Patents by Inventor Takuya Abe

Takuya Abe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11024514
    Abstract: There is provided an etching method including: loading a substrate having a recess and an etching target portion existing on an inner surface of the recess into a processing container, the etching target portion being made of SiN or Si; preferentially modifying a surface of the etching target portion at a top portion of the recess by performing an oxygen-containing plasma process on the substrate inside the processing container; and subsequently, dry-etching the etching target portion in an isotropic manner.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: June 1, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takuya Abe, Hidenori Miyoshi, Akitaka Shimizu, Koichi Nagakura
  • Patent number: 11007127
    Abstract: The present invention provides a bicontinuous microemulsion composition, including: (A) polyglycerin group-containing organo(poly)siloxane shown by the general formula (1): wherein R1 represents an alkyl group or a phenyl group, R2 represents a group having a polyglycerin structure shown by the formula (2) or the formula (3), R3 represents R1 or R2, “a” is 0 to 6, “b” is 0 to 4, a+b is 0 to 10, and at least one of R3 is R2 when “b” is 0: wherein R4 represents an alkylene group or an aralkylene group, “c” is 0 to 10, and “d” is 2 to 6; (B) silicone oil having a viscosity of 20 mm2/s or less at 25° C., volatile hydrocarbon oil, or ester oil; and (C) water. This provide a transparent bicontinuous microemulsion composition in which anionic or cationic surfactant, and water-soluble monovalent or polyvalent alcohol are unnecessary; and a cosmetic with excellent pleasantness of use.
    Type: Grant
    Filed: November 13, 2018
    Date of Patent: May 18, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Koji Sakuta, Takuya Abe
  • Patent number: 10984760
    Abstract: Provided is a musical instrument including a vibratable body; and a vibrator. The vibrator includes a vibrating body that vibrates in a predetermined direction; and a coupling member coupling the vibrating body and the vibratable body and that transmits vibration of the vibrating body to the vibratable body. The coupling member includes a shaft extending between the vibrating body and the vibratable body; a first wire rod coupling one end portion of the shaft and the vibrating body; and a second wire rod coupling another end portion of the shaft and the vibratable body. A resonance frequency of each of the shaft, the first wire rod, and the second wire rod is at least 10 kHz.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: April 20, 2021
    Assignee: YAMAHA CORPORATION
    Inventors: Banri Abe, Masatsugu Okazaki, Ichiro Osuga, Shinji Sumino, Takuya Abe, Takashi Kitagawa
  • Patent number: 10930445
    Abstract: A rotary operating device includes an operation part that is rotatable according to an operation by an operator, a rotation angle sensor that detects a rotation angle of the operation part, a torque applier that applies application torque to the operation part along a rotation direction of the operation part, a frictional force applier that applies a frictional force to the operation part, and a processor programmed to change the application torque and the frictional force according to the rotation angle.
    Type: Grant
    Filed: July 8, 2019
    Date of Patent: February 23, 2021
    Assignee: ALPS ALPINE CO., LTD.
    Inventors: I Ka, Hiroshi Wakuda, Takuya Abe
  • Patent number: 10891923
    Abstract: A vibrator includes: a movable portion connected to a vibratable member; a driver configured to drive the movable portion to cause vibration of the movable portion to vibrate the vibratable member; and a driver supporter secured to a support member and configured to support the driver such that the driver is pivotable about an axis extending in a direction intersecting a movable direction of the movable portion.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: January 12, 2021
    Assignee: YAMAHA CORPORATION
    Inventors: Masatsugu Okazaki, Ichiro Osuga, Banri Abe, Shinji Sumino, Takashi Kitagawa, Takuya Abe
  • Patent number: 10870734
    Abstract: A production method for an organopolysiloxane emulsion composition, wherein (I) an emulsion composition is prepared from an organopolysiloxane (A) that is represented by formula (1) and that has an octamethylcyclotetrasiloxane content of 1,000 ppm or less HO(R12SiO)nH??(1), (wherein R1 is H or a monovalent hydrocarbon group and n is a number that makes the viscosity, at 25° C., of the organopolysiloxane 200 mm2/s or more but less than 2,000 mm2/s), a surfactant (B) that is represented by formula (2) and that has an alkyl naphthalene skeleton R2a—C10H(7-a)—SO3M??(2), (wherein R2 is an alkyl group, M is H+, an alkali metal ion, an alkali earth metal ion, NH4+, or a tertiary NH4+, and m is 1-3), and water (C-1), and wherein (II) water (C-2) is added as necessary and then emulsion polymerization is performed in the presence of an acid catalyst (D).
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: December 22, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Akihiro Kobayashi, Yuko Takada, Takuya Abe
  • Publication number: 20200337984
    Abstract: A non-rinse-off hair protective cosmetic including a polyoxyalkylene-modified organopolysiloxane compound which has: a terminal to which a siloxane chain having a polyoxyalkylene group shown by a formula (1) is bonded; 50 or more structural units shown by a formula (2) per molecule; a viscosity of 50,000 mPa·s or more at 25° C.; and an HLB of 1 to 7, where each R1 represents an alkyl group or a phenyl group; A represents a monovalent group having a polyoxyalkylene group shown by a formula (3) or (4). Thus, a non-rinse-off hair protective cosmetic excellent in hair protection performance, resistant to water, but easily removable with a shampoo or the like after use.
