Abstract: Provided is a medical control apparatus including: a processing unit configured to restrict a function which is executable at a control target apparatus in a case where an operation is being performed, on a basis of whether or not an operation is being performed.

Abstract: In nanoimprinting processes, photo-cured products often separate from the substrate and stick to the mold due to insufficient adhesion between the photo-cured product and the substrate. This causes a defect of pattern separation. An adhesion layer composition used for forming an adhesion layer between a substrate and a photocurable composition includes a compound (A) having at least two functional groups, and a solvent (B). The functional groups include at least one functional group capable of being bound to the substrate, selected from the group consisting of hydroxy, carboxy, thiol, amino, epoxy, and (blocked) isocyanate, and at least one hydrogen donating group as a functional group capable of being bound to the photocurable composition.

Abstract: A pattern forming method of forming a pattern on a substrate by using a mold includes a step of supplying a curable composition onto a liquid film formed on a substrate, a step of vibrating the substrate so as to mix together a composition of the liquid film and the curable composition, a step of bringing a mixture into contact with the mold, the mixture being provided by vibrating the substrate to cause mixing, and a step of curing the mixture being in contact with the mold to form a pattern.

Abstract: To provide a curable composition for nanoimprinting that can form a cured product that has a sufficiently cured surface and is less prone to a pattern collapse defect even when the curable composition is cured by a photo-nanoimprint method at a low exposure dose. To provide a nanoimprint method for forming such a cured product. To provide a cured product that is less prone to a pattern collapse defect even when cured at a low exposure dose, a method for producing such a cured product, a method for manufacturing an optical component, a method for manufacturing a circuit board, and a method for manufacturing an electronic component. A curable composition that satisfies the formula (1) in a cured state: Er1/Er2?1.10??(1) wherein Er1 denotes the surface reduced modulus (GPa) of a cured product of the curable composition, and Er2 denotes the internal reduced modulus (GPa) of the cured product.

Abstract: Provided are a photocurable composition having high filling property and capable of reducing a mold release force upon production of a film through the utilization of a photo-imprint method, and a method of manufacturing a film using the photocurable composition. The photocurable composition is a photocurable composition, including at least the following component (A) to component (C): (A) a polymerizable compound; (B) a photopolymerization initiator; and (C) a surfactant represented by the following general formula (1): Rf1-Rc-X.

Abstract: An imprinting method for forming a pattern of a cured product by irradiating a curable composition for imprinting disposed on a substrate with light while the curable composition is in contact with a mold having surface asperities and removing the mold from a cured product of the curable composition. The method includes bringing the mold into contact with the curable composition in a condensable gas atmosphere, wherein the curable composition for imprinting has a viscosity in the range of 1 cP to 40 cP in air at 23° C., and the condensable gas is introduced between the mold and the curable composition such that the curable composition for imprinting has a condensable gas solubility (gas/(curable composition+gas)) (g/g) in the range of 0.1 to 0.4.

Abstract: The present invention provides a photo-curable composition that requires a small mold-releasing force in a method of producing a cured product and also provides a method of producing a cured product with a small mold-releasing force. The method of producing a cured product includes applying a photo-curable composition onto a base material; pressing a mold to the photo-curable composition to form a pattern in the photo-curable composition; irradiating the photo-curable composition provided with the pattern with first light to generate a cured product having the pattern; and releasing the mold from the cured product, wherein a gas-generating region is formed from a gas-generating agent between the cured product and the mold; the gas-generating region is irradiated with second light to generate a gas in the gas-generating region; and the mold is released from the cured product after the generation of the gas or simultaneously with the generation of the gas.

Abstract: A three dimensional manufactured product is manufactured A speed of filing an uncured light curing resin in a space for a next layer is enhanced, to improve a manufacturing speed. One surface of a container housing a light curing resin is configured by a gas-permeable sheet that faces the light curing resin, and transmits irradiation light of a light irradiating apparatus, and a light transmitting plate disposed at an outer side of the container from the gas permeable member. A pressurizing chamber controllable in pressure by a pressure controlling apparatus is defined between the gas-permeable sheet and the light transmitting plate. At moving a manufacturing stage, an inside of the pressurizing chamber is de-pressurized to cause the gas-permeable sheet to perform concave surface deformation, and at a time of performing light irradiation, gas in the pressurizing chamber is caused to permeate into the light curing resin by pressurizing.

