Patents by Inventor Theodorus Petrus Maria Cadee
Theodorus Petrus Maria Cadee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140340666Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.Type: ApplicationFiled: December 5, 2012Publication date: November 20, 2014Applicant: ASML Netherlands B.V.Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Marie Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
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Publication number: 20140340659Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.Type: ApplicationFiled: January 25, 2013Publication date: November 20, 2014Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Adrianus Hendrik Koevoets, Theodorus Petrus Maria Cadee, Sjoerd Nicolaas Lambertus Donders, Koen Jacobus Johannes Maria Zaal
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Patent number: 8830441Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure, wherein the fluid handling structure has a main body with an undersurface, a moveable member moveable relative to the main body, and a self-regulating mechanism to maintain a gap of a certain size between a bottom surface of the moveable member and the facing surface independent of the size of a gap between the undersurface and the facing surface.Type: GrantFiled: February 24, 2012Date of Patent: September 9, 2014Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Raymond Wilhelmus Louis Lafarre
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Patent number: 8810777Abstract: A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool.Type: GrantFiled: February 3, 2010Date of Patent: August 19, 2014Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Noud Jan Gilissen, Rene Theodorus Petrus Compen, James Kennon
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Publication number: 20140009746Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.Type: ApplicationFiled: March 16, 2012Publication date: January 9, 2014Applicant: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Martinus Hendricus Henricus Hoeks, Theodorus Petrus Maria Cadee
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Publication number: 20140002805Abstract: Disclosed is an electrostatic clamp apparatus (500) constructed to support a patterning device (505) of a lithographic apparatus, comprising a support structure against which said patterning device is supported, clamping electrodes (525) for providing a clamping force between the support structure and patterning device, and an array of capacitive sensors (660) operable to measure the shape of said patterning device.Type: ApplicationFiled: January 18, 2012Publication date: January 2, 2014Applicant: ASML Netherelands B.V.Inventors: Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Theodorus Petrus Maria Cadee, Johannes Antonius Gerardus Akkermans, Luigi Scaccabarozzi, Christiaan Louis Valentin
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Patent number: 8616598Abstract: An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a plurality of overpressure members, each overpressure member being provided with at least one exhaust opening, each traction member being provided with an indentation and at least two suction openings that are arranged in the indentation, the at least two suction openings of each traction member being configured to generate a pressure gradient between them so as to create a traction fluid flow in the indentation in a direction substantially parallel to the carrying surface; and a pressure controller configured to control the pressure gradient between the at least two suction openings of each traction member.Type: GrantFiled: April 7, 2011Date of Patent: December 31, 2013Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Koen Jacobus Johannes Maria Zaal, Timo Hol, Michael Wilhelmus Theodorus Koot
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Patent number: 8597014Abstract: An actuator is disclosed that includes a body, the body having a face, and a plurality of conduits located in the body, each conduit deformable in response to a change of pressure within the conduit, the deformation of the conduit configured to cause a deformation of the face.Type: GrantFiled: April 26, 2010Date of Patent: December 3, 2013Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Noud Jan Gilissen, Johannes Petrus Martinus Bernardus Vermeulen
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Publication number: 20130314684Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.Type: ApplicationFiled: April 26, 2013Publication date: November 28, 2013Applicant: ASML Netherlands B.V.Inventors: Yang-Shan HUANG, Theodorus Petrus Maria Cadee
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Patent number: 8593646Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). A measurement optical system comprises illumination subsystem (504) for illuminating the mark with a spot of radiation (206) and as detecting subsystem (580) for detecting radiation diffracted by the mark. The substrate and measurement optical system move relative to one another at a first velocity (vW) so as to scan the mark while synchronously moving the spot of radiation relative to the reference frame (RF) of the measurement optical system at a second velocity (vSPOT). The spot scans the mark at a third velocity (vEFF) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. In one embodiment, an objective lens (524) remains fixed in relation to the reference frame while a moving optical element (562) imparts the movement of the radiation spot relative to the reference frame.Type: GrantFiled: February 9, 2012Date of Patent: November 26, 2013Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Marcel Hendrikus Maria Beems, Theodorus Petrus Maria Cadee, Raymond Wilhelmus Louis Lafarre
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Patent number: 8587769Abstract: A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock and the table including the other one of the first data clock and the second data clock; and a circuit configured to synchronize the first and second data clocks, the circuit including a transmitter and receiver, the transmitter configured to wirelessly transmit clock signal data from the first data clock to the second data clock, and a synchronization circuit configured to synchronize the second data clock with the first data clock from the wirelessly transmitted clock signal data received by the receiver.Type: GrantFiled: May 4, 2011Date of Patent: November 19, 2013Assignee: ASML Netherlands B.V.Inventors: Johannes Antonius Gerardus Akkermans, Theodorus Petrus Maria Cadee, George Wilhelmus Johannes Clijsen