    Type: Application
    Filed: October 18, 2018
    Publication date: October 29, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Koji SAKUTA, Takuya ABE
  • Publication number: 20200332065
    Abstract: This organic group-modified organosilicon resin is represented by the average composition formula (1). (R13SiO1/2)a(R23SiO1/2)b(R33SiO1/2)c(R1SiO2/2)d(R1SiO3/2)e(SiO4/2)f ??(1) [a, b, c, d, e and f are numbers that satisfy 0?a?400, 0<b?200, 0?c?400, 0?d?320, 0?e?320, 0<f?1,000, and 0.5?(a+b+c)/f?1.5.] Because this organic group-modified organosilicon resin can form films softer than those formed with trimethylene siloxysilicate, the cosmetic obtained by blending with said silicon resin feels good when used, has good cosmetic holding properties, spreads easily and has an excellent finish, easy removal, and superior scratch resistance.
    Type: Application
    Filed: November 29, 2018
    Publication date: October 22, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takuya ABE, Masayuki KONISHI, Chihiro HAYAKAWA, Masanao KAMEI
  • Publication number: 20200246246
    Abstract: A cosmetic including at least one cyclic silicone represented by formula (1), and having a boiling point of 205 to 255° C. and a viscosity of less than 5 mm2/s (25° C.). This cosmetic has a light touch, a good spread, and excellent water repellency, forms a uniform cosmetic film, can achieve a feeling of use without a strong oily feeling, and has stability over time and cosmetic persistence when a variety of oil such as a silicone, hydrocarbon oil, and ester, an organic ultraviolet absorber, or an oily component being solid at 25° C. is mixed. (Wherein R1 is a monovalent hydrocarbon group having 2 or 3 carbon atoms, R2, R3, R4, R5, and R6 are each independently a monovalent hydrocarbon group having 1 to 3 carbon atoms, “a” is a positive number satisfying 0<a<4, and “b” and “c” are each independently a number of 0 to 3, provided that (a+b+c) <4.
    Type: Application
    Filed: June 22, 2018
    Publication date: August 6, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masanao KAMEI, Tomoya KANAI, Takuya ABE, Ryuichi INABA, Tsuneo KIMURA
  • Publication number: 20200184935
    Abstract: Provided is a musical instrument including a vibratable body; and a vibrator. The vibrator includes a vibrating body that vibrates in a predetermined direction; and a coupling member coupling the vibrating body and the vibratable body and that transmits vibration of the vibrating body to the vibratable body. The coupling member includes a shaft extending between the vibrating body and the vibratable body; a first wire rod coupling one end portion of the shaft and the vibrating body; and a second wire rod coupling another end portion of the shaft and the vibratable body. A resonance frequency of each of the shaft, the first wire rod, and the second wire rod is at least 10 kHz.
    Type: Application
    Filed: February 14, 2020
    Publication date: June 11, 2020
    Inventors: Banri ABE, Masatsugu OKAZAKI, Ichiro OSUGA, Shinji SUMINO, Takuya ABE, Takashi KITAGAWA
  • Publication number: 20200152160
    Abstract: A vibrator includes: a movable portion connected to a vibratable member; a driver configured to drive the movable portion to cause vibration of the movable portion to vibrate the vibratable member; and a driver supporter secured to a support member and configured to support the driver such that the driver is pivotable about an axis extending in a direction intersecting a movable direction of the movable portion.
    Type: Application
    Filed: November 6, 2019
    Publication date: May 14, 2020
    Inventors: Masatsugu OKAZAKI, Ichiro OSUGA, Banri ABE, Shinji SUMINO, Takashi KITAGAWA, Takuya ABE
  • Publication number: 20200125132
    Abstract: An input apparatus includes an operation member supported movably in accordance with a plurality of sections set on a two-dimensional plane, a section detection section configured to detect a section in which the operation member is located, a determination operation detection section configured to detect a determination operation performed using the operation member, and an execution section configured to perform a process corresponding to the section in which the operation member is located on the basis of the section detected by the section detection section and the determination operation detected by the determination operation detection section. The determination operation is movement of the operation member in a determination direction (y1 direction), which is a direction parallel to the two-dimensional plane.
