Patents by Inventor Tomotaka Tsuchimura

Tomotaka Tsuchimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10802399
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: October 13, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Ryo Nishio, Masafumi Kojima, Akiyoshi Goto, Tomotaka Tsuchimura, Michihiro Shirakawa, Keita Kato
  • Publication number: 20200319551
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can provide a resist film with excellent sensitivity and a pattern with excellent LER performance, and can suppress pattern collapse during pattern formation. In addition, the present invention also provides a resist film, a pattern forming method, a mask blank with a resist film, a method for producing a photomask, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Application
    Filed: June 18, 2020
    Publication date: October 8, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Tomotaka Tsuchimura, Takashi Kawashima, Akihiro Kaneko, Michihiro Ogawa, Michihiro Shirakawa, Hajime Furutani, Kyohei Sakita
  • Patent number: 10761424
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: September 1, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Ryo Nishio, Masafumi Kojima, Akiyoshi Goto, Tomotaka Tsuchimura, Michihiro Shirakawa, Keita Kato
  • Publication number: 20200201177
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid upon irradiation with actinic rays or radiation and a resin whose polarity increases by the action of an acid, in which the compound is represented by a specific General Formula (X).
    Type: Application
    Filed: March 2, 2020
    Publication date: June 25, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Kazunari YAGI, Takashi Kawashima, Tomotaka Tsuchimura
  • Publication number: 20200192220
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected with an acid-leaving group; a first photoacid generator that generates an acid having a pKa of ?2.00 to 2.00, in which in a case where the acid thus generated is a carboxylic acid, a pKa of the carboxylic acid is ?2.00 or more and less than 1.00; and a second photoacid generator that generates a carboxylic acid having a pKa of 1.00 or more.
    Type: Application
    Filed: February 21, 2020
    Publication date: June 18, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Kazunari YAGI, Takashi KAWASHIMA, Tomotaka TSUCHIMURA, Hajime FURUTANI, Michihiro SHIRAKAWA
  • Publication number: 20200183280
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition is an actinic ray-sensitive or radiation-sensitive resin composition including a compound that generates an acid upon irradiation with actinic rays or radiation and a resin capable of increasing polarity by the action of an acid, in which the resin includes a repeating unit represented by General Formula (B-1) and at least one halogen atom selected from the group consisting of a fluorine atom and an iodine atom.
    Type: Application
    Filed: February 19, 2020
    Publication date: June 11, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro OGAWA, Akihiro KANEKO, Takashi KAWASHIMA, Tomotaka TSUCHIMURA
  • Publication number: 20200124963
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a group represented by General Formula (1) and a compound that generates an acid upon irradiation with actinic rays or radiation.
    Type: Application
    Filed: December 20, 2019
    Publication date: April 23, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Akihiro KANEKO, Junichi Ito, Takashi Kawashima, Michihiro Ogawa, Tomotaka Tsuchimura
  • Publication number: 20200050106
    Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)??Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.
    Type: Application
    Filed: October 17, 2019
    Publication date: February 13, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro SHIRAKAWA, Hajime FURUTANI, Mitsuhiro FUJITA, Tomotaka TSUCHIMURA, Takashi KAWASHIMA, Michihiro OGAWA, Akihiro KANEKO, Hironori OKA, Yasuharu SHIRAISHI
  • Patent number: 10394127
    Abstract: Provide are a pattern forming method including a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin having an acid-decomposable repeating unit capable of decomposing by the action of an acid to generate an acid having a pKa of 3.0 or less, a step (2) of exposing the film using actinic rays or radiation, and a step (3) of carrying out development using a developer including an organic solvent after the exposure to form a negative tone pattern; and a method for manufacturing an electronic device, including the pattern forming method.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: August 27, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Wataru Nihashi, Hideaki Tsubaki, Toru Tsuchihashi, Tomotaka Tsuchimura
  • Patent number: 10324374
    Abstract: There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).
    Type: Grant
    Filed: March 25, 2016
    Date of Patent: June 18, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Tomotaka Tsuchimura, Natsumi Yokokawa, Koutarou Takahashi
  • Publication number: 20180364571
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).
