Patents by Inventor Tsuneyuki Okabe

Tsuneyuki Okabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200018519
    Abstract: A fluid heater includes: a passage member having a passage formed therein; a heater for heating the passage member; a fixing member for fixing the passage member to a fluid control device; and a connection member connected to the passage member so as to allow fluid to flow into the passage member. The passage has a helical shape.
    Type: Application
    Filed: September 26, 2019
    Publication date: January 16, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Tsuneyuki OKABE, Toshiyuki INADA, Taiji CHIBA, Tatsuhiko SATO, Michio YAMAJI, Tadayuki YAKUSHIJIN
  • Patent number: 10429263
    Abstract: There is provided a pressure measuring device including: a first pressure gauge connected to a processing chamber configured to process a process target and configured to measure an internal pressure of the processing chamber when the process target is being processed; a second pressure gauge connected to the processing chamber; and a first switching valve configured to disconnect the second pressure gauge from the processing chamber when the process target is being processed inside the processing chamber.
    Type: Grant
    Filed: March 15, 2017
    Date of Patent: October 1, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Satoshi Kikuchi, Tsuneyuki Okabe, Satoru Koike
  • Patent number: 10287682
    Abstract: A substrate processing apparatus includes: a process container configured to receive a substrate therein; a pressure detection part configured to measure an internal pressure of the process container; an exhaust-side valve installed in an exhaust pipe configured to exhaust an interior of the process container; a gas storage tank connected to the process container through a first gas supply pipe; a gas amount measuring part configured to measure an amount of gas stored in the gas storage tank; and a control valve installed in the first gas supply pipe and configured to control the internal pressure of the process container by changing an opening degree of the control valve based on the internal pressure of the process container which is detected by the pressure detection part and by controlling a flow path cross section through which the gas is supplied from the gas storage tank to the process container.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: May 14, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazuyuki Kikuchi, Tsuneyuki Okabe, Kohei Fukushima
  • Publication number: 20180299042
    Abstract: A gasket includes a thick portion providing a first face seal and a thin portion providing a second face seal. A fluid coupling has an annular gasket housing recess that includes a wide portion for housing the thick portion of the gasket and a narrow portion for housing the thin portion of the gasket.
    Type: Application
    Filed: March 25, 2016
    Publication date: October 18, 2018
    Applicants: FUJIKIN INCORPORATED, TOKYO ELECTRON LIMITED
    Inventors: Keisuke ISHIBASHI, Tadayuki YAKUSHIJIN, Tsuyoshi TANIKAWA, Michio YAMAJI, Tsuneyuki OKABE
  • Publication number: 20180258528
    Abstract: A substrate processing apparatus includes an inner tube configured to accommodate a plurality of substrates and having a first opening portion; an outer tube surrounding the inner tube; a movable wall movably provided in the inner tube or between the inner tube and the outer tube and having a second opening portion; a gas supply part configured to supply a processing gas into the inner tube; an exhaust part provided outside the movable wall and configured to exhaust the processing gas supplied into the inner tube through the first opening portion and the second opening portion; and a pressure detection part configured to detect a pressure inside the inner tube.
    Type: Application
    Filed: March 5, 2018
    Publication date: September 13, 2018
    Inventors: Kohei FUKUSHIMA, Tsuneyuki OKABE
  • Publication number: 20180112788
    Abstract: A first on-off valve 2 and a second on-off valve 3 each are a two-port valve. A first passage block 5 is provided with a first on-off valve-corresponding inflow passage 11 and a first on-off valve-corresponding outflow passage 12. A second passage block 6 is provided with a second on-off valve-corresponding inflow passage 14 and a second on-off valve-corresponding outflow passage 15. The second on-off valve-corresponding outflow passage 15 is in communication with an upstream side portion of the first on-off valve-corresponding outflow passage 12 via a communicating passage 13 formed in the first passage block 5. An orifice 20 is provided between the second on-off valve-corresponding outflow passage 15 and the communicating passage 13.
