Patents by Inventor Tetsuya Matsui

Tetsuya Matsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080015731
    Abstract: A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
    Type: Application
    Filed: September 14, 2007
    Publication date: January 17, 2008
    Inventors: Yoshiaki Ichikawa, Takako Oono, Akira Sekine, Tetsuya Matsui, Kiyomi Funabashi
  • Patent number: 7272465
    Abstract: A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
    Type: Grant
    Filed: September 21, 2005
    Date of Patent: September 18, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiaki Ichikawa, Takako Oono, Akira Sekine, Tetsuya Matsui, Kiyomi Funabashi
  • Patent number: 7235967
    Abstract: An eddy current testing probe has a flexible substrate adapted to face to a surface of a test article, a plurality of coils which are fixed to the flexible substrate and energized one of which is capable of being changed sequentially, a pressing member for pressing the substrate toward the test article, an elastic member arranged between the substrate and the pressing member, and a movement limiting member for limiting a movement of the pressing member toward the test article.
    Type: Grant
    Filed: January 6, 2006
    Date of Patent: June 26, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Akira Nishimizu, Tetsuya Matsui, Masahiro Koike, Yoshio Nonaka, Isao Yoshida
  • Publication number: 20070061044
    Abstract: The present invention provides a method and system for management of chemical materials comprising providing a first data set containing which substances comprise the materials, providing a second data set containing which of the substances are to be controlled, the substances being categorized by a group control number, and providing a third data set containing a ratio of discharge of the controlled substances in a process and analyzing a preset amount of the materials in the process and determining a quantity of the controlled substances utilizing the first and second data sets, and determining an emissions quantity of the controlled substances utilizing the ratio and the quantity of the controlled substances and wherein the group control number is the same for the substances in the same group.
    Type: Application
    Filed: November 15, 2006
    Publication date: March 15, 2007
    Inventors: Akira Sekine, Yoshiaki Ichikawa, Takako Oono, Hirotaka Satou, Tetsuya Matsui
  • Patent number: 7171854
    Abstract: A nondestructive inspection apparatus using a guided wave having waveform forming part that form a transmission waveform; a transmitting element for generating a guided wave within an object under inspection; a receiving element for receiving a reflection wave of the guided wave from an inspection region of the object under inspection; an analyzing element for outputting inspection information which is acquired based upon the reception waveform of the reflection wave received by the receiving element; and a display for displaying the inspection information.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: February 6, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiaki Nagashima, Masahiro Koike, Tetsuya Matsui
  • Patent number: 7151262
    Abstract: To provide a radioactive gas measurement apparatus that is simply constructed and can efficiently measure Xe-133 in a radioactive gas on-line under the condition that the radioactive gas is mixed with interference N-13, an apparatus is provided for measuring a radiation emitted from Xe-133, including an anticoincidence counter circuit 13 that conducts counting if it receives an output of a main detector 1 when it does not receive outputs of scintillation detectors 2 and 9, and a gate circuit 14, a plate-shaped semiconductor detector is used as the main detector 1, and a material not emitting a characteristic X ray in the range from 70 to 90 keV is used for a shielding structure. In particular, the thickness of the semiconductor detector 1 is set to fall within a range from 2 mm to 7 mm, thereby improving the analysis precision.
    Type: Grant
    Filed: June 22, 2004
    Date of Patent: December 19, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Kitaguchi, Atsushi Yamagoshi, Shigeru Izumi, Tetsuya Matsui, Akihisa Kaihara
  • Publication number: 20060278828
    Abstract: To provide a radioactive gas measurement apparatus that is simply constructed and can efficiently measure Xe-133 in a radioactive gas on-line under the condition that the radioactive gas is mixed with interference N-13, an apparatus is provided for measuring a radiation emitted from Xe-133, including an anticoincidence counter circuit 13 that conducts counting if it receives an output of a main detector 1 when it does not receive outputs of scintillation detectors 2 and 9, and a gate circuit 14, a plate-shaped semiconductor detector is used as the main detector 1, and a material not emitting a characteristic X ray in the range from 70 to 90 keV is used for a shielding structure. In particular, the thickness of the semiconductor detector 1 is set to fall within a range from 2 mm to 7 mm, thereby improving the analysis precision.
