Abstract: A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract: A bread packaging apparatus for packaging bread in a bag, includes a first urging unit that comes into contact with a loaf of bread and conveys the loaf of bread along a conveying path; and a control unit for controlling a speed of the first urging unit. The control unit controls the speed of the first urging unit such that the speed when the first urging unit comes into contact with the loaf of bread is different from the speed when the first urging unit conveys the loaf of bread.

Abstract: A laser device, which includes an oscillator unit having a rectangular-solid-shaped housing containing a laser oscillator for generating and outputting a laser light; an amplifier unit having a rectangular-solid-shaped housing containing an amplifier that receives and amplifies the laser light to output; and, a group of optical elements including optical elements provided on a laser light path, wherein the laser device includes one or more amplifier units, and the oscillator and the amplifier units are arranged such that surfaces having a wide area other than a surface having a smallest area of a housing of the oscillator unit and a housing of at least one amplifier unit are next to and face each other, or such that surfaces having a wide area other than a surface having a smallest area of a housing of at least two amplifier units are next to and face each other.

Abstract: A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.

Abstract: A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

Abstract: A device for determining a target generation condition for a target generator which is driven by a pulse voltage to generate a droplet of a target material may include a detector configured to detect a target generated by the target generator and output a detection signal of the target, and a controller configured to control a pulse duration of the pulse voltage for driving the target generator. The controller can determine whether or not a target is generated by the target generator based on the detection signal, and determine whether or not the generated target includes a plurality of droplets based on the detection signal.

Abstract: An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.

Abstract: An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.

Abstract: An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical eleme

Abstract: A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

Abstract: An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.

Abstract: In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.