Abstract: An ion source includes an arc chamber having an extraction aperture, and a plasma sheath modulator positioned in the arc chamber. The plasma sheath modulator is configured to control a shape of a boundary between a plasma and a plasma sheath proximate the extraction aperture, wherein the plasma sheath modulator includes a semiconductor. A well focused ion beam having a high current density can be generated by the ion source. A high current density ion beam can improve the throughput of an associated process. The emittance of the ion beam can also be controlled.

Abstract: A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.

Abstract: A plasma processing apparatus includes a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate a plasma in the process chamber having a plasma sheath adjacent to the front surface of the workpiece, and an insulating modifier. The insulting modifier is configured to control a shape of a boundary between the plasma and the plasma sheath so a portion of the shape of the boundary is not parallel to a plane defined by a front surface of the workpiece facing the plasma. Controlling the shape of the boundary between the plasma and the plasma sheath enables a large range of incident angles of particles striking the workpiece to be achieved.

Abstract: An ion source includes an arc chamber having an extraction aperture, and a plasma sheath modulator. The plasma sheath modulator is configured to control a shape of a boundary between plasma and a plasma sheath proximate the extraction aperture. The plasma sheath modulator may include a pair of insulators positioned in the arc chamber and spaced apart by a gap positioned proximate the extraction aperture. A well focused ion beam having a high current density can be generated by the ion source. A high current density ion beam can improve the throughput of an associated process. The emittance of the ion beam can also be controlled.

Abstract: A plasma processing apparatus includes a process chamber, a source configured to generate a plasma in the process chamber, and a platen configured to support a workpiece in the process chamber. The platen is biased with a pulsed platen signal having pulse ON and OFF time periods to accelerate ions from the plasma towards the workpiece during the pulse ON time periods and not the pulse OFF time periods. A plate is positioned in the process chamber. The plate is biased with a plate signal to accelerate ions from the plasma towards the plate to cause an emission of secondary electrons from the plate during at least a portion of one of the pulse OFF time periods of the pulsed platen signal to at least partially neutralize charge accumulation on the workpiece.

Abstract: A platen for a processing system includes a first and a second thermal region that are separated by at least one boundary. A first fluid conduit is positioned in the first thermal region. A second fluid conduit is positioned in the second thermal region. A fluid reservoir having a first output is coupled to the first fluid conduit and a second output that is coupled to the second fluid conduit. The fluid reservoir provides fluid to the first fluid conduit with first fluid conditions that provides a first thermal conductivity to the first thermal region and provides fluid to the second fluid conduit with second fluid conditions that provides a second thermal conductivity to the second thermal region so that a predetermined thermal conductivity profile is achieved in the platen.

Abstract: A plasma processing apparatus includes a platen that supports a substrate for plasma processing. A RF power supply generates a multi-level RF power waveform at an output having at least a first period with a first power level and a second period with a second power level. A RF plasma source having an electrical input that is electrically connected to the output of the RF power supply generates at least a first RF plasma with the first RF power level during the first period and a second RF plasma with the second RF power level during the second period. A bias voltage power supply having an output that is electrically connected to the platen generates a bias voltage waveform that is sufficient to attract ions in the plasma to the substrate for plasma processing.

Abstract: An apparatus for processing a substrate includes a pulsed power supply that generates a waveform having a first period with a first power level and a second period with a second power level. A plasma source generates a first plasma during the first period and a second plasma during the second period. The first plasma may have higher plasma density than the second plasma. A bias voltage power supply generates a bias voltage waveform at an output that is electrically connected to a platen which supports a substrate. The bias voltage waveform having a first voltage and a second voltage may be coupled to the substrate. The first voltage may have more negative potential than the second voltage.

Abstract: The present invention concerns methods and compositions for improved oral delivery of bioactive agents, such as vaccines. In preferred embodiments, the compositions comprise at least one lectin, saponin, polyunsaturated fatty acid and/or isoflavone. In further embodiments, the compositions may further comprise at least one protease inhibitor, buffer and/or surfactant. In more preferred embodiments, the lectins, saponins, fatty acids, isoflavones and/or protease inhibitors may be derived from extracts, homogenates, finely ground powders or derivatives of plant or animal material, such as beans, nuts, peas, fish meal or krill. The relative amounts of various naturally occurring materials contained in the compositions may be selected to optimize the concentrations of one or more lectins, saponins, polyunsaturated fatty acids and/or isoflavones. The compositions are of use for oral delivery of a wide variety of bioactive agents, particularly protein or peptide based agents.