    Type: Application
    Filed: December 18, 2019
    Publication date: April 23, 2020
    Inventors: Hiroshi Wakuda, Takeshi Shirasaka, Takuya Abe
  • Patent number: 10626222
    Abstract: An organic group-modified organosilicon resin having the average compositional formula (1), which is solid or liquid at 25° C., is suited for use in cosmetics. The resin is able to form an emulsion having a pleasant feel on use, a high internal water phase, and stability over time. In formula (1), a, b, c, d, e, and f are numbers: 0?a?400, 0<b?200, 0?c?400, 0?d?320, 0?e?320, 0<f?1,000, and 0.5?(a+b+c)/f?1.5.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: April 21, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takuya Abe, Masayuki Konishi, Chihiro Hayakawa, Masanao Kamei
  • Patent number: 10622205
    Abstract: There is provided a substrate processing method for removing an oxide film formed on a surface of a substrate. The method includes (a) transforming the oxide film into a reaction by-product by supplying a halogen element-containing gas and a basic gas to the substrate accommodated in a processing chamber; and (b) sublimating the reaction by-product to remove the reaction by-product from the substrate by stopping the supply of the halogen element-containing gas into the processing chamber and supplying an inert gas into the processing chamber. The steps (a) and (b) are repeated a plurality of times.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: April 14, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Hiroyuki Takahashi, Tomoaki Ogiwara, Takuya Abe, Masahiko Tomita, Jiro Katsuki
  • Publication number: 20200111674
    Abstract: There is provided an etching method including: a step of disposing a substrate in a chamber, the substrate having a silicon nitride film, a silicon oxide film, a silicon, and a silicon germanium; a step of setting a pressure in the chamber to 1,333 Pa or more; and a step of selectively etching the silicon nitride film with respect to the silicon oxide film, the silicon, and the silicon germanium by supplying a hydrogen fluoride gas into the chamber.
    Type: Application
    Filed: March 28, 2018
    Publication date: April 9, 2020
    Inventors: Reiko SASAHARA, Satoshi TODA, Takuya ABE, Tsuhung HUANG, Yoshie OZAWA, Ken NAKAGOMI, Kenichi NAKAHATA, Kenshiro ASAHI
  • Patent number: 10590242
    Abstract: A method for producing a hydrosilyl group-containing organic silicon resin of formula (6) in a solid form, wherein after formulae (1) to (3) are hydrolyzed in the presence of an acid catalyst, hydrolysis is carried out by adding hydrosilyl group-containing organic silicon compounds of formulae (4) and (5), followed by neutralization by a base catalyst with the amount thereof being more than a molar equivalent of the acid catalyst, and then by condensation. By so doing, deactivation amount of the hydrosilyl group can be reduced, so that the method for producing the hydrosilyl group-containing organic silicon resin, which is in a solid form without a solvent and to which a hydrosilyl group can be introduced quantitatively and in a large quantity, is provided, R13SiOSiR13??(1) R13SiX1??(2) SiX24??(3) HnR23-nSiOSiR23-nHn??(4) HnR23-nSiX3??(5) (R13SiO1/2)a(HnR23-nSiO1/2)b(SiO2)c(R4SiO3/2)d??(6).
    Type: Grant
    Filed: September 14, 2016
    Date of Patent: March 17, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takuya Abe, Hiroomi Iyoku, Masanao Kamei, Yoshinori Takamatsu
  • Publication number: 20200035504
    Abstract: There is provided an etching method including: loading a substrate having a recess and an etching target portion existing on an inner surface of the recess into a processing container, the etching target portion being made of SiN or Si; preferentially modifying a surface of the etching target portion at a top portion of the recess by performing an oxygen-containing plasma process on the substrate inside the processing container; and subsequently, dry-etching the etching target portion in an isotropic manner.
    Type: Application
    Filed: July 26, 2019
    Publication date: January 30, 2020
    Inventors: Takuya ABE, Hidenori MIYOSHI, Akitaka SHIMIZU, Koichi NAGAKURA
  • Publication number: 20190333720
    Abstract: A rotary operating device includes an operation part that is rotatable according to an operation by an operator, a rotation angle sensor that detects a rotation angle of the operation part, a torque applier that applies application torque to the operation part along a rotation direction of the operation part, a frictional force applier that applies a frictional force to the operation part, and a processor programmed to change the application torque and the frictional force according to the rotation angle.
    Type: Application
    Filed: July 8, 2019
    Publication date: October 31, 2019
    Inventors: I KA, Hiroshi WAKUDA, Takuya ABE
  • Publication number: 20190181015
    Abstract: A substrate processing method for removing an oxide film formed on the surface of a substrate includes modifying the oxide film into a reaction product by supplying a halogen element-containing gas and an alkaline gas onto the substrate accommodated in the interior of a processing chamber, and sublimating the reaction product by stopping the supply of the halogen element-containing gas into the processing chamber for removal from the substrate, wherein an internal pressure of the processing chamber in the sublimating is set to be higher than an internal pressure of the processing chamber in the modifying by supplying an inert gas into the processing chamber.
    Type: Application
    Filed: February 14, 2019
    Publication date: June 13, 2019
    Inventors: Tomoaki OGIWARA, Hiroyuki TAKAHASHI, Takuya ABE, Masahiko TOMITA, Shinya IWASHITA
  • Patent number: D872396
    Type: Grant
    Filed: October 10, 2018
    Date of Patent: January 7, 2020
    Assignee: IRIS OHYAMA INC.
    Inventors: Masayuki Miyawaki, Shohei Tokoi, Takuya Abe