Abstract: A method of forming a multifunction solar cell including an upper subcell, a middle subcell, and a lower subcell by providing a substrate for the epitaxial growth of semiconductor material; forming a first solar subcell on the substrate having a first band gap; forming a second solar subcell over the first solar subcell having a second band gap smaller than the first band gap; forming a graded interlayer over the second subcell, the graded interlayer having a third band gap greater than the second band gap; forming a third solar subcell over the graded interlayer having a fourth band gap smaller than the second band gap such that the third subcell is lattice mismatched with respect to the second subcell; and forming a contact composed of a sequence of layers over the first subcell at a temperature of 280° C. or less and having a contact resistance of less than 5×10?4 ohms-cm2.

Abstract: A multijunction solar cell including an upper first solar subcell having a first band gap; a middle second solar subcell adjacent to the first solar subcell and having a second band gap smaller than the first band gap and having a base layer and an adjacent emitter layer, wherein the other layer adjacent to the emitter layer has an index of refraction substantially equal to that of the emitter layer; a graded interlayer adjacent to the second solar having a third band gap greater than said second band gap; and a lower solar subcell adjacent to the interlayer, and having a fourth band gap smaller than the second band gap, the third subcell being lattice mismatched with respect to the second subcell.

Abstract: A method of forming a multijunction solar cell including an upper subcell, a middle subcell, and a lower subcell, the method including: providing first substrate for the epitaxial growth of semiconductor material; forming a first solar subcell on the substrate having a first band gap; forming a second solar subcell over the first solar subcell having a second band gap smaller than the first band gap; forming a barrier layer over the second subcell to reduce threading dislocations; forming a grading interlayer over the barrier layer, the grading interlayer having a third band gap greater than the second band gap; and forming a third solar subcell over the grading interlayer having a fourth band gap smaller than the second band gap such that the third subcell is lattice mismatched with respect to the second subcell.

Abstract: A multijunction solar cell including a first solar subcell having a first band gap; a second solar subcell disposed over the first subcell and having a second band gap smaller than the first band gap; a grading interlayer disposed over the second subcell and having a third band gap greater than the second band gap; a third solar subcell disposed over the interlayer that is lattice mismatched with respect to the middle subcell and having a fourth band gap smaller than the second band gap; and either a thin (approximately 2-6 mil) substrate and/or a rigid coverglass supporting the first, second, and third solar subcells.

Abstract: A method of forming a thin multifunction solar cell in which an electroplating process is used to form a thick metal layer to give strength and support to the solar cell. The strain of the plated thick metal layer is adjusted during the process by parameter control to compensate for the strain in the other device layers, so that the curvature of the thin device can be eliminated or otherwise controlled.

Abstract: A method of manufacturing a solar cell on a flexible film by providing a substrate; depositing on the substrate a sequence of layers of semiconductor material forming a solar cell; mounting the semiconductor substrate on a flexible film; and thinning the semiconductor substrate to a predetermined thickness. The sequence of layers forms an inverted metamorphic solar cell structure.

Abstract: A semiconductor laser device with a first side and a second side, comprising (a) an active region, (b) a P layer, wherein the P layer contains a first contact area, (c) an N layer, wherein said N layer contains a second contact area, wherein the contact area of the first contact area of the P layer and the second contact layer of the N layer reside on the first side of the laser device.

Abstract: A semiconductor laser device with a first side and a second side, comprising (a) an active region, (b) a P layer, wherein the P layer contains a first contact area, (c) an N layer, wherein said N layer contains a second contact area, wherein the contact area of the first contact area of the P layer and the second contact layer of the N layer reside on the first side of the laser device.