Patents by Inventor Tomohiro Kobayashi

Tomohiro Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210291542
    Abstract: A liquid cartridge includes a first surface, a second surface spaced apart from the first surface, and a third surface extending between the first surface and the second surface, with a liquid outlet through the first surface. A circuit board is mounted on the third surface. A locking mechanism includes a locking surface that extends above the third surface, and a liquid detection mechanism includes a light access portion. The light access portion is disposed between the circuit board and the locking surface, and the circuit board is disposed between the first surface and the light access portion.
    Type: Application
    Filed: March 12, 2021
    Publication date: September 23, 2021
    Applicant: BROTHER KOGYO KABUSHIKI KAISHA
    Inventors: Naoya OKAZAKI, Tetsuro KOBAYASHI, Hiroaki TAKAHASHI, Kosuke NUKUI, Akihito ONO, Mikio HIRANO, Suguru TOMOGUCHI, Yutao WANG, Tomohiro KANBE
  • Publication number: 20210271136
    Abstract: A display device includes a display panel, at least one light source, a diffusion plate, an optical member, and a plurality of adhesive layers. The diffusion plate diffuses light from the at least one light source. The optical member is disposed between the diffusion plate and the at least one light source and has at least one transmitting portion that transmits the light from the at least one light source and a reflective portion that reflects the light from the at least one light source. The adhesive layers bond the optical member and the diffusion plate with an air layer therebetween. The adhesive layers are arranged spaced apart from each other in a direction in which the optical member extends. The air layer has the same thickness as the adhesive layers and is located between an adjacent pair of the adhesive layers.
    Type: Application
    Filed: February 19, 2021
    Publication date: September 2, 2021
    Inventor: Tomohiro KOBAYASHI
  • Patent number: 11108214
    Abstract: A wavelength combining laser apparatus includes: a semiconductor laser emitting laser beams in an optical-axial direction perpendicular to a laser beam combining direction; a wavelength combining element combining the laser beams in the laser beam combining direction into a single laser beam; a cross-coupling reduction optical system having positive power in the laser beam combining direction perpendicular to an optical axis of the single laser beam output from the wavelength combining element; and a partially-reflective mirror reflecting the single laser beam having passed through the cross-coupling reduction optical system and also allowing the single laser beam to transmit through and exit the partially-reflective mirror.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: August 31, 2021
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Nobutaka Kobayashi, Tomotaka Katsura, Daiji Morita, Junichi Nishimae, Tomohiro Kyoto
  • Publication number: 20210200083
    Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
    Type: Application
    Filed: March 11, 2021
    Publication date: July 1, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei ADACHI, Shinya YAMASHITA, Masaki OHASHI, Tomohiro KOBAYASHI, Kenichi OIKAWA, Takayuki FUJIWARA
  • Publication number: 20210188770
    Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.
    Type: Application
    Filed: December 1, 2020
    Publication date: June 24, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Kenichi Oikawa, Tomohiro Kobayashi, Masahiro Fukushima
  • Publication number: 20210168925
    Abstract: A target structure includes a target and a cooling portion. The target generates neutrons by being irradiated with a charged particle beam. The cooling portion includes a front surface and a back surface that face to sides opposite to each other. The target is joined directly or indirectly to the front surface. A flow path for flowing of cooling liquid including hydrogen elements is formed in the cooling portion. When viewed in a thickness direction of the cooling portion from the front surface to the back surface, the flow path is positioned off a center portion of the target.
    Type: Application
    Filed: August 1, 2019
    Publication date: June 3, 2021
    Applicant: RIKEN
    Inventors: Tomohiro KOBAYASHI, Yoshie OTAKE, Hideyuki SUNAGA, Xiaobo LI
  • Publication number: 20210149301
    Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.
    Type: Application
    Filed: November 3, 2020
    Publication date: May 20, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Kenichi Oikawa, Tomohiro Kobayashi, Masahiro Fukushima
  • Patent number: 10996513
    Abstract: A lighting device includes a light source, a light diffusion plate, and a sheet-like optical member. The light diffusion plate is arranged opposite the light source. The light diffusion plate diffuses light from the light source. The optical member is disposed between the light diffusion plate and the light source. The optical member includes a transmitting part that transmits the light emitted from the light source and a reflecting part that reflects the light emitted from the light source. The optical member is supported by a support portion that is integrally provided to the light diffusion plate.
