Patents by Inventor Tomotaka Tsuchimura

Tomotaka Tsuchimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
    Patent number: 8728686
    Abstract: A photosensitive composition includes a compound represented by Formula (I) and a curable composition contains the compound of Formula (I) and a polymerizable compound. A compound is represented by a Formula (1) and a photocurable composition contains the compound of Formula (1) and a polymerizable compound. In Formula (I), R, R1 and R2 each independently represent a hydrogen atom or a monovalent substituent. In Formula (1), R and B each independently represent a monovalent substituent, A represents a divalent organic group, and Ar represents an aryl group.
    Type: Grant
    Filed: July 17, 2008
    Date of Patent: May 20, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Tomotaka Tsuchimura
  • ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME
    Publication number: 20140127627
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less, (A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation, (B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and (C) a repeating unit containing a carbon-carbon unsaturated bond.
    Type: Application
    Filed: November 6, 2012
    Publication date: May 8, 2014
    Inventors: Takayuki Ito, Hidenori Takahashi, Tomotaka Tsuchimura, Shohei Kataoka, Takeshi Inasaki
  • Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor
    Patent number: 8703366
    Abstract: Provided is a photopolymerizable composition that is highly sensitive to light having wavelengths of 365 nm and 405 nm, and is capable of forming a curable film that can suppress deterioration in physical properties of the film due to heat-aging. The photopolymerizable composition include: (A) an oxime polymerization initiator which includes a condensed ring formed by containing two or more rings selected from an aromatic ring and a heterocyclic ring, and a cyclic structure which is connected to the condensed ring, the cyclic structure containing a carbonyl group and having an oxime group directly connected to the carbonyl group; and (B) a polymerizable compound.
    Type: Grant
    Filed: January 12, 2010
    Date of Patent: April 22, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Masaomi Makino, Tomotaka Tsuchimura
  • ACTINIC-RAY- OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN
    Publication number: 20140099572
    Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below.
    Type: Application
    Filed: December 12, 2013
    Publication date: April 10, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Takeshi INASAKI, Takeshi KAWABATA, Tomotaka TSUCHIMURA
  • Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition
    Patent number: 8673538
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1) (in the formula, each of R11 and R12 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; X11 represents an aryl group; M11 represents a single bond or a divalent linking group; and Q11 represents an alkyl group, a cycloalkyl group or an aryl group, wherein the number of carbon atoms which are included in the group represented by -M11-Q11 is 3 or more, and at least two of R11, R12, Q11, and X11 may form a ring by bonding to each other).
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: March 18, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Inasaki, Tomotaka Tsuchimura
  • POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
    Publication number: 20140072905
    Abstract: A positive resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by an acid labile group represented by the following formula (I): wherein R represents a monovalent organic group; A represents a group having a polycyclic hydrocarbon ring structure or a group having a polycyclic heterocyclic structure; and * represents a bonding position to an oxygen atom of the phenolic hydroxyl group.
    Type: Application
    Filed: November 6, 2013
    Publication date: March 13, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Tomotaka TSUCHIMURA, Takeshi INASAKI
  • Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
    Patent number: 8642245
    Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.
    Type: Grant
    Filed: March 15, 2012
    Date of Patent: February 4, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Kana Fujii, Tomotaka Tsuchimura, Toru Fujimori, Hidenori Takahashi, Takayuki Ito
  • ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION
    Publication number: 20140030643
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below.
    Type: Application
    Filed: September 27, 2013
    Publication date: January 30, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Toshiya TAKAHASHI, Hiroo TAKIZAWA, Hideaki TSUBAKI, Shuji HIRANO, Tomotaka TSUCHIMURA
  • RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, RESIST FILM AND RESIST-COATED MASK BLANKS
    Publication number: 20140030640
    Abstract: A resist pattern forming method contains: in the following order, (1) forming a resist film by using a negative chemical amplification resist composition containing (A) a polymer compound having a repeating unit represented by formula (1) as defined in the specification, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a crosslinking agent capable of crosslinking the polymer compound (A) by an action of an acid; (2) exposing the resist film, so as to form an exposed resist film; and (4) developing the exposed resist film by using a developer containing an organic solvent.
