Patents by Inventor Tom Yu

Tom Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190117231
    Abstract: A sleeve for use with a tourniquet cuff to protect a patient's limb from tourniquet-related injury includes a stretchable body extending longitudinally over a sleeve length between a proximal end and a distal end. The body has a tubular shape, and the sleeve length is greater than a width of the tourniquet cuff. The body tapers from the proximal end to the distal end such that a proximal end circumference is greater than a distal end circumference. The body is formed to apply substantially uniform pressure to the patient's limb from the proximal end of the sleeve to the distal end of the sleeve varying only within a predetermined pressure range.
    Type: Application
    Filed: December 20, 2018
    Publication date: April 25, 2019
    Inventors: James Allen McEwen, Michael Jameson, Tom Yu Chia Lai
  • Patent number: 10233338
    Abstract: Intercalation pastes for use with semiconductor devices are disclosed. The pastes contain precious metal particles, intercalating particles, and an organic vehicle and can be used to improve the material properties of metal particle layers. Specific formulations have been developed to be screen-printed directly onto a dried metal particle layer and fired to make a fired multilayer stack. The fired multilayer stack can be tailored to create a solderable surface, high mechanical strength, and low contact resistance. In some embodiments, the fired multilayer stack can etch through a dielectric layer to improve adhesion to a substrate. Such pastes can be used to increase the efficiency of silicon solar cells, specifically multi- and mono-crystalline silicon back-surface field (BSF), and passivated emitter and rear contact (PERC) photovoltaic cells. Other applications include integrated circuits and more broadly, electronic devices.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: March 19, 2019
    Assignee: PLANT PV, Inc.
    Inventors: Brian E. Hardin, Erik Sauar, Dhea Suseno, Jesse J. Hinricher, Jennifer Huang, Tom Yu-Tang Lin, Stephen T. Connor, Daniel J. Hellebusch, Craig H. Peters
  • Patent number: 10201354
    Abstract: A sleeve for use with a tourniquet cuff to protect a patient's limb from tourniquet-related injury includes a stretchable body extending longitudinally over a sleeve length between a proximal end and a distal end. The body has a tubular shape, and the sleeve length is greater than a width of the tourniquet cuff. The body tapers from the proximal end to the distal end such that a proximal end circumference is greater than a distal end circumference. The body is formed to apply substantially uniform pressure to the patient's limb from the proximal end of the sleeve to the distal end of the sleeve varying only within a predetermined pressure range.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: February 12, 2019
    Assignee: Western Digital Engineering Ltd.
    Inventors: James Allen McEwen, Michael Jameson, Tom Yu Chia Lai
  • Patent number: 10000645
    Abstract: A method of forming a fired multilayer stack are described. The method involves the steps of a) applying a wet metal particle layer on at least a portion of a surface of a substrate, b) drying the wet metal particle layer to form a dried metal particle layer, c) applying a wet intercalation layer directly on at least a portion of the dried metal particle layer to form a multilayer stack, d) drying the multilayer stack, and e) co-firing the multilayer stack to form the fired multilayer stack. The intercalating layer may include one or more of low temperature base metal particles, crystalline metal oxide particles, and glass frit particles. The wet metal particle layer may include aluminum, copper, iron, nickel, molybdenum, tungsten, tantalum, titanium, steel or combinations thereof.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: June 19, 2018
    Assignee: PLANT PV, Inc.
    Inventors: Brian E. Hardin, Erik Sauar, Dhea Suseno, Jesse J. Hinricher, Jennifer Huang, Tom Yu-Tang Lin, Stephen T. Connor, Daniel J. Hellebusch, Craig H. Peters
  • Publication number: 20180140306
    Abstract: A low-cost contour cuff for surgical tourniquet systems comprises: a sheath containing an inflatable bladder, the sheath having an arcuate shape, an outer surface and a centerline equidistant between first and second side edges; a securing strap non-releasably attached to the outer surface and formed of substantially inextensible material having a shape that is predetermined and substantially flat, wherein the strap includes a bending portion near a first strap end and a fastening portion near a second strap end, and wherein the bending portion is adapted to allow twisting of the bending portion out of the substantially flat shape to facilitate positioning of the fastening portion into any of a plurality of positions in the substantially flat shape; and fastening means for releasably attaching the fastening portion of the securing strap to the outer surface whenever the sheath is curved into a position for surrounding a limb.