    Type: Application
    Filed: April 5, 2016
    Publication date: April 26, 2018
    Inventors: Keisuke Ishibashi, Tsuyoshi Tanikawa, Michio Yamaji, Takashi Funakoshi, Hidenori Kiso, Tsuneyuki Okabe, Hiroaki Kikuchi, Kuniyasu Sakashita
  • Publication number: 20170275757
    Abstract: A substrate processing apparatus includes: a process container configured to receive a substrate therein; a pressure detection part configured to measure an internal pressure of the process container; an exhaust-side valve installed in an exhaust pipe configured to exhaust an interior of the process container; a gas storage tank connected to the process container through a first gas supply pipe; a gas amount measuring part configured to measure an amount of gas stored in the gas storage tank; and a control valve installed in the first gas supply pipe and configured to control the internal pressure of the process container by changing an opening degree of the control valve based on the internal pressure of the process container which is detected by the pressure detection part and by controlling a flow path cross section through which the gas is supplied from the gas storage tank to the process container.
    Type: Application
    Filed: March 24, 2017
    Publication date: September 28, 2017
    Inventors: Kazuyuki KIKUCHI, Tsuneyuki OKABE, Kohei FUKUSHIMA
  • Publication number: 20170268952
    Abstract: There is provided a pressure measuring device including: a first pressure gauge connected to a processing chamber configured to process a process target and configured to measure an internal pressure of the processing chamber when the process target is being processed; a second pressure gauge connected to the processing chamber; and a first switching valve configured to disconnect the second pressure gauge from the processing chamber when the process target is being processed inside the processing chamber.
    Type: Application
    Filed: March 15, 2017
    Publication date: September 21, 2017
    Inventors: Satoshi KIKUCHI, Tsuneyuki OKABE, Satoru KOIKE
  • Publication number: 20170137942
    Abstract: A processing apparatus includes a processing container, a manifold having an injector supporting part, the injector supporting part being disposed at a lower end of the processing container, extending along an inner wall surface in the processing container and having an insertion hole, and a gas introduction part having a gas flow passage within the gas introduction part to communicate with the insertion hole and an outside of the processing container so that a gas flows in the gas flow passage, an injector inserted and fixed into the insertion hole, the injector entirely extending in a linear manner along the wall surface and having an opening communicating with the gas flow passage at a location where the injector is inserted into the insertion hole, and a gas supplying pipe communicating with and connected to an outer end of the gas flow passage of the gas introduction part.
    Type: Application
    Filed: November 9, 2016
    Publication date: May 18, 2017
    Inventors: Masahiro KIKUCHI, Tsuneyuki OKABE
  • Patent number: 9435470
    Abstract: A pipe joint for preventing fine particles generated when a male threaded member and a female threaded member are threadedly engaged with each other from entering a fluid passage thus maintaining a high degree of cleanliness. Joint members are joined to each other by a male threaded member formed on one joint member and a female threaded member formed on the other joint member. A cover portion which covers outer peripheral surfaces of abutting portions of both joint members is formed on the male threaded member.
    Type: Grant
    Filed: September 11, 2012
    Date of Patent: September 6, 2016
    Assignee: FUJIKIN INCORPORATED
    Inventors: Tsuneyuki Okabe, Shuji Moriya, Kenichi Sato, Tomohiro Nakata, Tsutomu Shinohara, Michio Yamaji
  • Patent number: 9371946
    Abstract: A pipe joint includes first and second joint members having fluid channels communicating with each other, an annular gasket to be interposed between abutting end surfaces of the both joint members, and a nut configured to couple the joint members. The nut is provided with an inner surface treated layer. The inner surface treated layer includes a Co (cobalt)-P (phosphorous) alloy metal coating provided on an inner surface of the nut and a fluorine coating provided on the surface of the alloy metal coating.
