Patents by Inventor Tsung-Mu Lai

Tsung-Mu Lai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11929434
    Abstract: A switch device includes a P-type substrate, a first gate structure, a first N-well, a shallow trench isolation structure, a first P-well, a second gate structure, a first N-type doped region, a second P-well, and a second N-type doped region. The first N-well is formed in the P-type substrate and partly under the first gate structure. The shallow trench isolation structure is formed in the first N-well and under the first gate structure. The first P-well is formed in the P-type substrate and under the first gate structure. The first N-type doped region is formed in the P-type substrate and between the first gate structure and the second gate structure. The second P-well is formed in the P-type substrate and under the second gate structure. The second N-type doped region is formed in the second P-well and partly under the second gate structure.
    Type: Grant
    Filed: April 15, 2022
    Date of Patent: March 12, 2024
    Assignee: eMemory Technology Inc.
    Inventors: Chih-Hsin Chen, Shih-Chen Wang, Tsung-Mu Lai, Wen-Hao Ching, Chun-Yuan Lo, Wei-Chen Chang
  • Publication number: 20230292516
    Abstract: A manufacturing method for a nonvolatile charge-trapping memory apparatus is provided. During the manufacturing process of the nonvolatile memory apparatus, a blocking layer of a storage device is effectively protected. Consequently, the blocking layer is not contaminated or thinned. Moreover, since the well regions of the logic device area and the memory device area are not simultaneously fabricated, it is feasible to fabricate small-sized nonvolatile memory cell in the memory device area and precisely control the threshold voltage of the charge trapping transistor.
    Type: Application
    Filed: March 10, 2023
    Publication date: September 14, 2023
    Inventors: Chun-Hsiao LI, Tsung-Mu LAI, Cheng-Yen SHEN, Chia-Jung HSU
  • Publication number: 20230262994
    Abstract: A resistive memory cell includes a P-well region, an isolation structure, an N-well region, a first gate structure, a second gate structure, a first N-type doped region, a second N-type doped region, a third N-type doped region, a fourth N-type doped region, a word line, a bit line, a conductor line and a program line. The third N-type doped region, the fourth N-type doped region and the N-well region are collaboratively formed as an N-type merged region. The bit line is connected with the first N-type doped region. The word line is connected with a conductive layer of the first gate structure. The conductor line is connected with the second N-type doped region and a conductive layer of the second gate structure. The program line is connected with the N-type merged region.
    Type: Application
    Filed: February 9, 2023
    Publication date: August 17, 2023
    Inventors: Tsung-Mu LAI, Wei-Chen CHANG, Chun-Hung LIN
  • Publication number: 20230240075
    Abstract: A memory cell of a charge-trapping non-volatile memory is provided. The memory cell is formed on a well region of a semiconductor substrate. The memory cell includes a storage transistor. A gate structure of the storage transistor includes a first tunneling layer, a second tunneling layer, a trapping layer, a blocking layer and a gate layer. The first tunneling layer is contacted with a surface of the well region. The second tunneling layer covers the first tunneling layer. The trapping layer covers the second tunneling layer. The blocking layer covers the trapping layer. The gate layer covers the blocking layer. The second tunneling layer has gradient nitrogen distribution. A first nitrogen concentration of a first region of the second tunneling layer close to the first tunneling layer is lower than a second nitrogen concentration of a second region of the second tunneling layer close to the trapping layer.
    Type: Application
    Filed: January 9, 2023
    Publication date: July 27, 2023
    Inventors: Chun-Hsiao LI, Tsung-Mu LAI, Cheng-Yen SHEN, Chia-Jung HSU
  • Patent number: 11663455
    Abstract: A resistive random-access memory cell includes a well region, a first doped region, a second doped region, a third doped region, a first gate structure, a second gate structure and a third gate structure. The first gate structure is formed over the surface of the well region between the first doped region and the second doped region. The second gate structure is formed over the second doped region. The third gate structure is formed over the surface of the well region between the second doped region and the third doped region. A first metal layer is connected with the first doped region and the third doped region. A second metal layer is connected with the conductive layer of the first gate structure and the conductive layer of the third gate structure.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: May 30, 2023
    Assignee: EMEMORY TECHNOLOGY INC.