    Type: Application
    Filed: January 2, 2018
    Publication date: May 24, 2018
    Applicant: Western Clinical Engineering Ltd.
    Inventors: James A. McEwen, Michael Jameson, Kenneth L. Glinz, Tom Yu Chia Lai
  • Publication number: 20180116679
    Abstract: A low-cost contour cuff for surgical tourniquet systems comprises: a sheath containing an inflatable bladder, the sheath having an arcuate shape, an outer surface and a centerline equidistant between first and second side edges; a securing strap non-releasably attached to the outer surface and formed of substantially inextensible material having a shape that is predetermined and substantially flat, wherein the strap includes a bending portion near a first strap end and a fastening portion near a second strap end, and wherein the bending portion is adapted to allow twisting of the bending portion out of the substantially flat shape to facilitate positioning of the fastening portion into any of a plurality of positions in the substantially flat shape; and fastening means for releasably attaching the fastening portion of the securing strap to the outer surface whenever the sheath is curved into a position for surrounding a limb.
    Type: Application
    Filed: December 22, 2017
    Publication date: May 3, 2018
    Applicant: Western Clinical Engineering Ltd.
    Inventors: James A. McEwen, Michael Jameson, Kenneth L. Glinz, Tom Yu Chia Lai
  • Patent number: 9741878
    Abstract: Intercalation pastes for use with semiconductor devices are disclosed. The pastes contain precious metal particles, intercalating particles, and an organic vehicle and can be used to improve the material properties of metal particle layers. Specific formulations have been developed to be screen-printed directly onto a dried metal particle layer and fired to make a fired multilayer stack. The fired multilayer stack can be tailored to create a solderable surface, high mechanical strength, and low contact resistance. In some embodiments, the fired multilayer stack can etch through a dielectric layer to improve adhesion to a substrate. Such pastes can be used to increase the efficiency of silicon solar cells, specifically multi- and mono-crystalline silicon back-surface field (BSF), and passivated emitter and rear contact (PERC) photovoltaic cells. Other applications include integrated circuits and more broadly, electronic devices.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: August 22, 2017
    Assignee: PLANT PV, Inc.
    Inventors: Brian E. Hardin, Erik Sauar, Dhea Suseno, Jesse J. Hinricher, Jennifer Huang, Tom Yu-Tang Lin, Stephen T. Connor, Daniel J. Hellebusch, Craig H. Peters
  • Publication number: 20170148937
    Abstract: Intercalation pastes for use with semiconductor devices are disclosed. The pastes contain precious metal particles, intercalating particles, and an organic vehicle and can be used to improve the material properties of metal particle layers. Specific formulations have been developed to be screen-printed directly onto a dried metal particle layer and fired to make a fired multilayer stack. The fired multilayer stack can be tailored to create a solderable surface, high mechanical strength, and low contact resistance. In some embodiments, the fired multilayer stack can etch through a dielectric layer to improve adhesion to a substrate. Such pastes can be used to increase the efficiency of silicon solar cells, specifically multi- and mono-crystalline silicon back-surface field (BSF), and passivated emitter and rear contact (PERC) photovoltaic cells. Other applications include integrated circuits and more broadly, electronic devices.
    Type: Application
    Filed: November 23, 2016
    Publication date: May 25, 2017
    Inventors: Brian E. Hardin, Erik Sauar, Dhea Suseno, Jesse J. Hinricher, Jennifer Huang, Tom Yu-Tang Lin, Stephen T. Connor, Daniel J. Hellebusch, Craig H. Peters
  • Publication number: 20170148944
    Abstract: A method of forming a fired multilayer stack are described. The method involves the steps of a) applying a wet metal particle layer on at least a portion of a surface of a substrate, b) drying the wet metal particle layer to form a dried metal particle layer, c) applying a wet intercalation layer directly on at least a portion of the dried metal particle layer to form a multilayer stack, d) drying the multilayer stack, and e) co-firing the multilayer stack to form the fired multilayer stack. The intercalating layer may include one or more of low temperature base metal particles, crystalline metal oxide particles, and glass frit particles. The wet metal particle layer may include aluminum, copper, iron, nickel, molybdenum, tungsten, tantalum, titanium, steel or combinations thereof.
