Patents by Inventor Takuya Abe

Takuya Abe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230157942
    Abstract: The present invention is a cosmetic containing a silicone resin whose constitutional units consist of general formulae (A) (R13SiO1/2)a, (B) (R22SiO2/2)b, (C) (R3SiO3/2) c, and (D) (SiO4/2) d, where R1, R2, and R3 each independently represent a group selected from an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 12 carbon atoms, and a fluorine-substituted alkyl group having 1 to 8 carbon atoms, “a” has a value of 0.2 to 0.5, “b” has a value of 0.0 to 0.1, “c” has a value of 0.2 to 0.6, “d” has a value of 0.2 to 0.5, a+b+c+d has a value of 1.0, a/(c+d) has a value of 0.3 to 0.9, and c/d has a value of 0.4 to 3.0, the silicone resin having a weight-average molecular weight of more than 20000 and 100000 or less. An object of the present invention is to provide accordingly a cosmetic that has no stickiness upon application, has excellent cosmetic durability, and can prevent adhesion to clothes or the like (secondary adhesion).
    Type: Application
    Filed: December 10, 2020
    Publication date: May 25, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takuya ABE, Masanao KAMEI
  • Publication number: 20230149290
    Abstract: A microemulsion composition containing: (A) a polyether-modified organopolysiloxane shown in the following general formula (1) having an HLB of 8.0 or more calculated by Griffin's method; (B) a polyether-modified organopolysiloxane shown in the following general formula (7) having an HLB of 5.0 or less calculated by Griffin's method; (C) a glycerol derivative shown in the following general formula (8); (D) a polyhydric alcohol other than the (C); (E) a silicone oil having a kinematic viscosity of 20 mm2/s or less at 25° C.; and (F) water, where a ratio (A)/(B) of a mass of the (A) to a mass of the (B) satisfies 1.0 to 15.0 and the microemulsion composition has a transparent to translucent appearance at 25° C. This provides a microemulsion composition having a transparent to translucent appearance.
    Type: Application
    Filed: February 10, 2021
    Publication date: May 18, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Takuya ABE
  • Publication number: 20230132674
    Abstract: An object of the present disclosure is to enable an ONU to acquire ID information of terminal devices even when a network device is connected between the ONU and the terminal devices, and to thereby enable generation of a logical path between the ONU and the OLT. The present disclosure relates to an optical communication network system configured to connect terminal devices and a passive optical network (PON) system via a network device. The PON system includes an optical line terminal and an optical network unit connected using an optical transmission line. The optical network unit is configured to construct a tunnel to the network device, acquire ID information of the terminal devices connected to the network device from the terminal devices via the tunnel, and generates a logical path to the optical line terminal on the optical transmission line using the acquired ID information.
    Type: Application
    Filed: March 31, 2020
    Publication date: May 4, 2023
    Applicant: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Takuya ABE, Satoshi NARIKAWA, Tomohiko IKEDA
  • Publication number: 20230122395
    Abstract: An object of the present disclosure is to enable an ONU to acquire ID information of terminal devices even when a network device is connected between the ONU and the terminal devices, and to thereby enable generation of a logical path between the ONU and the OLT. The present disclosure relates to an optical communication network system configured to connect a terminal device and a passive optical network (PON) system via a network device. The PON system includes an optical line terminal and an optical network unit connected using an optical transmission line. The network device is configured to acquire ID information of the terminal device, and notify the optical network unit of the acquired ID information. The optical network unit is configured to acquire ID information of the terminal device from the network device, and generate a logical path to the optical line terminal on the optical transmission line using the acquired ID information.
    Type: Application
    Filed: March 31, 2020
    Publication date: April 20, 2023
    Applicant: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Takuya ABE, Satoshi NARIKAWA, Tomohiko IKEDA
  • Publication number: 20230025050
    Abstract: The present invention has an object to provide an uplink band allocation apparatus and an uplink band allocation method that are capable of setting an uplink band of a PON in accordance with an application. The uplink band allocation apparatus and method according to the present invention collect not only the amount of the data accumulated in an ONU but also the information of the application (application information) used on a terminal apparatus. Then, the uplink band allocation apparatus and method according to the present invention reflect, on a DBA conducted by the OLT, information of a band and a delay (band delay information) that have been calculated by an application information acquisition server from the application information and that are demanded by the application.
