Patents by Inventor Theodorus Petrus Maria Cadee
Theodorus Petrus Maria Cadee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11378893Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.Type: GrantFiled: November 13, 2020Date of Patent: July 5, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Van Meer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Publication number: 20210063898Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.Type: ApplicationFiled: November 13, 2020Publication date: March 4, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Erik Roelof LOOPSTRA, Aschwin Lodewijk Hendricus Johannes VAN MEER, Jeroen Johannes Sophia Maria MERTENS, Christianus Gerardus Maria DE MOL, Marcel Johannus Elisabeth Hubertus MUITJENS, Antonius Johannus VAN DER NET, Joost Jeroen OTTENS, Johannes Anna QUAEDACKERS, Maria Elisabeth REUHMAN-HUISKEN, Marco Koert STAVENGA, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Frederik Eduard DE JONG, Koen GOORMAN, Boris MENCHTCHIKOV, Herman BOOM, Stoyan NIHTIANOV, Richard MOERMAN, Martin Frans Pierre SMEETS, Bart Leonard Peter SCHOONDERMARK, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
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Patent number: 10838310Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.Type: GrantFiled: April 5, 2019Date of Patent: November 17, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Van Meer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Publication number: 20190235397Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.Type: ApplicationFiled: April 5, 2019Publication date: August 1, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Erik Roelof LOOPSTRA, Aschwin Lodewijk Hendricus Johannes VAN MEER, Jeroen Johannes Sophia Maria MERTENS, Christianus Gerardus Maria DE MOL, Marcel Johannus Elisabeth Hubertus MUITJENS, Antonius Johannus VAN DER NET, Joost Jeroen OTTENS, Johannes Anna QUAEDACKERS, Maria Elisabeth REUHMAN-HUISKEN, Marco Koert STAVENGA, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Frederik Eduard DE JONG, Koen GOORMAN, Boris MENCHTCHIKOV, Herman BOOM, Stoyan NIHTIANOV, Richard MOERMAN, Martin Frans Pierre SMEETS, Bart Leonard Peter SCHOONDERMARK, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
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Patent number: 10254663Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.Type: GrantFiled: October 13, 2015Date of Patent: April 9, 2019Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Van Meer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 10095128Abstract: A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical object at least partly towards a discharging side of the physical object, the two-phase cooling medium being pre-heated in the pre-heating duct; guiding the two-phase cooling medium from the pre-heating duct to a phase transitioning duct of the physical object, the two-phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; guiding the two-phase cooling medium from the phase transitioning duct to a discharging duct of the physical object; and discharging at the discharging side the two-phase cooling medium from the discharging duct.Type: GrantFiled: November 24, 2015Date of Patent: October 9, 2018Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Benjamin Joseph De Smet, Sjoerd Nicolaas Lambertus Donders, Adrianus Marinus Verdonck
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Patent number: 10061213Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.Type: GrantFiled: July 20, 2015Date of Patent: August 28, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Johannes Antonius Gerardus Akkermans, Ruud Antonius Catharina Maria Beerens, Sander Christiaan Broers, Jeroen Johannes Theodorus Hendrikus De Best, Adrianus Marinus Wouter Heeren, George Alois Leonie Leenknegt, Bo Lenssen, Hendrikus Johannes Schellens, Peter Van Der Krieken, Theodorus Petrus Maria Cadee, Jan Van Eijk, Richard Henricus Adrianus Van Lieshout
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Patent number: 10012914Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.Type: GrantFiled: July 20, 2015Date of Patent: July 3, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Johannes Antonius Gerardus Akkermans, Ruud Antonius Catharina Maria Beerens, Sander Christiaan Broers, Jeroen Johannes Theodorus Hendrikus De Best, Adrianus Marinus Wouter Heeren, George Alois Leonie Leenknegt, Bo Lenssen, Hendrikus Johannes Schellens, Peter Van Der Krieken, Theodorus Petrus Maria Cadee, Jan Van Eijk, Richard Henricus Adrianus Van Lieshout
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Patent number: 9983482Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.Type: GrantFiled: February 26, 2014Date of Patent: May 29, 2018Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Erik Roelof Loopstra, Olav Waldemar Vladimir Frijns, Stig Bieling, Antonius Theodorus Wilhelmus Kempen, Ivo Vanderhallen, Nicolaas Ten Kate, Ruud Antonius Catharina Maria Beerens, Richard Henricus Adrianus Van Lieshout, Theodorus Petrus Maria Cadee, Sjoerd Nicolaas Lambertus Donders, Alexander Matthijs Struycken, Marcus Petrus Scheepers
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Patent number: 9921494Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.Type: GrantFiled: April 12, 2013Date of Patent: March 20, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria Cadee, Sander Christiaan Broers, Sven Antoin Johan Hol, Yang-Shan Huang, Antonius Franciscus Johannes De Groot, Bastiaan Lambertus Wilhelmus Marinus Van De Ven
