Patents by Inventor Tomoyuki Matsuyama
Tomoyuki Matsuyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20120250944Abstract: To determine the state of a subject person with a simple structure, an image determining device includes: an imaging unit that captures an image from a first direction, the image including the subject person; a first detector that detects size information from the image, the size information being about the subject person in the first direction; a second detector that detects position-related information, the position-related information being different from the information detected by the first detector; and a determining unit that determines the state of the subject person, based on a result of the detection performed by the first detector and a result of the detection performed by the second detector.Type: ApplicationFiled: December 28, 2010Publication date: October 4, 2012Applicant: NIKON CORPORATIONInventors: Tetsuya Yamamoto, Masahiro Nei, Isao Totsuka, Tomoyuki Matsuyama, Masamitsu Yanagihara, Satoshi Hagiwara, Masakazu Sekiguchi
-
Publication number: 20120236285Abstract: An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field. including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.Type: ApplicationFiled: May 29, 2012Publication date: September 20, 2012Applicant: NIKON CORPORATIONInventors: Osamu TANITSU, Hirohisa TANAKA, Kenichi MURAMATSU, Norio KOMINE, Hisashi NISHINAGA, Tomoyuki MATSUYAMA, Takehito KUDO
-
Publication number: 20120133915Abstract: Disclosed is a light source optimizing method wherein: a light source shape obtained as the result of SMO is set as a target, the SMO being an optimizing calculation method for optimizing a mask pattern and illumination light source, a spatial light modulator is controlled such that a deviation from the target is within an acceptable range, and the shape of the illumination light source is set; the image of the pattern obtained as the results of the SMO is formed on a wafer, using illumination light emitted from the illumination light source having the set light source shape, an OPE is evaluated as image-forming performance using the detection results obtained by detecting the image of the pattern thus formed; and the light source shape is optimized.Type: ApplicationFiled: February 6, 2012Publication date: May 31, 2012Applicant: NIKON CORPORATIONInventors: Tomoyuki MATSUYAMA, Naonori KITA
-
Patent number: 8174456Abstract: An antenna pointing control apparatus and method that reduce a pointing error of an antenna having a two-axis gimbal structure. An antenna installed on a ship hull is controlled to point toward a satellite by an antenna pointing control apparatus having a two-axis mechanism. Movement of the ship hull are recognized every prescribed cycle time, a satellite bearing is measured, and a pointing error of a directional antenna with respect to a satellite is detected. If it is determined that the satellite will not pass within a prescribed region A about an extension line of an azimuth angle (AZ) axis of the ship's hull, then a two-axis control is executed. However, if the satellite will pass within the prescribed region A, then a virtual three-axis control is executed.Type: GrantFiled: December 4, 2008Date of Patent: May 8, 2012Assignee: Furuno Electric Co., Ltd.Inventors: Go Omori, Tomoyuki Matsuyama, Hitoshi Maeno, Satoshi Adachi
-
Publication number: 20110273697Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.Type: ApplicationFiled: July 11, 2011Publication date: November 10, 2011Applicant: NIKON CORPORATIONInventors: Osamu Tanitsu, Koji Shigematsu, Hiroyuki Hirota, Tomoyuki Matsuyama
-
Publication number: 20100265149Abstract: An antenna pointing control apparatus and method that reduce a pointing error of an antenna having a two-axis gimbal structure. An antenna installed on a ship hull is controlled to point toward a satellite by an antenna pointing control apparatus having a two-axis mechanism. Movement of the ship hull are recognized every prescribed cycle time, a satellite bearing is measured, and a pointing error of a directional antenna with respect to a satellite is detected. If it is determined that the satellite will not pass within a prescribed region A about an extension line of an azimuth angle (AZ) axis of the ship's hull, then a two-axis control is executed. However, if the satellite will pass within the prescribed region A, then a virtual three-axis control is executed.Type: ApplicationFiled: December 4, 2008Publication date: October 21, 2010Applicant: FURUNO ELECTRIC CO., LTD.Inventors: Go Omori, Tomoyuki Matsuyama, Hitoshi Maeno, Satoshi Adachi
-
Publication number: 20100225895Abstract: An illumination optical system and method illuminates an irradiated surface based on linearly polarized light supplied from a light source. The illumination optical system includes a depolarizer which is selectively positioned between a first position in an optical path of the illumination optical system and a second position outside of the optical path, and has a crystal member whose thickness in a direction along an optical axis of the illumination optical system varies in a direction crossing the optical axis.Type: ApplicationFiled: May 18, 2010Publication date: September 9, 2010Applicant: NIKON CORPORATIONInventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
-
Publication number: 20100149511Abstract: An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.Type: ApplicationFiled: February 17, 2010Publication date: June 17, 2010Applicant: NIKON CORPORATIONInventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
-
Publication number: 20100058263Abstract: A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether ?1<?-1, wherein ?1 represents model vs. exposure difference and ?-1 represents predetermined criteria. The technique further includes completing the model when ?1<?-1.Type: ApplicationFiled: January 16, 2008Publication date: March 4, 2010Applicants: NIKON PRECISION INC.Inventors: Jacek Tyminski, Raluca Popescu, Tomoyuki Matsuyama
-
Publication number: 20090316132Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.Type: ApplicationFiled: August 25, 2009Publication date: December 24, 2009Applicant: NIKON CORPORATIONInventors: Osamu Tanitsu, Koji Shigematsu, Hiroyuki Hirota, Tomoyuki Matsuyama
-
Patent number: 7515248Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.Type: GrantFiled: November 5, 2007Date of Patent: April 7, 2009Assignee: Nikon CorporationInventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
-
Patent number: 7515247Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.Type: GrantFiled: November 5, 2007Date of Patent: April 7, 2009Assignee: Nikon CorporationInventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
-
Publication number: 20090073441Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.Type: ApplicationFiled: October 29, 2008Publication date: March 19, 2009Applicant: NIKON CORPORATIONInventors: Osamu Tanitsu, Koji Shigematsu, Hiroyuki Hirota, Tomoyuki Matsuyama
-
Publication number: 20080239274Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.Type: ApplicationFiled: June 2, 2008Publication date: October 2, 2008Applicant: NIKON CORPORATIONInventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
-
Illumination optical system, exposure apparatus, and exposure method with polarized switching device
Patent number: 7423731Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.Type: GrantFiled: May 31, 2005Date of Patent: September 9, 2008Assignee: Nikon CorporationInventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo -
Patent number: 7405803Abstract: A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.Type: GrantFiled: April 17, 2007Date of Patent: July 29, 2008Assignee: Nikon CorporationInventors: Yasuo Shimizu, Shigeru Hirukawa, Kousuke Suzuki, Tomoyuki Matsuyama
-
Patent number: 7391497Abstract: A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.Type: GrantFiled: April 17, 2007Date of Patent: June 24, 2008Assignee: Nikon CorporationInventors: Yasuo Shimizu, Shigeru Hirukawa, Kousuke Suzuki, Tomoyuki Matsuyama
-
Publication number: 20080094602Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.Type: ApplicationFiled: November 5, 2007Publication date: April 24, 2008Applicant: NIKON CORPORATIONInventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
-
Publication number: 20080074632Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.Type: ApplicationFiled: November 5, 2007Publication date: March 27, 2008Applicant: NIKON CORPORATIONInventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
-
Publication number: 20070188726Abstract: A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.Type: ApplicationFiled: April 17, 2007Publication date: August 16, 2007Applicant: Nikon CorporationInventors: Yasuo Shimizu, Shigeru Hirukawa, Kousuke Suzuki, Tomoyuki Matsuyama