Patents by Inventor Tomohiro Kobayashi

Tomohiro Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
    Publication number: 20150086926
    Abstract: A carboxylic acid sulfonium salt having formula (1) is provided wherein R0 is hydrogen or a monovalent hydrocarbon group, R01 and R02 are hydrogen or a monovalent hydrocarbon group, at least one of R0, R01, and R02 has a cyclic structure, L is a single bond or forms an ester, sulfonate, carbonate or carbamate bond with the vicinal oxygen atom, R2, R3 and R4 are monovalent hydrocarbon groups. The sulfonium salt functions as a quencher in a resist composition, enabling to form a pattern of good profile with minimal LWR, rectangularity, and high resolution.
    Type: Application
    Filed: September 9, 2014
    Publication date: March 26, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Masahiro Fukushima, Tomohiro Kobayashi, Ryosuke Taniguchi
  • POWER MODULE AND THREE-LEVEL POWER CONVERTER USING THE SAME
    Publication number: 20150078052
    Abstract: A first pair including a highest-outer-side switching element and a switching element that operates as a neutral clamp diode on a higher potential side, a second pair including a lowest-outer-side switching element and a switching element that operates as a neutral clamp diode on a lower potential side, and a third pair including a higher-inner-side switching element and a lower-inner-side switching element are respectively configured from power modules that are two-element-inclusive power modules, a power conversion circuit portion being configured from the first pair, the second pair, and the third pair.
    Type: Application
    Filed: April 26, 2012
    Publication date: March 19, 2015
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Tomohiro Kobayashi, Yukio Narashima, Hideo Okayama
  • POWER CONVERTER
    Publication number: 20150049527
    Abstract: A power converter, which performs cooling of a switching element by using a boiling cooling apparatus that makes use of a boiling phenomenon of a coolant incorporated therein, includes a control unit to control an operation of the power converter based on a deviation between an element attachment surface temperature, which is a temperature of an attachment surface of the switching element, and a cooling apparatus intake air temperature. When the deviation between the element attachment surface temperature and the cooling apparatus intake air temperature exceeds a predetermined threshold, the control unit performs control of stopping the power converter.
    Type: Application
    Filed: October 6, 2011
    Publication date: February 19, 2015
    Applicant: Mitsubishi Electric Corporation
    Inventors: Tetsuo Sugahara, Tomohiro Kobayashi, Ryosuke Nakagawa
  • Sulfonium salt, resist composition, and patterning process
    Patent number: 8956803
    Abstract: The present invention provides a sulfonium salt used in a resist composition that can give a pattern having a high resolution, especially an excellent rectangularity of a pattern form and a small roughness, while not readily generating a defect, in the photolithography using a high energy beam as a light source; a resist composition that contains the sulfonium salt; and a patterning process using this resist composition, wherein the sulfonium salt is shown by the following general formula (1a), wherein each of R and R0 independently represents a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 30 carbon atoms which may be optionally substituted by a heteroatom or interposed by a heteroatom.
    Type: Grant
    Filed: December 6, 2013
    Date of Patent: February 17, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Tomohiro Kobayashi, Akihiro Seki, Masayoshi Sagehashi, Masahiro Fukushima
  • Preparation of polymer, resulting polymer, resist composition, and patterning process
    Patent number: 8957160
    Abstract: A sulfonic acid anion-containing polymer having a triarylsulfonium cation is prepared by (1) preparing a sulfonic acid anion-containing polymer having an ammonium or metal cation not bound thereto, (2) purifying the polymer by water washing or crystallization, and (3) then reacting the polymer with a triarylsulfonium salt. A resist composition comprising the inventive polymer is effective for controlling acid diffusion since the sulfonium salt is bound to the polymer backbone.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: February 17, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Tomohiro Kobayashi, Masayoshi Sagehashi
  • CARBON HEAT SOURCE AND FLAVOR INHALER
    Publication number: 20150013703
    Abstract: A carbon heat source (10) is equipped with: a cylindrical section (11) provided with a cavity (11A) through which there is ventilation communication in the longitudinal axis direction (L) of the carbon heat source (10); and an ignition end (12) which is provided further to the ignition side of the carbon heat source (10) than the cylindrical section (11). Therein, a groove (12A) which connects with the cavity (11A) is formed on the end surface (E) of the ignition side of the ignition end (12).