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Publication number: 20180024446Abstract: A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical object at least partly towards a discharging side of the physical object, the two-phase cooling medium being pre-heated in the pre-heating duct; guiding the two-phase cooling medium from the pre-heating duct to a phase transitioning duct of the physical object, the two-phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; guiding the two-phase cooling medium from the phase transitioning duct to a discharging duct of the physical object; and discharging at the discharging side the two-phase cooling medium from the discharging duct.Type: ApplicationFiled: November 24, 2015Publication date: January 25, 2018Applicant: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria CADEE, Benjamin Joseph DE SMET, Sjoerd Nicolaas Lambertus DONDERS, Adrianus Marianus VERDONCK
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Patent number: 9811005Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.Type: GrantFiled: January 21, 2016Date of Patent: November 7, 2017Assignee: ASML Netherlands B.V.Inventors: Yang-Shan Huang, Theodorus Petrus Maria Cadee
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Publication number: 20170277042Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.Type: ApplicationFiled: July 20, 2015Publication date: September 28, 2017Inventors: Johannes Antonius Gerardus AKKERMANS, Ruud Antonius Catharina Maria BEERENS, Sander Christiaan BROERS, Jeroen Johannes Theodorus Hendrikus DE BEST, Adrianus Marinus Wouter HEEREN, George Alois Leonie LEENKNEGT, Bo LENSSEN, Hendrikus Johannes SCHELLENS, Peter VAN DER KRIEKEN, Theodorus Petrus Maria CADEE, Jan VAN EIJK, Richard Henricus Adrianus VAN LIESHOUT
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Publication number: 20170261866Abstract: A pump includes a collecting duct to guide a two-phase fluid provided with magnetic field responsive particles, a collecting duct magnet system arranged along the collecting duct and configured to generate a magnetic field in at least a part of the collecting duct, a pumping duct to guide the two-phase fluid, a pumping duct inlet being connected to a collecting duct outlet, and a pumping duct magnet system arranged along the pumping duct and configured to generate a magnetic field in at least a part of the pumping duct. A pump driver is configured to drive the collecting duct magnet system to generate a spatial repetition of collecting duct magnetic fields moving along a length of the collecting duct, and is configured to drive the pumping duct magnet system to generate a spatial repetition of pumping duct magnetic fields moving along a length of the pumping duct.Type: ApplicationFiled: October 5, 2015Publication date: September 14, 2017Applicant: ASML NETHERLANDS B.V.Inventor: Theodorus Petrus Maria CADEE
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Patent number: 9726985Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.Type: GrantFiled: January 25, 2013Date of Patent: August 8, 2017Assignees: ASML Netherland B.V., Koninklijke Philips Electronics N.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Antonius Franciscus Johannes De Groot, Johannes Petrus Martinus Bernardus Vermeulen, Theodorus Petrus Maria Cadee, Robertus Mathijs Gerardus Rijs, Richard Henricus Adrianus Van Lieshout
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Patent number: 9696640Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.Type: GrantFiled: May 2, 2013Date of Patent: July 4, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Adrianus Hendrik Koevoets, Theodorus Petrus Maria Cadee, Harmeet Singh
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Patent number: 9684249Abstract: A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology frame connected to the projection system, a grid positioned stationary with respect to the metrology frame, and an encoder connected to the substrate table and facing the grid for measuring the position of the substrate table relative to the grid. The metrology frame has a surface oriented towards the substrate table, and the surface has been configured, e.g., by writing or etching, so as to form the grid.Type: GrantFiled: January 25, 2013Date of Patent: June 20, 2017Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Theodorus Petrus Maria Cadee
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Patent number: 9618859Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.Type: GrantFiled: January 25, 2013Date of Patent: April 11, 2017Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Jan Bernard Plechelmus Van Schoot, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee
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Patent number: 9513561Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.Type: GrantFiled: March 16, 2012Date of Patent: December 6, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Arno Jan Bleeker, Martinus Hendricus Henricus Hoeks, Theodorus Petrus Maria Cadee
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Publication number: 20160349628Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.Type: ApplicationFiled: August 12, 2016Publication date: December 1, 2016Applicant: ASML Netherlands B.V.Inventors: Arno Jan BLEEKER, Thomas Josephus Maria CASTENMILLER, Pieter Willem Herman DEJAGER, Heine Melle MULDER, Koen Jacobus Johannes ZAAL, Theodorus Petrus Maria CADEE, Danny Maria Hubertus PHILIPS, Ruud Antonius Catharina Maria BEERENS, Roger Anton Marie TIMMERMANS