Patents by Inventor Travis Morey

Travis Morey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10381247
    Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.
    Type: Grant
    Filed: August 16, 2016
    Date of Patent: August 13, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Nagendra V. Madiwal, Robert Irwin Decottignies, Andrew Nguyen, Paul B. Reuter, Angela R. Sico, Michael Kuchar, Travis Morey, Mitchell DiSanto
  • Publication number: 20190208907
    Abstract: A load lock door assembly with side actuation is disclosed. Load lock door assembly includes a load lock door and a door support assembly coupled thereto. Door support assembly includes one or more pivot members pivotable relative to one or more sides of the load lock body, a door support bracket coupled to the load lock door, one or more separator side actuators coupled between the door support bracket being actuatable to separate the load lock door from a sealing surface, and one or more pivot side actuator operable to pivot the load lock door above or below the load lock entry. Load lock apparatus with side actuation, systems including one or more load lock door assemblies with side actuation, and methods of operating load lock door assemblies are provided, as are numerous other aspects.
    Type: Application
    Filed: March 19, 2019
    Publication date: July 11, 2019
    Inventors: Eran Weiss, Travis Morey, Nir Merry, Paul B. Reuter, Izya Kremerman, Jeffrey C. Hudgens, Dean C. Hruzek
  • Patent number: 10278501
    Abstract: A load lock door assembly with side actuation is disclosed. Load lock door assembly includes a load lock door and a door support assembly coupled thereto. Door support assembly includes one or more pivot members pivotable relative to one or more sides of the load lock body, a door support bracket coupled to the load lock door, one or more separator side actuators coupled between the door support bracket being actuatable to separate the load lock door from a sealing surface, and one or more pivot side actuator operable to pivot the load lock door above or below the load lock entry. Load lock apparatus with side actuation, systems including one or more load lock door assemblies with side actuation, and methods of operating load lock door assemblies are provided, as are numerous other aspects.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: May 7, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Eran Weiss, Travis Morey, Nir Merry, Paul B. Reuter, Izya Kremerman, Jeffrey C. Hudgens, Dean C. Hruzek
  • Patent number: 10119191
    Abstract: Porous diffuser assemblies including multiple diffuser elements. The porous diffuser assemblies include a diffuser body, a diffuser base coupled to the diffuser body and forming a plenum there between, the diffuser base including a plurality of openings formed therein, and a porous diffuser element disposed in each of the plurality of openings wherein surfaces of the porous diffuser elements are exposed to the plenum. Gas purged chambers and methods of purging a chamber are disclosed, as are numerous other aspects.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: November 6, 2018
    Assignee: Applied Materials, Inc.
    Inventor: Travis Morey
  • Patent number: 10056274
    Abstract: According to an embodiment of the invention, there is provided a system, comprising: a first chamber; a second chamber; a chuck; a movement system; wherein the first chamber comprises: a first element that has a first surface; a first chamber housing that comprises a second surface; wherein the first surface and the second surface come into proximity with each other at a first interface; a supporting element for supporting the chuck when the chuck is positioned within the first chamber; and a first dynamic seal formed at the first interface and is arranged to seal the first chamber from the movement system; wherein the second chamber comprises: a second chamber housing; a movement system that is arranged to introduce movement between (a) the first chamber housing and (b) the first element and the chuck; and a movement control element for mechanically coupling the first element to the movement system.
    Type: Grant
    Filed: February 10, 2016
    Date of Patent: August 21, 2018
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Michael R. Rice, Paul Reuter, William (Ty) Weaver, Travis Morey, Natan Schlimoff, Igor Krivts (Krayvitz), Israel Avneri, Yoram Uziel, Erez Admoni
  • Publication number: 20170356085
    Abstract: Porous diffuser assemblies including multiple diffuser elements. The porous diffuser assemblies include a diffuser body, a diffuser base coupled to the diffuser body and forming a plenum there between, the diffuser base including a plurality of openings formed therein, and a porous diffuser element disposed in each of the plurality of openings wherein surfaces of the porous diffuser elements are exposed to the plenum. Gas purged chambers and methods of purging a chamber are disclosed, as are numerous other aspects.
