Abstract: There are provided a pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific repeating units, and a crosslinking agent (C).

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive composition which has excellent heat stability and makes it possible to achieve high sensitivity and good roughness characteristics. The actinic ray-sensitive or radiation-sensitive composition according to the present invention contains (A) a compound in which in an organic/inorganic composite composition containing a metal or metalloid element, the aggregated domain size of the metal or metalloid element is 1 to 5 nm, and 1.2 to 2.0 mol times of a carboxylic acid and/or a carboxylic acid derivative with respect to the metal or metalloid element exists to form a coordinated structure; (B) a compound (Q) capable of generating an acid upon irradiation with actinic rays or radiation; and (C) an organic solvent.

Abstract: There are provided a pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific repeating units, and a crosslinking agent (C).

Abstract: The present invention has an object to provide a pattern peeling method which is excellent in peelability and causes less damage to a substrate, a method for manufacturing an electronic device, including the pattern peeling method, and an electronic device manufactured by the method for manufacturing an electronic device. The present invention includes a resist film forming step of applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film; an exposing step of exposing the resist film; a developing step of developing the exposed resist film using a developing liquid containing an organic solvent to form a negative-type pattern; and a peeling step of peeling the negative-type pattern using the following liquid A or B: A: a liquid containing a sulfoxide compound and/or an amide compound; or B: a liquid containing sulfuric acid and hydrogen peroxide.

Abstract: A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.

Abstract: A machine tool 1 comprises a bed 11, a column 12, a spindle head 15, a spindle 16, a saddle 17, a table 18, a feed mechanism for moving the spindle head 15, the saddle 17 and the table 18 in Z-axis, Y-axis and X-axis directions respectively, a position detector for detecting the positions of the spindle head 15, saddle 17 and table 18, a controller for feedback controlling the feed mechanism, a position detector 51 for detecting the position of the spindle head 15, a position detector 54 for detecting the position of the spindle head 15, a position detector 57 for detecting the position of the table 18, and a measurement frame 50 which is configured with a different member from the bed 11 and the column 12 and on which readers 53, 56, 59 of the position detectors 51, 54, 57 are disposed.

Abstract: The invention provides a photosensitive resin composition that includes titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 mgKOH/g to 250 mgKOH/g, a resin B having an acid value of from 26 mgKOH/g to 65 mgKOH/g, a photopolymerization initiator, and a solvent, the photopolymerization initiator including an oxime photopolymerization compound.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.

Abstract: The invention provides a photosensitive resin composition including a black colorant, a photopolymerizable compound, a resin, a photopolymerization initiator and a solvent, the composition capable of forming a light-shielding color filter having a ratio OD1200/OD365 of from 0.5 to 3, where OD1200 is an optical density at a wavelength of 1200 nm and OD365 is an optical density at a wavelength of 365 nm; and a photosensitive resin composition including titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 to 250 mgKOH/g, a resin B having an acid value of from 26 to 65 mgKOH/g, a photopolymerization initiator, and a solvent.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a basic compound; and (D) a specific compound containing at least two specific alicyclic hydrocarbon groups each substituted with a hydroxyl group.

Abstract: Provided is a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness. A colored photosensitive curing composition, comprising, as its colorant, a dipyrromethene-based metal complex compound obtained from a metal or metal compound and a dipyrromethene-based compound represented by the following Formula (I): wherein in Formula (I), R1 to R6 each independently represents a hydrogen atom or a substituent group; and R7 represents a hydrogen or halogen atom, or an alkyl, aryl or heterocyclic group.

Abstract: The invention provides a green curable composition including a colorant in an amount of 47.5% by mass or more with respect to the total solid content of the green curable composition, the colorant containing a halogenated copper phthalocyanine pigment and a barbituric acid derivative yellow pigment at a ratio of from 6/4 to 3/7 (halogenated copper phthalocyanine pigment/barbituric acid derivative yellow pigment); a colored pattern formed from the green curable composition; a color filter including the colored pattern; a solid-state image sensor including the color filter; and a method of producing the color filter.

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.

Abstract: A polymerizable composition including at least a polymerizable compound, a binder polymer, a photopolymerization initiator, and a titanium black dispersion, wherein the mass ratio of the content of the polymerizable compound to the content of the binder polymer is more than 1.

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.

Abstract: The invention provides a dye-containing negative working curable composition comprising at least a dye, a photo polymerization initiator, and as a radical polymerizable monomer, (C-1) an acidic group-containing polyfunctional (meth)acrylic compound having an acid value of 25 mgKOH/g or more, or (C-1) the acidic group-containing polyfunctional (meth)acrylic compound in combination with (C-2) another radical polymerizable compound other than (C-1).

Abstract: The invention provides a photosensitive resin composition that includes titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 mgKOH/g to 250 mgKOH/g, a resin B having an acid value of from 26 mgKOH/g to 65 mgKOH/g, a photopolymerization initiator, and a solvent, the photopolymerization initiator including an oxime photopolymerization compound.

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R1 and R11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R12 represents a phenyl group which may have a substituent.

Abstract: The invention provides a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness; the colored photosensitive curing composition including, as its colorant, a dipyrromethene-based metal complex compound or a interconvertible isomer thereof, obtained from a metal or metal compound and a dipyrromethene-based compound represented by Formula (III): wherein R2 to R5, R7 represent a hydrogen atom or a substituent group; Ma represents a metal or metal compound; X3 represents NR, a nitrogen, oxygen or sulfur atom; X4 represents NR, an oxygen or sulfur atom; Y1 represents NR, a nitrogen or carbon atom; Y2 represents a nitrogen or carbon atom; R8 and R9 represent a substituent group; X5 represents a group that can bond to Ma; and a is 0, 1, or 2.

Abstract: According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.