    Inventors: Tsung-Mu Lai, Wei-Chen Chang, Hsueh-Wei Chen
  • Publication number: 20230052438
    Abstract: A random code generating method for the magnetoresistive random access memory is provided. Firstly, a first magnetoresistive random access memory cell and a second magnetoresistive random access memory cell are programmed into an anti-parallel state. Then, an initial value of a control current is set. Then, an enroll action is performed on the first and second magnetoresistive random access memory cells. If the first and second magnetoresistive random access memory cells fail to pass the verification action, the control current is increased by a current increment, and the step of setting the control current is performed again. If the first and second magnetoresistive random access memory cells pass the verification action, a one-bit random code is stored in the first magnetoresistive random access memory cell or the second magnetoresistive random access memory cell.
    Type: Application
    Filed: June 14, 2022
    Publication date: February 16, 2023
    Inventors: Tsung-Mu LAI, Chun-Yuan LO, Chun-Chieh CHAO
  • Publication number: 20230046230
    Abstract: A forming control method for a resistive random-access memory cell array is provided. While a forming action of the resistive random-access memory cell array is performed, a verification action is performed to judge whether the forming action on the resistive random-access memory cells has been successfully done. By properly changing a forming voltage or a pulse width, the forming actions on all of the resistive random-access memory cells of the resistive random-access memory cell array can be successfully done.
    Type: Application
    Filed: August 4, 2022
    Publication date: February 16, 2023
    Inventors: Tsung-Mu LAI, Meng-Chiuan WU, Wei-Chen CHANG, I-Lang LIN
  • Patent number: 11416416
    Abstract: A random code generator includes a differential cell array, a power supply circuit, a first selecting circuit and a current judgment circuit. The power supply circuit receives an enrolling signal and a feedback signal. The first selecting circuit receives a first selecting signal. When the enrolling signal is activated and an enrollment is performed on the first differential cell, the power supply circuit provides an enrolling voltage, and the enrolling voltage is transmitted to a first storage element and a second storage element of the first differential cell through the first selecting circuit. Consequently, the cell current is generated. When a magnitude of the cell current is higher than a specified current value, the current judgment circuit activates the feedback signal, so that the power supply circuit stops providing the enrolling voltage.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: August 16, 2022
    Assignee: EMEMORY TECHNOLOGY INC.
    Inventors: Tsung-Mu Lai, Chun-Fu Lin, Chun-Chieh Chao
  • Publication number: 20220246758
    Abstract: A switch device includes a P-type substrate, a first gate structure, a first N-well, a shallow trench isolation structure, a first P-well, a second gate structure, a first N-type doped region, a second P-well, and a second N-type doped region. The first N-well is formed in the P-type substrate and partly under the first gate structure. The shallow trench isolation structure is formed in the first N-well and under the first gate structure. The first P-well is formed in the P-type substrate and under the first gate structure. The first N-type doped region is formed in the P-type substrate and between the first gate structure and the second gate structure. The second P-well is formed in the P-type substrate and under the second gate structure. The second N-type doped region is formed in the second P-well and partly under the second gate structure.
    Type: Application
    Filed: April 15, 2022
    Publication date: August 4, 2022
    Applicant: eMemory Technology Inc.
    Inventors: Chih-Hsin Chen, Shih-Chen Wang, Tsung-Mu Lai, Wen-Hao Ching, Chun-Yuan Lo, Wei-Chen Chang
  • Patent number: 11398259
    Abstract: A memory cell array of a multi-time programmable non-volatile memory includes plural memory cells. The memory cell has the structure of 1T1C cell, 2T1C cell or 3T1C cell. Moreover, the floating gate transistors of the memory cells in different rows of the memory cell array are constructed in the same well region. Consequently, the chip size is reduced. Moreover, by providing proper bias voltages to the memory cell array, the program action, the erase action or the read action can be performed normally.
    Type: Grant
    Filed: February 24, 2021
    Date of Patent: July 26, 2022
    Assignee: EMEMORY TECHNOLOGY INC.