Abstract: To provide a patterning method for forming a desired pattern in a reverse process. A patterning method includes a reverse process. A photocurable composition contains at least a polymerizable compound (A) component and a photopolymerization initiator (B) component. The (A) component has a mole fraction weighted average molecular weight of 200 or more and 1000 or less. The (A) component has an Ohnishi parameter (OP) of 3.80 or more. The Ohnishi parameter (OP) of the (A) component is a mole fraction weighted average of N/(NC?NO), wherein N denotes a total number of atoms in a molecule, NC denotes a number of carbon atoms in the molecule, and NO denotes a number of oxygen atoms in the molecule.

Abstract: A pattern is formed by arranging a photocurable composition on a substrate; bringing a mold having a concavo-convex pattern into contact with the composition; irradiating the composition with light to form a cured film; releasing the mold from the cured film; forming a reversal layer on the cured film having a concavo-convex pattern transferred from the mold; partially removing the reversal layer to expose the convexes of the pattern in such a manner that the reversal layer remains in the concaves of the pattern formed on the cured film; and etching the photocurable composition layer using the reversal layer remaining in the concaves as a mask to form a reversal pattern, wherein the mold is brought into contact with the photocurable composition in an atmosphere of a soluble gas having a solubility in the composition; and the soluble gas has a saturation solubility of 38% by volume or more.

Abstract: A nanoimprint liquid material in which the particle number concentration of particles having a particle diameter of 0.07 ?m or more is less than 310/mL is provided.

Abstract: The present invention relates to a photocurable composition for imprint in a condensable gas atmosphere. The composition at least includes a polymerizable compound component (A) and photopolymerization initiator component (B) and satisfies the Requirement (1): a value ECG of greater than or equal to 2.30 GPa, where ECG denotes the reduced modulus (GPa) of a photocured film prepared by exposing the photocurable composition for imprint to light at an exposure dose of 200 mJ/cm' in an atmosphere containing a condensable gas in a concentration of 90% by volume or more.

Abstract: A photocurable composition for imprint at least has a polymerizable compound (A) and a photopolymerization initiator (B), in which the polymerizable compound (A) contains 20% by weight or more of a multifunctional (meth)acrylic monomer and the glass transition temperature of a photocured substance of the photocurable composition is 90° C. or more.

Abstract: A liquid ejection device includes a storage section storing a nanoimprinting liquid and also includes an ejection port which communicates with the storage section and which ejects the nanoimprinting liquid. The storage section contains a sorption medium that adsorbs or absorbs at least one selected from the group consisting of particles, metal ions, and water. The sorption tedium is not ejected from the ejection port when the nanoimprinting liquid is ejected from the ejection port.

Abstract: A nanoimprint lithography method to remove uncured pretreatment composition from an imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area, and the composite polymerizable coating is contacted with a nanoimprint lithography template. The composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate, and the uncured portion of the pretreatment coating is removed from the nanoimprint lithography substrate.

Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a polymerizable compound (a1) on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a polymerizable compound (a2) dropwise discretely onto the curable composition (A1) layer, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after the curing. The curable composition (A1) except a solvent has a viscosity at 25° C. of 40 mPa·s or more and less than 500 mPa·s. The curable composition (A2) except a solvent has a viscosity at 25° C. of 1 mPa·s or more and less than 40 mPa·s.

Abstract: A pattern is formed on a substrate with a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound dropwise discretely onto the layer of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a contact angle of a composition of components of the curable composition (A1) except a solvent of the curable composition (A1) with respect to a surface of the mold being 10° or less.

Abstract: A photocurable composition contains a polymerizable compound (A) satisfying OA=NA/(NC,A?NO,A), wherein NA, NC,A and NO,A represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in (A); and a non-polymerizable component (E) containing at least one compound (X) including a photopolymerization initiator (B), in a proportion of 10% to 50% relative to the total weight of (A) and (E). The component (E) has a weight average molecular weight of 250 or less. The compound (X) satisfies OX=NX/(NC,X?NO,X). NX, NC,X and NO,X represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in the corresponding compound (X). The composition satisfies: OA?OE>1.00; and OAE<3.40. OE and OAE represent the molar fraction weighted averages of OX's and of OA and OE, respectively.

Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound (a1) and a component (b1) serving as a photopolymerization initiator on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a component (a2) serving as a polymerizable compound (a2) and a component (b2) serving as a photopolymerization initiator dropwise discretely onto the layer of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after the curing.

Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound and a component (e1) on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound dropwise discretely onto the layer of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a surface tension of a composition of components of the curable composition (A1) except a solvent being higher than a surface tension a composition of components of the curable composition (A2) except a solvent.