Abstract: A plasma source having a plasma chamber with metal chamber walls contains a process gas. A dielectric window passes a RF signal into the plasma chamber. The RF signal excites and ionizes the process gas, thereby forming a plasma in the plasma chamber. A plasma chamber liner that is positioned inside the plasma chamber provides line-of-site shielding of the inside of the plasma chamber from metal sputtered by ions striking the metal walls of the plasma chamber.

Abstract: A method and apparatuses for providing improved electrical contact to a semiconductor wafer during plasma processing applications are disclosed. In one embodiment, an apparatus includes a wafer platen for supporting the wafer; and a plurality of electrical contact elements, each of the plurality of electrical contact elements are configured to provide a path for supplying a bias voltage from a bias power supply to the wafer on the wafer platen. The plurality of electrical contact elements are also geometrically arranged such that at least one electrical contact element contacts an inner surface region (e.g., region between a center of wafer and a distance approximately half of the radius of the wafer) and at least one electrical contact element contacts an outer annular surface region (e.g., region between an outer edge of wafer and a distance approximately half of the radius of the wafer).

Abstract: A laser projection system is disclosed. The laser projection system includes a laser light source that is configured to selectively provide laser light. The system also includes an input beam deflection unit receiving the laser light and configured to deflect the laser light. The input beam deflection unit is configured to selectively change the angle of deflection of the laser light. A selection lens is also a part of the laser projection system and is configured to refract the laser light. A mask having at least one aperture is used. The mask receives the refracted laser light from the selection lens. A selected area of the mask is selectively illuminated by the refracted laser light. Further, a collection lens receives at least a portion of the laser light from the at least one aperture and refracts the portion of laser light.

Abstract: An outgassing shield (40) for a lamp socket (22) comprises a cup-shaped unit that fits over the end of the socket that penetrates a lamp reflector (12), reducing the temperature upon the socket body and substantially eliminating outgassing. The elimination of the outgassing prevents deleterious buildup of outgassed materials on the reflector surface and the interior of the lens, thereby enhancing light output.

Abstract: An electrical connector assembly is provided including first and second housings having ends configured to receive electrical contacts. The first and second housings are configured to be matable with one another to join corresponding electrical contacts. The electrical connector assembly includes a lever member having a cam arm received by the first housing and engaging the second housing as the lever member is rotated through a range of motion from an insertion position to an engaged position. The lever member connects the first and second housings to join corresponding electrical contacts when the lever member is rotated to the engaged position. The lever member has a position assurance tab received by the first housing.

Abstract: The invention is drawn to compositions and methods for using E. coli heat labile toxin (LT) and known analogs as adjuvants in birds. The invention further provides compositions and methods for using plant-produced LT, its known analogs, and protective immunogens as vaccines in birds.

Abstract: The present invention relates to polypeptides and proteins useful in the diagnosis and prevention of disease caused by feline infectious peritonitis virus (FIPV) and feline enteric coronavirus (FECV).

Abstract: A laser projection system is disclosed. The laser projection system includes a laser light source that is configured to selectively provide laser light. The system also includes an input beam deflection unit receiving the laser light and configured to deflect the laser light. The input beam deflection unit is configured to selectively change the angle of deflection of the laser light. A selection lens is also a part of the laser projection system and is configured to refract the laser light. A mask having at least one aperture is used. The mask receives the refracted laser light from the selection lens. A selected area of the mask is selectively illuminated by the refracted laser light. Further, a collection lens receives at least a portion of the laser light from the at least one aperture and refracts the portion of laser light.

Abstract: A portion or component of a metal container is provided with markings or indicia using laser light. High-speed laser steering is used to position laser light or laser light pulses across a lateral and longitudinal extent in a relatively short time period such as a time period selected so as to avoid slowing, stopping or otherwise interfering with other container or container component production processes. Preferably, tab stock for container-opening tabs can be provided with 6 to 9 or more visible characters within a time window of 50 to 100 milliseconds or less. Preferably, the size and resolution provided by the pulses are sufficient to permit legible, and preferably attractive, formation of any standard typewriter characters. In one embodiment, other logos, designs, textures, backgrounds and similar features can be provided.