    Type: Application
    Filed: January 7, 2020
    Publication date: January 26, 2023
    Inventors: Takuya Abe, Tomohiko Ikeda, Satoshi Narikawa
  • Publication number: 20220417625
    Abstract: An object of the present disclosure is to enable each ONU to generate a plurality of logical paths corresponding to the number of terminal devices connected to the ONU without setting a plurality of MAC addresses in each ONU.
    Type: Application
    Filed: November 26, 2019
    Publication date: December 29, 2022
    Applicant: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Takuya ABE, Satoshi NARIKAWA, Tomohiko IKEDA
  • Publication number: 20220387265
    Abstract: A water-dispersion emulsion composition containing: (A) an anionic surfactant; (B) an organopolysiloxane having at least two hydrosilyl groups in one molecule thereof shown in formula (I); (C) an organopolysiloxane having at least two olefinic unsaturated groups in one molecule thereof shown in formula (II); (D) a monohydric or polyhydric alcohol; and (E) water, where the water-dispersion emulsion composition has a milky-white appearance at 25° C. and has emulsion particles that are spherical particles having an average particle size of 2.0 ?m or less. This provides: a water-dispersion emulsion composition that gives a cosmetic having reduced stickiness, excellent feeling on use, refreshing feeling, and temporal stability, and particularly excellent cosmetic sustainability, abrasion resistance, and soft focus effect; an emulsion addition-cured composition obtained by addition-curing the same; and a cosmetic formulated with the emulsion addition-cured composition.
    Type: Application
    Filed: September 10, 2020
    Publication date: December 8, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Takuya ABE
  • Patent number: 11389389
    Abstract: A cosmetic including at least one cyclic silicone represented by formula (1), and having a boiling point of 205 to 255° C. and a viscosity of less than 5 mm2/s (25° C.). This cosmetic has a light touch, a good spread, and excellent water repellency, forms a uniform cosmetic film, can achieve a feeling of use without a strong oily feeling, and has stability over time and cosmetic persistence when a variety of oil such as a silicone, hydrocarbon oil, and ester, an organic ultraviolet absorber, or an oily component being solid at 25° C. is mixed. (Wherein R1 is a monovalent hydrocarbon group having 2 or 3 carbon atoms, R2, R3, R4, R5, and R6 are each independently a monovalent hydrocarbon group having 1 to 3 carbon atoms, “a” is a positive number satisfying 0<a<4, and “b” and “c” are each independently a number of 0 to 3, provided that (a+b+c)?4.
    Type: Grant
    Filed: June 22, 2018
    Date of Patent: July 19, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masanao Kamei, Tomoya Kanai, Takuya Abe, Ryuichi Inaba, Tsuneo Kimura
  • Publication number: 20220062121
    Abstract: A microemulsion composition containing: (A) an anionic surfactant; (B) an organopolysiloxane having at least two hydrosilyl groups in one molecule thereof shown in the following formula (I); (C) an organopolysiloxane having at least two olefinic unsaturated groups in one molecule thereof shown in the following formula (II); (D) a monohydric or polyhydric alcohol; and (E) water, where the microemulsion composition has a transparent or translucent appearance at 25° C. This provides a microemulsion composition having a transparent or translucent appearance when an organopolysiloxane having reactive functional groups such as hydrosilyl groups and olefinic unsaturated groups is used for an oil phase.
    Type: Application
    Filed: November 11, 2019
    Publication date: March 3, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Takuya ABE
  • Patent number: 11214652
    Abstract: This organic group-modified organosilicon resin is represented by the average composition formula (1). (R13SiO1/2)a(R23SiO1/2)b(R33SiO1/2)c(R12SiO2/2)d(R1SiO3/2)e(SiO4/2)f??(1) [a, b, c, d, e and f are numbers that satisfy 0?a?400, 0<b?200, 0?c?400, 0?d?320, 0?e?320, 0<f?1,000, and 0.5?(a+b+c)/f?1.5.] Because this organic group-modified organosilicon resin can form films softer than those formed with trimethylene siloxysilicate, the cosmetic obtained by blending with said silicon resin feels good when used, has good cosmetic holding properties, spreads easily and has an excellent finish, easy removal, and superior scratch resistance.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: January 4, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takuya Abe, Masayuki Konishi, Chihiro Hayakawa, Masanao Kamei
  • Patent number: 11174362
    Abstract: A method of producing a film-attached resin base may include supplying a surface treatment gas including at least fluorine gas to a resin base including reinforcing fibers so that embrittled regions are formed in a surface of the resin base and the reinforcing fiber present near the surface of the resin base is modified at least partially; removing at least the embrittled regions so that an uneven surface is formed on the resin base and the reinforcing fiber is at least partially exposed in the uneven surface; and forming a film onto the uneven surface of the resin base.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: November 16, 2021
    Assignee: YKK Corporation
    Inventor: Takuya Abe
  • Patent number: 11160748
    Abstract: A non-rinse-off hair protective cosmetic including a polyoxyalkylene-modified organopolysiloxane compound which has: a terminal to which a siloxane chain having a polyoxyalkylene group shown by a formula (1) is bonded; 50 or more structural units shown by a formula (2) per molecule; a viscosity of 50,000 mPa·s or more at 25° C.; and an HLB of 1 to 7, where each R1 represents an alkyl group or a phenyl group; A represents a monovalent group having a polyoxyalkylene group shown by a formula (3) or (4). Thus, a non-rinse-off hair protective cosmetic excellent in hair protection performance, resistant to water, but easily removable with a shampoo or the like after use.