    Type: Application
    Filed: September 29, 2014
    Publication date: January 15, 2015
    Applicant: JAPAN TOBACCO INC.
    Inventors: Takeshi AKIYAMA, Tomohiro KOBAYASHI, Manabu YAMADA
  • Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
    Patent number: 8933251
    Abstract: A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
    Type: Grant
    Filed: March 20, 2013
    Date of Patent: January 13, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Yuji Harada, Jun Hatakeyama, Kazunori Maeda, Tomohiro Kobayashi
  • Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition
    Patent number: 8900793
    Abstract: There is disclosed a polymer having a repeating unit shown by the following general formula (1). There can be, in a photolithography using a high energy beam such as an ArF excimer laser beam and an EUV as a light source, (1) a polymer that gives a resist composition having an appropriate adhesion with a substrate and being capable of forming a pattern having excellent resolution, especially an excellent rectangular pattern profile, (2) a chemically amplified resist composition containing the said polymer, and (3) a patterning process using the said chemically amplified resist composition.
    Type: Grant
    Filed: May 21, 2012
    Date of Patent: December 2, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Youichi Ohsawa, Koji Hasegawa, Tomohiro Kobayashi
  • Acid generator, chemically amplified resist composition, and patterning process
    Patent number: 8900796
    Abstract: The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: To provide a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of LER and a depth of focus and can be effectively and widely used particularly without degradation of a resolution, a chemically amplified resist composition using the same, and a patterning process.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: December 2, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Tomohiro Kobayashi, Masayoshi Sagehashi
  • PATTERNING PROCESS AND RESIST COMPOSITION
    Publication number: 20140322650
    Abstract: A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units of formulae (1) and (2) and a photoacid generator of formula (3) onto a substrate, baking, exposure, PEB and developing in an organic solvent. In formulae (1) and (2), R1 is H, F, CH3 or CF3, Z is a single bond, phenylene, naphthylene, or (backbone)-C(?O)—O—Z?—, Z? is alkylene, phenylene or naphthylene, XA is an acid labile group, YL is H or a polar group. In formula (3), R2 and R3 are a monovalent hydrocarbon group, R4 is a divalent hydrocarbon group, or R2 and R3, or R2 and R4 may form a ring with the sulfur, L is a single bond or a divalent hydrocarbon group, Xa and Xb are H, F or CF3, and k is an integer of 1 to 4.
    Type: Application
    Filed: April 10, 2014
    Publication date: October 30, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Masahiro Fukushima, Tomohiro Kobayashi, Kazuhiro Katayama, Chuanwen Lin
  • PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND MONOMER
    Publication number: 20140308614
    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, PEB, and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition is based on a polymer comprising recurring units (a1) of formula (1) wherein R1 is H or CH3, R2 and R3 are H, F or a monovalent hydrocarbon group, R4 is H or a monovalent hydrocarbon group, R5 and R6 are a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, and k1=0 or 1. A fine hole or trench pattern can be formed therefrom.
    Type: Application
    Filed: March 14, 2014
    Publication date: October 16, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Koji Hasegawa, Masayoshi Sagehashi, Tomohiro Kobayashi, Kazuhiro Katayama
  • Catheter having denatured part for contact with body
    Patent number: 8858527
    Abstract: It is an object of the present invention to provide a catheter, whereby a tunnel infection route is closed such that infection can be prevented, by improving adhesiveness between a medical catheter and a biologically-derived adhesive (fibrin adhesive), cells, or biological tissue. The present invention provides a medical catheter which is composed of material selected from the group consisting of silicone, polyurethane, polypropylene and polytetrafluoroethylene (PTFE), at least a portion of the surface of which is modified by plasma ion implantation.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: October 14, 2014
    Assignee: Riken
    Inventors: Tomohiro Kobayashi, Yoshiaki Suzuki, Tomonori Miyazato, Hiroshi Ujiie
  • PROJECTOR
    Publication number: 20140293435
    Abstract: A projector for projecting an image includes a light source that outputs light; a reflecting member that reflects the light from the light source; and a diaphragm member with an aperture that restricts a range of flux of either an incident light incident to the reflecting member or a reflected light reflected by the reflecting member. The aperture may penetrate through the diaphragm member along a direction of thickness of the diaphragm member. The diaphragm member may be arranged so as to not block the other of the incident light or the reflected light, and a direction perpendicular to the direction of thickness may be oblique with respect to an optical path of either the incident light or the reflected light.