    Type: Grant
    Filed: October 18, 2013
    Date of Patent: June 21, 2016
    Assignees: Tokyo Electron Limited, Fujikin Incorporated
    Inventors: Tsuneyuki Okabe, Shuji Moriya, Kenichi Sato, Tomohiro Nakata, Tsutomu Shinohara, Michio Yamaji
  • Patent number: 9159548
    Abstract: A method for using a system, which includes a film formation apparatus for forming a high-dielectric constant thin film on target substrates together and a gas supply apparatus for supplying a process gas. The method includes a preparatory stage of determining a set pressure range of pressure inside a vaporizing chamber for a liquid material cooled at a set temperature. The preparatory stage includes obtaining a first limit value of pressure at which vaporization of the liquid material starts being inhibited due to an increase in the pressure, obtaining a second limit value of pressure at which vaporization of the liquid material starts being unstable and the pressure starts pulsating movement due to a decrease in the pressure, and determining the set pressure range to be defined by an upper limit lower than the first limit value and a lower limit higher than the second limit value.
    Type: Grant
    Filed: November 22, 2013
    Date of Patent: October 13, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tsuneyuki Okabe, Hitoshi Katoh, Junya Hiraka, Hiroyuki Kikuchi
  • Patent number: 8973615
    Abstract: Rails 20 corresponding to lines A, B, C are provided in parallel on a bass plate 1, and coupling members 21, 22 are slidably mounted on each of the rails 20. Each of fluid controllers 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14 is mounted generally on two of these coupling members 21, 22.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: March 10, 2015
    Assignees: Tokyo Electron Limited, CKD Corporation, Fujikin Incorporated
    Inventors: George Hoshi, Tsuneyuki Okabe, Kenichi Goshima, Hideo Kobayashi, Akinori Nagaya, Michio Yamaji, Kazuhiro Yoshikawa, Yuji Kawano
  • Patent number: 8944095
    Abstract: There is provided a gas supply apparatus 10 which does not necessitate installation of a pressure type flow controller for each processing reactor and which enables a compact construction of the flow controller. The gas supply apparatus 10 includes gas supply sources 11a, 11b, gas introduction pipes 13a, 13b, a main gas pipe 15, and branch pipes 21a, 21b. A pressure type flow controller 30 is provided for the main gas pipe 15 and the branch pipes 21a, 21b. The pressure type flow controller 30 includes a pressure detector 17 provided in the main gas pipe 15, and control valves 23a, 23b and orifices 22a, 22b, both provided in the branch pipes 21a, 21b. An arithmetic circuit 40 determines a flow rate Qc based on a detected pressure P1 from the pressure detector 17, and an arithmetic control circuit 58 controls the control valves 23a, 23b based on a set flow rate signal Qs from a flow rate setting circuit 52 and on the flow rate Qc from the arithmetic circuit 40.
    Type: Grant
    Filed: April 26, 2011
    Date of Patent: February 3, 2015
    Assignee: Tokyo Electron Limited
    Inventor: Tsuneyuki Okabe
  • Patent number: 8893743
    Abstract: The flow rate controller controlling a flow rate of gas supplied through a gas passage includes: a main gas pipe; a flow rate detecting unit detecting the flow rate of gas supplied through the main gas pipe and outputting a flow rate signal; a flow rate control valve mechanism controlling a flow rate; a conversion data storage unit storing a plurality of pieces of conversion data corresponding to a plurality of gaseous species, to indicate a relationship between a flow rate instruction signal input from outside and a target flow rate; and a flow rate control main body which selects the corresponding conversion data from the conversion data based on a gaseous species selection signal input from outside, calculates the target flow rate based on the flow rate instruction signal, and controls the flow rate control valve mechanism based on the target flow rate and the flow rate signal.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: November 25, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Tsuneyuki Okabe, Shuji Moriya, Kazushige Matsuno
  • Publication number: 20140333067
    Abstract: Provided is a joint which can decrease the number of kinds of parts. A bolt 5 has a shaft portion 14 which is constituted of a distal end portion on which male threads 14a are formed and a remaining portion 14b on which male threads are not formed. First and second joint members 2, 3 have the same shape. A shaft insertion hole 15 which is disposed on an abutting end surface side of the joint member and a threaded hole 16 which is communicated with the shaft insertion hole 15 and extends to an end surface of the joint member on a side opposite to an abutting end surface of the joint member are formed in the first and second joint members 2, 3.
