Patents by Inventor Tim Johnson

Tim Johnson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6544220
    Abstract: A system for performing fluid jet myocardial revascularization includes a catheter having a proximal region, a distal region, a lumen extending therethrough and a valve disposed in the lumen for allowing the passage of fluids in the lumen to create holes in the myocardium. A valve control means extends through the proximal region of the catheter to open and close the valve. In one embodiment, the valve also includes a biasing mechanism for biasing the valve in a closed position. The valve may be controlled using an electrically actuated device that is heated with an electrical current to open and close the valve. In one embodiment of the invention, the catheter has a wall that can be expanded within a guide catheter to anchor the catheter during revascularization.
    Type: Grant
    Filed: February 14, 2001
    Date of Patent: April 8, 2003
    Assignee: Scimed Life Systems, Inc.
    Inventors: Brandon J. Shuman, Tim Johnson, Joseph Pearce, Zihong Guo
  • Publication number: 20030065350
    Abstract: An ablative burr (100) that may be used for a medical procedure, such as an atherectomy, that does not require the user of an elongate flexible drive shaft. The burr comprises a main body (110) that is elastically connected to an abrasive shell member (130). One or more oscillatory driver(s) (150), such as a piezoelectric transducer, is disposed between the shell member and the main body to oscillate the shell with respect to the main body. Elastically compressible members (140, 142) are provided between the shell member and the main body member. The oscillatory drivers are preferably set or tuned to operate at a resonant frequency of the shell member whereby shell member amplitudes larger than the oscillatory driver amplitudes may be induced. Embodiments of longitudinally oscillatory burrs (100, 200) and rotationally oscillatory burrs (300, 400) are disclosed.
    Type: Application
    Filed: September 28, 2001
    Publication date: April 3, 2003
    Applicant: SCIMED Life Systems, Inc
    Inventors: Eric B. Hamilton, Tim Johnson
  • Patent number: 6467991
    Abstract: A method for treating golf course sand traps to reduce contamination of the sand and to reduce erosion. The bottom of the trap, which is substantially devoid of playing sand is roughened. An initial amount of hydrophobic liquid polyurethane is applied to the roughened soil on the bottom of the trap. The trap is raked and an additional amount of hydrophobic liquid polyurethane is applied to the bottom of the trap. A thin layer of sand is applied to the bottom of the trap and a further additional amount of hydrophobic liquid polyurethane is applied to the sand and the sand is raked. The thin layer of sand is sprayed with water and the trap is permitted to cure for approximately 24 hours. A sufficient amount of playing sand is then added to the trap so the trap is playable.
    Type: Grant
    Filed: July 5, 2000
    Date of Patent: October 22, 2002
    Inventors: James T. Joyce, Tim Johnson
  • Publication number: 20020111644
    Abstract: Devices and methods for performing myocardial revascularization using fluid jets. Devices can include a pressurized fluid source coupled through fluid supply lumens to a distal-most nozzle disposed on the distal end of the catheter. Some devices have separate myocardial revascularization catheters disposed within guide catheters, while other devices have unitary devices including a generally steerable myocardial revascularization catheter shaft. Preferred embodiments include a distally disposed control valve. One valve is controlled using an electrically actuated device, another valve is controlled using a low-pressure control fluid, while yet another device valve is controlled using an axially slidable activation wire. The fluid valve can include a biasing spring to shut the valve and preclude fluid flow, with the bias opposed by a user-applied fluid, mechanical, or electrical force.
    Type: Application
    Filed: February 14, 2001
    Publication date: August 15, 2002
    Applicant: SciMed Life Systems, Inc.
    Inventors: Brandon J. Shuman, Tim Johnson, Joseph Pearce, Zihong Guo
  • Patent number: 6398923
    Abstract: An improved sputtering process increases the perpendicularity of the sputtered flux to the target surface by bombarding the target with both low and high mass ions, with low mass ions predominating, packing the target with both low and high mass implanted ions, and causing target atoms ejected as a result of high mass incident ions to have a higher probability of perpendicular or near perpendicular ejection. An alternative improved sputtering process bombards the target with both low and high mass ions, with high mass ions predominating, resulting in a higher sputter rate than achievable with either the high or low mass species alone. Including in either process as the high or the low mass species a species having a lower ionization energy than a standard species allows a reduced pressure plasma, resulting in less scattering of the sputtered flux. A low ionization energy species may also be employed to assist in striking a plasma before sputtering by a single species during deposition.
