Patents by Inventor Tomohiro Kobayashi
Tomohiro Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11973380Abstract: An aspect of an electric pump of the present invention is an electric pump attached to a predetermined object. The electric pump includes a motor having a rotor rotatable about a center axis extending in an axial direction, a pump mechanism coupled to the rotor, a circuit board located radially outside the motor and having a plate face directed in a radial direction, an electrolytic capacitor attached to the plate face of the circuit board, and a housing that houses the motor, the pump mechanism, the circuit board, and the electrolytic capacitor therein. The housing has a mounting face attached to a predetermined object. The mounting face is a face directed radially outward. The plate face of the circuit board is disposed along a direction intersecting the mounting face. The electrolytic capacitor is disposed at a position closer to the mounting face than the center axis in the direction orthogonal to the mounting face.Type: GrantFiled: January 17, 2022Date of Patent: April 30, 2024Assignee: NIDEC TOSOK CORPORATIONInventors: Yoshiyuki Kobayashi, Tomohiro Sakata, Yuzo Nagai, Hideo Nagai
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Patent number: 11964838Abstract: A printing apparatus includes a printing unit configured to print an image on a sheet; a first exit path from which the sheet with the image printed thereon by the printing unit is discharged while being reversed; a second exit path from which the sheet with the image printed thereon by the printing unit is discharged without being reversed; and a switch member configured to be pivotably arranged so as to switch between the first exit path and the second exit path. The first exit path passes above a pivot center of the switch member, and the second exit path passes below the pivot center.Type: GrantFiled: November 17, 2021Date of Patent: April 23, 2024Assignee: Canon Kabushiki KaishaInventors: Shinya Asano, Takeshi Koda, Toshiro Sugiyama, Waichiro Saiki, Tomohiro Suzuki, Ryo Kobayashi, Tomoyuki Nagase
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Publication number: 20240094303Abstract: A battery state estimation device includes: a first state of charge (SOC) calculator that calculates a first SOC using a first method that uses the battery model parameter of a battery; a second SOC calculator that calculates a second SOC using a second method different from the first method; an alternating-current (AC) impedance measurement unit that measures the AC impedance of the battery when the error between the first SOC and the second SOC is greater than a predetermined threshold; and a battery model parameter calculator that calculates a battery model parameter using the measured AC impedance. The first SOC calculator recalculates the first SOC using the battery model parameter calculated.Type: ApplicationFiled: November 30, 2023Publication date: March 21, 2024Inventors: Keiichi FUJII, Hitoshi KOBAYASHI, Tomohiro OKACHI
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Patent number: 11935936Abstract: [Object] It is an object of the present invention to provide an aluminum alloy film having excellent bending resistance and heat resistance, and a thin film transistor including the aluminum alloy film. [Solving Means] In order to achieve the above-mentioned object, an aluminum alloy film according to an embodiment of the present invention includes: an Al pure metal that includes at least one type of a first additive element selected from the group consisting of Zr, Sc, Mo, Y, Nb, and Ti. A content of the first additive element is 0.01 atomic % or more and 1.0 atomic % or less. Such an aluminum alloy film has excellent bending resistance and excellent heat resistance. Further, also etching can be performed on the aluminum alloy film.Type: GrantFiled: March 28, 2019Date of Patent: March 19, 2024Assignee: ULVAC, INC.Inventors: Yuusuke Ujihara, Motoshi Kobayashi, Yasuhiko Akamatsu, Tomohiro Nagata, Ryouta Nakamura, Junichi Nitta, Yasuo Nakadai
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Publication number: 20240053678Abstract: A resist composition comprising an acid compound, a photoacid generator of iodonium salt type and/or a photo-decomposable quencher of iodonium salt type, and a base polymer has a high sensitivity, reduced edge roughness or size variation, improved resolution and satisfactory storage stability.Type: ApplicationFiled: July 26, 2023Publication date: February 15, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Yutaro Otomo, Tomohiro Kobayashi
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Patent number: 11876429Abstract: A vibration motor includes a stationary portion and a movable portion vibrable in an axis direction with respect to the stationary portion. The stationary portion includes a coil and a housing. The housing includes a first region expanding in a first direction orthogonal to the axis direction, and a second region disposed on one side in a second direction orthogonal to the axis direction and the first direction relative to the first region and expanding in the first direction. In a cross-section across the axis direction, a distance in the second direction between the second region and the first region is longest at a center in the first direction of the first region. In the cross-section, a shape formed by the first and second regions is asymmetric with respect to an axis extending parallel to the first direction through a center of the housing in the second direction.Type: GrantFiled: April 21, 2022Date of Patent: January 16, 2024Assignee: NIDEC CORPORATIONInventors: Atsunori Hirata, Daisuke Adachi, Hiroaki Hirano, Tomohiro Kobayashi
