Abstract: A raw material supply apparatus according to an aspect of the present disclosure includes: a container configured to store a solution of a first solid raw material dissolved in a solvent or a dispersion system of the first solid raw material dispersed in a dispersion medium; a removal part configured to form a second solid raw material by removing the solvent or the dispersion medium from the solution or the dispersion system stored in the container; a detection part configured to detect a completion of a removal of the solvent or the dispersion medium from the solution or the dispersion system; and a heater configured to heat the second solid raw material.

Abstract: A pipe joint includes first and second sleeves having fluid flow paths communicating with each other; an annular gasket interposed between abutting end surfaces of the sleeves; a male screw member having a through hole into which the first sleeve is inserted; and a female screw member having a through hole into which the second sleeve is inserted, the sleeves being joined by screwing the male screw member with the female screw member, wherein the pipe joint has a leak port opened at a portion of the outer peripheral surface of the male screw member not covered by the female screw member and communicates with a gap between the male screw member and the first sleeve to detect a leak fluid leaked from gaps between the sleeves and the gasket.

Abstract: A pressure adjusting valve includes a pipe, a valve body arranged inside the pipe, and a support shaft configured to rotatably support the valve body. The pressure adjusting valve is configured to adjust pressure by rotating the valve body. The valve body has, inside the valve body, a valve body side flow path through which a purge gas can flow, and has a plurality of outlets that communicate with the valve body side flow path at an outer periphery of the valve body. The support shaft has a support shaft side flow path for introducing the purge gas into the valve body side flow path.

Abstract: A substrate processing apparatus includes a processing chamber configured to process a substrate, and a filtration part containing a porous coordination polymer and provided in an exhaust path configured to exhaust a gas from the processing chamber.

Abstract: A substrate processing apparatus includes a processing chamber configured to process a substrate, and a filtration part containing a porous coordination polymer and provided in a supply path configured to supply a gas to the processing chamber.

Abstract: A pipe joint includes first and second sleeves having fluid flow paths communicating with each other; an annular gasket interposed between abutting end surfaces of the sleeves; a male screw member having a through hole into which the first sleeve is inserted; and a female screw member having a through hole into which the second sleeve is inserted, the sleeves being joined by screwing the male screw member with the female screw member, wherein the pipe joint has a leak port opened at a portion of the outer peripheral surface of the male screw member not covered by the female screw member and communicates with a gap between the male screw member and the first sleeve to detect a leak fluid leaked from gaps between the sleeves and the gasket.

Abstract: A substrate processing apparatus includes: a chamber; and a processing gas supply unit connected to the chamber via a processing gas supply flow path and configured to supply a processing gas. The processing gas supply unit includes a raw material cartridge that includes a raw material tank that accommodates a porous member containing a metal-organic framework adsorbed with gas molecules of a raw material of the processing gas; a main body configured to communicate the raw material tank and the processing gas supply flow path with each other when the raw material cartridge is attached; and a desorption mechanism configured to desorb the gas molecules of the raw material of the processing gas and allow the gas molecules to flow out as the processing gas to the processing gas supply flow path while the raw material cartridge is attached to the main body.

Abstract: A raw material gas supply system that supplies a raw material gas generated by vaporizing a solid raw material to a processing apparatus includes: a vaporizer configured to vaporize the solid raw material to generate the raw material gas; a delivery mechanism configured to deliver a solution, in which the solid raw material is dissolved in a solvent, from a solution source storing the solution to the vaporizer; and an evaporation mechanism configured to evaporate the solvent of the solution delivered from the delivery mechanism and accommodated in the vaporizer to separate the solid raw material.

Abstract: A substrate processing apparatus includes: a chamber; a raw material tank in which a raw material of a processing gas is accommodated; a carrier gas supply unit that supplies a carrier gas to the raw material tank; a mixed gas flow path connected to the raw material tank, and through which a mixed gas of the processing gas obtained from the raw material of the processing gas and the carrier gas flows therethrough; a concentration tank connected to a downstream of the mixed gas flow path, accommodating a porous member including a metal-organic framework; a desorption mechanism that desorbs the processing gas adsorbed to the porous member; and a concentration gas flow path that allows the processing gas desorbed from the porous member to flow to the chamber.

Abstract: A raw material supply apparatus includes: a container configured to store a solution obtained by dissolving a first solid raw material in a solvent or a dispersion system obtained by dispersing the first solid raw material in a dispersion medium; an injection part configured to spray the solution or the dispersion system to inject the solution or the dispersion system into the container; an exhaust port configured to exhaust an inside of the container; a heating part configured to heat a second solid raw material formed by removing the solvent or the dispersion medium from the solution or the dispersion system; and a deposition part provided between the injection part and the exhaust port in the container and configured to deposit the second solid raw material.