    Type: Application
    Filed: June 8, 2016
    Publication date: December 14, 2017
    Inventor: Travis Morey
  • Publication number: 20160358792
    Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.
    Type: Application
    Filed: August 16, 2016
    Publication date: December 8, 2016
    Inventors: Nagendra V. Madiwal, Robert Irwin Decottignies, Andrew Nguyen, Paul B. Reuter, Angela R. Sico, Michael Kuchar, Travis Morey, Mitchell DiSanto
  • Publication number: 20160314997
    Abstract: A loadlock apparatus including a lower disc diffuser is provided. The loadlock apparatus includes a loadlock body containing a lower loadlock chamber and an upper load loadlock chamber, a lower cooling plate in the lower loadlock chamber, and an upper cooling plate in the upper loadlock chamber. The lower disc diffuser may be centrally located above the lower cooling plate. An upper disc diffuser may be centrally located above the upper cooling plate. Systems including the loadlock apparatus and methods of operating the loadlock apparatus are provided. A cooling plate assembly that is readily removable for cleaning is also provided, as are numerous other aspects.
    Type: Application
    Filed: April 22, 2015
    Publication date: October 27, 2016
    Inventors: Paul B. Reuter, Travis Morey
  • Patent number: 9441792
    Abstract: Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: September 13, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Edward Ng, Eric A. Englhardt, Travis Morey, Ayan Majumdar, Steve S. Hongkham
  • Patent number: 9435025
    Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.
    Type: Grant
    Filed: September 25, 2013
    Date of Patent: September 6, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Nagendra V. Madiwal, Robert Irwin Decottignies, Andrew Nguyen, Paul B. Reuter, Angela R. Sico, Michael Kuchar, Travis Morey, Mitchell Disanto
  • Publication number: 20160163570
    Abstract: According to an embodiment of the invention, there is provided a system, comprising: a first chamber; a second chamber; a chuck; a movement system; wherein the first chamber comprises: a first element that has a first surface; a first chamber housing that comprises a second surface; wherein the first surface and the second surface come into proximity with each other at a first interface; a supporting element for supporting the chuck when the chuck is positioned within the first chamber; and a first dynamic seal formed at the first interface and is arranged to seal the first chamber from the movement system; wherein the second chamber comprises: a second chamber housing; a movement system that is arranged to introduce movement between (a) the first chamber housing and (b) the first element and the chuck; and a movement control element for mechanically coupling the first element to the movement system.
    Type: Application
    Filed: February 10, 2016
    Publication date: June 9, 2016
    Inventors: Michael R. Rice, Paul Reuter, William (Ty) Weaver, Travis Morey, Natan Schlimoff, Igor Krivts (Krayvitz), Israel Avneri, Yoram Uziel, Erez Admoni
  • Publication number: 20150311102
    Abstract: A load lock door assembly with side actuation is disclosed. Load lock door assembly includes a load lock door and a door support assembly coupled thereto. Door support assembly includes one or more pivot members pivotable relative to one or more sides of the load lock body, a door support bracket coupled to the load lock door, one or more separator side actuators coupled between the door support bracket being actuatable to separate the load lock door from a sealing surface, and one or more pivot side actuator operable to pivot the load lock door above or below the load lock entry. Load lock apparatus with side actuation, systems including one or more load lock door assemblies with side actuation, and methods of operating load lock door assemblies are provided, as are numerous other aspects.
    Type: Application
    Filed: April 17, 2015
    Publication date: October 29, 2015
    Inventors: Eran Weiss, Travis Morey, Nir Merry, Paul B. Reuter, Izya Kremerman, Jeffrey C. Hudgens, Dean C. Hruzek
  • Publication number: 20150090341
    Abstract: Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.
    Type: Application
    Filed: September 26, 2014
    Publication date: April 2, 2015
    Inventors: Edward Ng, Eric A. Englhardt, Travis Morey, Ayan Majumdar, Steve S. Hongkham
  • Publication number: 20150083330
    Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.