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Patent number: 11789536Abstract: An input device includes a contact body to contact an object, a pressure sensor to detect pressure of contact of the contact body with the object, a vibrator to generate a vibration to provide a tactile sensation, and a vibration controller. The vibration of the vibrator when the pressure detected based on the output of the pressure sensor is large is larger than that when the pressure detected based on the output of the pressure sensor is small.Type: GrantFiled: December 10, 2021Date of Patent: October 17, 2023Assignee: NIDEC CORPORATIONInventors: Atsunori Hirata, Tomohiro Hasegawa, Daisuke Adachi, Hiroaki Hirano, Tomohiro Kobayashi
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Publication number: 20230318396Abstract: A vibration motor includes a stationary portion and a movable portion to vibrate in a center axis direction with respect to the stationary portion. The stationary portion includes a coil to apply a driving force to the movable portion by energization, and a housing that accommodates the movable portion and the coil. The housing includes a notch recessed inward from an outer edge of the housing in the center axis direction. The notch includes a first notch recessed inward from an outer edge of the housing in the center axis direction, and a second notch recessed inward from an outer edge of the first notch in the center axis direction. A lead wire of the coil extends out of the housing through the notch.Type: ApplicationFiled: March 29, 2023Publication date: October 5, 2023Inventor: Tomohiro KOBAYASHI
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Publication number: 20230296981Abstract: Provided are: a resist material and patterning process having sensitivity, resolution, and dissolution contrast exceeding those of conventional positive-type resist materials, having reduced edge roughness and size variation, and having a good pattern shape after exposure. A resist material, including: (Ia) a polymer having a repeating unit (A) having a hydroxy group or a carboxy group; (II) a crosslinker having a structure represented by the following formula (1); (III) a thermal acid generator having a structure represented by the following formula (2); (IV) an organic solvent; and (V) a component to be decomposed by irradiation of active ray or radiation to generate an acid.Type: ApplicationFiled: March 9, 2023Publication date: September 21, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Gentaro HIDA, Tomohiro KOBAYASHI, Yutaro OTOMO, Tomonari NOGUCHI
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Publication number: 20230296980Abstract: An object of the present invention is to provide a resist material and a pattern forming method with which the edge roughness and dimension variation become small, superior resolution can be obtained, pattern shape becomes preferable after exposure, and further preferable storage stability can be obtained.Type: ApplicationFiled: March 9, 2023Publication date: September 21, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Yutaro OTOMO, Tomohiro Kobayashi, Gentaro Hida, Kousuke Ohyama, Masayoshi Sagehashi, Masahiro Fukushima
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Patent number: 11762287Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.Type: GrantFiled: November 3, 2020Date of Patent: September 19, 2023Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Takayuki Fujiwara, Kenichi Oikawa, Tomohiro Kobayashi, Masahiro Fukushima
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Publication number: 20230280651Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.Type: ApplicationFiled: May 15, 2023Publication date: September 7, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Teppei ADACHI, Shinya YAMASHITA, Masaki OHASHI, Tomohiro KOBAYASHI, Kenichi OIKAWA, Takayuki FUJIWARA
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Publication number: 20230244142Abstract: Provided is a polymer, a resist composition, and a pattern forming method with high sensitivity, high resolution, and high contrast, and that can form a pattern with small variation in pattern width (LWR), and small in-plane uniformity of the pattern (CDU) with high energy ray. A polymer to generate an acid by light exposure and to change in solubility in a developing liquid with an action of the acid, the polymer including: a repeating unit represented by the following formula (A-1); and a repeating unit represented by any one or more of the following formulae (B-1) to (B-4), wherein, M? represents a non-nucleophilic counterion, A+ represents an onium cation, n1 represents an integer of 1 or 2, n2 represents an integer of 0 to 2, n3 represents an integer of 0 to 5, n4 represents an integer of 0 to 2, and ācā represents an integer of 0 to 3.Type: ApplicationFiled: January 26, 2023Publication date: August 3, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masahiro FUKUSHIMA, Masayoshi SAGEHASHI, Tomohiro KOBAYASHI, Yutaro OTOMO, Koji HASEGAWA
