Patents by Inventor Tetsuya Matsui

Tetsuya Matsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040118210
    Abstract: An ultrasonic inspection instrument for detecting a crack and performing sizing in the depth direction of the crack. By a transmitter element array and a receiver element array included in a common sensor, focus points between focused acoustic fields are electronically scanned in a range including a location where half the sum of the transmitting angle of ultrasonic waves to an inspection-target material and the receiving angle of diffraction echoes from the inspection-target material is 30 degrees, so that a tip portion of the crack is detected from the received diffraction echoes. Thus, the detectability of the ultrasonic inspection instrument for detecting diffraction waves in a subject to be inspected and performing crack inspection is stabilized and kept high.
    Type: Application
    Filed: October 30, 2003
    Publication date: June 24, 2004
    Inventors: Masahiro Tooma, Naoyuki Kono, Masahiro Koike, Hirokazu Adachi, Takao Shimura, Makoto Senoo, Tetsuya Matsui
  • Patent number: 6639392
    Abstract: A highly sensitive charged particle measuring device capable of measuring low-level alpha rays comprises in a measurement chamber 7 provided with a sealable door 15, a test sample 2 and a semiconductor detector 1, a radiation measuring circuit 30 including a preamplifier 30c connected to the semiconductor detector 1, a linear amplifier 30d, and a pulse height analyzer 30e, a charged particle emission amount arithmetic unit 40 for performing the quantitative analysis of charged particles from its measurement, a display unit for displaying its analysis result, and further has an evacuation pipe line and a pure gas supply pipe line for performing supply and replacement of the pure gas in the measuring chamber 7.
    Type: Grant
    Filed: February 28, 2002
    Date of Patent: October 28, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Nobuyoshi Kogawa, Hiroshi Kitaguchi, Tetsuya Matsui, Akihisa Kaihara, Junichi Arita
  • Publication number: 20030146760
    Abstract: A highly sensitive charged particle measuring device capable of measuring low-level alpha rays comprises in a measurement chamber 7 provided with a sealable door 15, a test sample 2 and a semiconductor detector 1, a radiation measuring circuit 30 including a preamplifier 30c connected to the semiconductor detector 1, a linear amplifier 30d, and a pulse height analyzer 30e, a charged particle emission amount arithmetic unit 40 for performing the quantitative analysis of charged particles from its measurement, a display unit for displaying its analysis result, and further has an evacuation pipe line and a pure gas supply pipe line for performing supply and replacement of the pure gas in the measuring chamber 7.
    Type: Application
    Filed: March 7, 2003
    Publication date: August 7, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Nobuyoshi Kogawa, Hiroshi Kitaguchi, Tetsuya Matsui, Akihisa Kaihara, Junichi Arita
  • Publication number: 20030030444
    Abstract: A highly sensitive charged particle measuring device capable of measuring low-level alpha rays comprises in a measurement chamber 7 provided with a sealable door 15, a test sample 2 and a semiconductor detector 1, a radiation measuring circuit 30 including a preamplifier 30c connected to the semiconductor detector 1, a linear amplifier 30d, and a pulse height analyzer 30e, a charged particle emission amount arithmetic unit 40 for performing the quantitative analysis of charged particles from its measurement, a display unit for displaying its analysis result, and further has an evacuation pipe line and a pure gas supply pipe line for performing supply and replacement of the pure gas in the measuring chamber 7.
    Type: Application
    Filed: February 28, 2002
    Publication date: February 13, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Nobuyoshi Kogawa, Hiroshi Kitaguchi, Tetsuya Matsui, Akihisa Kaihara, Junichi Arita
  • Publication number: 20020195572
    Abstract: An electronic exposure dose meter and a radiation handling operation management system is capable of realizing real time exposure management. The radiation handling operation management system has monitoring unit receiving an exposure dose amount measured by an electronic exposure dose meter having a radiation detector, its counter circuit and a PHS transmission and reception antenna, from a plurality of transmission and reception base station installed in a radiation handling operation site through bidirectional communication with a central management section via an external management base station, and deriving position of user of the electronic exposure dose meter for collecting and displaying position and exposure dose amount of the user. The electronic exposure dose meter has a radiation detector, a counter circuit, a PHS antenna for bidirectional communication with a central management section.
