Patents by Inventor Toru Fujimori

Toru Fujimori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7435527
    Abstract: A positive resist composition comprising (A) a compound that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that is insoluble or hardly soluble in an alkali developing solution but becomes soluble in the alkali developing solution by the action of an acid, and (C) a compound having at least one group that is decomposed with an acid to generate a carboxylic acid and at least three groups selected from hydroxy group and substituted hydroxy group.
    Type: Grant
    Filed: June 16, 2004
    Date of Patent: October 14, 2008
    Assignee: FUJIFILM Corporation
    Inventor: Toru Fujimori
  • Publication number: 20080226994
    Abstract: The invention provides a negative curable composition comprising a colorant, a photopolymerization initiator, a radical polymerizable monomer, a binder, and a monofunctional thiol compound, wherein the content of the radical polymerizable monomer with respect to the total solid content of the composition is from about 10 mass % to about 50 mass %, and the content of the binder with respect to the total solid content of the composition is about 20 mass % or less; a color filter formed by using the composition; and a method of producing the color filter. The negative curable composition has excellent developability at high sensitivity and enables formation of a fine rectangular pattern even in a low-binder content formulation.
    Type: Application
    Filed: March 12, 2008
    Publication date: September 18, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Yosuke MURAKAMI, Toru FUJIMORI
  • Publication number: 20080096130
    Abstract: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
    Type: Application
    Filed: October 29, 2007
    Publication date: April 24, 2008
    Inventors: Koji Shirakawa, Toru Fujimori, Shoichiro Yasunami
  • Patent number: 7361446
    Abstract: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
    Type: Grant
    Filed: March 30, 2004
    Date of Patent: April 22, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Koji Shirakawa, Toru Fujimori, Shoichiro Yasunami
  • Publication number: 20080081268
    Abstract: Provided is a colored curable composition, comprising at least one tetraazaporphyrin dye represented by the following Formula (C1), a color filter prepared by using the same, and a production method thereof. wherein, R1 represents a substituent group; L represents an aliphatic or aromatic connecting group; Z1 represents a non-metal atom group needed for forming a six-membered ring with carbon atoms; at least one of the multiple groups R1 has —OY, —COOY, —SO3Y, —CON(Y)CO—, —CON(Y)SO2— or —SO2N(Y)CO—; Y represents a hydrogen atom, a metal atom or a conjugate acid; and M represents two hydrogen atoms, a bivalent metal atom, a bivalent metal oxide, a bivalent metal hydroxide or a bivalent metal chloride.
    Type: Application
    Filed: August 27, 2007
    Publication date: April 3, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Masuji MOTOKI, Yuki MIZUKAWA, Toru FUJIMORI, Hideki TAKAKUWA
  • Publication number: 20080076044
    Abstract: Provided is a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness. A colored photosensitive curing composition, comprising, as its colorant, a dipyrromethene-based metal complex compound obtained from a metal or metal compound and a dipyrromethene-based compound represented by the following Formula (I): wherein in Formula (I), R1 to R6 each independently represent a hydrogen atom or a substituent group; and R7 represents a hydrogen or halogen atom, or an alkyl, aryl or heterocyclic group.
    Type: Application
    Filed: September 27, 2007
    Publication date: March 27, 2008
    Applicant: FUJIFILM Corporation
    Inventors: Yuki Mizukawa, Ryoji Goto, Hideki Takakuwa, Masashi Ogiyama, Toru Fujimori
  • Publication number: 20080063953
    Abstract: According to an aspect of the invention, there is provided a process for producing a dye-containing negative curable composition, the process including passing a mixture containing a dye, a photopolymerization initiator, and a radical polymerizable monomer through a filter having a pore diameter of from not less than 0.02 ?m to less than 0.2 ?m.
    Type: Application
    Filed: August 31, 2007
    Publication date: March 13, 2008
    Applicant: FUJIFILM CORPORATION
    Inventor: Toru FUJIMORI
  • Publication number: 20070254240
    Abstract: The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the total amount of the composition.
    Type: Application
    Filed: April 26, 2007
    Publication date: November 1, 2007
    Applicant: FUJIFILM CORPORATION
    Inventors: Tomoya Sasaki, Toru Fujimori
  • Patent number: 7255971
    Abstract: A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and (D) a compound comprising at least three hydroxyl groups or at least three substituted hydroxyl groups, and comprising at least one cyclic structure.
    Type: Grant
    Filed: September 16, 2002
    Date of Patent: August 14, 2007
    Assignee: Fujifilm Corporation
    Inventors: Toru Fujimori, Yasumasa Kawabe
  • Publication number: 20070166631
    Abstract: The invention provides a dye-containing negative working curable composition comprising at least a dye, a photo polymerization initiator, and as a radical polymerizable monomer, (C-1) an acidic group-containing polyfunctional (meth)acrylic compound having an acid value of 25 mgKOH/g or more, or (C-1) the acidic group-containing polyfunctional (meth)acrylic compound in combination with (C-2) another radical polymerizable compound other than (C-1).
    Type: Application
    Filed: January 17, 2007
    Publication date: July 19, 2007
    Applicant: FUJIFILM Corporation
    Inventor: Toru Fujimori
  • Patent number: 7241551
    Abstract: A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35° C. or more or a boiling point of 100° C./10 mmHg or more: and (D) a solvent.
