Patents by Inventor Toshifumi Minami
Toshifumi Minami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180108418Abstract: A semiconductor memory device includes a first memory cell, a second memory cell above the first memory cell, a first word line electrically connected to a gate of the first memory cell, a second word line electrically connected to a gate of the second memory cell, and a control unit that performs an erasing operation on the first and second memory cells. During the erasing operation, the control unit applies a first voltage to a first word line and a second voltage higher than the first voltage to a second word line.Type: ApplicationFiled: October 23, 2017Publication date: April 19, 2018Inventors: Masanobu SHIRAKAWA, Takuya FUTATSUYAMA, Kenichi ABE, Hiroshi NAKAMURA, Keisuke YONEHAMA, Atsuhiro SATO, Hiroshi SHINOHARA, Yasuyuki BABA, Toshifumi MINAMI
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Patent number: 9893078Abstract: A semiconductor memory device includes a conducting layer and an insulating layer that are disposed above a semiconductor substrate, a plurality of pillars that extend in a direction which crosses a surface of the semiconductor substrate, and a plate that is disposed between the plurality of pillars and extends in the same direction as the pillars. A surface of the plate, which faces the pillars, has convex portions and non-convex portions.Type: GrantFiled: February 24, 2015Date of Patent: February 13, 2018Assignee: Toshiba Memory CorporationInventors: Toshifumi Minami, Atsuhiro Sato, Keisuke Yonehama, Yasuyuki Baba, Hiroshi Shinohara, Hideyuki Kamata, Teppei Higashitsuji
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Patent number: 9847301Abstract: According to one embodiment, a semiconductor device includes a semiconductor substrate including an element region, a guard ring provided on an outer periphery of the element region and including a first interconnect and a first plug which electrically couples the first-interconnect and a first well region, a second interconnect provided above the first interconnect via a first insulating layer and non-electrically coupling to the first interconnect, and a first circuit coupled to the second interconnect. The first circuit detects one of a crack and a peeling of the guard ring in accordance with a break in the second interconnect or a short circuit between the second interconnect and the first interconnect.Type: GrantFiled: March 2, 2017Date of Patent: December 19, 2017Assignee: TOSHIBA MEMORY CORPORATIONInventors: Toshifumi Minami, Hiroyuki Maeda
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Patent number: 9799403Abstract: A semiconductor memory device includes a first memory cell, a second memory cell above the first memory cell, a first word line electrically connected to a gate of the first memory cell, a second word line electrically connected to a gate of the second memory cell, and a control unit that performs an erasing operation on the first and second memory cells. During the erasing operation, the control unit applies a first voltage to a first word line and a second voltage higher than the first voltage to a second word line.Type: GrantFiled: June 6, 2016Date of Patent: October 24, 2017Assignee: Toshiba Memory CorporationInventors: Masanobu Shirakawa, Takuya Futatsuyama, Kenichi Abe, Hiroshi Nakamura, Keisuke Yonehama, Atsuhiro Sato, Hiroshi Shinohara, Yasuyuki Baba, Toshifumi Minami
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Patent number: 9768189Abstract: According to one embodiment, a semiconductor memory device includes: a semiconductor substrate; a first semiconductor pillar above the semiconductor substrate; a first insulating layer comprising a first section and a second section, the first section being in contact with the semiconductor substrate and a bottom of the first semiconductor pillar, and the second section covering a side of the first semiconductor pillar; conductive layers and second insulating layers stacked one by one above the semiconductor substrate and covering the second section of the first insulating layer; a first plug on the first semiconductor pillar; and an interconnect on the first plug.Type: GrantFiled: April 7, 2016Date of Patent: September 19, 2017Assignee: TOSHIBA MEMORY CORPORATIONInventors: Hiroshi Shinohara, Atsuhiro Sato, Keisuke Yonehama, Yasuyuki Baba, Toshifumi Minami, Hiroyuki Maeda, Shinji Saito, Hideyuki Kamata
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Publication number: 20170263639Abstract: According to one embodiment, a semiconductor storage device includes a substrate including an insulating region and a semiconductor region, an insulating film disposed on upper surfaces of the semiconductor region and the insulating region, a first conductive film disposed on an upper surface of the insulating film, and including a terrace region, and a first contact plug disposed on an upper surface of the terrace region of the first conductive film. The insulating region includes an upper surface positioned directly under the first contact plug. A lower surface of the insulating film is in contact with the upper surfaces of the semiconductor region and the insulating region, in the region directly under the terrace region.Type: ApplicationFiled: March 10, 2017Publication date: September 14, 2017Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Shinji SAITO, Toshifumi MINAMI