    Type: Application
    Filed: June 22, 2004
    Publication date: December 14, 2006
    Inventors: Hiroshi Kitaguchi, Atsushi Yamagoshi, Shigeru Izumi, Tetsuya Matsui, Akihisa Kaihara
  • Patent number: 7093490
    Abstract: In order to make it possible in ultrasonic flaw detection to generate ultrasonic waves containing a main beam only by use of an array probe and clearly identify a defect in a specimen by use of images, an element pitch P (the distance between centers of adjacent ultrasonic transducer elements in the array probe) is set longer than ¼ of the wavelength of longitudinal waves generated by the ultrasonic transducer elements and shorter than ½ of the wavelength and reception signals up to time corresponding to the sum of wall thickness round-trip propagation time for longitudinal waves and wall thickness round-trip propagation time for shear waves in the specimen are displayed.
    Type: Grant
    Filed: February 4, 2005
    Date of Patent: August 22, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Naoyuki Kono, Tetsuya Matsui, Masahiro Koike, Masahiro Tooma, Yoshinori Musha, Masahiro Miki
  • Patent number: 7092960
    Abstract: A chemical substance total management system and a chemical substance total management method which can easily manage amounts and release destination of managing substances. The chemical substance total management system includes a material composition database of component composition information of material or product in a form of database, a managing substance database in a form of a list of substance requiring management, for identifying substances constituting the material or product on the basis of the material composition database and identifying substance required management on the basis of the managing substance database for managing chemical substance contained in the material handled by a business entity or product. The system further includes release coefficient database storing weight ratio data in each transfer and release destination per the identified management required substance in a form of database.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: August 15, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Satoshi Ohishi, Yoshiaki Ichikawa, Akira Sekine, Takako Oono, Tetsuya Matsui
  • Publication number: 20060170420
    Abstract: An eddy current testing probe has a flexible substrate adapted to face to a surface of a test article, a plurality of coils which are fixed to the flexible substrate and energized one of which is capable of being changed sequentially, a pressing member for pressing the substrate toward the test article, an elastic member arranged between the substrate and the pressing member, and a movement limiting member for limiting a movement of the pressing member toward the test article.
    Type: Application
    Filed: January 6, 2006
    Publication date: August 3, 2006
    Inventors: Akira Nishimizu, Tetsuya Matsui, Masahiro Koike, Yoshio Nonaka, Isao Yoshida
  • Publication number: 20060015212
    Abstract: A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
    Type: Application
    Filed: September 21, 2005
    Publication date: January 19, 2006
    Inventors: Yoshiaki Ichikawa, Takako Oono, Akira Sekine, Tetsuya Matsui, Kiyomi Funabashi
  • Patent number: 6980883
    Abstract: A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
    Type: Grant
    Filed: July 7, 2004
    Date of Patent: December 27, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiaki Ichikawa, Takako Oono, Akira Sekine, Tetsuya Matsui, Kiyomi Funabashi
  • Patent number: 6957583
    Abstract: An ultrasonic inspection instrument for detecting a crack and performing sizing in the depth direction of the crack. By a transmitter element array and a receiver element array included in a common sensor, focus points between focused acoustic fields are electronically scanned in a range including a location where half the sum of the transmitting angle of ultrasonic waves to an inspection-target material and the receiving angle of diffraction echoes from the inspection-target material is 30 degrees, so that a tip portion of the crack is detected from the received diffraction echoes. Thus, the detectability of the ultrasonic inspection instrument for detecting diffraction waves in a subject to be inspected and performing crack inspection is stabilized and kept high.
    Type: Grant
    Filed: October 30, 2003
    Date of Patent: October 25, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Tooma, Naoyuki Kono, Masahiro Koike, Hirokazu Adachi, Takao Shimura, Makoto Senoo, Tetsuya Matsui
  • Publication number: 20050183505
    Abstract: In order to make it possible in ultrasonic flaw detection to generate ultrasonic waves containing a main beam only by use of an array probe and clearly identify a defect in a specimen by use of images, an element pitch P (the distance between centers of adjacent ultrasonic transducer elements in the array probe) is set longer than ¼ of the wavelength of longitudinal waves generated by the ultrasonic transducer elements and shorter than ½ of the wavelength and reception signals up to time corresponding to the sum of wall thickness round-trip propagation time for longitudinal waves and wall thickness round-trip propagation time for shear waves in the specimen are displayed.
