Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a basic compound; and (D) a specific compound containing at least two specific alicyclic hydrocarbon groups each substituted with a hydroxyl group.

Abstract: The present invention provides a dye-containing negative curable composition including a dye that is soluble in an organic solvent, a photopolymerization initiator, a photopolymerizable compound, and cyclopentanone; a color filter formed from the dye-containing negative curable composition; and a method of producing the color filter.

Abstract: A machine tool 1 comprises a bed 11, a column 12, a spindle head 15, a spindle 16, a saddle 17, a table 18, a feed mechanism for moving the spindle head 15, the saddle 17 and the table 18 in Z-axis, Y-axis and X-axis directions respectively, a position detector for detecting the positions of the spindle head 15, saddle 17 and table 18, a controller for feedback controlling the feed mechanism, a position detector 51 for detecting the position of the spindle head 15, a position detector 54 for detecting the position of the spindle head 15, a position detector 57 for detecting the position of the table 18, and a measurement frame 50 which is configured with a different member from the bed 11 and the column 12 and on which readers 53, 56, 59 of the position detectors 51, 54, 57 are disposed.

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.

Abstract: Provided is a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness. A colored photosensitive curing composition, comprising, as its colorant, a dipyrromethene-based metal complex compound obtained from a metal or metal compound and a dipyrromethene-based compound represented by the following Formula (I): wherein in Formula (I), R1 to R6 each independently represent a hydrogen atom or a substituent group; and R7 represents a hydrogen or halogen atom, or an alkyl, aryl or heterocyclic group.

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.

Abstract: Provided is a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness. A colored photosensitive curing composition, comprising, as its colorant, a dipyrromethene-based metal complex compound obtained from a metal or metal compound and a dipyrromethene-based compound represented by the following Formula (I): wherein in Formula (I), R1 to R6 each independently represent a hydrogen atom or a substituent group; and R7 represents a hydrogen or halogen atom, or an alkyl, aryl or heterocyclic group.

Abstract: Provided is a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness. A colored photosensitive curing composition, comprising, as its colorant, a dipyrromethene-based metal complex compound obtained from a metal or metal compound and a dipyrromethene-based compound represented by the following Formula (I): wherein in Formula (I), R1 to R6 each independently represent a hydrogen atom or a substituent group; and R7 represents a hydrogen or halogen atom, or an alkyl, aryl or heterocyclic group.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.

Abstract: The invention provides a negative curable composition comprising a colorant, a photopolymerization initiator, a radical polymerizable monomer, a binder, and a monofunctional thiol compound, wherein the content of the radical polymerizable monomer with respect to the total solid content of the composition is from about 10 mass % to about 50 mass %, and the content of the binder with respect to the total solid content of the composition is about 20 mass % or less; a color filter formed by using the composition; and a method of producing the color filter. The negative curable composition has excellent developability at high sensitivity and enables formation of a fine rectangular pattern even in a low-binder content formulation.

Abstract: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter.

Abstract: The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the total amount of the composition.

Abstract: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a process for producing a light-shielding color filter, the process including a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern. Furthermore, there is provided an image sensor that includes the light-shielding color filter.

Abstract: An azo compound represented by Formula (I), Formula (II), or Formula (III): wherein R1 and R2 each independently represent a hydrogen atom or a substituent; D1 and D2 each independently represent a coupler residue; Z1 and Z2 each independently represent —C(R3)? or —N?; and R3 represents a hydrogen atom or a substituent.

Abstract: A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R1 and R11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R12 represents a phenyl group which may have a substituent.

Abstract: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.

Abstract: The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the total amount of the composition.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition of the first invention includes (A1) an acid-decomposable resin, the resin containing three kinds of repeating units each having a specific structure, (B) a photo-acid generator and (C1) a 2-phenylbenzimidazole-based basic compound; an actinic ray-sensitive or radiation-sensitive resin composition of the second invention includes (A2) an acid-decomposable resin, (B) a photo-acid generator and (C2) 2-heteryl benzimidazole-based basic compound; a chemical amplification resist composition of the third invention includes (A3) an acid-decomposable resin, (B) a photo-acid generator and (C3) a benzimidazole-based basic compound having a sulfur atom-containing specific structure; and a resist film and a pattern forming method each use such a composition.

Abstract: Provided is a colored curable composition, comprising at least one tetraazaporphyrin dye represented by the following Formula (C1), a color filter prepared by using the same, and a production method thereof. wherein, R1 represents a substituent group; L represents an aliphatic or aromatic connecting group; Z1 represents a non-metal atom group needed for forming a six-membered ring with carbon atoms; at least one of the multiple groups R1 has —OY, —COOY, —SO3Y, —CON(Y)CO—, —CON(Y)SO2— or —SO2N(Y)CO—; Y represents a hydrogen atom, a metal atom or a conjugate acid; and M represents two hydrogen atoms, a bivalent metal atom, a bivalent metal oxide, a bivalent metal hydroxide or a bivalent metal chloride.