    Type: Application
    Filed: November 23, 2016
    Publication date: May 25, 2017
    Inventors: Brian E. Hardin, Erik Sauar, Dhea Suseno, Jesse J. Hinricher, Jennifer Huang, Tom Yu-Tang Lin, Stephen T. Connor, Daniel J. Hellebusch, Craig H. Peters
  • Publication number: 20170145224
    Abstract: Intercalation pastes for use with semiconductor devices are disclosed. The pastes contain precious metal particles, intercalating particles, and an organic vehicle and can be used to improve the material properties of metal particle layers. Specific formulations have been developed to be screen-printed directly onto a dried metal particle layer and fired to make a fired multilayer stack. The fired multilayer stack can be tailored to create a solderable surface, high mechanical strength, and low contact resistance. In some embodiments, the fired multilayer stack can etch through a dielectric layer to improve adhesion to a substrate. Such pastes can be used to increase the efficiency of silicon solar cells, specifically multi- and mono-crystalline silicon back-surface field (BSF), and passivated emitter and rear contact (PERC) photovoltaic cells. Other applications include integrated circuits and more broadly, electronic devices.
    Type: Application
    Filed: November 23, 2016
    Publication date: May 25, 2017
    Inventors: Brian E. Hardin, Erik Sauar, Dhea Suseno, Jesse J. Hinricher, Jennifer Huang, Tom Yu-Tang Lin, Stephen T. Connor, Daniel J. Hellebusch, Craig H. Peters
  • Publication number: 20170148933
    Abstract: Intercalation pastes for use with semiconductor devices are disclosed. The pastes contain precious metal particles, intercalating particles, and an organic vehicle and can be used to improve the material properties of metal particle layers. Specific formulations have been developed to be screen-printed directly onto a dried metal particle layer and fired to make a fired multilayer stack. The fired multilayer stack can be tailored to create a solderable surface, high mechanical strength, and low contact resistance. In some embodiments, the fired multilayer stack can etch through a dielectric layer to improve adhesion to a substrate. Such pastes can be used to increase the efficiency of silicon solar cells, specifically multi- and mono-crystalline silicon back-surface field (BSF), and passivated emitter and rear contact (PERC) photovoltaic cells. Other applications include integrated circuits and more broadly, electronic devices.
    Type: Application
    Filed: November 23, 2016
    Publication date: May 25, 2017
    Inventors: Brian E. Hardin, Erik Sauar, Dhea Suseno, Jesse J. Hinricher, Jennifer Huang, Tom Yu-Tang Lin, Stephen T. Connor, Daniel J. Hellebusch, Craig H. Peters
  • Patent number: 9064147
    Abstract: Handwriting interpretation tools, such as optical character recognition (OCR), have improved over the years such that OCR is a common tool in business for interpreting typed text and sometimes handwritten text. OCR does not apply well to non-text-only diagrams, such as chemical structure diagrams. A method according to an embodiment of the present invention of interpreting a human-drawn sketch includes determining a local metric indicating whether a candidate symbol belongs to a certain classification based on a set of features. The set of features includes, as a feature, scores generated from feature images of the candidate symbol. Also included is determining a joint metric of multiple candidate symbols based on their respective classifications and interpreting the sketch as a function of the local and joint metrics.
    Type: Grant
    Filed: March 19, 2014
    Date of Patent: June 23, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Tom Yu Ouyang, Randall Davis
  • Publication number: 20140205188
    Abstract: Handwriting interpretation tools, such as optical character recognition (OCR), have improved over the years such that OCR is a common tool in business for interpreting typed text and sometimes handwritten text. OCR does not apply well to non-text-only diagrams, such as chemical structure diagrams. A method according to an embodiment of the present invention of interpreting a human-drawn sketch includes determining a local metric indicating whether a candidate symbol belongs to a certain classification based on a set of features. The set of features includes, as a feature, scores generated from feature images of the candidate symbol. Also included is determining a joint metric of multiple candidate symbols based on their respective classifications and interpreting the sketch as a function of the local and joint metrics.
