Abstract: A liquid crystal (LC) injection device is disclosed in the present invention and includes an LC container, a transporting pipe, a filter and an LC extractor. An inner wall of a bottom in the LC container is a concave shape. The transporting pipe is disposed within the LC container and contacted the inner wall of the bottom in the LC container. The present invention also discloses an LC container. The present invention is to increase the utilization efficiency of the LC container, decrease the LCs waste and enhance the accuracy of the measurement of the remaining LC quantity in the LC bottle.

Abstract: The present invention discloses an apparatus for baking a glass substrate, which includes: a baking oven, a support component, a temperature sensing device, a heating device, a cooling device, and a temperature controlling device. The present invention further discloses a method for baking a glass substrate. The present invention is capable of dynamically controlling the temperature of the support component, which contacts the glass substrate. The temperature of the glass substrate keeps identical and the temperature of the support component keep identical, so as to prevent a Mura defect appearing on the glass substrate.

Abstract: Provided is a parallelism measuring system and a method thereof, wherein the system includes a measured module, which includes a measured unit; a reference unit; and an optical measuring unit including an optical measuring module and a shift module. A lower surface of the measured unit is a measured surface and an upper surface of the reference is a reference surface. The optical measuring module includes a light source unit, a reflecting unit, and a sensing unit. A collimated beam is emitted from the light source unit and sequentially reflected by the measured surface, the reflecting unit and the reference surface to the sensing unit. The sensing unit senses location of the collimated beam and thereby calculates interval distance between the measured surface and the reference surface. By using the shift module to move the optical measuring module, the interval distance between different points may be measured.

Abstract: The present invention provides a liquid crystal substrate cutting device used for cutting a liquid crystal substrate along a cutting line, and the liquid crystal substrate cutting device comprises a heating unit and a cutter unit. The heating unit moves along the cutting line and heats the liquid crystal substrate to soften a sealant covered on the cutting line, and the cutter unit moves along the cutting line to further cut the liquid crystal substrate. The present invention comprises the heating unit for heating the liquid crystal substrate along the cutting line to soften the sealant covered on the cutting line such that the cutter unit can precisely cut the liquid crystal substrate without abnormity of the feeding distance of the cutter unit which cause the liquid crystal substrate to break. Therefore, the scrap-rate is reduced.

Abstract: The present invention provides a liquid crystal display module configured with a color filter substrate, a TFT substrate, a layer of liquid crystal, and a sealant. The TFT substrate and the color filter substrate are arranged opposite to each other and the sealant is used to confine the layer of liquid crystal within the space defined between the TFT substrate and the color filter substrate. The color filter substrate includes a first glass substrate, a transparent conductive layer, and a black matrix. Wherein the transparent conductive layer is laminated over the black matrix and defines a recess which is located on a surface facing the layer of liquid crystal of the first glass substrate. The recess is surrounded by the black matrix, and end of the sealant abuts against the recess, and a width of the sealant is smaller than the width of the recess. The present invention further provides a LCD device incorporated with a LCD module as described.

Abstract: The present invention provides a liquid crystal display panel, a method for making the panel, and a liquid crystal display device. The liquid crystal display panel includes a color filter substrate and a thin-film-transistor substrate facing each other. Wherein the thin-film-transistor includes a transfer pad, a first alignment film, and a sealant deploying area. The sealant is arranged between the color filter substrate and the thin-film-transistor substrate and is located at outside of a displaying area of the liquid crystal display panel. The thin-film-transistor includes a transfer pad arranged close to an outer rim of a displaying area and located on an inner surface of the thin-film-transistor substrate.

Abstract: The present invention relates to an ultra slim bezel structure of liquid crystal display device, which includes a TFT surface having an inner face on which a PI film is arranged, a CF surface having an inner face on which a PI film is arranged, a sealant, and a first color resist barrier and a second color resist barrier. The inner faces of the TFT surface and the CF surface are in registration with each other in a vertical direction and edges of the inner faces of the TFT surface and the CF surface are bonded together with the sealant. The first color resist barrier includes a linear color resist barrier that is formed by continuously arranging color resist on the inner face of the TFT surface adjacent to the sealant to extend along the edge of the TFT surface. The second color resist barrier includes a linear color resist barrier that is formed by continuously arranging color resist on the inner face of the CF surface adjacent to the sealant to extend along the edge of the CF surface.

Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC, wherein means are provided for increasing the pressure in the volume.

Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test. A pressure regulator is coupled to a gas source. The GFC is positioned downstream of the pressure regulator. A pressure transducer is measuring pressure in a volume between the pressure regulator and the GFC, wherein means are provided for increasing the pressure in the volume.

Abstract: An apparatus to measure the transient response of a mass flow controller (MFC). The size of a variable orifice, upstream of the MFC, is controlled such that the pressure between the orifice and the MFC is held constant during the entire time that the MFC is going through its transient response. The known relationship between the size of the orifice and the flow through it allows a determination of the transient response of the MFC.

Abstract: A method and apparatus for self-calibrating control of gas flow. The gas flow rate is initially set by controlling, to a high degree of precision, the amount of opening of a flow restriction, where the design of the apparatus containing the flow restriction lends itself to achieving high precision. The gas flow rate is then measured by a pressure rate-of-drop upstream of the flow restriction, and the amount of flow restriction opening is adjusted, if need be, to obtain exactly the desired flow.

Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.

Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.

Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.

Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.