Abstract: A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock and the table including the other one of the first data clock and the second data clock; and a circuit configured to synchronize the first and second data clocks, the circuit including a transmitter and receiver, the transmitter configured to wirelessly transmit clock signal data from the first data clock to the second data clock, and a synchronization circuit configured to synchronize the second data clock with the first data clock from the wirelessly transmitted clock signal data received by the receiver.

Abstract: An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a plurality of overpressure members, each overpressure member being provided with at least one exhaust opening, each traction member being provided with an indentation and at least two suction openings that are arranged in the indentation, the at least two suction openings of each traction member being configured to generate a pressure gradient between them so as to create a traction fluid flow in the indentation in a direction substantially parallel to the carrying surface; and a pressure controller configured to control the pressure gradient between the at least two suction openings of each traction member

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.

Abstract: Actuator for exerting a force and a torque on an object, wherein the actuator includes a first part that is movable with respect to a second part of the actuator in at least a first degree of freedom, wherein the object is mounted to the first part, wherein one of the parts is provided with a first electrical coil that is arranged to cooperate with a magnetizable portion of the other part and wherein a controller of the actuator is arranged to generate a first electrical current through the first electrical coil for generating a force between the parts, wherein the one of the parts is provided with a second electrical coil which is arranged to cooperated with a magnetizable portion of the other part, wherein the controller is further arranged to generate a second current through the second coil and the first current through the first electrical coil for exerting the force and torque between the parts so that the actuator is arranged to exert the force and the torque on the object with respect to the second pa

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

Abstract: An actuator is disclosed that includes a body, the body having a face, and a plurality of conduits located in the body, each conduit deformable in response to a change of pressure within the conduit, the deformation of the conduit configured to cause a deformation of the face.

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

Abstract: A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool.

Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; a gas pressure controlled article clamp for clamping an article to be placed in a beam path of the projection beam of radiation; and a pressure circuit for controlling the article clamp, comprising a supply line for connection with the article clamp. According to the invention, a buffer volume is provided for providing a buffered gas pressure pulse in the supply line. In this way, faster clamp response times can be realized.

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a substrate support constructed to support a substrate, a projection system configured to project a patterned radiation beam onto a target portion of the substrate, and a frame onto which at least a part of the projection system is mounted. A fluid provider is arranged to provide a fluid between the substrate and a downstream end of the projection system. The apparatus also includes an actuator associated with the frame and with the fluid provider and arranged to position the fluid provider, and a cushion system for cushioning vibrational forces when the actuator positions the fluid provider.

Abstract: A lithographic projection apparatus includes a beam production system for projecting a patterned beam of radiation onto a target portion of a substrate, and a support table for supporting an article. The support table has a support surface and an array of protrusions extending from the support surface to support the article on the protrusions. The apparatus also includes a detector for detecting height deviations of the protrusions that affect a surface flatness of the article, a height adjustment device arranged to independently modify a height of the individual protrusions when the support table is operable in the apparatus, and a controller coupled between the detector and the height adjustment device and arranged to control the height adjustment device to adjust the height of the protrusions corresponding to the detected height deviations of the protrusions that affect the surface flatness of the article.