    Type: Application
    Filed: March 15, 2002
    Publication date: December 26, 2002
    Inventors: Hiroshi Kitaguchi, Tetsuya Matsui, Naoya Fukutsuka, Kouichi Ushiroda, Naoyuki Kono
  • Publication number: 20020180606
    Abstract: An electronic exposure dose meter and a radiation handling operation management system is capable of realizing real time exposure management. The radiation handling operation management system has monitoring unit receiving an exposure dose amount measured by an electronic exposure dose meter having a radiation detector, its counter circuit and a PHS transmission and reception antenna, from a plurality of transmission and reception base station installed in a radiation handling operation site through bidirectional communication with a central management section via an external management base station, and deriving position of user of the electronic exposure dose meter for collecting and displaying position and exposure dose amount of the user. The electronic exposure dose meter has a radiation detector, a counter circuit, a PHS antenna for bidirectional communication with a central management section.
    Type: Application
    Filed: July 23, 2002
    Publication date: December 5, 2002
    Applicant: Hitachi, Ltd.
    Inventors: Hiroshi Kitaguchi, Tetsuya Matsui, Naoya Fukutsuka, Kouichi Ushiroda, Naoyuki Kono
  • Publication number: 20020133302
    Abstract: The problem is providing an environmental performance improvement support system and an environmental performance improvement support method that support to improve effects on the environment due to release of chemical substances.
    Type: Application
    Filed: January 24, 2002
    Publication date: September 19, 2002
    Applicant: Hitachi, Ltd.
    Inventors: Tetsuya Matsui, Kiyomi Funabashi, Yoshiaki Ichikawa, Takako Oono, Akira Sekine
  • Publication number: 20020084420
    Abstract: To provide a radioactive gas measurement apparatus that is simply constructed and can efficiently measure Xe-133 in a radioactive gas on-line under the condition that the radioactive gas is mixed with interference N-13, an apparatus is provided for measuring a radiation emitted from Xe-133, including an anticoincidence counter circuit 13 that conducts counting if it receives an output of a main detector 1 when it does not receive outputs of scintillation detectors 2 and 9, and a gate circuit 14, a plate-shaped semiconductor detector is used as the main detector 1, and a material not emitting a characteristic X ray in the range from 70 to 90 keV is used for a shielding structure. In particular, the thickness of the semiconductor detector 1 is set to fall within a range from 2 mm to 7 mm, thereby improving the analysis precision.
    Type: Application
    Filed: February 28, 2002
    Publication date: July 4, 2002
    Applicant: Hitachi, Ltd.
    Inventors: Hiroshi Kitaguchi, Atsushi Yamagoshi, Shigeru Izumi, Tetsuya Matsui, Akihisa Kaihara
  • Publication number: 20020004769
    Abstract: The present invention provides a method and system for management of chemical materials comprising the steps of providing a first data set containing which substances comprise the materials, providing a second data set containing which of the substances are to be controlled, providing a third data set containing a ratio of discharge of the controlled substances in a process, analyzing a preset amount of the materials in the process and determining a quantity of the controlled substances utilizing the first and second data sets, determining an emissions quantity of the controlled substances utilizing the ratio and the quantity of the controlled substances and maintaining the third data set according to a preset interval of time.