    Type: Grant
    Filed: July 15, 2020
    Date of Patent: May 4, 2021
    Assignee: FUNAI ELECTRIC CO., LTD.
    Inventor: Tomohiro Kobayashi
  • Publication number: 20210063871
    Abstract: The present invention is a resist material containing: (i) a metal compound shown by the following general formula (M-1) and (ii) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.
    Type: Application
    Filed: July 24, 2020
    Publication date: March 4, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tomohiro Kobayashi, Tsukasa Watanabe, Hiroki Nonaka, Seiichiro Tachibana
  • Publication number: 20210063873
    Abstract: The present invention is a resist material containing: (i) a compound (i-1), which is a (partial) condensate or a (partial) hydrolysis-condensate of a metal compound shown by the following general formula (A-1), or a compound (i-2), which is a reaction product of the compound (i-1) and a dihydric or trihydric alcohol shown by the following general formula (A-2), (ii) a photo-acid generator, (iii) a basic compound, and (iv) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.
    Type: Application
    Filed: July 22, 2020
    Publication date: March 4, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tomohiro KOBAYASHI, Tsukasa WATANABE, Hiroki NONAKA, Seiichiro TACHIBANA
  • Patent number: 10928582
    Abstract: A display device of which an entire thickness in front and rear directions can be reduced and in which temperature of a lower portion can be prevented from being high is provided. A television device (display device) (100) includes a light source part (2), an optical sheet (5), and a rear frame (6). The light source part (2) is disposed in the upper portion of the television device (television device) (100) and a hollow light-guiding region (7) is provided between the reflection sheet (4) and the optical sheet (5). In the reflection sheet (4), a distance to the optical sheet (5) is less in the lower portion than in the upper portion.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: February 23, 2021
    Assignee: FUNAI ELECTRIC CO., LTD.
    Inventor: Tomohiro Kobayashi
  • Publication number: 20210018797
    Abstract: A lighting device includes a plurality of light sources, a light diffusion plate, a sheet-like optical member, and a partition. The light diffusion plate is arranged opposite the light sources. The light diffusion plate diffuses light from the light sources. The optical member is disposed between the light diffusion plate and the light sources. The optical member includes a transmitting part that transmits the light emitted from the light sources and a reflecting part that reflects the light emitted from the light sources. The partition is arranged between adjacent light sources. The optical member is held by a support portion that is integrally provided to the partition and protrudes from an end portion of the partition toward the light diffusion plate.
    Type: Application
    Filed: July 15, 2020
    Publication date: January 21, 2021
    Inventor: Tomohiro KOBAYASHI
  • Publication number: 20210018798
    Abstract: A lighting device includes a light source, a light diffusion plate, and a sheet-like optical member. The light diffusion plate is arranged opposite the light source. The light diffusion plate diffuses light from the light source. The optical member is disposed between the light diffusion plate and the light source. The optical member includes a transmitting part that transmits the light emitted from the light source and a reflecting part that reflects the light emitted from the light source. The optical member is supported by a support portion that is integrally provided to the light diffusion plate.
    Type: Application
    Filed: July 15, 2020
    Publication date: January 21, 2021
    Inventor: Tomohiro KOBAYASHI
  • Publication number: 20200340806
    Abstract: A method for measuring a distance of diffusion of a curing catalyst for a thermosetting silicon-containing material includes the steps of: forming a silicon-containing film from a composition containing a thermosetting silicon-containing material, a curing catalyst and a solvent; coating the silicon-containing film with a photosensitive resin composition containing a resin whose solubility in alkaline developer is increased by the action of an acid, an acid generator and a solvent, and subsequently heating to prepare a substrate on which the silicon-containing film and a resin film are formed; irradiating the substrate with a high energy beam or an electron beam to generate an acid and heat-treating the substrate to increase the solubility of the resin in an alkaline developer by the action of the acid in the resin film; dissolving the resin film in an alkaline developer; and measuring a film thickness of the remaining resin.