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Publication number: 20170256504Abstract: According to one embodiment, a semiconductor device includes a semiconductor substrate including an element region, a guard ring provided on an outer periphery of the element region and including a first interconnect and a first plug which electrically couples the first-interconnect and a first well region, a second interconnect provided above the first interconnect via a first insulating layer and non-electrically coupling to the first interconnect, and a first circuit coupled to the second interconnect. The first circuit detects one of a crack and a peeling of the guard ring in accordance with a break in the second interconnect or a short circuit between the second interconnect and the first interconnect.Type: ApplicationFiled: March 2, 2017Publication date: September 7, 2017Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Toshifumi MINAMI, Hiroyuki MAEDA
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Publication number: 20160358659Abstract: A semiconductor memory device includes a first memory cell, a second memory cell above the first memory cell, a first word line electrically connected to a gate of the first memory cell, a second word line electrically connected to a gate of the second memory cell, and a control unit that performs an erasing operation on the first and second memory cells. During the erasing operation, the control unit applies a first voltage to a first word line and a second voltage higher than the first voltage to a second word line.Type: ApplicationFiled: June 6, 2016Publication date: December 8, 2016Inventors: Masanobu SHIRAKAWA, Takuya FUTATSUYAMA, Kenichi ABE, Hiroshi NAKAMURA, Keisuke YONEHAMA, Atsuhiro SATO, Hiroshi SHINOHARA, Yasuyuki BABA, Toshifumi MINAMI
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Patent number: 9437300Abstract: A semiconductor memory device includes first and second memory cell transistors, first and second word lines electrically connected to the first and second memory cell transistors, respectively, first and second transfer transistors. The first and second transistors are electrically connected to the first and second word lines, respectively. The sizes of the first transistor and the second transistor are different.Type: GrantFiled: August 26, 2014Date of Patent: September 6, 2016Assignee: Kabushiki Kaisha ToshibaInventors: Hideyuki Kamata, Toshifumi Minami, Teppei Higashitsuji, Atsuhiro Sato, Keisuke Yonehama, Yasuyuki Baba, Hiroshi Shinohara
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Publication number: 20160218109Abstract: According to one embodiment, a semiconductor memory device includes: a semiconductor substrate; a first semiconductor pillar above the semiconductor substrate; a first insulating layer comprising a first section and a second section, the first section being in contact with the semiconductor substrate and a bottom of the first semiconductor pillar, and the second section covering a side of the first semiconductor pillar; conductive layers and second insulating layers stacked one by one above the semiconductor substrate and covering the second section of the first insulating layer; a first plug on the first semiconductor pillar; and an interconnect on the first plug.Type: ApplicationFiled: April 7, 2016Publication date: July 28, 2016Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Hiroshi SHINOHARA, Atsuhiro Sato, Keisuke Yonehama, Yasuyuki Baba, Toshifumi Minami, Hiroyuki Maeda, Shinji Saito, Hideyuki Kamata
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Patent number: 9361988Abstract: A semiconductor memory device includes a first memory cell, a second memory cell above the first memory cell, a first word line electrically connected to a gate of the first memory cell, a second word line electrically connected to a gate of the second memory cell, and a control unit that performs an erasing operation on the first and second memory cells. During the erasing operation, the control unit applies a first voltage to a first word line and a second voltage higher than the first voltage to a second word line.Type: GrantFiled: August 26, 2014Date of Patent: June 7, 2016Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Masanobu Shirakawa, Takuya Futatsuyama, Kenichi Abe, Hiroshi Nakamura, Keisuke Yonehama, Atsuhiro Sato, Hiroshi Shinohara, Yasuyuki Baba, Toshifumi Minami
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Patent number: 9337145Abstract: According to one embodiment, a semiconductor memory device includes: a semiconductor substrate; a first semiconductor pillar above the semiconductor substrate; a first insulating layer comprising a first section and a second section, the first section being in contact with the semiconductor substrate and a bottom of the first semiconductor pillar, and the second section covering a side of the first semiconductor pillar; conductive layers and second insulating layers stacked one by one above the semiconductor substrate and covering the second section of the first insulating layer; a first plug on the first semiconductor pillar; and an interconnect on the first plug.Type: GrantFiled: March 10, 2015Date of Patent: May 10, 2016Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Hiroshi Shinohara, Atsuhiro Sato, Keisuke Yonehama, Yasuyuki Baba, Toshifumi Minami, Hiroyuki Maeda, Shinji Saito, Hideyuki Kamata
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Publication number: 20160071870Abstract: A semiconductor memory device includes a conducting layer and an insulating layer that are disposed above a semiconductor substrate, a plurality of pillars that extend in a direction which crosses a surface of the semiconductor substrate, and a plate that is disposed between the plurality of pillars and extends in the same direction as the pillars. A surface of the plate, which faces the pillars, has convex portions and non-convex portions.Type: ApplicationFiled: February 24, 2015Publication date: March 10, 2016Inventors: Toshifumi MINAMI, Atsuhiro SATO, Keisuke YONEHAMA, Yasuyuki BABA, Hiroshi SHINOHARA, Hideyuki KAMATA, Teppei HIGASHITSUJI