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Patent number: 11693314Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.Type: GrantFiled: March 11, 2021Date of Patent: July 4, 2023Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Teppei Adachi, Shinya Yamashita, Masaki Ohashi, Tomohiro Kobayashi, Kenichi Oikawa, Takayuki Fujiwara
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Publication number: 20230198365Abstract: A vibration motor includes a stator, a vibrator capable of vibrating in a left-right direction, and an elastic portion that connects the vibrator and the stator. The vibrator includes a mass body including a groove recessed in an up-down direction, and a magnet fixed to the mass body inside the groove when viewed in the up-down direction. The stator includes a coil located inside the groove and opposing the magnet in the up-down direction, and a protector covering at least a portion of two ends of the coil in the left-right direction. The groove includes a first opposing surface. The protector includes a second opposing surface. The first opposing surface and the second opposing surface oppose each other in the left-right direction.Type: ApplicationFiled: December 16, 2022Publication date: June 22, 2023Inventors: Atsunori HIRATA, Tomohiro KOBAYASHI
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Publication number: 20230198362Abstract: A vibration motor includes a stator, a vibrator capable of vibrating in an axial direction, and an elastic member that connects the vibrator and the stator and is arranged on the axially upper side of the vibrator. The vibrator includes a mass body and a magnet member fixed to the mass body on the axially lower side of the mass body. The mass body includes a base portion extending in a radial direction and a column portion extending axially downward from the base portion. The magnet member has a hole portion recessed axially downward from an upper surface or penetrating through the magnet member. An outer edge of the hole portion is arranged radially outward of the column portion. The base portion faces an upper end of the coil in the axial direction.Type: ApplicationFiled: December 20, 2022Publication date: June 22, 2023Inventors: Atsunori HIRATA, Tomohiro KOBAYASHI
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Patent number: 11680339Abstract: There is provided a method of manufacturing a group III nitride semiconductor substrate including: a fixing step S10 of fixing abase substrate, which includes a group III nitride semiconductor layer having a semipolar plane as a main surface, to a susceptor; a first growth step S11 of forming a first growth layer by growing a group III nitride semiconductor over the main surface of the group III nitride semiconductor layer in a state in which the base substrate is fixed to the susceptor using an HVPE method; a cooling step S12 of cooling a laminate including the susceptor, the base substrate, and the first growth layer; and a second growth step S13 of forming a second growth layer by growing a group III nitride semiconductor over the first growth layer in a state in which the base substrate is fixed to the susceptor using the HVPE method.Type: GrantFiled: March 19, 2018Date of Patent: June 20, 2023Assignee: FURUKAWA CO., LTD.Inventors: Yujiro Ishihara, Hiroki Goto, Shoichi Fuda, Tomohiro Kobayashi, Hitoshi Sasaki
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Patent number: 11662663Abstract: A composition comprising (A) a polymer comprising recurring units (a1) having a carboxyl group protected with an acid labile group and recurring units (a2) having a cyclic ester, cyclic carbonate or cyclic sulfonate structure, (B) a thermal acid generator, and (C) an organic solvent is suited to form a protective film between a substrate and a resist film. Even when a metal-containing resist film is used, the protective film is effective for preventing the substrate from metal contamination.Type: GrantFiled: October 8, 2019Date of Patent: May 30, 2023Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tomohiro Kobayashi, Kenichi Oikawa, Masayoshi Sagehashi, Teppei Adachi
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Publication number: 20230152560Abstract: The optical system includes a plurality of lens groups in which an interval between adjacent lens groups changes when focusing, and an aperture stop, and when intervals between an exit pupil of an on-axis ray by the aperture stop and an image plane in an infinite-distance object focusing state, a first short-distance object focusing state in which an imaging magnification is ?1, and a second short-distance object focusing state in which an imaging magnification is ?2 are Pinf, P1, and P2, respectively, the optical system satisfies predetermined conditions. An imaging apparatus includes the optical system and an image sensor.Type: ApplicationFiled: September 20, 2022Publication date: May 18, 2023Applicant: TAMRON CO., LTD.Inventor: Tomohiro KOBAYASHI
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Patent number: 11649972Abstract: A gas conditioner 60 comprises: a case 62 that forms a gas flowpath 61 through which gas flows; and resin members 80 that are provided to the gas flowpath 61 and that are water permeable. The resin members 80 are formed of sealed hollow bodies that are filled with water.Type: GrantFiled: June 25, 2019Date of Patent: May 16, 2023Assignee: SUMITOMO PRECISION PRODUCTS CO., LTD.Inventors: Tomohiro Kobayashi, Tatsuya Yamakawa, Masaya Yoshimura, Ryo Fujita