    Type: Grant
    Filed: June 9, 2004
    Date of Patent: July 10, 2007
    Assignee: Fujifilm Corporation
    Inventors: Hyou Takahashi, Tsukasa Yamanaka, Toru Fujimori
  • Patent number: 7235341
    Abstract: A positive resist composition comprising: (A) a compound capable of generating an acid on exposure to active light rays or a radiation; (B) a resin which is insoluble or sparingly soluble in an alkali and becomes alkali-soluble by an action of an acid; and (D) an acyclic compound having at least three groups selected from a hydroxyl group and a substituted hydroxyl group.
    Type: Grant
    Filed: March 17, 2003
    Date of Patent: June 26, 2007
    Assignee: Fujifilm Corporation
    Inventor: Toru Fujimori
  • Publication number: 20070141513
    Abstract: A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.
    Type: Application
    Filed: January 26, 2007
    Publication date: June 21, 2007
    Inventor: Toru Fujimori
  • Publication number: 20070117031
    Abstract: A dye polymer prepared by polymerizing one or more pigment monomer represented by formula (I), or a dye polymer prepared by copolymerizing one or more pigment monomer represented by formula (I) and one or more monomer having one ethylene group.
    Type: Application
    Filed: November 20, 2006
    Publication date: May 24, 2007
    Inventors: Yuki Mizukawa, Toru Fujimori, Yasuhiro Kato
  • Patent number: 7214465
    Abstract: A positive photosensitive composition comprising (A1) a compound that generates an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a compound that has at least three hydroxy or substituted hydroxy groups and at least one cyclic structure or (A2) an onium salt of an alkanesulfonic acid in which the ?-position of the sulfonic acid is not substituted with a fluorine atom and/or an onium salt of a carboxylic acid.
    Type: Grant
    Filed: January 9, 2003
    Date of Patent: May 8, 2007
    Assignee: Fujifilm Corporation
    Inventors: Hajime Nakao, Yasumasa Kawabe, Toru Fujimori, Kunihiko Kodama
  • Publication number: 20070072955
    Abstract: A negative dye-containing curable composition, comprising: (A) an organic solvent-soluble dye, (B) a photopolymerization initiator, (C) a radical-polymerizable monomer, and (D) an organic solvent, wherein the composition contains further comprises (X) an inorganic metal salt that is different from the organic solvent-soluble dye (A), and the content of the inorganic metal salt (X) is 0.1 mass % or less with respect to the total solid content of the composition is provided.
    Type: Application
    Filed: September 27, 2006
    Publication date: March 29, 2007
    Inventors: Toru Fujimori, Akira Hibino, Nobuo Seto, Yoshiharu Yabuki, Yuki Mizukawa
  • Patent number: 7192681
    Abstract: A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: March 20, 2007
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toru Fujimori
  • Publication number: 20060257762
    Abstract: The present invention provides a colored curable composition comprising at least one azomethine dye represented by the following formula (I) and one tetraazaporphyrin dye represented by the following formula (A), wherein R11 to R15: H or a substituent group; R16 and R17: an alkyl, an alkenyl, an aryl or a heterocyclic group; Za and Zb: —N?, or —C(R18)?, in which R18 is a hydrogen atom, an alkyl, an alkenyl, an aryl, or a heterocyclic group; rings A1 to A4: a benzene ring or a pyridine ring provided that at least one of rings A1 to A4 is a pyridine ring; R1 and R2: H or an alkyl provided that R1 and R2 do not simultaneously represent a hydrogen atom; m=1 to 8; and n=1 to 4.
    Type: Application
    Filed: April 28, 2006
    Publication date: November 16, 2006
    Inventors: Toru Fujimori, Yuki Mizukawa
  • Publication number: 20060246364
    Abstract: A colorant-containing curable composition containing a tetraazaporphyrin compound represented by formula (1), wherein rings A1, A2, A3, and A4 each independently represent a benzene ring or a pyridine ring, at least one of the rings A1, A2, A3, and A4 represents a pyridine ring, R1 and R2 each independently represent a hydrogen atom or an alkyl group provided that R1 and R2 are not hydrogen atoms at the same time, m represents an integer of 1 to 8, and n is an integer of 1 to 4.
    Type: Application
    Filed: April 28, 2006
    Publication date: November 2, 2006
    Inventor: Toru Fujimori
  • Publication number: 20060051685
    Abstract: The present invention provides a negative dye-containing curable composition comprising at least (A) an alkali-soluble binder, (B) an organic solvent-soluble dye, (C) a photopolymerization initiator, (D) a radical-polymerizable monomer and (E) an organic solvent, wherein the organic solvent-soluble dye (B) comprises at least one kind of azomethine-type dye represented by the following formula (I) and at least one kind of tetraazaporphyrin-type dye represented by the following formula (A), and the photopolymerization initiator (C) is an oxime-type compound, wherein R1 represents a hydrogen atom or a substituent group; R2 to R5 each represent a hydrogen atom or a substituent group, R6 to R7 each represent an alkyl group, alkenyl group, aryl group or heterocyclic group, Za and Zb each represent —N? or —C(R8)?; R8 represents a hydrogen atom, alkyl group, aryl group or heterocyclic group; M1 represents a metal, and Z1 to Z4 each represent an atomic group forming a 6-membered ring composed of atoms selected fr
    Type: Application
    Filed: September 6, 2005
    Publication date: March 9, 2006
    Inventors: Toru Fujimori, Yuki Mizukawa