Abstract: A photocurable composition which decreases a mold releasing force is provided. The photocurable composition is a photocurable composition which is cured using light while being in contact with a mold having a surface in which a concavo-convex pattern is formed so as to manufacture a film having a concavo-convex pattern and which includes a polymerizable compound, a photopolymerization initiator, and a photosensitive gas generating agent having a photostimulation responsive portion. The photosensitive gas generating agent has a repeating structure containing at least one alkylene oxide chain and generates a gas from the photostimulation responsive portion by light irradiation.

Abstract: An imprint method that uses a condensable gas process has a problem in that the surface of a resist cured film is rough. This is resolved by a photocurable composition used for performing imprint in an atmosphere containing a condensable gas. The photocurable composition contains a component (A) which is a (meth)acrylate monomer, a component (B) which is a photopolymerization initiator, and a component (C) which is a mold releasing agent. A saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 5% by weight or less, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.

Abstract: A curable composition for photoimprint at least includes a polymerizable compound component (A) and a photopolymerization initiator component (B) and satisfies expression (1) and (2): 0.800?Er10/Er200??(1) 2.55?Er10??(2) wherein, Er10 represents the reduced modulus (GPa) of a photocured film prepared by exposing a film of the curable composition for photoimprint to light of 10 mJ/cm2; and Er200 represents the reduced modulus (GPa) of a photocured film prepared by exposing a film of the curable composition for photoimprint to light of 200 mJ/cm2.

Abstract: A photocurable composition excellent in the effect of reducing the mold releasing force even in a small amount of light exposure, and a photosensitive gas generating agent contained in the photocurable composition are provided. The photosensitive gas generating agent is a compound having a photostimulation responsive gas generating group to generate a gas by photostimulation, a perfluoroalkyl group and a polyalkyleneoxy group to link the photostimulation responsive gas generating group and the perfluoroalkyl group. The photocurable composition contains the photosensitive gas generating agent.

Abstract: An adhesion layer-forming composition to allow a substrate to adhere to a photocurable composition at least contains a curable base material (A) containing at least one functional group that binds to a base and at least one radically polymerizable functional group, a polymerization inhibitor (B), and an organic solvent (C), the adhesion layer-forming composition having a polymerization inhibitor (B) content of 0.1 parts by weight or more and 20 parts by weight or less based on 100 parts by weight of the curable base material (A).

Abstract: To provide a patterning method for forming a desired pattern in a reverse process. A patterning method includes a reverse process. A photocurable composition contains at least a polymerizable compound (A) component and a photopolymerization initiator (B) component. The (A) component has a mole fraction weighted average molecular weight of 200 or more and 1000 or less. The (A) component has an Ohnishi parameter (OP) of 3.80 or more. The Ohnishi parameter (OP) of the (A) component is a mole fraction weighted average of N/(NC?NO), wherein N denotes a total number of atoms in a molecule, NC denotes a number of carbon atoms in the molecule, and NO denotes a number of oxygen atoms in the molecule.

Abstract: An imprint method includes: placing a light-curable composition on a workpiece substrate (placement); bringing the light-curable composition and a mold into contact with each other an atmosphere of a condensable gas (contact); aligning the mold and the workpiece substrate (alignment); irradiating the light-curable composition with light to obtain a light-cured composition (irradiation); and separating the light-cured composition and the mold from each other after the irradiation (release). The film thickness of the light-curable composition during the alignment is 20% or more greater than that of the light-cured composition after the release.

Abstract: A method of producing a film includes: a disposing step of disposing a photocurable composition on a substrate; a mold contact step of bringing the photocurable composition and a mold into contact with each other; a photoirradiation step of irradiating the photocurable composition with light to form a cured product; and a mold release step of releasing the cured product and the mold from each other, in which the method further includes an alignment step of aligning the mold and the substrate with each other before the photoirradiation step, in which the photocurable composition contains at least a polymerizable compound serving as a component (A) and a photopolymerization initiator serving as a component (B), and in which the polymerizable compound has a polymerization conversion ratio of 50% or more when exposed to light under conditions of an illuminance of 0.12 mW/cm2 and an exposure time of 11.0 seconds.

Abstract: In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer; a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.

Abstract: A curable composition contains a polymerizable compound and a polymerization initiator. The polymerization initiator initiates polymerization to cure the polymerizable compound. The curable composition further contains compounds having the following general formulae (1) and (2): wherein X1 is selected from a hydroxy group, a carboxy group, a sulfo group, an amino group, and an alkoxy group, l1 denotes an integer in the range of 0 to 7, m1 denotes an integer in the range of 1 to 5, and n1 denotes an integer in the range of 1 to 16, and X2 is selected from a hydroxy group, a carboxy group, a sulfo group, an amino group, and an alkoxy group, l2 denotes an integer in the range of 0 to 7, m2 denotes an integer in the range of 1 to 5, and n2 denotes an integer in the range of 1 to 16.

Abstract: Provided is a curable composition, including a polymerization initiator; a polymerizable compound; and an internal addition type release agent having a hydrophilic functional group, in which the internal addition type release agent is prevented from being unevenly distributed in a gas-liquid interface of the curable composition.