    Type: Application
    Filed: February 4, 2005
    Publication date: August 25, 2005
    Inventors: Naoyuki Kono, Tetsuya Matsui, Masahiro Koike, Masahiro Tooma, Yoshinori Musha, Masahiro Miki
  • Patent number: 6934640
    Abstract: The present invention provides a method and system for management of chemical materials comprising the steps of providing a first data set containing which substances comprise the materials, providing a second data set containing which of the substances are to be controlled, providing a third data set containing a ratio of discharge of the controlled substances in a process, analyzing a preset amount of the materials in the process and determining a quantity of the controlled substances utilizing the first and second data sets, determining an emissions quantity of the controlled substances utilizing the ratio and the quantity of the controlled substances and maintaining the third data set according to a preset interval of time.
    Type: Grant
    Filed: May 17, 2001
    Date of Patent: August 23, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiaki Ichikawa, Akira Sekine, Takako Oono, Hirotaka Satou, Tetsuya Matsui
  • Patent number: 6891476
    Abstract: An electronic exposure dose meter and a radiation handling operation management system is capable of realizing real time exposure management. The radiation handling operation management system has monitoring unit receiving an exposure dose amount measured by an electronic exposure dose meter having a radiation detector, its counter circuit and a PHS transmission and reception antenna, from a plurality of transmission and reception base station installed in a radiation handling operation site through bidirectional communication with a central management section via an external management base station, and deriving position of user of the electronic exposure dose meter for collecting and displaying position and exposure dose amount of the user. The electronic exposure dose meter has a radiation detector, a counter circuit, a PHS antenna for bidirectional communication with a central management section.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: May 10, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Kitaguchi, Tetsuya Matsui, Naoya Fukutsuka, Kouichi Ushiroda, Naoyuki Kono
  • Publication number: 20040255678
    Abstract: A nondestructive apparatus uses a guided wave. The nondestructive apparatus has a waveform forming apparatus for forming a transmission waveform by employing a reference waveform, a transmitting element for generating the guided wave within an object under inspection based upon the transmission waveform, a receiving element for receiving a reflection wave of the guided wave from an inspection region of the object under inspection, an analyzing apparatus for outputting inspection information which is acquired based upon the reception waveform of the reflection wave received by the receiving element, and the display apparatus for displaying the inspection information.
    Type: Application
    Filed: February 19, 2004
    Publication date: December 23, 2004
    Inventors: Yoshiaki Nagashima, Masahiro Koike, Tetsuya Matsui
  • Publication number: 20040260627
    Abstract: A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
    Type: Application
    Filed: July 7, 2004
    Publication date: December 23, 2004
    Inventors: Yoshiaki Ichikawa, Takako Oono, Akira Sekine, Tetsuya Matsui, Kiyomi Funabashi
  • Patent number: 6778877
    Abstract: A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: August 17, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiaki Ichikawa, Takako Oono, Akira Sekine, Tetsuya Matsui, Kiyomi Funabashi
  • Patent number: 6774638
    Abstract: A highly sensitive charged particle measuring device capable of measuring low-level alpha rays comprises in a measurement chamber 7 provided with a sealable door 15, a test sample 2 and a semiconductor detector 1, a radiation measuring circuit 30 including a preamplifier 30c connected to the semiconductor detector 1, a linear amplifier 30d, and a pulse height analyzer 30e, a charged particle emission amount arithmetic unit 40 for performing the quantitative analysis of charged particles from its measurement, a display unit for displaying its analysis result, and further has an evacuation pipe line and a pure gas supply pipe line for performing supply and replacement of the pure gas in the measuring chamber 7.
    Type: Grant
    Filed: March 7, 2003
    Date of Patent: August 10, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Nobuyoshi Kogawa, Hiroshi Kitaguchi, Tetsuya Matsui, Akihisa Kaihara, Junichi Arita