the following general formula (3): wherein Ar is as defined above, and removing the ?-arylethyl group of the resulting compound (3) to form 2-methyl-N-(2?-methylbutyl)butanamide (1).
    Type: Application
    Filed: May 24, 2022
    Publication date: December 29, 2022
    Inventors: Takeshi Kinsho, Yusuke Nagae, Shogo Tsukaguchi, Yasuhiko Kutsuwada, Tatsuya Hojo, Takeru Watanabe
  • Patent number: 11500292
    Abstract: An object of the present invention is to provide: a compound containing an imide group which is not only cured under film formation conditions of inert gas as well as air and has excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but can also form an organic underlayer film with favorable adhesion to a substrate, and a material for forming an organic film containing the compound.
    Type: Grant
    Filed: April 16, 2020
    Date of Patent: November 15, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Kori, Keisuke Niida, Takashi Sawamura, Seiichiro Tachibana, Takeru Watanabe, Tsutomu Ogihara
  • Patent number: 11492337
    Abstract: An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: November 8, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Ryosuke Taniguchi, Takeru Watanabe, Yoshinori Matsui
  • Publication number: 20220234983
    Abstract: The present invention relates to a process for preparing a (1S,2R)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound of the following general formula (S,R)-(2), wherein R1 represents a monovalent hydrocarbon group having 1 to 6 carbon atoms, and a bold wedged bond represents the absolute configuration, and a (1R,2S)-(2-acetoxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound of the following general formula (R,S)-(3), wherein R1 is as defined above, a hashed wedged bond represents the absolute configuration, and Ac represents an acetyl group, the process comprising: subjecting a (1RS,2SR)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound of the following general formula (RS,SR)-(2), wherein R1 is as defined above, and a hashed unwedged bond represents a relative configuration, to a kinetic resolution reaction with a lipase in the presence of vinyl acetate to obtain the (1S,2R)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl carboxylate compound ((S,R)-(2)
    Type: Application
    Filed: January 21, 2022
    Publication date: July 28, 2022
    Inventors: Tomohiro Watanabe, Takeshi Kinsho, Takeru Watanabe, Miyoshi Yamashita, Yusuke Nagae