Abstract: Provided is a method of producing a cured product pattern, including: a first step (arranging step) of arranging a layer formed of a curable composition (?1?) that is the components of the curable composition (?1) except the component (D) serving as a solvent on a substrate; and a second step (applying step) of applying droplets of a curable composition (?2) discretely onto the layer formed of the curable composition (?1), the curable composition (?1) having a number concentration of particles each having a particle diameter of 0.07 ?m or more of less than 2,021 particles/mL, and the curable composition (?1?) having a surface tension larger than that of the curable composition (?2).

Abstract: In an imprint process in a gaseous atmosphere containing a condensable gas, the curable composition for photoimprint is difficult to cure, the pattern is not fully formed to cause defects. The present invention relates to a curable composition for photoimprint in a gaseous atmosphere containing a condensable gas. The curable composition for photoimprint at least comprises the following component (A) and component (B): (A) polymerizable compound, and (B) photopolymerization initiator. Component (B) has a saturated solubility of less than 1% by weight in the condensable gas in a liquid state at 5° C. and 1 atm or has a Hansen distance (Ra) of larger than 7.6 to the condensable gas.

Abstract: A pattern forming method comprising, a step (1) of coating a layer formed of a curable composition (A1) containing at least a certain polymerizable compound (a1) on a surface of a substrate, a step (2) of dispersedly dropping a droplet of a curable composition (A2) containing at least a polymerizable compound (a2) on the layer of the curable composition (A1) to form lamination, a step (3) of sandwiching between a mold and the substrate a layer in which the curable composition (A1) and the curable composition (A2) are partially mixed, a step (4) of curing a portion of the layer in which the two curable compositions are partially mixed all at once by applying light from the side of the mold, the portion being sandwiched between the mold and the substrate, and a step (5) of separating the mold from the layer formed of the cured curable compositions.

Abstract: An additive manufacturing apparatus in which a streak in a manufacturing direction is difficult to be made on the surface of a product manufactured object in a boundary region of projection regions of exposure images is provided. In this apparatus, a vessel holds a photosetting liquid resin material, a first projector makes a first exposure image incident from an incident surface and projects it into the resin material, a second projector makes a second exposure image, continuous with the first exposure image, incident from the incident surface and projects it into the resin material, and a controlling unit adjusts on a projection surface a boundary region between a first projection image obtained by projecting the first exposure image by the first projector and a second projection image obtained by projecting the second exposure image by the second projector.

Abstract: Provided is a method for manufacturing a photo cured material, by which transferring precision can be improved and a small surface roughness can be obtained. The method includes the steps of: placing a photo-curable composition on a substrate; brining a mold into contact with the photo-curable composition; irradiating the photo-curable composition with light; and releasing the mold from the photo-curable composition. The contact is performed in a condensable gas atmosphere, the condensable gas condensing under a temperature condition at the contact and under a pressure condition that the condensable gas receives when the photo-curable composition intrudes gaps between the substrate and the mold or concavities provided on the mold, and the photo-curable composition includes a gas dissolution inhibitor having a rate of weight change with reference to the condensable gas that is ?1.0% to 3.0%.

Abstract: A photo-curable composition having a high polymerization rate and a high polymerization conversion is provided, containing a radical-polymerizable monomer (A), a photopolymerization initiator (B), and a compound (C) serving as a sensitizer and having the following general formula (1), wherein X1 and X2 are selected from the group consisting of a hydrogen atom, alkyl groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine; where X1 and X2 may be the same or different; and R1 to R10 are independently selected from the group consisting of a hydrogen atom, halogen atoms, alkyl groups, alkoxy groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine, wherein R1 to R10 may be the same or different.

Abstract: To provide a curable composition for nanoimprinting that can form a cured product that has a sufficiently cured surface and is less prone to a pattern collapse defect even when the curable composition is cured by a photo-nanoimprint method at a low exposure dose. To provide a nanoimprint method for forming such a cured product. To provide a cured product that is less prone to a pattern collapse defect even when cured at a low exposure dose, a method for producing such a cured product, a method for manufacturing an optical component, a method for manufacturing a circuit board, and a method for manufacturing an electronic component. A curable composition that satisfies the formula (1) in a cured state: Er1/Er2?1.10 ??(1) wherein Er1 denotes the surface reduced modulus (GPa) of a cured product of the curable composition, and Er2 denotes the internal reduced modulus (GPa) of the cured product.

Abstract: A nanoimprint lithography method to remove uncured pretreatment composition from an imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area, and the composite polymerizable coating is contacted with a nanoimprint lithography template. The composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate, and the uncured portion of the pretreatment coating is removed from the nanoimprint lithography substrate.

Abstract: Provided is a medical control apparatus including: a processing unit configured to cause one or both of a first display region in which an object relating to an input source of an image is to be displayed and a second display region in which an object relating to an output destination of an image is to be displayed and a third display region in which an object for controlling the input source or the output destination is to be displayed, to be displayed in one screen.