    Type: Application
    Filed: March 19, 2014
    Publication date: July 24, 2014
    Applicant: Massachusetts Institute of Technology
    Inventors: Tom Yu Ouyang, Randall Davis
  • Patent number: 8718375
    Abstract: Handwriting interpretation tools, such as optical character recognition (OCR), have improved over the years such that OCR is a common tool in business for interpreting typed text and sometimes handwritten text. OCR does not apply well to non-text-only diagrams, such as chemical structure diagrams. A method according to an embodiment of the present invention of interpreting a human-drawn sketch includes determining a local metric indicating whether a candidate symbol belongs to a certain classification based on a set of features. The set of features includes, as a feature, scores generated from feature images of the candidate symbol. Also included is determining a joint metric of multiple candidate symbols based on their respective classifications and interpreting the sketch as a function of the local and joint metrics.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: May 6, 2014
    Assignee: Massachusetts Institute of Technology
    Inventors: Tom Yu Ouyang, Randall Davis
  • Publication number: 20120141032
    Abstract: Handwriting interpretation tools, such as optical character recognition (OCR), have improved over the years such that OCR is a common tool in business for interpreting typed text and sometimes handwritten text. OCR does not apply well to non-text-only diagrams, such as chemical structure diagrams. A method according to an embodiment of the present invention of interpreting a human-drawn sketch includes determining a local metric indicating whether a candidate symbol belongs to a certain classification based on a set of features. The set of features includes, as a feature, scores generated from feature images of the candidate symbol. Also included is determining a joint metric of multiple candidate symbols based on their respective classifications and interpreting the sketch as a function of the local and joint metrics.
    Type: Application
    Filed: December 2, 2011
    Publication date: June 7, 2012
    Applicant: Massachusetts Institute of Technology
    Inventors: Tom Yu Ouyang, Randall Davis
  • Patent number: 7645696
    Abstract: Methods of depositing thin seed layers that improve continuity of the seed layer as well as adhesion to the barrier layer are provided. According to various embodiments, the methods involve performing an etchback operation in the seed deposition chamber prior to depositing the seed layer. The etch step removes barrier layer overhang and/or oxide that has formed on the barrier layer. It some embodiments, a small deposition flux of seed atoms accompanies the sputter etch flux of argon ions, embedding metal atoms into the barrier layer. The embedded metal atoms create nucleation sites for subsequent seed layer deposition, thereby promoting continuous seed layer film growth, film stability and improved seed layer-barrier layer adhesion.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: January 12, 2010
    Assignee: Novellus Systems, Inc.
    Inventors: Alexander Dulkin, Anil Vijayendran, Tom Yu, Daniel R. Juliano
  • Patent number: 6471831
    Abstract: A PVD system comprises a hollow cathode magnetron with a downstream plasma control mechanism. The magnetron has a hollow cathode with a non-planar target and at least one electromagnetic coil to generate and maintain a plasma within the cathode. The magnetron also has an anode located between the cathode and a downstream plasma control mechanism. The control mechanism comprises a first, second and third electromagnetic coil beneath a mouth of the target, vertically spaced so as to form a tapered magnetic convergent lens between the target mouth and a pedestal of the magnetron.
    Type: Grant
    Filed: January 9, 2001
    Date of Patent: October 29, 2002
    Assignee: Novellus Systems, Inc.
    Inventors: Jean Qing Lu, Tom Yu, Linda Stenzel, Jeffrey Tobin
  • Patent number: 6468404
    Abstract: A PVD system comprises a hollow cathode magnetron with a capability of producing a high magnetic field for PVD and a low magnetic field for pasting. The high magnetic field is used for PVD and causes an optimal uniform film to form on a substrate but redeposits some metals onto a top portion of a target within the magnetron. The low magnetic field erodes redeposited materials from a top portion of a target within the magnetron.
    Type: Grant
    Filed: January 23, 2001
    Date of Patent: October 22, 2002
    Assignee: Novellus Systems, Inc.
    Inventors: Jean Qing Lu, Tom Yu, Jeffrey Tobin
  • Patent number: D847344
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: April 30, 2019
    Assignee: Western Clinical Engineering Ltd.
    Inventors: James A. McEwen, Michael Jameson, Kenneth L. Glinz, Jeswin Jeyasurya, Tom Yu Chia Lai
  • Patent number: D850631
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: June 4, 2019
    Assignee: Western Clinical Engineering Ltd.
    Inventors: James Allen McEwen, Michael Jameson, Tom Yu Chia Lai, Jane Dorothea Procyshyn, Joshua Jonathan Sam