Abstract: A raw material supply apparatus according to an aspect of the present disclosure includes: a container configured to store a solution of a first solid raw material dissolved in a solvent or a dispersion system of the first solid raw material dispersed in a dispersion medium; a removal part configured to form a second solid raw material by removing the solvent or the dispersion medium from the solution or the dispersion system stored in the container; a detection part configured to detect a completion of a removal of the solvent or the dispersion medium from the solution or the dispersion system; and a heater configured to heat the second solid raw material.

Abstract: A raw material gas supply system for supplying a raw material gas generated by vaporizing a solid raw material to a processing apparatus, includes a vaporization device configured to vaporize the solid raw material to generate the raw material gas, a delivery mechanism configured to deliver a dispersion containing the solid raw material dispersed in a liquid from a storage container storing the dispersion to the vaporization device, and a separation mechanism configured to separate the solid raw material from the dispersion in the vaporization device.

Abstract: A fluid heater includes: a passage member having a passage formed therein; a heater for heating the passage member; a fixing member for fixing the passage member to a fluid control device; and a connection member connected to the passage member so as to allow fluid to flow into the passage member. The passage has a helical shape.

Abstract: A deposition apparatus includes: a decompressable process container; a showerhead configured to supply a gas in the process container, the showerhead including a lower member having a plurality of gas holes and an upper member that forms, between the upper member and the lower member, a diffusion space that diffuses the gas; a mounting table arranged to face the showerhead and to form a process space between the mounting table and the showerhead; a lifting and lowering mechanism configured to lift and lower the mounting table; a cylindrical section that penetrates the showerhead and communicates with the process space; and a pressure sensor that is airtightly provided in the cylindrical section and configured to measure a pressure in the process space.

Abstract: A gasket includes a thick portion providing a first face seal and a thin portion providing a second face seal. A fluid coupling has an annular gasket housing recess that includes a wide portion for housing the thick portion of the gasket and a narrow portion for housing the thin portion of the gasket.

Abstract: A substrate processing apparatus includes an inner tube configured to accommodate a plurality of substrates and having a first opening portion; an outer tube surrounding the inner tube; a movable wall movably provided in the inner tube or between the inner tube and the outer tube and having a second opening portion; a gas supply part configured to supply a processing gas into the inner tube; an exhaust part provided outside the movable wall and configured to exhaust the processing gas supplied into the inner tube through the first opening portion and the second opening portion; and a pressure detection part configured to detect a pressure inside the inner tube.

Abstract: A first on-off valve (2) and a second on-off valve (3) each are a two-port valve. A first passage block (5) is provided with a first on-off valve-corresponding inflow passage (11) and a first on-off valve-corresponding outflow passage (12). A second passage block (6) is provided with a second on-off valve-corresponding inflow passage (14) and a second on-off valve-corresponding outflow passage (15). The second on-off valve-corresponding outflow passage (15) is in communication with an upstream side portion of the first on-off valve-corresponding outflow passage (12) via a communicating passage (13) formed in the first passage block (5). An orifice (20) is provided between the second on-off valve-corresponding outflow passage (15) and the communicating passage (13).

Abstract: A processing apparatus includes a processing container, a manifold having an injector supporting part, the injector supporting part being disposed at a lower end of the processing container, extending along an inner wall surface in the processing container and having an insertion hole, and a gas introduction part having a gas flow passage within the gas introduction part to communicate with the insertion hole and an outside of the processing container so that a gas flows in the gas flow passage, an injector inserted and fixed into the insertion hole, the injector entirely extending in a linear manner along the wall surface and having an opening communicating with the gas flow passage at a location where the injector is inserted into the insertion hole, and a gas supplying pipe communicating with and connected to an outer end of the gas flow passage of the gas introduction part.

Abstract: A fluid heater includes: a passage member having a passage formed therein; a heater for heating the passage member; a fixing member for fixing the passage member to a fluid control device; and a connection member connected to the passage member so as to allow fluid to flow into the passage member. The passage has a helical shape.

Abstract: There is provided a pressure measuring device including: a first pressure gauge connected to a processing chamber configured to process a process target and configured to measure an internal pressure of the processing chamber when the process target is being processed; a second pressure gauge connected to the processing chamber; and a first switching valve configured to disconnect the second pressure gauge from the processing chamber when the process target is being processed inside the processing chamber.