Patents by Inventor Tetsuya Hayashida

Tetsuya Hayashida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma-etching apparatus
    Patent number: 4243506
    Abstract: A "planar" type plasma-etching apparatus wherein one electrode is a metallic mesh electrode, while the other electrode is a metallic plate electrode, and wherein a work piece is placed outside the mesh electrode. This apparatus has the advantage that a work piece having a large area can be etched uniformly over its whole surface.
    Type: Grant
    Filed: August 23, 1979
    Date of Patent: January 6, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Kiyoji Ikeda, Tetsuya Hayashida