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Publication number: 20160071793Abstract: According to one embodiment, a semiconductor memory device includes: a semiconductor substrate; a first semiconductor pillar above the semiconductor substrate; a first insulating layer comprising a first section and a second section, the first section being in contact with the semiconductor substrate and a bottom of the first semiconductor pillar, and the second section covering a side of the first semiconductor pillar; conductive layers and second insulating layers stacked one by one above the semiconductor substrate and covering the second section of the first insulating layer; a first plug on the first semiconductor pillar; and an interconnect on the first plug.Type: ApplicationFiled: March 10, 2015Publication date: March 10, 2016Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Hiroshi SHINOHARA, Atsuhiro SATO, Keisuke YONEHAMA, Yasuyuki BABA, Toshifumi MINAMI, Hiroyuki MAEDA, Shinji SAITO, Hideyuki KAMATA
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Publication number: 20150262685Abstract: A semiconductor memory device includes a first memory cell, a second memory cell above the first memory cell, a first word line electrically connected to a gate of the first memory cell, a second word line electrically connected to a gate of the second memory cell, and a control unit that performs an erasing operation on the first and second memory cells. During the erasing operation, the control unit applies a first voltage to a first word line and a second voltage higher than the first voltage to a second word line.Type: ApplicationFiled: August 26, 2014Publication date: September 17, 2015Inventors: Masanobu SHIRAKAWA, Takuya FUTATSUYAMA, Kenichi ABE, Hiroshi NAKAMURA, Keisuke YONEHAMA, Atsuhiro SATO, Hiroshi SHINOHARA, Yasuyuki BABA, Toshifumi MINAMI
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Publication number: 20150262669Abstract: A semiconductor memory device includes first and second memory cell transistors, first and second word lines electrically connected to the first and second memory cell transistors, respectively, first and second transfer transistors. The first and second transistors are electrically connected to the first and second word lines, respectively. The sizes of the first transistor and the second transistor are different.Type: ApplicationFiled: August 26, 2014Publication date: September 17, 2015Inventors: Hideyuki KAMATA, Toshifumi MINAMI, Teppei HIGASHITSUJI, Atsuhiro SATO, Keisuke YONEHAMA, Yasuyuki BABA, Hiroshi SHINOHARA
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Publication number: 20150062843Abstract: According to one embodiment, a semiconductor device includes a cell portion and a peripheral portion, including: a substrate, a first insulating layer disposed on the substrate, a first conductive layer disposed on the first insulating layer, a second insulating layer disposed on the first conductive layer, and a second conductive layer disposed on the second insulating layer.Type: ApplicationFiled: March 12, 2014Publication date: March 5, 2015Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Teppei HIGASHITSUJI, Toshifumi MINAMI, Hideyuki KAMATA, Atsuhiro SATO, Keisuke YONEHAMA
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Patent number: 8241999Abstract: A semiconductor device has a circuit element region formed on a semiconductor substrate, and a protective pattern formed so as to surround the circuit element region.Type: GrantFiled: February 16, 2010Date of Patent: August 14, 2012Assignee: Kabushiki Kaisha ToshibaInventors: Takafumi Ikeda, Takahito Nakazawa, Hideaki Maekawa, Yuuichi Tatsumi, Toshifumi Minami
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Publication number: 20110228606Abstract: According to one embodiment, a nonvolatile semiconductor memory device comprises a first block, a second block, a storage circuit, a controller. A first block comprises a first select gate and a first word line. A second block comprises a second select gate and a second word line. A storage circuit configures to store first data concerning a voltage to be applied to the first select gate, and second data concerning a voltage to be applied to the second select gate. A controller configures to control the voltages to be applied to the first select gate and the second select gate. The controller applies, in a write operation, a first voltage to the first select gate based on the first data, and a second voltage different from the first voltage to the second select gate based on the second data.Type: ApplicationFiled: March 17, 2011Publication date: September 22, 2011Inventors: Hiroki MUROTANI, Toshifumi MINAMI
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Patent number: 8013381Abstract: A semiconductor device has a semiconductor substrate of a first conductivity type; first to third high-voltage insulated-gate field effect transistors formed on a principal surface of the semiconductor substrate; a first device isolation insulating film that is formed in the semiconductor substrate and isolates the first high-voltage insulated-gate field effect transistor and the second high-voltage insulated-gate field effect transistor from each other; a second device isolation insulating film that is formed in the semiconductor substrate and isolates the first high-voltage insulated-gate field effect transistor and the third high-voltage insulated-gate field effect transistor from each other; a first impurity diffusion layer of the first conductivity type that is formed below the first device isolation insulating film; and a second impurity diffusion layer of the first conductivity type that is formed below the second device isolation insulating film.Type: GrantFiled: January 28, 2009Date of Patent: September 6, 2011Assignee: Kabushiki Kaisha ToshibaInventors: Norio Magome, Toshifumi Minami, Tomoaki Hatano, Norihisa Arai