    Inventors: Chih-Hsin Chen, Chun-Yuan Lo, Shih-Chen Wang, Tsung-Mu Lai
  • Publication number: 20220199622
    Abstract: A cell array structure includes a first resistive memory cell. The first resistive memory cell includes a well region, a first doped region, a merged region, a first gate structure, a second gate structure and a first metal layer. The first doped region is formed under a surface of the well region. The merged region is formed under the surface of the well region. The first gate structure is formed over the surface of the well region between the first doped region and the merged region. The first gate structure includes a first insulation layer and a first conductive layer. The second gate structure is formed over the merged region. The second gate structure includes a second insulation layer and a second conductive layer. The first metal layer is connected with the first doped region.
    Type: Application
    Filed: August 31, 2021
    Publication date: June 23, 2022
    Inventors: Tsung-Mu LAI, Wei-Chen CHANG
  • Patent number: 11335805
    Abstract: A switch device includes a P-type substrate, a first gate structure, a first N-well, a shallow trench isolation structure, a first P-well, a second gate structure, a first N-type doped region, a second P-well, and a second N-type doped region. The first N-well is formed in the P-type substrate and partly under the first gate structure. The shallow trench isolation structure is formed in the first N-well and under the first gate structure. The first P-well is formed in the P-type substrate and under the first gate structure. The first N-type doped region is formed in the P-type substrate and between the first gate structure and the second gate structure. The second P-well is formed in the P-type substrate and under the second gate structure. The second N-type doped region is formed in the second P-well and partly under the second gate structure.
    Type: Grant
    Filed: September 8, 2020
    Date of Patent: May 17, 2022
    Assignee: eMemory Technology Inc.
    Inventors: Chih-Hsin Chen, Shih-Chen Wang, Tsung-Mu Lai, Wen-Hao Ching, Chun-Yuan Lo, Wei-Chen Chang
  • Publication number: 20210287746
    Abstract: A memory cell array of a multi-time programmable non-volatile memory includes plural memory cells. The memory cell has the structure of 1T1C cell, 2T1C cell or 3T1C cell. Moreover, the floating gate transistors of the memory cells in different rows of the memory cell array are constructed in the same well region. Consequently, the chip size is reduced. Moreover, by providing proper bias voltages to the memory cell array, the program action, the erase action or the read action can be performed normally.
    Type: Application
    Filed: February 24, 2021
    Publication date: September 16, 2021
    Inventors: Chih-Hsin CHEN, Chun-Yuan LO, Shih-Chen WANG, Tsung-Mu LAI
  • Publication number: 20210249601
    Abstract: A resistive random-access memory cell includes a well region, a first doped region, a second doped region, a third doped region, a first gate structure, a second gate structure and a third gate structure. The first gate structure is formed over the surface of the well region between the first doped region and the second doped region. The second gate structure is formed over the second doped region. The third gate structure is formed over the surface of the well region between the second doped region and the third doped region. A first metal layer is connected with the first doped region and the third doped region. A second metal layer is connected with the conductive layer of the first gate structure and the conductive layer of the third gate structure.
    Type: Application
    Filed: November 24, 2020
    Publication date: August 12, 2021
    Inventors: Tsung-Mu LAI, Wei-Chen CHANG, Hsueh-Wei CHEN
  • Patent number: 11062773
    Abstract: A near-memory computation system includes a plurality of computation nodes. Each computation node receives a plurality of input signals and outputs a computing result signal. The computation node includes a plurality of non-volatile memory cells and a processing element. Each non-volatile memory cell stores a weighting value during a program operation and outputs a weighting signal according to the weighting value during a read operation. The processing element is coupled to the plurality of non-volatile memory cells. The processing element receives the plurality of input signals and generates the computing result signal by performing computations with the plurality of input signals and a plurality of weighting signals generated by the plurality of non-volatile memory cells. The plurality of non-volatile memory cells and the processing element are manufactured by different or the same processes.
    Type: Grant
    Filed: March 22, 2020
    Date of Patent: July 13, 2021
    Assignee: eMemory Technology Inc.
