Abstract: A method for measuring a distance of diffusion of a curing catalyst for a thermosetting silicon-containing material includes the steps of: forming a silicon-containing film from a composition containing a thermosetting silicon-containing material, a curing catalyst and a solvent; coating the silicon-containing film with a photosensitive resin composition containing a resin whose solubility in alkaline developer is increased by the action of an acid, an acid generator and a solvent, and subsequently heating to prepare a substrate on which the silicon-containing film and a resin film are formed; irradiating the substrate with a high energy beam or an electron beam to generate an acid and heat-treating the substrate to increase the solubility of the resin in an alkaline developer by the action of the acid in the resin film; dissolving the resin film in an alkaline developer; and measuring a film thickness of the remaining resin.

Abstract: A vibration motor includes a stationary portion and a movable portion vibrable in an axis direction with respect to the stationary portion. The stationary portion includes a coil and a housing. The housing includes a first region expanding in a first direction orthogonal to the axis direction, and a second region disposed on one side in a second direction orthogonal to the axis direction and the first direction relative to the first region and expanding in the first direction. In a cross-section across the axis direction, a distance in the second direction between the second region and the first region is longest at a center in the first direction of the first region. In the cross-section, a shape formed by the first and second regions is asymmetric with respect to an axis extending parallel to the first direction through a center of the housing in the second direction.

Abstract: A printed wiring board includes a base insulating layer, a conductor layer formed on the base layer and including pads, a solder resist layer formed on the base layer such that the solder resist layer is covering the conductor layer and has openings exposing the pads, and plating bumps formed on the pads such that each plating bump includes a base plating layer formed in a respective one of the openings, an intermediate layer formed on the base plating layer, and a top plating layer formed on the intermediate layer. The plating bumps are formed such that the base plating layer has a side surface including a portion protruding from the solder resist layer, that the intermediate layer has a thickness in a range of 2.7 to 7.0 ?m, and that the top plating layer has a hemispherical shape and is covering only an upper surface of the intermediate layer.

Abstract: A resist composition comprising a sulfonium salt having formula (1) as PAG, a base polymer, and an organic solvent, when processed by lithography, has light transmittance, acid diffusion suppressing effect, and excellent lithography performance factors such as DOF, LWR and MEF. A lithography process for forming a resist pattern from the composition is also provided.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and further containing at least one repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms with a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms without a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process of using it that show a particularly favorable mask dimension dependency and CDU in photolithography where a light source is a high-energy beam such as a KrF excimer laser beam, an electron beam, or an extreme ultraviolet ray.

Abstract: An input device includes a contact body to contact an object, a pressure sensor to detect pressure of contact of the contact body with the object, a vibrator to generate a vibration to provide a tactile sensation, and a vibration controller. The vibration of the vibrator when the pressure detected based on the output of the pressure sensor is large is larger than that when the pressure detected based on the output of the pressure sensor is small.

Abstract: A pattern having a good balance of sensitivity, resolution and LWR is formed by providing a resist film comprising a base resin comprising recurring units having a C4-C6 tertiary alkoxy or alkoxycarbonyl group as an acid labile group and recurring units capable of generating a backbone-bound acid upon exposure, exposing the resist film to radiation, optionally post-exposure baking the resist film at a low temperature of 30-70° C., and developing the film.

Abstract: A gas conditioner 60 comprises: a case 62 that forms a gas flowpath 61 through which gas flows; and resin members 80 that are provided to the gas flowpath 61 and that are water permeable. The resin members 80 are formed of sealed hollow bodies that are filled with water.

Abstract: A vibrating motor includes a stationary portion, a movable element having a magnet member and capable of vibrating in a first direction, and an elastic member. The stationary portion has a coil that applies a driving force to the magnet member when the coil is energized, and a case that accommodates the movable element and the coil therein. The movable element has a holder member that holds one end portion in the first direction of the magnet member. The elastic member is connected to the holder member. The case has a case notch. The case notch is notched toward the other side in the first direction from one end in the first direction of the case. The holder member has a holder notch that is notched toward one side in a second direction perpendicular to the first direction. The case notch and the holder notch overlap as viewed in the second direction.

Abstract: A display device includes a display panel, at least one light source, a diffusion plate, an optical member, and a plurality of adhesive layers. The diffusion plate diffuses light from the at least one light source. The optical member is disposed between the diffusion plate and the at least one light source and has at least one transmitting portion that transmits the light from the at least one light source and a reflective portion that reflects the light from the at least one light source. The adhesive layers bond the optical member and the diffusion plate with an air layer therebetween. The adhesive layers are arranged spaced apart from each other in a direction in which the optical member extends. The air layer has the same thickness as the adhesive layers and is located between an adjacent pair of the adhesive layers.

Abstract: An imaging lens is configured by, in order from an object side, an object side group including at least one lens group and having positive refractive power as a whole and an image side group configured by one lens group and having negative refractive power. Focusing is performed by moving the object side group in an optical axis direction, and a predetermined conditional expression is satisfied. The image side group includes a subgroup satisfying a predetermined conditional expression. Further, an imaging device includes the optical system and an image sensor.

Abstract: A lighting device includes a plurality of light sources, a light diffusion plate, a sheet-like optical member, and a partition. The light diffusion plate is arranged opposite the light sources. The light diffusion plate diffuses light from the light sources. The optical member is disposed between the light diffusion plate and the light sources. The optical member includes a transmitting part that transmits the light emitted from the light sources and a reflecting part that reflects the light emitted from the light sources. The partition is arranged between adjacent light sources. The optical member is held by a support portion that is integrally provided to the partition and protrudes from an end portion of the partition toward the light diffusion plate.

Abstract: A display device includes a display panel, at least one light source, a diffusion plate, an optical member, and a plurality of adhesive layers. The diffusion plate diffuses light from the at least one light source. The optical member is disposed between the diffusion plate and the at least one light source and has at least one transmitting portion that transmits the light from the at least one light source and a reflective portion that reflects the light from the at least one light source. The adhesive layers bond the optical member and the diffusion plate with an air layer therebetween. The adhesive layers are arranged spaced apart from each other in a direction in which the optical member extends. The air layer has the same thickness as the adhesive layers and is located between an adjacent pair of the adhesive layers.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.

Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.

Abstract: A target structure includes a target and a cooling portion. The target generates neutrons by being irradiated with a charged particle beam. The cooling portion includes a front surface and a back surface that face to sides opposite to each other. The target is joined directly or indirectly to the front surface. A flow path for flowing of cooling liquid including hydrogen elements is formed in the cooling portion. When viewed in a thickness direction of the cooling portion from the front surface to the back surface, the flow path is positioned off a center portion of the target.

Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.

Abstract: A lighting device includes a light source, a light diffusion plate, and a sheet-like optical member. The light diffusion plate is arranged opposite the light source. The light diffusion plate diffuses light from the light source. The optical member is disposed between the light diffusion plate and the light source. The optical member includes a transmitting part that transmits the light emitted from the light source and a reflecting part that reflects the light emitted from the light source. The optical member is supported by a support portion that is integrally provided to the light diffusion plate.

Abstract: The present invention is a resist material containing: (i) a metal compound shown by the following general formula (M-1) and (ii) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.

Abstract: The present invention is a resist material containing: (i) a compound (i-1), which is a (partial) condensate or a (partial) hydrolysis-condensate of a metal compound shown by the following general formula (A-1), or a compound (i-2), which is a reaction product of the compound (i-1) and a dihydric or trihydric alcohol shown by the following general formula (A-2), (ii) a photo-acid generator, (iii) a basic compound, and (iv) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.