    Type: Application
    Filed: September 24, 2013
    Publication date: January 30, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Toru TSUCHIHASHI, Tadateru YATSUO, Koutarou TAKAHASHI, Tomotaka TSUCHIMURA
  • Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition
    Patent number: 8637220
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a guanidine compound having a logP value of 1.2 or more, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: January 28, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Tomotaka Tsuchimura, Hideaki Tsubaki, Toshiya Takahashi
  • Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition
    Patent number: 8614033
    Abstract: A resist film formed by using a chemical amplification type resist composition containing (A) a high molecular compound having a structure wherein a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by the following general formula (I), (B) a compound generating an acid upon irradiation with actinic rays or radiation, and an organic solvent, and the film thickness is 10 to 200 nm. wherein, R1 represents a hydrocarbon group, R2 represents a hydrogen atom or a hydrocarbon group, and Ar represents an aryl group. R1 may also bind to Ar to form a ring which may also contain a heteroatom. * represents a binding position with an oxygen atom of the phenolic hydroxyl group.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: December 24, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Tomotaka Tsuchimura, Takeshi Inasaki, Hiroo Takizawa
  • Active light ray sensitive or radioactive ray sensitive resin composition, and active light ray sensitive or radioactive ray sensitive film and pattern forming method using the same
    Patent number: 8603727
    Abstract: An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided. The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.
    Type: Grant
    Filed: October 4, 2011
    Date of Patent: December 10, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Kawabata, Hidenori Takahashi, Tomotaka Tsuchimura, Shuji Hirano, Hideaki Tsubaki
  • PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER, METHOD OF PRODUCING THE SAME AND SOLID-STATE IMAGE SENSOR
    Publication number: 20130306919
    Abstract: The invention provides a photosensitive resin composition that includes titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 mgKOH/g to 250 mgKOH/g, a resin B having an acid value of from 26 mgKOH/g to 65 mgKOH/g, a photopolymerization initiator, and a solvent, the photopolymerization initiator including an oxime photopolymerization compound.
    Type: Application
    Filed: July 30, 2013
    Publication date: November 21, 2013
    Inventors: Yoichi MARUYAMA, Hiroyuki EINAGA, Toru FUJIMORI, Kazuto SHIMADA, Tomotaka TSUCHIMURA, Yushi KANEKO
  • CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
    Publication number: 20130302726
    Abstract: A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
    Type: Application
    Filed: July 16, 2013
    Publication date: November 14, 2013
    Inventors: Tomotaka TSUCHIMURA, Tadateru YATSUO
  • Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition
    Patent number: 8574814
    Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification).
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: November 5, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Inasaki, Tomotaka Tsuchimura
  • Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensor
    Patent number: 8535857
    Abstract: The invention provides a dye-containing negative curable composition containing at least a dye soluble in an organic solvent, a photopolymerization initiator, a photopolymerizable compound containing an amine structure, and an organic solvent; a color filter formed from the dye-containing negative curable composition; a method of producing the color filter; and a solid-state image sensor.
    Type: Grant
    Filed: December 23, 2008
    Date of Patent: September 17, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Yosuke Murakami, Tomotaka Tsuchimura
  • ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
    Publication number: 20130171562
    Abstract: An actinic ray- or radiation-sensitive resin composition according to the present invention comprises a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 ?3 or more and a compound that generates the acid when exposed to actinic rays or radiation.
    Type: Application
    Filed: December 29, 2011
    Publication date: July 4, 2013
    Applicant: FUJIFILM Corporation
    Inventors: Tomotaka TSUCHIMURA, Takayuki Ito
  • ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
    Publication number: 20130029255
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1).
    Type: Application
    Filed: July 26, 2012
    Publication date: January 31, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeshi INASAKI, Tomotaka TSUCHIMURA
  • CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
    Publication number: 20130029254
    Abstract: A chemical amplification resist composition contains: (A) a polymer compound having a phenolic hydroxyl group and a group formed by substituting a substituent for a hydrogen atom of a hydroxyl group in a phenolic hydroxyl group and satisfying the following (a) to (c) at the same time: (a) the polydispersity is 1.2 or less, (b) the weight average molecular weight is from 2,000 to 6,500, and (c) the glass transition temperature (Tg) is 140° C. or more.
    Type: Application
    Filed: June 29, 2012
    Publication date: January 31, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Tomotaka TSUCHIMURA, Tadateru YATSUO
  • Polymerizable compositions, color filters, production methods thereof, and solid-state imaging devices
    Patent number: 8361681
    Abstract: Disclosed is a polymerizable composition characterized by containing at least (A) a photopolymerization initiator represented by the following general formula (1); (B) a coloring agent; (C) a polymerizable monomer; (D) a binder polymer; and (E) a solvent. wherein, in formula (1), R1 represents an aromatic group; R2 represents a group represented by any one of the above Formulae (2-1) to (2-3); R3 represents an alkyl group or the like; and A represents a single bond or —C(?O)—; X1, X2, and Y each independently represent a hydrogen atom, an alkyl group or the like and Z represents an atomic group which may form an arbitrary ring structure containing a carbon-carbon double bond.
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: January 29, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Masaomi Makino, Tomotaka Tsuchimura