Abstract: A vibrating motor includes a stationary portion, a movable element having a magnet member and capable of vibrating in a first direction, and an elastic member. The stationary portion has a coil that applies a driving force to the magnet member when the coil is energized, and a case that accommodates the movable element and the coil therein. The movable element has a holder member that holds one end portion in the first direction of the magnet member. The elastic member is connected to the holder member. The case has a case notch. The case notch is notched toward the other side in the first direction from one end in the first direction of the case. The holder member has a holder notch that is notched toward one side in a second direction perpendicular to the first direction. The case notch and the holder notch overlap as viewed in the second direction.

Abstract: A chemically amplified negative resist composition is provided comprising (A) a polymer P having a predetermined structure and comprising repeat units adapted to generate an acid upon exposure, repeat units adapted to change its solubility in a developer by degrading under the action of an acid, and repeat units having phenolic hydroxy group, and (B) a crosslinker X in the form of a melamine compound, a glycoluril compound, a urea compound or an epoxy compound substituted with at least one selected from a methylol group, an alkoxymethyl group and an acyloxymethyl group.

Abstract: The present invention is a monomer represented by the following general formula (a)-1M or (a)-2M. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a monomer to be an ingredient for the resist material; a resist composition containing the resist material; and a patterning process.

Abstract: The present invention is a resist material containing: a repeating unit-a containing at least one iodine atom between a polymer main chain and a carboxylate; and a repeating unit-b, being a sulfonium salt or iodonium salt of a sulfonic acid bonded to a polymer main chain. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a resist composition containing the resist material; and a patterning process.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.

Abstract: A printed wiring board includes a base insulating layer, a conductor layer formed on the base layer and including pads, a solder resist layer formed on the base layer such that the solder resist layer is covering the conductor layer and has openings exposing the pads, and plating bumps formed on the pads such that each plating bump includes a base plating layer formed in a respective one of the openings, an intermediate layer formed on the base plating layer, and a top plating layer formed on the intermediate layer. The plating bumps are formed such that the base plating layer has a side surface including a portion protruding from the solder resist layer, that the intermediate layer has a thickness in a range of 2.7 to 7.0 ?m, and that the top plating layer has a hemispherical shape and is covering only an upper surface of the intermediate layer.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and further containing at least one repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms with a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms without a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process of using it that show a particularly favorable mask dimension dependency and CDU in photolithography where a light source is a high-energy beam such as a KrF excimer laser beam, an electron beam, or an extreme ultraviolet ray.

Abstract: The present invention is a resist material containing: (i) a compound (i-1), which is a (partial) condensate or a (partial) hydrolysis-condensate of a metal compound shown by the following general formula (A-1), or a compound (i-2), which is a reaction product of the compound (i-1) and a dihydric or trihydric alcohol shown by the following general formula (A-2), (ii) a photo-acid generator, (iii) a basic compound, and (iv) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.

Abstract: A zoom lens has a plurality of lens groups and is a zoom lens that zooms from the wide-angle end to the telephoto end by changing the distance between adjacent lens groups, and has an aperture stop and at least one focus group each on the object side and the image side with the aperture stop therebetween, and when focused from infinity to a close object, the focus groups move along the optical axis, and the focus group arranged on the object side closer than the aperture stop includes at least one lens, and the lens satisfies the predetermined conditional expression. In addition, an imaging apparatus includes the zoom lens.

Abstract: The present invention is a resist material containing: (i) a metal compound shown by the following general formula (M-1) and (ii) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.

Abstract: A target structure includes a target and a cooling portion. The target generates neutrons by being irradiated with a charged particle beam. The cooling portion includes a front surface and a back surface that face to sides opposite to each other. The target is joined directly or indirectly to the front surface. A flow path for flowing of cooling liquid including hydrogen elements is formed in the cooling portion. When viewed in a thickness direction of the cooling portion from the front surface to the back surface, the flow path is positioned off a center portion of the target.

Abstract: A resist composition comprising an acid compound, a photoacid generator of iodonium salt type and/or a photo-decomposable quencher of iodonium salt type, and a base polymer has a high sensitivity, reduced edge roughness or size variation, improved resolution and satisfactory storage stability.

Abstract: A vibration motor includes a stationary portion and a movable portion vibrable in an axis direction with respect to the stationary portion. The stationary portion includes a coil and a housing. The housing includes a first region expanding in a first direction orthogonal to the axis direction, and a second region disposed on one side in a second direction orthogonal to the axis direction and the first direction relative to the first region and expanding in the first direction. In a cross-section across the axis direction, a distance in the second direction between the second region and the first region is longest at a center in the first direction of the first region. In the cross-section, a shape formed by the first and second regions is asymmetric with respect to an axis extending parallel to the first direction through a center of the housing in the second direction.

Abstract: An input device includes a contact body to contact an object, a pressure sensor to detect pressure of contact of the contact body with the object, a vibrator to generate a vibration to provide a tactile sensation, and a vibration controller. The vibration of the vibrator when the pressure detected based on the output of the pressure sensor is large is larger than that when the pressure detected based on the output of the pressure sensor is small.

Abstract: A vibration motor includes a stationary portion and a movable portion to vibrate in a center axis direction with respect to the stationary portion. The stationary portion includes a coil to apply a driving force to the movable portion by energization, and a housing that accommodates the movable portion and the coil. The housing includes a notch recessed inward from an outer edge of the housing in the center axis direction. The notch includes a first notch recessed inward from an outer edge of the housing in the center axis direction, and a second notch recessed inward from an outer edge of the first notch in the center axis direction. A lead wire of the coil extends out of the housing through the notch.

Abstract: An object of the present invention is to provide a resist material and a pattern forming method with which the edge roughness and dimension variation become small, superior resolution can be obtained, pattern shape becomes preferable after exposure, and further preferable storage stability can be obtained.

Abstract: Provided are: a resist material and patterning process having sensitivity, resolution, and dissolution contrast exceeding those of conventional positive-type resist materials, having reduced edge roughness and size variation, and having a good pattern shape after exposure. A resist material, including: (Ia) a polymer having a repeating unit (A) having a hydroxy group or a carboxy group; (II) a crosslinker having a structure represented by the following formula (1); (III) a thermal acid generator having a structure represented by the following formula (2); (IV) an organic solvent; and (V) a component to be decomposed by irradiation of active ray or radiation to generate an acid.

Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.

Abstract: Provided is a polymer, a resist composition, and a pattern forming method with high sensitivity, high resolution, and high contrast, and that can form a pattern with small variation in pattern width (LWR), and small in-plane uniformity of the pattern (CDU) with high energy ray. A polymer to generate an acid by light exposure and to change in solubility in a developing liquid with an action of the acid, the polymer including: a repeating unit represented by the following formula (A-1); and a repeating unit represented by any one or more of the following formulae (B-1) to (B-4), wherein, M? represents a non-nucleophilic counterion, A+ represents an onium cation, n1 represents an integer of 1 or 2, n2 represents an integer of 0 to 2, n3 represents an integer of 0 to 5, n4 represents an integer of 0 to 2, and “c” represents an integer of 0 to 3.