    Type: Application
    Filed: March 4, 2020
    Publication date: October 29, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tsutomu OGIHARA, Tsukasa WATANABE, Yoshio KAWAI, Tomohiro KOBAYASHI, Yusuke BIYAJIMA, Masahiro KANAYAMA
  • Publication number: 20200249571
    Abstract: A resist composition comprising a sulfonium salt having formula (1) as PAG, a base polymer, and an organic solvent, when processed by lithography, has light transmittance, acid diffusion suppressing effect, and excellent lithography performance factors such as DOF, LWR and MEF. A lithography process for forming a resist pattern from the composition is also provided.
    Type: Application
    Filed: January 15, 2020
    Publication date: August 6, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Kenichi Oikawa, Masaki Ohashi, Tomohiro Kobayashi
  • Publication number: 20200133123
    Abstract: A composition comprising (A) a polymer comprising recurring units (a1) having a carboxyl group protected with an acid labile group and recurring units (a2) having a cyclic ester, cyclic carbonate or cyclic sulfonate structure, (B) a thermal acid generator, and (C) an organic solvent is suited to form a protective film between a substrate and a resist film. Even when a metal-containing resist film is used, the protective film is effective for preventing the substrate from metal contamination.
    Type: Application
    Filed: October 8, 2019
    Publication date: April 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tomohiro Kobayashi, Kenichi Oikawa, Masayoshi Sagehashi, Teppei Adachi
  • Publication number: 20200064543
    Abstract: A display device of which an entire thickness in front and rear directions can be reduced and in which temperature of a lower portion can be prevented from being high is provided. A television device (display device) (100) includes a light source part (2), an optical sheet (5), and a rear frame (6). The light source part (2) is disposed in the upper portion of the television device (television device) (100) and a hollow light-guiding region (7) is provided between the reflection sheet (4) and the optical sheet (5). In the reflection sheet (4), a distance to the optical sheet (5) is less in the lower portion than in the upper portion.
    Type: Application
    Filed: August 22, 2019
    Publication date: February 27, 2020
    Applicant: FUNAI ELECTRIC CO., LTD.
    Inventor: Tomohiro Kobayashi
  • Publication number: 20200024770
    Abstract: There is provided a method of manufacturing a group III nitride semiconductor substrate including: a fixing step S10 of fixing a base substrate, which includes a group III nitride semiconductor layer having a semipolar plane as a main surface, to a susceptor; a first growth step S11 of forming a first growth layer by growing a group III nitride semiconductor over the main surface of the group III nitride semiconductor layer in a state in which the base substrate is fixed to the susceptor using an HVPE method; a cooling step S12 of cooling a laminate including the susceptor, the base substrate, and the first growth layer; and a second growth step S13 of forming a second growth layer by growing a group III nitride semiconductor over the first growth layer in a state in which the base substrate is fixed to the susceptor using the HVPE method.
    Type: Application
    Filed: March 19, 2018
    Publication date: January 23, 2020
    Inventors: Yujiro ISHIHARA, Hiroki GOTO, Shoichi FUDA, Tomohiro KOBAYASHI, Hitoshi SASAKI
  • Publication number: 20190233832
    Abstract: It was found that bringing a substance into contact with a plant cell after the plant cell is treated with plasma makes it possible to easily and highly efficiently introduce the substance into the cell without causing a damae regardless of the types of the plant and tissue from which the plant cell is derived.
    Type: Application
    Filed: June 8, 2017
    Publication date: August 1, 2019
    Applicants: NATIONAL AGRICULTURE AND FOOD RESEARCH ORGANIZATION, TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Ichiro MITSUHARA, Yuki YANAGAWA, Akitoshi OKINO, Hidekazu MIYAHARA, Hiroaki KAWANO, Tomohiro KOBAYASHI, Yosuke WATANABE
  • Publication number: 20190163065
    Abstract: A pattern having a good balance of sensitivity, resolution and LWR is formed by providing a resist film comprising a base resin comprising recurring units having a C4-C6 tertiary alkoxy or alkoxycarbonyl group as an acid labile group and recurring units capable of generating a backbone-bound acid upon exposure, exposing the resist film to radiation, optionally post-exposure baking the resist film at a low temperature of 30-70° C., and developing the film.
    Type: Application
    Filed: November 19, 2018
    Publication date: May 30, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takeshi Sasami, Tomohiro Kobayashi