Publication number: 20120038012
Abstract: A composite free layer having a FL1/insertion/FL2 configuration is disclosed for achieving high dR/R, low RA, and low ? in TMR or GMR sensors. Ferromagnetic FL1 and FL2 layers have (+) ? and (?) ? values, respectively. FL1 may be CoFe, CoFeB, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, or Nb. FL2 may be CoFe, NiFe, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, Nb, or B. The thin insertion layer includes at least one magnetic element such as Co, Fe, and Ni, and at least one non-magnetic element selected from Ta, Ti, W, Zr, Hf, Nb, Mo, V, Cr, or B. In a TMR stack with a MgO tunnel barrier, dR/R>60%, ?˜1+10?6, and RA=1.2 ohm-um2 when FL1 is CoFe/CoFeB/CoFe, FL2 is CoFe/NiFe/CoFe, and the insertion layer is CoTa or CoFeBTa.
Type:
Application
Filed:
October 19, 2011
Publication date:
February 16, 2012
Inventors:
Tong Zhao, Hui-Chuan Wang, Min Li, Kunliang Zhang
Patent number: 8059374
Abstract: A composite free layer having a FL1/insertion/FL2 configuration is disclosed for achieving high dR/R, low RA, and low ? in TMR or GMR sensors. Ferromagnetic FL1 and FL2 layers have (+) ? and (?) ? values, respectively. FL1 may be CoFe, CoFeB, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, or Nb. FL2 may be CoFe, NiFe, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, Nb, or B. The thin insertion layer includes at least one magnetic element such as Co, Fe, and Ni, and at least one non-magnetic element selected from Ta, Ti, W, Zr, Hf, Nb, Mo, V, Cr, or B. In a TMR stack with a MgO tunnel barrier, dR/R>60%, ?˜1×10?6, and RA=1.2 ohm-um2 when FL1 is CoFe/CoFeB/CoFe, FL2 is CoFe/NiFe/CoFe, and the insertion layer is CoTa or CoFeBTa.
Type:
Grant
Filed:
January 14, 2009
Date of Patent:
November 15, 2011
Assignee:
Headway Technologies, Inc.
Inventors:
Tong Zhao, Hui-Chuan Wang, Min Li, Kunliang Zhang
Publication number: 20110205863
Abstract: A near field transducer includes gold and at least one dopant. The dopant can include at least one of: Cu, Rh, Ru, Ag, Ta, Cr, Al, Zr, V, Pd, Ir, Co, W, Ti, Mg, Fe, or Mo. The dopant concentration may be in a range from 0.5% and 30%. The dopant can be a nanoparticle oxide of V, Zr, Mg, Ca, Al, Ti, Si, Ce, Y, Ta, W, or Th, or a nitride of Ta, Al, Ti, Si, In, Fe, Zr, Cu, W or B.
Type:
Application
Filed:
February 23, 2011
Publication date:
August 25, 2011
Applicant:
Seagate Technology LLC
Inventors:
Tong Zhao, Michael Christopher Kautzky, William Albert Challener, Michael Allen Seigler