    Inventors: Chun-Fu Lin, Ching-Yuan Lin, Tsung-Mu Lai, Chih-Hsin Chen
  • Patent number: 11063772
    Abstract: A multi-cell per bit nonvolatile memory (NVM) unit includes a select transistor disposed on a first oxide define (OD) region, a word line transistor disposed on the first OD region, and serially connected floating gate transistors disposed between the select transistor and the word line transistor. A first floating gate extension continuously extends toward a second OD region and adjacent to an erase gate region. A second floating gate extension continuously extends toward a third OD region and is capacitively coupled to a control gate region. A channel length of each of the floating gate transistors is shorter than that of the select transistor or the word line transistor.
    Type: Grant
    Filed: June 6, 2018
    Date of Patent: July 13, 2021
    Assignee: eMemory Technology Inc.
    Inventors: Chih-Hsin Chen, Tsung-Mu Lai, Shih-Chen Wang
  • Patent number: 10991430
    Abstract: A non-volatile memory cell includes a storage transistor having a first terminal, a second terminal, and a gate terminal. During a program operation, the first terminal of the storage transistor receives a data voltage according to a weighting to be stored in the non-volatile memory cell, the second terminal of the storage transistor is floating, and the gate terminal of the storage transistor is coupled to a program voltage. The program voltage is greater than the data voltage.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: April 27, 2021
    Assignee: eMemory Technology Inc.
    Inventors: Tsung-Mu Lai, Chih-Hsin Chen, Chun-Fu Lin
  • Publication number: 20210074855
    Abstract: A switch device includes a P-type substrate, a first gate structure, a first N-well, a shallow trench isolation structure, a first P-well, a second gate structure, a first N-type doped region, a second P-well, and a second N-type doped region. The first N-well is formed in the P-type substrate and partly under the first gate structure. The shallow trench isolation structure is formed in the first N-well and under the first gate structure. The first P-well is formed in the P-type substrate and under the first gate structure. The first N-type doped region is formed in the P-type substrate and between the first gate structure and the second gate structure. The second P-well is formed in the P-type substrate and under the second gate structure. The second N-type doped region is formed in the second P-well and partly under the second gate structure.
    Type: Application
    Filed: September 8, 2020
    Publication date: March 11, 2021
    Inventors: Chih-Hsin Chen, Shih-Chen Wang, Tsung-Mu Lai, Wen-Hao Ching, Chun-Yuan Lo, Wei-Chen Chang
  • Patent number: 10910062
    Abstract: A random bit cell includes a latch and a nonvolatile memory cell. The nonvolatile memory cell includes a storage circuit, a control element, an erase element, and a read circuit. The storage circuit is coupled to a first terminal of the latch. The storage circuit includes a floating gate transistor having a first terminal, a second terminal, and a floating gate. The control element has a first terminal coupled to a control line, and a control terminal coupled to the floating gate of the floating gate transistor. The erase element has a first terminal coupled to an erase line, and a control terminal coupled to the floating gate of the floating gate transistor. The read circuit is coupled to a bit line, a select gate line, and the floating gate of the floating gate transistor.
    Type: Grant
    Filed: November 27, 2019
    Date of Patent: February 2, 2021
    Assignee: eMemory Technology Inc.
    Inventors: Tsung-Mu Lai, Hung-Hsiang Wang, Cheng-Te Yang, Chih-Hsin Chen
  • Publication number: 20200365209
    Abstract: A near-memory computation system includes a plurality of computation nodes. Each computation node receives a plurality of input signals and outputs a computing result signal. The computation node includes a plurality of non-volatile memory cells and a processing element. Each non-volatile memory cell stores a weighting value during a program operation and outputs a weighting signal according to the weighting value during a read operation. The processing element is coupled to the plurality of non-volatile memory cells. The processing element receives the plurality of input signals and generates the computing result signal by perform computations with the plurality of input signals and a plurality of weighting signals generated by the plurality of non-volatile memory cells. The plurality of non-volatile memory cells and the processing element are manufactured by different or the same processes.
    Type: Application
    Filed: March 22, 2020
    Publication date: November 19, 2020
    Inventors: Chun-Fu Lin, Ching-Yuan Lin, Tsung-Mu Lai, Chih-Hsin Chen