    Type: Application
    Filed: September 11, 2012
    Publication date: November 13, 2014
    Applicant: FUJIKIN INCORPORATED
    Inventors: Tsuneyuki Okabe, Shuji Moriya, Kenichi Sato, Tomohiro Nakata, Tsutomu Shinohara, Michio Yamaji
  • Publication number: 20140312617
    Abstract: Provided is a pipe joint which can prevent fine particles generated when a male threaded member and a female threaded member are threadedly engaged with each other from entering a fluid passage thus maintaining a high degree of cleanliness. Joint members 2, 3 are joined to each other by a male threaded member 6 formed on one joint member 2 and a female threaded member 7 formed on the other joint member 3. A cover portion 16 which covers outer peripheral surfaces of abutting portions of both joint members 2, 3 is formed on the male threaded member 6.
    Type: Application
    Filed: September 11, 2012
    Publication date: October 23, 2014
    Applicant: FUJIKIN INCORPORATED
    Inventors: Tsuneyuki Okabe, Shuji Moriya, Kenichi Sato, Tomohiro Nakata, Tsutomu Shinohara, Michio Yamaji
  • Patent number: 8851106
    Abstract: A disclosed gas supplying apparatus includes a pressure controller that reduces a primary pressure thereby providing a secondary pressure greater than a process pressure at which a predetermined process is performed and less than the atmospheric pressure in a secondary pipe; a pressure sensor that measures a pressure in the secondary pipe; a first open/close valve provided in the secondary pipe; an open/close valve controller that opens or closes the first open/close valve; a pressure comparator that compares the pressure measured by the pressure sensor in the secondary pipe with a first set pressure that is greater than the process pressure by a predetermined pressure; and a controller that outputs a signal to the open/close valve controller thereby closing the first open/close valve, when the pressure comparator determines that the pressure in the secondary pipe is less than the first set pressure.
    Type: Grant
    Filed: March 1, 2012
    Date of Patent: October 7, 2014
    Assignee: Tokyo Electron Limited
    Inventor: Tsuneyuki Okabe
  • Publication number: 20140110937
    Abstract: A pipe joint which does not generate fine particles even though being repeatedly mounted and demounted is provided. A pipe joint includes first and second joint members having fluid channels communicating with each other, an annular gasket to be interposed between abutting end surfaces of the both joint members, and a nut configured to couple the joint members. The nut is provided with an inner surface treated layer. The inner surface treated layer includes a Co (cobalt)-P (phosphorous) alloy metal coating provided on an inner surface of the nut and a fluorine coating provided on the surface of the alloy metal coating.
    Type: Application
    Filed: October 18, 2013
    Publication date: April 24, 2014
    Applicants: FUJIKIN INCORPORATED, TOKYO ELECTRON LIMITED
    Inventors: Tsuneyuki OKABE, Syuji MORIYA, Kenichi SATO, Tomohiro NAKATA, Tsutomu SHINOHARA, Michio YAMAJI
  • Publication number: 20140080320
    Abstract: A method for using a system, which includes a film formation apparatus for forming a high-dielectric constant thin film on target substrates together and a gas supply apparatus for supplying a process gas. The method includes a preparatory stage of determining a set pressure range of pressure inside a vaporizing chamber for a liquid material cooled at a set temperature. The preparatory stage includes obtaining a first limit value of pressure at which vaporization of the liquid material starts being inhibited due to an increase in the pressure, obtaining a second limit value of pressure at which vaporization of the liquid material starts being unstable and the pressure starts pulsating movement due to a decrease in the pressure, and determining the set pressure range to be defined by an upper limit lower than the first limit value and a lower limit higher than the second limit value.
    Type: Application
    Filed: November 22, 2013
    Publication date: March 20, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tsuneyuki OKABE, Hitoshi Katoh, Junya Hiraka, Hiroyuki Kikuchi