    Type: Application
    Filed: March 21, 2014
    Publication date: October 2, 2014
    Applicant: FUNAI ELECTRIC CO., LTD.
    Inventor: Tomohiro Kobayashi
  • Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process
    Patent number: 8835094
    Abstract: Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(?O)—, Aa is a (k1+1)-valent C1-C20 hydrocarbon or fluorinated hydrocarbon group, and k1 is 1, 2 or 3.
    Type: Grant
    Filed: September 19, 2011
    Date of Patent: September 16, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Hasegawa, Takeru Watanabe, Tomohiro Kobayashi, Takeshi Kinsho
  • PATTERNING PROCESS AND RESIST COMPOSITION
    Publication number: 20140255843
    Abstract: A negative pattern is formed by coating a resist composition comprising (A) a polymer having an acid labile group, adapted to change its polarity under the action of acid, (B) a photoacid generator, and (C) an organic solvent onto a substrate, baking, exposing the resist film to high-energy radiation, PEB, and developing in an organic solvent-based developer to selectively dissolve the unexposed region of resist film. The photoacid generator has the formula: R1—COOC(CF3)2—CH2SO3?R2R3R4S+ wherein R1 is a monovalent hydrocarbon group, R2, R3 and R4 are an alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl group, or may bond together to form a ring with the sulfur atom.
    Type: Application
    Filed: February 18, 2014
    Publication date: September 11, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tomohiro Kobayashi, Kazuhiro Katayama, Kentaro Kumaki, Chuanwen Lin, Masaki Ohashi, Masahiro Fukushima
  • Patterning process and resist composition
    Patent number: 8828647
    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units having an acid labile group-substituted carboxyl group and/or hydroxy group and recurring units having an oxirane or oxetane ring, an acid generator, and an organic solvent displays a high dissolution contrast in organic solvent development and controlled acid diffusion. A fine hole pattern featuring good size control can be formed.
    Type: Grant
    Filed: May 29, 2012
    Date of Patent: September 9, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tomohiro Kobayashi
  • PATTERNING PROCESS AND RESIST COMPOSITION
    Publication number: 20140242518
    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units of cycloolefin having a hydroxyl group substituted with an acid labile group, an acid generator, and an organic solvent displays a high dissolution contrast and high etch resistance.
    Type: Application
    Filed: May 2, 2014
    Publication date: August 28, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Tomohiro Kobayashi, Koji Hasegawa
  • Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process
    Patent number: 8808964
    Abstract: An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: August 19, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Takeru Watanabe, Tomohiro Kobayashi
  • Positive resist composition and patterning process
    Patent number: 8795942
    Abstract: There is disclosed a resist composition that remarkably improves the resolution of photolithography using a high energy beam such as ArF excimer laser light as a light source, and exhibits excellent resistance to surface roughness and side lobe under use of a halftone phase shift mask; and a patterning process using the resist composition. The positive resist composition at least comprises (A) a resin component comprising a repeating unit represented by the following general formula (1); (B) a photoacid generator generating sulfonic acid represented by the following general formula (2) upon exposure to a high energy beam; and (C) an onium salt where a cation is sulfonium represented by the following general formula (3), or ammonium represented by the following general formula (4); and an anion is represented by any one of the following general formulae (5) to (7).
    Type: Grant
    Filed: December 11, 2007
    Date of Patent: August 5, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tomohiro Kobayashi, Youichi Ohsawa, Ryosuke Taniguchi
  • PATTERNING PROCESS AND RESIST COMPOSITION
    Publication number: 20140212808
    Abstract: A resist composition comprising a polymer comprising recurring units having an acid labile group of cyclopentyl with tert-butyl or tert-amyl pendant is coated onto a substrate, baked, exposed to high-energy radiation, PEB and developed in an organic solvent to form a negative pattern. A fine hole pattern can be formed from the resist composition with advantages including high dissolution contrast, good size control and wide depth of focus.
    Type: Application
    Filed: December 31, 2013
    Publication date: July 31, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Kenji Funatsu, Kentaro Kumaki, Akihiro Seki, Tomohiro Kobayashi, Koji Hasegawa