    Type: Application
    Filed: May 17, 2001
    Publication date: January 10, 2002
    Inventors: Yoshiaki Ichikawa, Akira Sekine, Takako Oono, Hirotaka Satou, Tetsuya Matsui
  • Publication number: 20020004768
    Abstract: The present invention provides a method and system for management of chemical materials comprising providing a first data set containing which substances comprise the materials, providing a second data set containing which of the substances are to be controlled, the substances being categorized by a group control number, and providing a third data set containing a ratio of discharge of the controlled substances in a process and analyzing a preset amount of the materials in the process and determining a quantity of the controlled substances utilizing the first and second data sets, and determining an emissions quantity of the controlled substances utilizing the ratio and the quantity of the controlled substances and wherein the group control number is the same for the substances in the same group.
    Type: Application
    Filed: May 17, 2001
    Publication date: January 10, 2002
    Inventors: Akira Sekine, Yoshiaki Ichikawa, Takako Oono, Hirotaka Satou, Tetsuya Matsui
  • Publication number: 20010025282
    Abstract: A chemical substance total management system and a chemical substance total management method which can easily manage amounts and release destination of managing substances. The chemical substance total management system includes a material composition database of component composition information of material or product in a form of database, a managing substance database in a form of a list of substance requiring management, for identifying substances constituting the material or product on the basis of the material composition database and identifying substance required management on the basis of the managing substance database for managing chemical substance contained in the material handled by a business entity or product. The system further includes release coefficient database storing weight ratio data in each transfer and release destination per the identified management required substance in a form of database.
    Type: Application
    Filed: February 28, 2001
    Publication date: September 27, 2001
    Inventors: Satoshi Ohishi, Yoshiaki Ichikawa, Akira Sekine, Takako Oono, Tetsuya Matsui
  • Publication number: 20010018625
    Abstract: A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.
    Type: Application
    Filed: February 26, 2001
    Publication date: August 30, 2001
    Inventors: Yoshiaki Ichikawa, Takako Oono, Akira Sekine, Tetsuya Matsui, Kiyomi Funabashi
  • Patent number: 6167514
    Abstract: Wireless communication method and apparatus which can perform the wireless transmission/reception of encrypted data without previous provision of a cryptographic key and without any system for registering a cryptographic key. Under control of a communication control section 504 in PC 1, the PC 1 transmits its own identification information to a printer 2 and receives identification information of the printer 2. The PC 1 has an encrypting/decrypting section 502 which generates a cryptographic key by using the identification information of the printer 2 and its own secret algorithm read out of an identification information storage section 510. According to a cryptographic program using such a cryptographic key, data is encrypted and transmitted toward the printer 2.
    Type: Grant
    Filed: March 26, 1998
    Date of Patent: December 26, 2000
    Assignee: Seiko Epson Corporation
    Inventors: Tetsuya Matsui, Michio Kobayashi, Masaki Hoshina
  • Patent number: 5991360
    Abstract: A laser plasma X-ray source has an improved X-ray conversion efficiency and a minimized occurrence of debris, and a semiconductor lithography apparatus using the same and a method therefor are provided. An X-ray generation unit has a vacuum chamber 5 which encases the target; target supply unit 110 which supplies a fine particle mixture gas target into the vacuum chamber 5; a laser irradiation unit 120 which irradiates a laser beam 2 on the particle mixture gas target 10; and a target recovery unit 130 which recovers unused particle mixture gas target from the vacuum chamber 5.
    Type: Grant
    Filed: February 3, 1998
    Date of Patent: November 23, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Tetsuya Matsui, Kimio Yamada, Masatsugu Nishi, Manabu Ueno, Masahiro Tooma
  • Patent number: 5369674
    Abstract: This invention concerns a plant diagnosis apparatus which comprises a first detecting unit for detecting a state of devices constituting a circulating system in which a fluid circulates and a second detecting unit for detecting a quality of the above-mentioned circulating fluid or a quality of the atmosphere surrounding the above-mentioned circulating system, and a unit for diagnosing the circulating system by output of the first and second detecting units, and therefore can diagnose anomaly of facilities such as a nuclear power plant with high reliability and rapidity.
