Abstract: Substrates of glass or glass ceramic are disclosed which are coated with decorations, also methods for preparing such coatings are disclosed, wherein the decorations are optimized with respect to their acoustic characteristics in such a way that in particular when displacing cookware on induction cooking surfaces the subjective noise feeling is minimized, as possible.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a pupil forming unit directing light on a spatial light modulator that transmits or reflects impinging light in a spatially resolved manner. An objective images a light exit surface of the spatial light modulator on light entrance facets of an optical integrator so that an image of an object area on the light exit surface completely coincides with one of the light entrance facets. The pupil forming unit and the spatial light modulator are controlled so that the object area is completely illuminated by the pupil forming unit and projection light associated with a point in the object area is at least partially and variably prevented from impinging on the one of the light entrance facets.

Abstract: An illumination system includes an optical integrator having a plurality of light entrance facets, whose images at least substantially superimpose in a mask plane. A spatial light modulator transmits or reflects impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light onto the spatial light modulator. An objective images a light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator so that an image of an object area on the light exit surface completely coincides with one of the light entrance facets. A control unit controls the spatial light modulator such that along a scan direction a length of an image, which is formed on a mask from a light pattern in the object area, gradually increases at a beginning of a scan cycle and gradually decreases at the end of the scan cycle.

Abstract: An illumination optical unit for a mask inspection system is used with EUV illumination light. A hollow waveguide of the illumination optical unit serves for guiding the illumination light. The hollow waveguide has an entry opening for the illumination light and an exit opening for the illumination light. An imaging mirror optical unit, arranged downstream of the hollow waveguide serves to image the exit opening into an illumination field. This results in an illumination optical unit, the throughput of which is optimized for the EUV illumination light.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes an optical integrator having a plurality of light entrance facets each being associated with a secondary light source. A spatial light modulator has a light exit surface and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light on the spatial light modulator. An objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator. The light exit surface of the optical light modulator includes groups of object areas being separated by areas that are not imaged on the light entrance facets. The objective combines images of the object areas so that the images of the object areas abut on the optical integrator.

Abstract: An illumination system includes an optical integrator having a plurality of light entrance facets, whose images at least substantially superimpose in a mask plane. A spatial light modulator transmits or reflects impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light onto the spatial light modulator. An objective images a light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator so that an image of an object area on the light exit surface completely coincides with one of the light entrance facets. A control unit controls the spatial light modulator such that along a scan direction a length of an image, which is formed on a mask from a light pattern in the object area, gradually increases at a beginning of a scan cycle and gradually decreases at the end of the scan cycle.

Abstract: First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.

Abstract: First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.

Abstract: The invention relates to a method for the production of faithfully-reproduced medical implants (12) and epiprostheses, whereby initially a virtual modeln (11) is produced from extant data on a patient. Said virtual model (11) is converted into the concrete negative thereof (15) into which the material (14) for the implant/epiprosthesis is introduced.