    Type: Grant
    Filed: October 18, 2018
    Date of Patent: November 2, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Koji Sakuta, Takuya Abe
  • Patent number: 11127597
    Abstract: There is provided an etching method including: a step of disposing a substrate in a chamber, the substrate having a silicon nitride film, a silicon oxide film, a silicon, and a silicon germanium; a step of setting a pressure in the chamber to 1,333 Pa or more; and a step of selectively etching the silicon nitride film with respect to the silicon oxide film, the silicon, and the silicon germanium by supplying a hydrogen fluoride gas into the chamber.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: September 21, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Reiko Sasahara, Satoshi Toda, Takuya Abe, Tsuhung Huang, Yoshie Ozawa, Ken Nakagomi, Kenichi Nakahata, Kenshiro Asahi
  • Publication number: 20210277187
    Abstract: An object is to provide a crosslinked organosilicone resin which has a crosslinked structure formed by reacting a silicone or hydrocarbon having an alkenyl group at both ends thereof with a hydrosilyl group-containing organosilicone resin, is soluble with a liquid oil at room temperature, and forms a film by volatilization of the oil, and to provide a method for preparing the same and cosmetics containing the crosslinked organosilicone resin.
    Type: Application
    Filed: July 9, 2019
    Publication date: September 9, 2021
    Inventors: Takuya Abe, Masayuki Konishi, Chihiro Hayakawa
  • Patent number: 11086350
    Abstract: An input apparatus includes an operation member supported movably in accordance with a plurality of sections set on a two-dimensional plane, a section detection section configured to detect a section in which the operation member is located, a determination operation detection section configured to detect a determination operation performed using the operation member, and an execution section configured to perform a process corresponding to the section in which the operation member is located on the basis of the section detected by the section detection section and the determination operation detected by the determination operation detection section. The determination operation is movement of the operation member in a determination direction (y1 direction), which is a direction parallel to the two-dimensional plane.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: August 10, 2021
    Assignee: Alps Alpine Co., Ltd.
    Inventors: Hiroshi Wakuda, Takeshi Shirasaka, Takuya Abe
  • Patent number: 11024514
    Abstract: There is provided an etching method including: loading a substrate having a recess and an etching target portion existing on an inner surface of the recess into a processing container, the etching target portion being made of SiN or Si; preferentially modifying a surface of the etching target portion at a top portion of the recess by performing an oxygen-containing plasma process on the substrate inside the processing container; and subsequently, dry-etching the etching target portion in an isotropic manner.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: June 1, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takuya Abe, Hidenori Miyoshi, Akitaka Shimizu, Koichi Nagakura
  • Patent number: D927099
    Type: Grant
    Filed: January 28, 2020
    Date of Patent: August 3, 2021
    Assignee: IRIS OHYAMA INC.
    Inventors: Takuya Abe, Masayuki Miyawaki, Hideki Yamamoto
  • Patent number: D927100
    Type: Grant
    Filed: January 28, 2020
    Date of Patent: August 3, 2021
    Assignee: IRIS OHYAMA INC.
    Inventors: Takuya Abe, Masayuki Miyawaki
  • Patent number: D941758
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: January 25, 2022
    Assignee: IRIS OHYAMA INC.
    Inventor: Takuya Abe
  • Patent number: D951568
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: May 10, 2022
    Assignee: IRIS OHYAMA INC.
    Inventor: Takuya Abe