    Type: Grant
    Filed: January 23, 1992
    Date of Patent: November 29, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Kenji Yokose, Makoto Nagase, Hiroshi Kamimura, Yamato Asakura, Tetsuya Matsui, Hidefumi Ibe, Yoshitaka Nishino, Shunsuke Uchida
  • Patent number: 5316983
    Abstract: An apparatus and a method for analysis of a particle by irradiation of the particle in a fluid with an intense laser pulse to cause laser breakdown and to detect sonic waves or plasma emission which are generated by the laser breakdown. The size of the particle is measured by using at least two kinds of information from the following: intensity of plasma emission or sonic wave generated by the laser breakdown, location of the laser breakdown plasma, and plasma emission waveform. Also, a laser pulse having flattened distribution of intensity for the irradiation is used in order to eliminate the dependence of the measured value on the particle location.
    Type: Grant
    Filed: August 5, 1991
    Date of Patent: May 31, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Haruo Fujimori, Tetsuya Matsui, Taiko Ajiro, Kenji Yokose, Shigeru Izumi
  • Patent number: 5178836
    Abstract: This invention relates to an analytical method and a relevant equipment for particulate substances in a sample with the detection of acoustic waves generated in the sample with the irradiation of onto the sample. In this invention, the light power density of the irradiating light onto the sample is set high enough above the breakdown threshold of the particulate substances in the sample, and low enough below the breakdown threshold of the media, and the particulate substances in the sample are counted by detecting the acoustic waves generated by the breakdown of the particulate substances. The particulate substances are also analyzed for their components on the basis of the light signal (emission spectrum) which is detected with a dispersed spectrum from the light which is generated by the breakdown of the particulate substances.
    Type: Grant
    Filed: April 7, 1989
    Date of Patent: January 12, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Takehiko Kitamori, Kenji Yokose, Tetsuya Matsui, Masaharu Sakagami
  • Patent number: 5164592
    Abstract: The power density of a pulsed laser beam for irradiating a sample is adjusted to break down the sample into the form of a plasma. After the momentary breakdown of the sample into the form of a plasma, ions are generated having a high charge. Then, after a certain time elapses, the ions having a high charge recombine with the electrons in the plasma to provide monovalent or low valent ions. These low valent ions are taken out of the plasma and introduced to a mass spectrometric apparatus.
    Type: Grant
    Filed: September 13, 1990
    Date of Patent: November 17, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Takehiko Kitamori, Masataka Koga, Tsuyoshi Nishitarumizu, Tetsuya Matsui, Kenji Yokose, Masaharu Sakagami
  • Patent number: 5122752
    Abstract: A method of and an apparatus for analyzing a granular material contained in a sample of a medium such as water produced by an ultra-pure water producing apparatus includes the steps of adding energy to granular materials contained in a sample which is mixed with the medium, wherein the energy is set to be lower than the breakdown threshold of the medium and to be higher than the breakdown threshold of the granular materials, detecting ions which are generated with the breakdown of the granular materials by using a pair of positive and negative electrodes; and analyzing characteristics of the granular materials based on the ions.
    Type: Grant
    Filed: August 30, 1990
    Date of Patent: June 16, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Masataka Koga, Tsuyoshi Nishitarumizu, Tetsuya Matsui, Kenji Yokose, Masaharu Sakagami, Takehiko Kitamori
  • Patent number: 5070300
    Abstract: Apparatus for measuring breakdown plasma, comprising an irradiating device for irradiating a sample with a focused light beam and for causing breakdown of a ultrafine particle to be measured in the sample at the focused beam region to change the particle into plasma; a pair of electrodes arranged on opposite sides of the focused region of the beam; and a device for measuring an electrical resistance between the electrodes under a condition where the breakdown plasma is produced between the electrodes and for determining a diameter of the particle according to the measured electrical resistance serves for accurate measurement of the diameter of the ultrafine particle in the sample.
    Type: Grant
    Filed: August 8, 1989
    Date of Patent: December 3, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Tetsuya Matsui, Takehiko Kitamori, Kenji Yokose, Masaharu Sakagami