    Type: Application
    Filed: September 25, 2013
    Publication date: March 26, 2015
    Inventors: Nagendra V. Madiwal, Robert Irwin Decottignies, Andrew Nguyen, Paul B. Reuter, Angela R. Sico, Michael Kuchar, Travis Morey, Mitchell Disanto
  • Patent number: 8486194
    Abstract: An apparatus for removing volatile residues from a substrate is provided. In one embodiment, an apparatus for removing halogen-containing residues from a substrate includes a chamber suitable for operating maintaining a vacuum therein and a heat module positioned to heat a substrate disposed in the chamber. The apparatus for removing halogen-containing residues from a substrate also includes at least one of A) a temperature controlled pedestal having a projection extending radially therefrom suitable for supporting the temperature control pedestal on a ledge of the chamber body, the projection thermally isolating the base from the chamber body; B) a pair of substrate holders that include two support flanges extending radially inward from an inner edge of an arc-shaped body, each support flange having a substrate support step that includes a sloped landing; or C) a domed window.
    Type: Grant
    Filed: October 16, 2012
    Date of Patent: July 16, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Kenneth J. Bhang, Matthew Fenton Davis, Travis Morey, James D. Carducci
  • Publication number: 20130040080
    Abstract: An apparatus for removing volatile residues from a substrate is provided. In one embodiment, an apparatus for removing halogen-containing residues from a substrate includes a chamber suitable for operating maintaining a vacuum therein and a heat module positioned to heat a substrate disposed in the chamber. The apparatus for removing halogen-containing residues from a substrate also includes at least one of A) a temperature controlled pedestal having a projection extending radially therefrom suitable for supporting the temperature control pedestal on a ledge of the chamber body, the projection thermally isolating the base from the chamber body; B) a pair of substrate holders that include two support flanges extending radially inward from an inner edge of an arc-shaped body, each support flange having a substrate support step that includes a sloped landing; or C) a domed window.
    Type: Application
    Filed: October 16, 2012
    Publication date: February 14, 2013
    Inventors: Kenneth J. Bhang, Matthew F. Davis, Travis Morey, James D. Carducci
  • Patent number: 8293016
    Abstract: An apparatus for removing volatile residues from a substrate is provided. In one embodiment, an apparatus for removing halogen-containing residues from a substrate includes a chamber suitable for operating maintaining a vacuum therein and a heat module positioned to heat a substrate disposed in the chamber. The apparatus for removing halogen-containing residues from a substrate also includes at least one of A) a temperature controlled pedestal having a projection extending radially therefrom suitable for supporting the temperature control pedestal on a ledge of the chamber body, the projection thermally isolating the base from the chamber body; B) a pair of substrate holders that include two support flanges extending radially inward from an inner edge of an arc-shaped body, each support flange having a substrate support step that includes a sloped landing; or C) a domed window.
    Type: Grant
    Filed: October 2, 2009
    Date of Patent: October 23, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Kenneth J. Bahng, Matthew F. Davis, Travis Morey, James D. Carducci
  • Publication number: 20100133255
    Abstract: An apparatus for removing volatile residues from a substrate is provided. In one embodiment, an apparatus for removing halogen-containing residues from a substrate includes a chamber suitable for operating maintaining a vacuum therein and a heat module positioned to heat a substrate disposed in the chamber. The apparatus for removing halogen-containing residues from a substrate also includes at least one of A) a temperature controlled pedestal having a projection extending radially therefrom suitable for supporting the temperature control pedestal on a ledge of the chamber body, the projection thermally isolating the base from the chamber body; B) a pair of substrate holders that include two support flanges extending radially inward from an inner edge of an arc-shaped body, each support flange having a substrate support step that includes a sloped landing; or C) a domed window.
    Type: Application
    Filed: October 2, 2009
    Publication date: June 3, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Kenneth J. Bahng, Matthew F. Davis, Travis Morey, James D. Carducci