    Type: Grant
    Filed: July 3, 2000
    Date of Patent: June 4, 2002
    Assignee: Micron Technology, Inc.
    Inventors: P. J. Ireland, Howard Rhodes, Sujit Sharan, Sukesh Sandhu, Tim O'Brien, Tim Johnson
  • Patent number: 6083358
    Abstract: An improved sputtering process increases the perpendicularity of the sputtered flux to the target surface by bombarding the target with both low and high mass ions, with low mass ions predominating, packing the target with both low and high mass implanted ions, and causing target atoms ejected as a result of high mass incident ions to have a higher probability of perpendicular or near perpendicular ejection. An alternative improved sputtering process bombards the target with both low and high mass ions, with high mass ions predominating, resulting in a higher sputter rate than achievable with either the high or low mass species alone. Including in either process as the high or the low mass species a species having a lower ionization energy than a standard species allows a reduced pressure plasma, resulting in less scattering of the sputtered flux. A low ionization energy species may also be employed to assist in striking a plasma before sputtering by a single species during deposition.
    Type: Grant
    Filed: April 1, 1998
    Date of Patent: July 4, 2000
    Assignee: Micron Technology, Inc.
    Inventors: P. J. Ireland, Howard Rhodes, Sujit Sharan, Sukesh Sandhu, Tim O'Brien, Tim Johnson
  • Patent number: 5846045
    Abstract: An over-the-cab transporting device, including a pair of tracks extending from a position adjacent the vehicle-supporting surface over the cab to a position aft of the cab. A load-carrying platform moves from a position partly supported by the vehicle-supporting surface for loading and unloading to a position above the cab, where it is secured for transport.
    Type: Grant
    Filed: September 15, 1997
    Date of Patent: December 8, 1998
    Inventors: Tim Johnson, Ron Johnson, Robert Ellis
  • Patent number: 5750012
    Abstract: An improved sputtering process increases the perpendicularity of the sputtered flux to the target surface by bombarding the target with both low and high mass ions, with low mass ions predominating, packing the target with both low and high mass implanted ions, and causing target atoms ejected as a result of high mass incident ions to have a higher probability of perpendicular or near perpendicular ejection. An alternative improved sputtering process bombards the target with both low and high mass ions, with high mass ions predominating, resulting in a higher sputter rate than achievable with either the high or low mass species alone. Including in either process as the high or the low mass species a species having a lower ionization energy than a standard species allows a reduced pressure plasma, resulting in less scattering of the sputtered flux. A low ionization energy species may also be employed to assist in striking a plasma before sputtering by a single species during deposition.
    Type: Grant
    Filed: April 4, 1996
    Date of Patent: May 12, 1998
    Assignee: Micron Technology, Inc.
    Inventors: P. J. Ireland, Howard Rhodes, Sujit Sharan, Sukesh Sandhu, Tim O'Brien, Tim Johnson
  • Patent number: 4808826
    Abstract: In scintillation cameras, spatial or linearity correction is accomplished utilizing a weighted average of correction vectors in the region of the apparent location of scintillation events. Such vectors are developed in a calibration step using a pinhole or slot apertured mask. On the fly, vectors beyond those next adjacent the apparent location are used for correction, which are constrained to exhibit continuity in both the functional value, and at a minimum the first derivative, but which may include continuity in higher order derivatives also. One such correction function, which insures continuity in both the functional value and its first derivative, is called a Hermite interpolation function.
    Type: Grant
    Filed: April 8, 1986
    Date of Patent: February 28, 1989
    Assignee: Technicare Corporation
    Inventors: Chun B. Lim, Richard Chaney, Felix Jih, Tim Johnson, Steven E. King