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Patent number: 8472010Abstract: Actuator for exerting a force and a torque on an object, wherein the actuator includes a first part that is movable with respect to a second part of the actuator in at least a first degree of freedom, wherein the object is mounted to the first part, wherein one of the parts is provided with a first electrical coil that is arranged to cooperate with a magnetizable portion of the other part and wherein a controller of the actuator is arranged to generate a first electrical current through the first electrical coil for generating a force between the parts, wherein the one of the parts is provided with a second electrical coil which is arranged to cooperated with a magnetizable portion of the other part, wherein the controller is further arranged to generate a second current through the second coil and the first current through the first electrical coil for exerting the force and torque between the parts so that the actuator is arranged to exert the force and the torque on the object with respect to the second paType: GrantFiled: September 21, 2010Date of Patent: June 25, 2013Assignee: ASML Netherlands B.V.Inventors: Sven Antoin Johan Hol, Antonius Franciscus Johannes De Groot, Theodorus Petrus Maria Cadee, Marijn Kessels, Daniƫl Godfried Emma Hobbelen
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Publication number: 20130107241Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus including a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes a vacuum clamp arranged to clamp the substrate at a top side thereof. The vacuum clamp may be arranged to clamp at least part of a circumferential outer zone of the substrate top surface. There is also provided a substrate handling method including positioning the substrate using a gripper on a substrate table of a lithographic apparatus, the method including clamping the substrate at a top side thereof using a vacuum clamp of the gripper.Type: ApplicationFiled: October 24, 2012Publication date: May 2, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis LAFARRE, Hubert Marie Segers, Theodorus Petrus Maria Cadee, Yang-Shan Huang, Christiaan Louis Valentin
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Patent number: 8411247Abstract: A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object.Type: GrantFiled: November 16, 2009Date of Patent: April 2, 2013Assignee: ASML Netherlands B.V.Inventors: Noud Jan Gilissen, Theodorus Petrus Maria Cadee
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Patent number: 8368868Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.Type: GrantFiled: November 30, 2009Date of Patent: February 5, 2013Assignee: ASML Netherlands B.V.Inventors: Johannes Petrus Martinus Bernardus Vermeulen, Marcel Koenraad Marie Baggen, Hans Butler, Henrikus Herman Marie Cox, Jan Van Eijk, Andre Bernardus Jeunink, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Engelbertus Antonius Fransiscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Theodorus Petrus Maria Cadee, Fransiscus Mathijs Jacobs, Christiaan Louis Valentin
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Publication number: 20120327386Abstract: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.Type: ApplicationFiled: June 12, 2012Publication date: December 27, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Yang-Shan Huang, Hans Butler, Jan Van Eijk, Sven Antoin Johan Hol, Engelbertus Antonius Fransiscus Van Der Pasch, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Johannes Petrus Martinus Bernardus Vermeulen, Theodorus Petrus Maria Cadee, Robbert Edgar Van Leeuwen
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Publication number: 20120249982Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure, wherein the fluid handling structure has a main body with an undersurface, a moveable member moveable relative to the main body, and a self-regulating mechanism to maintain a gap of a certain size between a bottom surface of the moveable member and the facing surface independent of the size of a gap between the undersurface and the facing surface.Type: ApplicationFiled: February 24, 2012Publication date: October 4, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria CADEE, Raymond Wilhelmus Louis Lafarre
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Publication number: 20120162621Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus having a first object and a planar member mounted on the first object to improve thermal transfer to/from a second object.Type: ApplicationFiled: December 21, 2011Publication date: June 28, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Ruud Antonius Catharina Maria Beerens, Theodorus Petrus Maria Cadee
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Publication number: 20120153543Abstract: A lithography apparatus comprises a projection system arranged to transfer a pattern from a patterning device onto a substrate, a carrier, and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprises a shuttle moving parallel to the Y-axis, a shuttle connector connecting the shuttle to the carrier, the shuttle connector allowing movement of the carrier in a direction parallel to the X-axis relative to the shuttle, and a shuttle driver for driving movement of the shuttle parallel to the Y-axis. The shuttle is located to one side of the carrier in a direction parallel to the X-axis and it is desirable if only one of the shuttle is connected to the carrier.Type: ApplicationFiled: November 15, 2011Publication date: June 21, 2012Applicant: ASML Netherlands B.V.Inventors: Johannes Petrus Martinus Bernardus Vermeulen, Antonius Franciscus Johannes De Groot, Theodorus Petrus Maria Cadee, Jeroen De Boeij
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Publication number: 20120113402Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: ApplicationFiled: November 3, 2011Publication date: May 10, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen