Patents by Inventor Tongoh Chin
Tongoh Chin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8881731Abstract: A respiratory mask system is provided, in which while wearing a respiratory mask system, force generated by movement of a user's head and the like to induce laterally slipping a mask cushion may be reduced or absorbed. The respiratory mask system is provided with a mask cushion covering a nose, a nose and a mouth, or a full face. A first frame is connected with the mask cushion to supply respiratory gas under positive pressure. A second frame is connected with a headgear strap, in which the mask cushion is placed on a face side of the first frame and the first frame is placed on a face side of the second frame. The first frame is connected slidably with the second frame along a slide surface.Type: GrantFiled: October 18, 2007Date of Patent: November 11, 2014Assignee: Teijin Pharma LimitedInventors: Masahide Takishita, Takamitsu Okayama, Keiko Omura, Tongoh Chin
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Patent number: 8631793Abstract: The present invention relates to a nasal respiratory mask system comprising: a nasal mask that is tightly attached to the face of a user and serves as means for leading positive-pressure breathing gas to the nose of the user, a frame to keep the nasal mask at a predetermined position, and a headgear that is mounted on the head in order to attach the nasal mask tightly to the face; wherein, the headgear comprises, on the tip thereof, a headgear strap for adjusting the length of the headgear, the headgear strap comprises a headgear fastener that serves as means for connection/disconnection with the frame, the frame comprises a fastener catch that engages with the headgear fastener, and the fastener catch comprises an axisymmetric guide whose (rotation) axis is the insertion direction of the headgear fastener.Type: GrantFiled: March 29, 2007Date of Patent: January 21, 2014Assignee: Teijin Pharma LimitedInventors: Keiko Omura, Masahide Takishita, Tongoh Chin, Hideharu Shimura, Shinya Fujimoto, Kazuaki Fujiura
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Patent number: 8596276Abstract: A light weight nasal respiratory mask system securing airtightness of a mounting section between a nasal mask and a frame is provided.Type: GrantFiled: July 17, 2007Date of Patent: December 3, 2013Assignee: Teijin Pharma LimitedInventors: Keiko Omura, Masahide Takishita, Tongoh Chin, Hideharu Shimura, Shinya Fujimoto, Naoki Kurai
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Patent number: 8393327Abstract: A headgear suitable for wearing a respiratory mask system wearing on the head of a user is provided, wherein it can be easily manufactured, the leakage of the positive pressure gas when pressurized is reduced, and a good wearing feel is achieved. The headgear is adapted to secure a respiratory mask, which contacts the face of the user to supply a positive pressure gas for respiration to the user, to the head of user. The headgear has a head mounted portion which is worn on the occipital of the user and a strap (3) connecting to this head mounted portion. The head mounted portion has at least one closed curved belt (1) which has thereon at least one junction (2). At least one junction provides the closed curved belt with a nonplanar structure adaptable to the shape of the head of the user.Type: GrantFiled: October 16, 2007Date of Patent: March 12, 2013Assignee: Teijin Pharma LimitedInventors: Keiko Omura, Masahide Takishita, Shin Ooya, Tongoh Chin, Hideharu Shimura, Shinya Fujimoto, Toru Hikosaka, Toshiki Nakamura, Kazuaki Fujiura, Naoki Kurai
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Publication number: 20100043800Abstract: A light weight nasal respiratory mask system securing airtightness of a mounting section between a nasal mask and a frame is provided.Type: ApplicationFiled: July 17, 2007Publication date: February 25, 2010Applicant: Teijin Pharma LimitedInventors: Keiko Omura, Masahide Takishita, Tongoh Chin, Hideharu Shimura, Shinya Fujimoto, Naoki Kurai
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Publication number: 20100012128Abstract: A respiratory mask system is provided, in which while wearing a respiratory mask system, force generated by movement of a user's head and the like to induce laterally slipping a mask cushion may be reduced or absorbed. A respiratory mask system, which is provided with a mask cushion covering a nose, a nose and a mouth or a full face, a first frame connected with the mask cushion enabling to supply respiratory gas under positive pressure from a means for supplying respiratory gas under positive pressure, and a second frame connected with a headgear strap, in which the mask cushion is placed on a face side of the first frame, the first frame is placed on a face side of the second frame, a slide surface is formed at least a side of the first frame facing the second frame or a side of the second frame facing the first frame and the first frame is connected slidably with the second frame along the slide surface.Type: ApplicationFiled: October 18, 2007Publication date: January 21, 2010Applicant: Teijin Pharma LimitedInventors: Masahide Takishita, Takamitsu Okayama, Keiko Omura, Tongoh Chin