    Type: Application
    Filed: August 23, 2018
    Publication date: December 20, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Ryo NISHIO, Masafumi KOJIMA, Akiyoshi GOTO, Tomotaka TSUCHIMURA, Michihiro SHIRAKAWA, Keita KATO
  • Patent number: 10139727
    Abstract: A chemical amplification resist composition according to the present invention includes (A) a compound including a triarylsulfonium cation having one or more fluorine atoms and capable of generating an acid with a volume of 240 ?3 or higher by irradiation of active rays or radiation; and (B) a compound including a phenolic hydroxyl group.
    Type: Grant
    Filed: November 13, 2014
    Date of Patent: November 27, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Tomotaka Tsuchimura, Koutarou Takahashi
  • Publication number: 20180321589
    Abstract: The pattern forming method includes (1) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, (2) a step of exposing the film with actinic rays or radiation, and (3) a step of developing the exposed film using a developer containing an organic solvent, in which the actinic ray-sensitive or radiation-sensitive resin composition contains an acid-decomposable resin (1) having a repeating unit (a) having an aromatic ring and a repeating unit (b) represented by a specific general formula, and the content of the repeating unit (a) is 55% by mole or more with respect to all the repeating units of the acid-decomposable resin (1). The method for manufacturing an electronic device includes the pattern forming method.
    Type: Application
    Filed: July 19, 2018
    Publication date: November 8, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Tomotaka TSUCHIMURA, Akihiro KANEKO, Wataru NIHASHI
  • Patent number: 10120281
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: November 6, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Koutarou Takahashi, Tomotaka Tsuchimura, Shuhei Yamaguchi, Natsumi Yokokawa, Hidehiro Mochizuki
  • Publication number: 20180267404
    Abstract: Provided are a pattern forming method for obtaining a pattern which is excellent in etching resistance and in which occurrence of pattern collapse can be suppressed, and a method for manufacturing an electronic device including the pattern forming method. The pattern forming method includes a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin A having a repeating unit represented by General Formula (I) and a repeating unit represented by General Formula (BII), a step of exposing the film, and a step of developing the exposed film using a developer containing an organic solvent, to form a pattern.
    Type: Application
    Filed: May 23, 2018
    Publication date: September 20, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Akihiro KANEKO, Tomotaka TSUCHIMURA, Shuji HIRANO, Hideaki TSUBAKI, Wataru NIHASHI
  • Patent number: 10011576
    Abstract: The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: July 3, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Koutarou Takahashi, Tomotaka Tsuchimura, Natsumi Yokokawa, Hidehiro Mochizuki
  • Patent number: 10007180
    Abstract: A negative resist composition includes an onium salt compound (A) containing a nitrogen atom in its cation moiety, a compound (B) that is configured to produce an acid when exposed to actinic rays or radiation, and a compound (C) containing an acid-crosslinkable group.
    Type: Grant
    Filed: July 8, 2015
    Date of Patent: June 26, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Tomotaka Tsuchimura, Tadateru Yatsuo
  • Patent number: 9958775
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent.
    Type: Grant
    Filed: December 4, 2014
    Date of Patent: May 1, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Takuya Tsuruta, Tomotaka Tsuchimura, Tadeteru Yatsuo
  • Patent number: 9904167
    Abstract: Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): in the formulae, each of Y1 and Y2 represents a monovalent organic group; each of M1+ and M2+ represents an organic onium ion; each of X1 and X2 represents a group that is represented by —S—, —NH—, or —NR1—; R1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R1 and Y1 or Y2 may bond with each other to form a ring.
    Type: Grant
    Filed: December 29, 2015
    Date of Patent: February 27, 2018
    Assignee: FUJIFILM Corporation
    Inventor: Tomotaka Tsuchimura
  • Publication number: 20180017872
    Abstract: Provide are a pattern forming method including a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin having an acid-decomposable repeating unit capable of decomposing by the action of an acid to generate an acid having a pKa of 3.0 or less, a step (2) of exposing the film using actinic rays or radiation, and a step (3) of carrying out development using a developer including an organic solvent after the exposure to form a negative tone pattern; and a method for manufacturing an electronic device, including the pattern forming method.
    Type: Application
    Filed: September 28, 2017
    Publication date: January 18, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Wataru NIHASHI, Hideaki TSUBAKI, Toru TSUCHIHASHI, Tomotaka TSUCHIMURA