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Publication number: 20090250065Abstract: A headgear suitable for wearing a respiratory mask system wearing on the head of a user is provided, wherein it can be easily manufactured, the leakage of the positive pressure gas when pressurized is reduced, and a good wearing feel is achieved. The headgear is adapted to secure a respiratory mask, which contacts the face of the user to supply a positive pressure gas for respiration to the user, to the head of user. The headgear has a head mounted portion which is worn on the occipital of the user and a strap (3) connecting to this head mounted portion. The head mounted portion has at least one closed curved belt (1) which has thereon at least one junction (2). At least one junction provides the closed curved belt with a nonplanar structure adaptable to the shape of the head of the user.Type: ApplicationFiled: October 16, 2007Publication date: October 8, 2009Applicant: TEIJIN PHARMA LIMITEDInventors: Keiko Omura, Masahide Takishita, Shin Ooya, Tongoh Chin, Hideharu Shimura, Shinya Fujimoto, Toru Hikosaka, Toshiki Nakamura, Kazuaki Fujiura, Naoki Kurai
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Publication number: 20090173343Abstract: The present invention relates to a nasal respiratory mask system comprising: a nasal mask that is tightly attached to the face of a user and serves as means for leading positive-pressure breathing gas to the nose of the user, a frame to keep the nasal mask at a predetermined position, and a headgear that is mounted on the head in order to attach the nasal mask tightly to the face; wherein, the headgear comprises, on the tip thereof, a headgear strap for adjusting the length of the headgear, the headgear strap comprises a headgear fastener that serves as means for connection/disconnection with the frame, the frame comprises a fastener catch that engages with the headgear fastener, and the fastener catch comprises an axisymmetric guide whose (rotation) axis is the insertion direction of the headgear fastener.Type: ApplicationFiled: March 29, 2007Publication date: July 9, 2009Applicant: Teijin Pharma LimitedInventors: Keiko Omura, Masahide Takishita, Tongoh Chin, Hideharu Shimura, Shinya Fujimoto, Kazuaki Fujiura
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Publication number: 20090014008Abstract: According to the present invention, there is provided a nasal respiratory mask contacting with the face of a user for supplying respiratory positive-pressure gas to the nose of the user, comprising at least a part attached tightly to the face that is attached tightly to the face of the user; a frame-fitting part for fitting to a frame; and an elastic connecting part that connects elastically the part attached tightly to the face with the frame-fitting part, wherein a facial side of the elastic connecting part is kept apart from the frame-fitting part side thereof for a required distance even in the absence of applied respiratory positive pressure. The nasal respiratory mask has advantages that it can be worn in an appropriate position without applying positive pressure at the start of wearing, scarcely disturbs the visual field during wearing, and can prevent prolongation of the time required for drying or occurrence of unsanitary condition after routine cleaning by washing with water.Type: ApplicationFiled: March 23, 2007Publication date: January 15, 2009Applicant: Teijin Pharma LimitedInventors: Masahide Takishita, Keiko Omura, Tongoh Chin, Takamitsu Okayama, Hideharu Shimura, Shinya Fujimoto, Toru Hikosaka, Satoe Matsunaga
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Patent number: D582545Type: GrantFiled: September 7, 2007Date of Patent: December 9, 2008Assignee: Teijin Pharma LimitedInventors: Keiko Omura, Takamitsu Okayama, Masahide Takishita, Tongoh Chin, Shinya Fujimoto, Hideharu Shimura, Satoe Matsunaga, Toru Hikosaka
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Patent number: D582546Type: GrantFiled: September 7, 2007Date of Patent: December 9, 2008Assignee: Teijin Pharma LimitedInventors: Kazuaki Fujiura, Toshiki Nakamura, Naoki Kurai, Keiko Omura, Takamitsu Okayama, Masahide Takishita, Tongoh Chin, Shinya Fujimoto, Satoe Matsunaga, Hideharu Shimura, Toru Hikosaka